JPS5951326B2 - gas absorption device - Google Patents
gas absorption deviceInfo
- Publication number
- JPS5951326B2 JPS5951326B2 JP53078091A JP7809178A JPS5951326B2 JP S5951326 B2 JPS5951326 B2 JP S5951326B2 JP 53078091 A JP53078091 A JP 53078091A JP 7809178 A JP7809178 A JP 7809178A JP S5951326 B2 JPS5951326 B2 JP S5951326B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- container
- reaction section
- absorption
- treated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Treating Waste Gases (AREA)
- Gas Separation By Absorption (AREA)
Description
【発明の詳細な説明】
本発明は多数の球状充填物を内蔵する竪型吸収容器と該
容器内に被処理ガスを送入するガス流入口と、吸収薬液
を充填物層に供給しその表面に付着させる薬液供給装置
と、球状充填物を揚送してこれを容器内に循環移動させ
るスクリューコンベヤ装置と、被処理ガスと接触して充
填物表面の薬液と反応してその表面に生成した反応生成
物を容器外に排出する掻取装置とよりなり、薬液は循環
移動する球状充填物層の表面に撒布されて各充填物の表
面に薬液を付着させて薄い被膜を形成させ被処理ガスは
ガス流入口より容器内に送入されて下降する充填物に対
向流してその隙間を上昇して流れ、これと接触し、その
間に充填物表面に付着する薬液の被膜に接触吸収されて
反応生成物を生成し、処理済の清浄ガスはガス排出口よ
り容器外に排出され、充填物は循環移動する間にその表
面の反応生成物が掻取装置により剥離された後、容器の
中心部に位置するスクリューコンベヤ装置によって揚送
されて薬物撒布地帯に返送される吸収装置に関するもの
である。DETAILED DESCRIPTION OF THE INVENTION The present invention provides a vertical absorption container containing a large number of spherical packings, a gas inlet for introducing a gas to be treated into the container, and a gas inlet for supplying an absorption chemical solution to a packing layer and a surface of the filling layer. a screw conveyor device that lifts up the spherical filling and circulates it into the container; It consists of a scraping device that discharges the reaction products out of the container, and the chemical solution is spread on the surface of the spherical packing layer that circulates and moves, and the chemical solution is attached to the surface of each packing material to form a thin film and remove the gas to be treated. is fed into the container from the gas inlet, flows counter-currently to the descending filling material, rises through the gap, comes into contact with it, and is absorbed by the chemical film that adheres to the surface of the filling material, causing a reaction. The processed clean gas is discharged from the gas outlet to the outside of the container, and the reaction products on the surface of the filling are removed by a scraping device while the filling is being circulated, and then removed to the center of the container. The invention relates to an absorption device that is lifted up by a screw conveyor device located in the area and returned to the drug distribution zone.
此の種のガス吸収装置に於て容器内に循環移動する充填
物に吸収薬液を斑無く均一に供給し、よって球状充填物
の表面に薬液を均等に付着させる事は被処理ガスの安定
したガス吸収性能を得る為の不可欠の要件である。In this type of gas absorption device, it is important to uniformly supply the absorbent chemical solution to the filling material that circulates within the container, and to make the chemical solution evenly adhere to the surface of the spherical packing material. This is an essential requirement for obtaining gas absorption performance.
これが為に従来より種々の提案がなされている。For this purpose, various proposals have been made in the past.
本発明はかかる目的の為に提案されたものでガス吸収装
置のスクリューコンベヤの回転軸と同軸の回転軸に掻均
し装置を設けこれを充填物層表面に沿って一定速度で回
転せしめ充填物層表面を掻き均してその高さを均一にす
ると共に掻均し装置の上部に吸収薬液供給装置を設け、
充填物表面に斑無く薬液を撒布し充填物の表面に均等な
る薬液の被膜を形成しよって安定したガスの吸収性能を
有ることを特徴としている。The present invention has been proposed for this purpose, and a leveling device is provided on the rotating shaft coaxial with the rotating shaft of the screw conveyor of the gas absorption device, and the leveling device is rotated at a constant speed along the surface of the packed layer. The layer surface is leveled to make its height uniform, and an absorption chemical supply device is installed above the leveling device.
It is characterized by having stable gas absorption performance by uniformly distributing the chemical liquid onto the surface of the filling material and forming a uniform coating of the chemical liquid on the surface of the filling material.
該掻均し装置は一定速度にて回転する回転軸より放射状
に突出する多数の連結棒から多数の爪を有するレークを
垂下した構造を有して居りその回転運動により継続的に
循環移動する充填物層表面を掻き均し堆積する充填物層
の高さを均一にする如く構成されて居り、又、該薬液供
給装置は該掻均し装置に併設されてその上方に位置する
ノズルより薬液を供給する構成を有し、掻均し装置の掻
均し作用を協働して循環移動する充填物層への斑の無い
均等なる薬液の撒布を可能とするもので被処理ガスの安
定した吸収効果を達成するものである。The leveling device has a structure in which rakes having a number of claws are suspended from a number of connecting rods that radially project from a rotating shaft that rotates at a constant speed, and the filling material that is continuously circulated by the rotational movement of the rake is suspended from a number of connecting rods that protrude radially from a rotating shaft that rotates at a constant speed. The chemical solution supply device is configured to scrape the surface of the filler layer to make the height of the deposited filler layer uniform, and the chemical solution supply device is attached to the leveling device and supplies the chemical solution from a nozzle located above it. This device has a supply structure that enables the uniform distribution of the chemical solution without unevenness to the filling layer that circulates and moves in cooperation with the leveling action of the leveling device, and it ensures stable absorption of the gas to be treated. It is what achieves the effect.
次に添付図面によって本発明に係るガス吸収装置の１実
施例の詳細を説明する。Next, details of one embodiment of the gas absorption device according to the present invention will be explained with reference to the accompanying drawings.
第１図は本発明によるガス吸収装置を示す縦断面図であ
り、図中１は竪型形状の吸収容器、２は被処理ガス流入
口、３は処理済ガス流出口、１１は充填物を揚送するス
クリューコンベヤ、９は多数の球状充填物、４は掻均し
装置、５は回転軸、６は掻取装置、７は反応生成物排出
口である。FIG. 1 is a longitudinal sectional view showing a gas absorption device according to the present invention, in which 1 is a vertical absorption container, 2 is an inlet for gas to be treated, 3 is an outlet for treated gas, and 11 is a filler. A screw conveyor for lifting, 9 a large number of spherical packings, 4 a leveling device, 5 a rotating shaft, 6 a scraping device, and 7 a reaction product outlet.
図中、塩化水素等の有害成分を含有する酸性被処理ガス
はガス流入口２より吸収容器１内に流入し、容器内の反
応部８にて降下する多数の球状充填物群９と対向流して
これと接触しながらその隙間を上昇しその間にその表面
に薄膜状に付着した薬液と反応し、含有の塩化水素等の
有害成分が吸収されて充填物表面に反応生成物を生成さ
せ浄化された後、流出口３より器外に排出される。In the figure, an acidic gas to be treated containing harmful components such as hydrogen chloride flows into an absorption container 1 from a gas inlet 2, and flows counter-flowing with a large number of spherical packings 9 that descend in a reaction section 8 inside the container. It rises through the gap while coming into contact with the filling material, and during that time it reacts with the chemical solution that adheres to the surface in a thin film form, and harmful components such as hydrogen chloride are absorbed and a reaction product is generated on the surface of the filling material, which is then purified. After that, it is discharged from the outlet 3 to the outside of the vessel.
一方、充填物は更に降下を続は容器内に反応部８を区画
する断面円錐形の仕切壁１０の狭い底部開口より落下し
、容器底部の掻取装置６によりその表面の反応生成物を
剥離した後、容器の中心部に位置して図示せざる駆動装
置によって駆動されて回動するスクリューコンベヤ１１
に揚送されて上昇し容器の上部に返送される。On the other hand, the filled material continues to fall through the narrow bottom opening of the partition wall 10 with a conical cross section that partitions the reaction section 8 in the container, and the reaction product on the surface is peeled off by the scraping device 6 at the bottom of the container. After that, a screw conveyor 11 is located at the center of the container and rotates by being driven by a drive device (not shown).
It is lifted up to the upper part of the container and returned to the upper part of the container.
容器の上部にはスクリューコンベヤと同軸の回転軸５に
掻均し装置４が設けられて居り、これは第２図に示す如
く回転軸５より放射状に突出する連結棒１２とこれより
垂下する多数の爪を有するレーク体１３より成って居り
回転軸５の回転に伴って回動し堆積する充填物層の表面
を均一に掻均す。At the top of the container, a leveling device 4 is installed on a rotating shaft 5 that is coaxial with the screw conveyor, and as shown in FIG. It consists of a rake body 13 having claws, which rotates with the rotation of the rotary shaft 5 to uniformly level the surface of the deposited filling layer.
該回転軸５には掻均し装置の上方に位置する薬液供給装
置が設けられて居り、これは回転軸の中心に形成された
薬液供給路１４とこれに連通するノズル１５及びその先
端に位置する１列に配列された多数の噴出口１６より構
成され該噴出口より図示せざる薬液貯蔵槽より供給され
る薬液が該掻均し装置により均一に掻均らされた充填物
層の表面に帯状に撒布される。The rotary shaft 5 is provided with a chemical supply device located above the leveling device, which consists of a chemical supply channel 14 formed at the center of the rotary shaft, a nozzle 15 communicating with the channel, and a nozzle 15 located at the tip thereof. The chemical liquid supplied from the chemical liquid storage tank (not shown) is made up of a large number of jet ports 16 arranged in one row, and the chemical liquid is supplied from the chemical liquid storage tank (not shown) to the surface of the packed layer that has been uniformly leveled by the leveling device. Spread in strips.
充填物群は既に述べたスクリューコンベヤの回転により
継続的に容器内に循環移動し、容器上部にて掻均し装置
によりその堆積層高が継続的に均一に掻均され、薬液供
給装置により薬液がむら無く均等に撒布され、かくして
充填物の表面に均等に吸収薬液が分配付着され、次の反
応部に於ける被処理ガスの安定した吸収効果の達成を可
能とする。The filling group is continuously circulated and moved into the container by the rotation of the screw conveyor mentioned above, and the leveling device at the top of the container continuously levels out the height of the piled layer, and the chemical solution supply device removes the chemical solution. In this way, the absorption chemical liquid is evenly distributed and adhered to the surface of the packing material, making it possible to achieve a stable absorption effect of the gas to be treated in the next reaction section.
本発明のガス吸収装置は上記の如き構造の掻均し装置及
び薬液供給装置を有するので薬液は循環移動する充填物
層にむら無く均等に供給され充填物表面の均等なる薬液
の付着を可能とし、よってガス吸収装置に於けるガス吸
収性能の向上に優れた効果を有して居る。Since the gas absorption device of the present invention has a leveling device and a chemical solution supply device having the above-described structure, the chemical solution is evenly and evenly supplied to the circulating packing layer, and the chemical solution can be evenly attached to the surface of the packing material. Therefore, it has an excellent effect on improving the gas absorption performance of the gas absorption device.
第１図は本発明に係るガス吸収装置の１実施例を示す縦
断面図、第２図はその要部を示す斜視図である。
尚、図中の主要部の符号は次の通りである。
１・・・・・・吸収容器、２・・・・・・被処理ガス流
入口、３・・・・・・処理済ガス排出口、４・・・・・
・掻均し装置、５・・・・・・回転軸、６・・・・・・
掻取装置、７・・・・・・反応生成物排出口、８・・・
・・・反応部、９・・・・・・多数の球状充填物、１０
・・・・・・仕切壁、１１・・・・・・スクリューコン
ベヤ、１２・・・・・・連結棒、１３・・・・・・レー
ク体、１４・・・・・・薬液供給路、１５・・・・・・
ノズル、１６・・・・・・噴出口。FIG. 1 is a longitudinal sectional view showing one embodiment of a gas absorption device according to the present invention, and FIG. 2 is a perspective view showing the main parts thereof. Incidentally, the symbols of the main parts in the figure are as follows. 1... Absorption container, 2... Treated gas inlet, 3... Treated gas outlet, 4...
- Leveling device, 5...rotating shaft, 6...
Scraping device, 7...Reaction product outlet, 8...
... Reaction part, 9 ... Many spherical packings, 10
......Partition wall, 11...Screw conveyor, 12...Connection rod, 13...Rake body, 14...Medical solution supply path, 15...
Nozzle, 16... spout.
Claims (1)
に反応部を区画し、該反応部の一側下方に被処理ガス流
入口を開設すると共に他側上方に処理済ガス流出口を開
設し、上記反応部に充填されて被処理ガスと接触反応し
た球状充填物を上記仕切壁の底部開口より落下せしめて
上記吸収容器の下方部に堆積層を形成し、該堆積層の球
状充填物表面の反応生成物を剥離する掻取装置を該吸収
容器の底部に設けると共に球状充填物を循環移動させる
スクリューコンベヤの下端取入れ口を臨ませ、一方、前
記反応部の上部には前記スクリューコンベヤの上端排出
口を開口せしめると共に薬液付着手段を設け、該スクリ
ューコンベヤと同軸の回転軸に設けられた掻き均し装置
のレーク体の後ろ側にこれに追随して回転するノズルを
併設して配置し、該ノズルに配列した多数の噴出口か薬
液を帯状に散布するようにしたことを特徴とするガス反
収装置。1. A partition wall is provided in the middle of a vertical absorption vessel, a reaction section is defined above the partition wall, and an inlet for the gas to be treated is opened at the bottom of one side of the reaction section, and an outlet for the processed gas is opened at the top of the other side. The spherical filler filled in the reaction section and reacted with the gas to be treated is allowed to fall through the bottom opening of the partition wall to form a deposited layer in the lower part of the absorption container. A scraping device for peeling off the reaction products on the surface of the packing is provided at the bottom of the absorption container, and faces the lower end intake of a screw conveyor that circulates the spherical packing, while the screw is installed in the upper part of the reaction section. A discharge port at the upper end of the conveyor is opened, a chemical liquid adhering means is provided, and a nozzle that rotates in accordance with the rake body of a scraping device provided on a rotating shaft coaxial with the screw conveyor is provided. What is claimed is: 1. A gas recovery device, characterized in that a large number of ejection ports arranged in the nozzle spray a chemical solution in a band shape.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP53078091A JPS5951326B2 (en) | 1978-06-29 | 1978-06-29 | gas absorption device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP53078091A JPS5951326B2 (en) | 1978-06-29 | 1978-06-29 | gas absorption device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS555709A JPS555709A (en) | 1980-01-16 |
| JPS5951326B2 true JPS5951326B2 (en) | 1984-12-13 |
Family
ID=13652174
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP53078091A Expired JPS5951326B2 (en) | 1978-06-29 | 1978-06-29 | gas absorption device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5951326B2 (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63236518A (en) * | 1987-03-26 | 1988-10-03 | Gadelius Kk | Gas absorption device |
| KR100454182B1 (en) * | 2001-06-21 | 2004-10-28 | 모던엔지니어링 주식회사 | Dust removing device of waste-gas-purifier using screw conveyer |
-
1978
- 1978-06-29 JP JP53078091A patent/JPS5951326B2/en not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| JPS555709A (en) | 1980-01-16 |
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