JPS5921739B2 - Electrolytic processing equipment - Google Patents
Electrolytic processing equipmentInfo
- Publication number
- JPS5921739B2 JPS5921739B2 JP5766475A JP5766475A JPS5921739B2 JP S5921739 B2 JPS5921739 B2 JP S5921739B2 JP 5766475 A JP5766475 A JP 5766475A JP 5766475 A JP5766475 A JP 5766475A JP S5921739 B2 JPS5921739 B2 JP S5921739B2
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- electrolytic
- electrolytic processing
- flow
- periphery
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
Description
【発明の詳細な説明】
本発明は電解加工装置、特に気泡が混在している電解液
を電極にもうけられた分流孔から噴射して被加工物を電
解加工する電解加工装置において、上記電極等を保持す
る支持台に取付けられたチャック部に傘型で周辺が次第
に挟小になる傾斜空所と、周辺部に向つてその長さが次
第に短かくなつている多数の流入孔を有する整流部と、
整流マット並びに金網などよりなる邸抗層と、その下部
にもうけた電解液貯部とをもうけ、該貯部内の電解液の
流れを層流にして上記電極分流孔から供給するようにし
た電解加工装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to an electrolytic processing apparatus, particularly an electrolytic processing apparatus that electrolytically processes a workpiece by injecting an electrolytic solution containing air bubbles from a flow dividing hole provided in an electrode. A rectifying section has an umbrella-shaped slanted space whose periphery becomes gradually narrower in the chuck section attached to the support base that holds the flow, and a large number of inflow holes whose length gradually becomes shorter toward the periphery. and,
An electrolytic process comprising a rectifier mat, a wire mesh, etc., and an electrolyte storage section provided below the layer, and the flow of the electrolyte in the storage section is made into a laminar flow and is supplied from the electrode distribution hole. It is related to the device.
従来の電解加工装置は第１図にその原理を示す如く被加
工体１に電極２を対向せしめ、電極２の中央にもうけら
れた電解液流入口３より流入圧力３ないし１０に９／ｃ
ｒｉｌ程度で電解液４を供給し被加工物１に上記電解液
４を噴射すると共に、上記電極２と被加工物１との間に
上記電解液４を介して直流１０ないし１５Ｖで、１ない
し２Ａ／一程度の電流を流すことにより電解作用を利用
して被加工物１を徐々に加工せしめ、加工孔５を穿つよ
うにされる。この間電解面には陽極酸化皮膜が形成され
易く該酸化皮膜は上記電解作用を妨たげ、或いは停止さ
れる。このため上記の如く電解液を噴射すると共に容積
比ｌ（電解液）；５〜１０（気泡）の割で電解液中に気
泡を混在せしめ被加工物１の電解面に噴射せしめるよう
にしている。しかし第２図に示すように断面が所定以上
の面積をもつ如き電解をもつて加工を行なう場合、電極
２内に等間隔に均一な分流孔６をもうけ各分流孔６から
加工面均等に供給するように配慮することが必要となる
。第３図は多数の分流孔６をあけた電極をもつ従来の電
極部のーー例を示す。As shown in FIG. 1, a conventional electrolytic processing apparatus has an electrode 2 facing a workpiece 1, and an inflow pressure of 3 to 10 to 9/c from an electrolyte inlet 3 provided at the center of the electrode 2.
The electrolytic solution 4 is supplied at about ril, and the electrolytic solution 4 is injected onto the workpiece 1, and at the same time, a DC voltage of 10 to 15 V is applied between the electrode 2 and the workpiece 1 via the electrolytic solution 4. By passing a current of about 2 A/1, the workpiece 1 is gradually machined using electrolytic action, and the machined hole 5 is bored. During this time, an anodic oxide film is likely to be formed on the electrolytic surface, and this oxide film hinders or stops the electrolytic action. For this reason, while injecting the electrolytic solution as described above, bubbles are mixed in the electrolytic solution at a volume ratio of 1 (electrolytic solution) to 5 to 10 (bubbles) and are injected onto the electrolytic surface of the workpiece 1. . However, as shown in Fig. 2, when processing with electrolysis whose cross section has a predetermined area or more, evenly spaced dividing holes 6 are formed in the electrode 2 so that the flow is uniformly supplied from each dividing hole 6 to the machined surface. It is necessary to take care to do so. FIG. 3 shows an example of a conventional electrode section having an electrode with a large number of diversion holes 6.
即ちチャック支持台Ｔにチャック８を固着し、それらの
中央には電解液４を流通させる流入孔９、１０がもうけ
られている。上記チャック８の下方には上部に貯部１１
を有する加工電極２が固着される。該電極２に加工形状
に対応した断面形状をもち該電極２内には同じく略等間
隔に配置された分流孔６がもうけられている。今電解液
４を流入孔９より圧入すれば電解液４は電極２の上部に
ある貯部１１に流入されるがその両端部から僅かに入つ
た所の点（２）において電解液４は矢印１２の如く渦流
となり、分流孔６に流入されるとき中心部囚の分流孔６
では電解液と気泡との比率は所望のものとなるが、上記
渦流発生部（２）において気泡の比率が大となり、両端
部（０において気泡の比率が小となる。このため電極２
における点囚部、点８部および点◎部とで夫夫加工速度
に差を生じ、特に電極の両端部即ち点Ｃ部において大き
く加工され、加工精度が著しく劣化する。本発明は上記
の点を解決することを目的としており上記目的に合致し
た整流手段をもつ電解加工装置を提供することを目的と
している。That is, a chuck 8 is fixed to a chuck support T, and inlet holes 9 and 10 through which the electrolytic solution 4 flows are formed in the center thereof. Below the chuck 8 there is a reservoir 11 at the top.
A machining electrode 2 having a diameter is fixed. The electrode 2 has flow dividing holes 6 having a cross-sectional shape corresponding to the processed shape and arranged at approximately equal intervals within the electrode 2. If the electrolytic solution 4 is now pressurized through the inflow hole 9, it will flow into the reservoir 11 at the top of the electrode 2, but the electrolytic solution 4 will flow into the reservoir 11 at the top of the electrode 2 at the point (2) where it enters slightly from both ends. When the flow becomes a vortex as shown in 12 and flows into the dividing hole 6, the central dividing hole 6
In this case, the ratio of the electrolyte to the bubbles becomes the desired one, but the ratio of bubbles becomes large in the vortex generating section (2), and the ratio of bubbles becomes small at both ends (0).
There is a difference in machining speed between the point prisoner part, point 8 part, and point ◎ part, and the machining speed is particularly large at both ends of the electrode, that is, the point C part, and the machining accuracy is significantly deteriorated. The present invention aims to solve the above-mentioned problems and provides an electrolytic processing apparatus having a rectifying means that meets the above-mentioned aims.
以下第４図を参照しつつ本発明を説明する。第４図は本
発明による一実施例電解加工装置電極部の断面図を示す
。The present invention will be explained below with reference to FIG. FIG. 4 shows a sectional view of an electrode section of an electrolytic processing apparatus according to an embodiment of the present invention.
第４図において第３図と同一符号は同一部分を表わす。In FIG. 4, the same symbols as in FIG. 3 represent the same parts.
また１３は電解液４の流体圧力均一化部であつて傘型で
周辺が次第に挟小になつている傾斜空所１４を有する。
該傾斜空所１４は、その下にもうけられた整流部１５に
接触され、該整流部にもうけられかつ周辺部へ行くに従
つてその長さが短くなつている多数の流入孔１０に連通
されている。該整流部１５の下部には合成樹脂繊維のマ
ツト１６がもうけられ該マツト１６は横方向には強い流
力抵抗を示し、縮方向には小さな抵抗を示すように考慮
されている。また上記マツト１６は目の細かい金網１７
により支持されており、上記マツト１６および金網１７
は本明細書にいう抵抗部を構成する。該抵抗部の下方に
は貯部１１が形成されている。そこで、流入孔９から流
入された電解液４は傾斜空所１４に流入され流体圧力が
均一化されて、流入孔１０により分流されて整流される
。Reference numeral 13 denotes a fluid pressure equalization section for the electrolytic solution 4, which has an umbrella-shaped inclined space 14 whose periphery becomes gradually narrower.
The inclined cavity 14 is brought into contact with a rectifying section 15 provided below, and is communicated with a large number of inflow holes 10 provided in the rectifying section, the length of which decreases toward the periphery. ing. A mat 16 made of synthetic resin fibers is provided at the lower part of the rectifying section 15, and the mat 16 is designed to exhibit strong flow resistance in the lateral direction and small resistance in the contraction direction. In addition, the mat 16 is a fine wire mesh 17.
The mat 16 and the wire mesh 17
constitutes the resistance section referred to in this specification. A storage portion 11 is formed below the resistance portion. Therefore, the electrolytic solution 4 flowing from the inflow hole 9 flows into the inclined space 14, the fluid pressure is equalized, and the flow is divided and rectified by the inflow hole 10.
該電解液はマツトなどの抵抗部における横方向の大きな
抵抗により横方向への流れをさらに整流されて、貯部１
１に流入される。即ち渦流をつくることなく貯部１１に
供給される。そして貯部１１から電極２の分流孔６を通
り電解液と気泡との体積比に変化を与えることなく均一
な層流となつて被加工物に噴流される。従つて電解加工
は均等に行なわれる。この場合、従来の装置と同様に流
入孔９においては、電解液４の圧力は３ないし１０ｋｇ
／Ｃｄであるが、貯部１０では２ないし６ｋｇ／Ｃｒｌ
ｌとなり所望の流体圧力を保つように配慮される。以下
の如く本発明によれば断面形状の面積が大きい電極を用
いて広い面積を加工する場合でも各部の加工速度が均一
であつて、加工精度を良好に保つことが可能となる。The flow of the electrolytic solution in the lateral direction is further rectified by the large lateral resistance in the resistance part such as the mat, and the flow is further rectified in the storage part 1.
1. That is, the water is supplied to the reservoir 11 without creating a vortex. Then, the liquid flows from the reservoir 11 through the flow dividing hole 6 of the electrode 2 and is jetted onto the workpiece as a uniform laminar flow without changing the volume ratio of the electrolytic solution and the bubbles. Therefore, electrolytic processing is performed uniformly. In this case, the pressure of the electrolytic solution 4 at the inflow hole 9 is 3 to 10 kg as in the conventional device.
/Cd, but in the reservoir 10 it is 2 to 6 kg/Crl
care is taken to maintain the desired fluid pressure. As described below, according to the present invention, even when machining a wide area using an electrode with a large cross-sectional area, the machining speed of each part is uniform and it is possible to maintain good machining accuracy.
また加工電極の断面形状が異なる場合でも、略等間隔に
分流孔６を穿つた電極をチヤツク８に取付けるだけで各
種の型の加工をすることができる。Furthermore, even when the cross-sectional shapes of the machining electrodes are different, various types of machining can be carried out simply by attaching the electrodes having flow dividing holes 6 at approximately equal intervals to the chuck 8.
第１図は従来の電解加工装置の原理を説明する説明図、
第２図は多数の孔をもうけた断面形状の面積が大きい電
極の一例、第３図は従来の電解加工装置における電極部
の構造を夫々示す。
第４図は本発明の電解加工装置における電極部の一実施
例構造を示す。図中１は被加工体、２は電極、４は電解
液、６は分流孔、７はチヤツク支持台、８はチヤツク、
９，１０は流入孔、１１は貯部、１３は流体圧力均一化
部、１４は傾斜空所、１７は整流部を表わす。Fig. 1 is an explanatory diagram explaining the principle of a conventional electrolytic processing device;
FIG. 2 shows an example of an electrode having a large cross-sectional area with a large number of holes, and FIG. 3 shows the structure of an electrode portion in a conventional electrolytic processing apparatus. FIG. 4 shows an embodiment of the structure of the electrode section in the electrolytic processing apparatus of the present invention. In the figure, 1 is the workpiece, 2 is the electrode, 4 is the electrolytic solution, 6 is the dividing hole, 7 is the chuck support, 8 is the chuck,
Reference numerals 9 and 10 represent inflow holes, 11 represents a storage portion, 13 represents a fluid pressure equalization portion, 14 represents an inclined cavity, and 17 represents a rectification portion.
Claims (1)
する電極をそなえ、気泡が混在している電解液を上記電
極にもうけられた複数の分流孔から噴射して電解加工す
る電解加工装置において、上記電極を保持するチャック
部に傘型で周辺が次第に挟小になる傾斜空所と、周辺部
に向つてその長さが、短かくなつている複数の流入孔を
有する整流部と、横方向に大きい流体抵抗をもち縦方向
に小さい流体抵抗をもつ抵抗層と、該抵抗層の下部にも
うけられた電解液貯部とをもうけ、該貯部内につくられ
た電解液の層流を上記電極にもうけられた分流孔に供給
したことを特徴とする電解加工装置。1. In an electrolytic processing apparatus that is equipped with an electrode having a cross-sectional shape corresponding to the processing shape of a workpiece and performs electrolytic processing by injecting an electrolytic solution containing bubbles from a plurality of branch holes provided in the electrode, The chuck part that holds the electrode has an umbrella-shaped inclined cavity whose periphery becomes gradually narrower, a rectifying part having a plurality of inlet holes whose length becomes shorter toward the periphery, and a rectifying part which has a plurality of inflow holes whose length becomes shorter toward the periphery; A resistance layer having a large fluid resistance and a small fluid resistance in the longitudinal direction is provided, and an electrolyte reservoir is provided at the bottom of the resistance layer, and a laminar flow of the electrolyte created in the reservoir is directed to the electrode. An electrolytic processing device characterized in that a flow is supplied to a diversion hole formed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5766475A JPS5921739B2 (en) | 1975-05-14 | 1975-05-14 | Electrolytic processing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5766475A JPS5921739B2 (en) | 1975-05-14 | 1975-05-14 | Electrolytic processing equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS51132132A JPS51132132A (en) | 1976-11-17 |
| JPS5921739B2 true JPS5921739B2 (en) | 1984-05-22 |
Family
ID=13062158
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5766475A Expired JPS5921739B2 (en) | 1975-05-14 | 1975-05-14 | Electrolytic processing equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5921739B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0328353Y2 (en) * | 1984-10-17 | 1991-06-18 |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006026361A (en) * | 2004-07-16 | 2006-02-02 | Hiroyoshi Fujimoto | One-touch hanger |
| JP2015039752A (en) * | 2013-08-23 | 2015-03-02 | 株式会社日立製作所 | Electrolytic processing device and electrolytic processing method |
| JP2017203667A (en) * | 2016-05-10 | 2017-11-16 | 日立造船株式会社 | Electrochemical processing apparatus |
-
1975
- 1975-05-14 JP JP5766475A patent/JPS5921739B2/en not_active Expired
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0328353Y2 (en) * | 1984-10-17 | 1991-06-18 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS51132132A (en) | 1976-11-17 |
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