JPS5944916A - Multilayer thermally shrinkable tube - Google Patents
Multilayer thermally shrinkable tubeInfo
- Publication number
- JPS5944916A JPS5944916A JP15434282A JP15434282A JPS5944916A JP S5944916 A JPS5944916 A JP S5944916A JP 15434282 A JP15434282 A JP 15434282A JP 15434282 A JP15434282 A JP 15434282A JP S5944916 A JPS5944916 A JP S5944916A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- insulating layer
- tube
- shrinkable tube
- thermally shrinkable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Cable Accessories (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
この発明は、ゴムΦプラスチック電カケーフルの中間接
続部に使用する多層熱収縮チー−−プに関するものであ
る。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a multilayer heat-shrinkable cheapo used for intermediate connections of rubber Φ plastic electric cable cables.
発明の背景
電カケープルの中間接続部の補強絶縁層を収縮デユープ
によって構成するという提案はすてにある。しかし従来
の場合は、外部半導電層と補強絶縁層、あるいはさらに
内部半導電層を、各層ごとＧこ別の収縮チューブを使っ
て形成していた。BACKGROUND OF THE INVENTION Proposals have already been made to construct reinforcing insulating layers at intermediate connections of electrical cables by means of shrink duplexes. However, in the conventional case, the outer semiconducting layer, the reinforcing insulating layer, or the inner semiconducting layer were formed using G-sized shrink tubes for each layer.
そのため、１）何回も収縮チ３−ブをかぶせては収縮さ
せるという工程が必要で、手間がかかる、２）各層間の
接着がよくない、３）各層間にゴミや気泡が入る、など
の点があった。Therefore, 1) the process of covering the shrink tube and shrinking it many times is necessary, which is time-consuming, 2) the adhesion between each layer is not good, and 3) dust and air bubbles get between the layers, etc. There was a point.
この発明は、上記問題を解消するとともに、中間接続部
を小型化できる多層熱収縮チューブの提供を目的とする
ものである。The object of the present invention is to provide a multilayer heat-shrinkable tube that solves the above-mentioned problems and can reduce the size of the intermediate connection portion.
発明の構成
（１）たとえば「第１図」のように、少なくとも半導電
層１２と絶縁層１４とを有し、かつそれらの各層は強固
に密着して−体化していること、（，２）絶縁層１４中
に電極球２０を分散配置していること、
を特徴とする。Structure of the invention (1) For example, as shown in FIG. ) The electrode balls 20 are distributed in the insulating layer 14.
構成の説明
多層熱収縮チューブは、たとえば２層や３層あるいはグ
層の多層押出し機などによって同時押出しを行ない、そ
の１α後に架橋し、その後加熱１軟化させてふくらませ
、そのまま冷却して長尺の多層収縮チューブを作り、そ
れを所定の長さに切断して作る。Explanation of structure Multi-layer heat shrinkable tube is made by co-extruding, for example, using a multi-layer extruder with two, three or three layers, cross-linking after 1α, then heating to soften and swell, and then cooling to form a long length. Make a multilayer shrink tube and cut it to the desired length.
また電極球２０は０．５〜］０フｎηｌ稈［伍の鉄、銅
、７′ルミなどの金属や半導電性ポリエチレンなとから
なる。これを補強絶縁水中に分散配置すると、絶縁体内
部の半径方向と１ｔｑｌ＋力向に非常に多数の静電容量
が分布形成し、電圧を分担する。したがって補強絶縁層
を小型にすることかできる。Further, the electrode bulb 20 is made of metal such as iron, copper, 7'luminium, etc., or semiconductive polyethylene. When these are dispersed in reinforcing insulating water, a large number of capacitances are distributed in the radial direction and 1 tql+ force direction inside the insulator, and the voltage is shared. Therefore, the reinforcing insulating layer can be made smaller.
第１実施例（第１、第２図）
１０は収縮デユープの全体を示し、１２は半導電層、１
°４は絶縁層である。これらは−１−記のように密着し
て一体化している。1st Example (FIGS. 1 and 2) 10 indicates the entire shrinkage duplex, 12 indicates a semiconducting layer, 1
°4 is an insulating layer. These are closely integrated as shown in -1-.
絶縁層１４はたとえば架橋ポリエチレンやＥＰゴムなど
からなり、その中に多数の電極球２０を分散配置してい
る。The insulating layer 14 is made of, for example, crosslinked polyethylene or EP rubber, and a large number of electrode balls 20 are dispersed therein.
この収縮チューブ１０をケーブル導体接続部」二におい
て収縮させると、「第、２図」のようになる。すなわち
１０ａは補強絶縁層の全体、１２ａは外部半導電層、１
４． ａは補強絶縁層である。なおこの場合は内部半導
電層１６ａと谷埋め絶縁層１８ａはテープ巻きによって
形成している。またろ０はケーブルの全体、３２はケー
ブル導体、６４は導体接続部、６６はケーブル絶縁体で
あるっ第２実施例（第３、第５図）
上記第１図の収縮チューブ１０の絶縁層１４の内側にさ
らに半導電層１６を加えて、３層一体化したものである
。When this shrink tube 10 is shrunk at the cable conductor connection part 2, it becomes as shown in Fig. 2. That is, 10a is the entire reinforcing insulating layer, 12a is the outer semiconducting layer, 1
4. a is a reinforcing insulating layer. In this case, the internal semiconducting layer 16a and the valley-filling insulating layer 18a are formed by tape winding. In addition, 0 is the entire cable, 32 is the cable conductor, 64 is the conductor connection part, and 66 is the cable insulator.Second embodiment (Figs. 3 and 5) The insulation layer of the shrink tube 10 shown in Fig. 1 above. A semiconducting layer 16 is further added to the inside of 14 to form a three-layer structure.
この収縮チ３−ブ１０を導水接続部上において収縮させ
ると、「第を図」のようになるっずなわぢ１０ｂは補強
絶縁層の全体、１２ｂは外部半導電層、１４． ｂは補
強絶縁層、１６ｂは内＆１（半導電層である。なおこの
場合導体ろ２は同径接続し−Ｃいる。When this contraction tube 3-10 is contracted on the water-conducting connection part, the result will be as shown in Figure 1. The tube 10b is the entire reinforcing insulating layer, 12b is the outer semiconducting layer, 14. b is a reinforcing insulating layer, and 16b is an inner &1 (semiconducting layer). In this case, the conductor loops 2 are connected with the same diameter.
第３実施例（第Ｓ１第乙図）
収縮チ、−ブ１０を外側収縮チ３−ブ１０１と内側収縮
ヂー−ブ１０２の！つによって構成する０外側収縮チユ
ーブ１０１は、第１図の場合と同じように、半導電層１
２と絶縁層１４とからなり、かつ絶縁層１４中に電極球
２０を分散配置している。また内側収縮チューブ１０２
は半導電層１６と絶縁層１８との一体化したものからな
り、絶縁層１８中にも電極球２０を分散配置している。Third Embodiment (Figure S1) The contraction tube 10 is connected to the outer contraction tube 3-b 101 and the inner contraction tube 102! As in the case of FIG.
2 and an insulating layer 14, and electrode balls 20 are dispersed in the insulating layer 14. Also, the inner shrink tube 102
is made up of an integrated semiconducting layer 16 and an insulating layer 18, and electrode balls 20 are also dispersed in the insulating layer 18.
「第３図」のように、はじめ内側収縮チ、−ブ１０２を
導水接続部上において収縮させて、内部半導電層１６ｃ
と谷埋め絶縁層１８ｃとを形成する。そしてその」二に
外側収縮チューブ１０１を収縮させて、外部半導電層１
２ｃと補強絶縁層１４ｃとを形成し、補強絶縁体１０ｃ
全体を形成する。As shown in FIG. 3, the inner contraction tube 102 is first contracted on the water conduction connection part, and the inner semiconductive layer 16c is
and a valley-filling insulating layer 18c are formed. Then, the outer shrink tube 101 is shrunk, and the outer semiconductive layer 1 is
2c and a reinforcing insulating layer 14c, and reinforcing insulating material 10c.
form a whole.
な４にの場合、外側収縮チューブ１０１と内側収縮チュ
ーブ１０２とを別にしないて、はしめからそれらが密着
一体化した、を層の多１ψ７熱収縮チューフ゛としても
Ｊ二い。In the case of No. 4, the outer shrink tube 101 and the inner shrink tube 102 are not separated, and they are closely integrated from the clasp to a multi-layer 1ψ7 heat shrink tube.
発明の効果
（１）多層一体化しているので、中間接続部の形成時間
を短縮することができる。その際各層間にゴミや気泡が
入ることかない。Effects of the Invention (1) Since multiple layers are integrated, the time required to form the intermediate connection portion can be shortened. At this time, no dust or air bubbles will enter between the layers.
（，２）絶縁層１４中には、多数の電極球２０を分散配
置しているので、上記のようにそれらによって多数の静
電容量が分布形成されて、７１圧を分担する。したがっ
て中間接続部を小型にすることかできる。(,2) Since a large number of electrode balls 20 are distributed in the insulating layer 14, a large number of electrostatic capacitances are distributed and distributed as described above, and share 71 voltages. Therefore, the intermediate connection portion can be made smaller.
第１図と第３図と第５図はこの発明の異なる実施例の縦
断立面図、
第２図と第を図と第６図は、それぞれ第１図、第３図お
よび第Ｓ図の収縮チューブによって形成した中間接続部
の説明図。
１０：収縮チー−ブ
１２．１６：半導電層
１４．１８：絶縁層
２０：電極球
特許出願人 藤倉電線株式会社
代理人 １乎 啓次1, 3 and 5 are vertical sectional elevational views of different embodiments of the invention, and FIGS. An explanatory diagram of an intermediate connection portion formed by a shrink tube. 10: Shrinkage tube 12. 16: Semi-conductive layer 14. 18: Insulating layer 20: Electrode ball Patent applicant Fujikura Electric Cable Co., Ltd. Agent 1 Keiji
Claims (1)
密着して一体化しているとともに、ＡＱ記絶縁層中には
多数の電極球を分散配置していること、 を特徴とする多層熱収縮チューブ。[Scope of Claims] It comprises at least a semiconducting layer and an insulating layer, and each of the layers is closely integrated with each other, and a large number of electrode balls are dispersed in the insulating layer AQ; Multi-layer heat shrink tubing featuring:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15434282A JPH0232848B2 (en) | 1982-09-03 | 1982-09-03 | TASONETSUSHUSHUKUCHUUBU |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15434282A JPH0232848B2 (en) | 1982-09-03 | 1982-09-03 | TASONETSUSHUSHUKUCHUUBU |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5944916A true JPS5944916A (en) | 1984-03-13 |
| JPH0232848B2 JPH0232848B2 (en) | 1990-07-24 |
Family
ID=15582050
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15434282A Expired - Lifetime JPH0232848B2 (en) | 1982-09-03 | 1982-09-03 | TASONETSUSHUSHUKUCHUUBU |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0232848B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4715487A (en) * | 1984-12-28 | 1987-12-29 | Toyo Seimaiki Seisakusho K. K. | Chute for optical selector |
| JP5981414B2 (en) * | 2011-03-17 | 2016-08-31 | 古河電気工業株式会社 | Superconducting cable fixing structure and superconducting cable line fixing structure |
-
1982
- 1982-09-03 JP JP15434282A patent/JPH0232848B2/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4715487A (en) * | 1984-12-28 | 1987-12-29 | Toyo Seimaiki Seisakusho K. K. | Chute for optical selector |
| JP5981414B2 (en) * | 2011-03-17 | 2016-08-31 | 古河電気工業株式会社 | Superconducting cable fixing structure and superconducting cable line fixing structure |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0232848B2 (en) | 1990-07-24 |
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