JPS59204820A - Pattern defect detecting method - Google Patents
Pattern defect detecting methodInfo
- Publication number
- JPS59204820A JPS59204820A JP8041783A JP8041783A JPS59204820A JP S59204820 A JPS59204820 A JP S59204820A JP 8041783 A JP8041783 A JP 8041783A JP 8041783 A JP8041783 A JP 8041783A JP S59204820 A JPS59204820 A JP S59204820A
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- JP
- Japan
- Prior art keywords
- pattern
- light
- spatial filter
- fourier transform
- optical fourier
- Prior art date
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Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
- G01N21/956—Inspecting patterns on the surface of objects
- G01N21/95623—Inspecting patterns on the surface of objects using a spatial filtering method
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- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は、メツシュのストライブ等の光透過性単位パタ
ーンが規則的に繰υ返し配列されたパターンのパターン
欠陥検査方法に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a pattern defect inspection method for a pattern in which light-transmitting unit patterns such as mesh stripes are regularly and repeatedly arranged.
上記のような規則的な繰シ返しパターンの欠陥を検査す
る方法として光学的フーリエ変換空間フィルター法が知
られている。第１図はその原理を示すものであシ、レー
ザーヘッド（１）より出たレーザー光を集光レンズ（２
）、ピンホール板（３）、コリメーターレンズ（４）に
よシ、コヒーレントな平行光として被検パターン（５）
に照射する。An optical Fourier transform spatial filter method is known as a method for inspecting defects in regular repeating patterns as described above. Figure 1 shows the principle.The laser beam emitted from the laser head (1) is focused on the condenser lens (2).
), the pinhole plate (3), and the collimator lens (4) to detect the test pattern (5) as coherent parallel light.
irradiate.
パターンの透明部を通過した光はフーリエ変換レンズ（
６）によりその後焦点の位置に被検パターン（５）の光
学的フーリエ変換スペクトルを生ずる。The light that has passed through the transparent part of the pattern is passed through a Fourier transform lens (
6) then produces an optical Fourier transform spectrum of the test pattern (5) at the focal point.
空間フィルター（７）は前記フーリエ変換スペクトルを
写真記録する等の方法によって作成した遮光パターンを
もち正常な被検パターン（５）のスペクトルを遮光する
。被検パターン（５）の光照射部にパターン欠陥がある
とその部分からの光は空間フィルター（７）を通過し、
逆フーリエ変換レンズ（８）により、スクリーン又は検
出器（９）の位置に欠陥像を形成する。この欠陥像を目
視又は光検出装置で検出する事によシ容易にパターンの
欠陥部のみを検知する事ができる。The spatial filter (7) has a light-blocking pattern created by photographically recording the Fourier transform spectrum, and blocks the spectrum of the normal test pattern (5). If there is a pattern defect in the light irradiation part of the test pattern (5), the light from that part passes through the spatial filter (7),
An inverse Fourier transform lens (8) forms a defect image at the location of the screen or detector (9). By visually detecting this defect image or using a photodetector, it is possible to easily detect only the defective portion of the pattern.
この検査方法は繰り返しパターンの欠陥部のみを光学的
に抽出するため精密な機構、電気的な欠陥抽出回路等が
不要となシ装置化が容易で、ｌ）、また、パターン検査
で使われるビデオ信号処理による方法と比較し高速検査
も容易である。反面被検パターンと空間フィルターのパ
ターンが対応している為、検査するパターンの種類毎に
空間フィルターを用意しなければならずまた被検パター
ンの検査領域内で光透過性単位パターンの繰シ返しピッ
チ、配列角度、光透過性単位パターンの形、大きさ等が
変化する様なパターンは検査できない等制約がち如実用
化の障害となっていた。Since this inspection method optically extracts only the defective parts of repeated patterns, it does not require a precise mechanism or electrical defect extraction circuit, and is easy to implement. High-speed inspection is also easier compared to methods using signal processing. On the other hand, since the pattern to be inspected corresponds to the pattern of the spatial filter, a spatial filter must be prepared for each type of pattern to be inspected, and the light transmitting unit pattern must be repeated within the inspection area of the pattern to be inspected. There are many restrictions such as the inability to inspect patterns in which the pitch, arrangement angle, shape and size of the light-transmitting unit patterns change, etc., and this has been an obstacle to practical application.
本発明は空間フィルターの改良によシこれらの欠点を除
きフーリエ変換空間フィルター法による欠陥検査法の検
査可能パターンの種類を拡大し能率を向上させるべく研
究の結果、空間フィルターとして検査領域内で光透過性
単位パターンの繰シ返しピッチ等の異なった複数種のパ
ターン部分の透過光の光学的フーリエ変換スペクトルの
像を複合させて形成した、前記光学的フーリエ変換スペ
クトルの全てを遮光する遮光部を有する空間フィルター
を用いることによシ所期の目的を達成し得ることを見出
だし、かかる知見にもとづい雪氷発明を完成したもので
ある。The present invention aims to eliminate these drawbacks by improving the spatial filter, expand the types of patterns that can be inspected in the defect inspection method using the Fourier transform spatial filter method, and improve the efficiency. A light-shielding portion that blocks all of the optical Fourier-transformed spectra formed by combining images of optical Fourier-transformed spectra of transmitted light of a plurality of pattern portions with different repetition pitches of the transparent unit pattern. He discovered that the desired purpose could be achieved by using a spatial filter, and based on this knowledge, he completed the invention of snow and ice.
即ち、本発明の要旨は、光透過性単位パターンが規則的
に繰り返し配列されたパターンに平行光を照射し、欠陥
のない繰シ返しパターンによって生ずる回折光を遮光し
、パターン欠陥部からの光を通過させる空間フィルター
を備え、通過した光を目視又は光検出装置で検出するパ
ターン欠陥検出方法において、空間フィルターとして、
検査領域内で光透過性単位パターンの繰り返しピッチ等
の異なった複数種のパターン部分の透過光の光学的フー
リエ変換スペクトルの像を複合させて形成した、前記光
学的フーリエ変換スペクトルの全てを遮光する遮光部を
有する空間フィルターを用いることを特徴とするパター
ン欠陥検出方法である。That is, the gist of the present invention is to irradiate a pattern in which light-transmitting unit patterns are regularly and repeatedly arranged with parallel light, to block the diffracted light generated by the defect-free repeated pattern, and to block the light from the defective portions of the pattern. In a pattern defect detection method that includes a spatial filter that allows light to pass through and detects the passed light visually or with a photodetection device, as the spatial filter,
Blocking all of the optical Fourier transform spectra formed by combining images of optical Fourier transform spectra of transmitted light of multiple types of pattern portions with different repetition pitches of light transmitting unit patterns within the inspection area. This is a pattern defect detection method characterized by using a spatial filter having a light shielding part.
以下、本発明につき詳細に説明する。Hereinafter, the present invention will be explained in detail.
本発明について説明する前に検査すべきパターンと従来
の撮影型空間フィルターのパターンの関係について説明
する。Before explaining the present invention, the relationship between the pattern to be inspected and the pattern of a conventional photographic spatial filter will be explained.
第２図は等ピッチ、等開口中のストライプ状の光透過性
単位パターンを有する繰り返しパターンの例を示す。図
においてｐはパターンの繰り返しピッチ、ａは開口中、
１０は光透過性単位パターンを示す。次に第３図は第２
図示の繰シ返しパターンのパターン欠陥部検出用の撮影
型空間フィルターの遮光部パターンを示す。FIG. 2 shows an example of a repeating pattern having stripe-like light transmitting unit patterns with equal pitches and equal openings. In the figure, p is the repeating pitch of the pattern, a is the opening,
10 indicates a light transmitting unit pattern. Next, Figure 3 shows the second
The light-shielding part pattern of the photographic spatial filter for detecting pattern defects in the illustrated repeating pattern is shown.
第３図示の撮影型空間フィルターのパターンにおいて、
被検パターンの透過光のフーリエ変換スペクトルに対応
するドツト列のピッチＰｆは被検パターンの繰シ返しピ
ッチｐで決定され透ものであシ、又ドツト径ｄの変化は
単位パターン（スリット状）の開口巾ａによシ決定され
る。したがって被検パターンの繰り返しピッチ又は開口
中が異なれば正常パターンのフーリエ変換スペクトルと
空間フィルターパターンが一致せず正常パターンからの
光が空間フィルターを通過し検出部に達する為、欠陥識
別の８７Ｎ比が低下し高精度な検出ができない事となる
。In the pattern of the photographic spatial filter shown in the third diagram,
The pitch Pf of the dot row corresponding to the Fourier transform spectrum of the transmitted light of the test pattern is determined by the repetition pitch p of the test pattern, and the change in dot diameter d is determined by the unit pattern (slit shape). It is determined by the opening width a. Therefore, if the repetition pitch or aperture of the test pattern is different, the Fourier transform spectrum of the normal pattern and the spatial filter pattern will not match, and the light from the normal pattern will pass through the spatial filter and reach the detection part, resulting in a 87N ratio for defect identification. As a result, highly accurate detection cannot be performed.
本発明においては第３図示のような空間フィルターを改
良した第４図示のような改良型空間フィルターを用いる
ものである。In the present invention, an improved spatial filter shown in FIG. 4, which is an improved version of the spatial filter shown in FIG. 3, is used.
この改良型空間フィルターにおいては繰シ返しピッチｐ
１のストライブ状の光透過性単位パターン（図示せず）
に対応するドツトがピッチｐｆ。In this improved spatial filter, the repetition pitch p
1 striped light transmitting unit pattern (not shown)
The dot corresponding to is the pitch pf.
のところに表示されており、且つ繰シ返しピッチｐ２の
ストライプ状の光透過性単位パターン（図示せず）に対
応するドツトがピッチｐｆ２のところに表示されておシ
、両ドツト間が連続している。更に前記のドツトよシ高
次のドツトは相互に連続して棒状に表示されている。即
ち、この改良型空間フィルターにおいてはｐ１≦ｐ≦ｐ
２の範囲で徐々に変化する配列ピッチで配列された光透
過性単位パターンからなる複数種のパターン部分の透過
光の光学的フーリエ変換スペクトルの像に対応するドツ
トの列が複合せしめられて表示されているものである。A dot corresponding to a striped light transmitting unit pattern (not shown) with a repeating pitch p2 is displayed at a pitch pf2, and the dots are continuous. ing. Further, dots of a higher order than the above-mentioned dots are displayed in a continuous bar shape. That is, in this improved spatial filter, p1≦p≦p
A combination of rows of dots corresponding to images of optical Fourier transform spectra of transmitted light of a plurality of types of pattern portions consisting of light transmitting unit patterns arranged at an arrangement pitch that gradually changes within a range of 2 is displayed in a composite manner. It is something that
従って；この改良型空間フィルターによシ、被検パター
ンの繰シ返しピッチｐがｐ、〜ｐ２の間にあシ、開口巾
がｏ ＜ ａ ＜ ｐであるストライプ状の正常パター
ンからの光で遮光し同時に欠陥部からの光を通過させ得
るものである。この改良型空間フィルターによれば等ピ
ッチ等開口巾のストライブ状パターンで繰シ返しピッチ
ｐがｐ、≦ｐ≦ｐ２、開口巾ａがｏ （ａ （ｐ ４．
０・・種々のパターンが検査可能であシ、さらに繰り返
しピッチｐの変化する範囲がｐ、≦。Therefore, with this improved spatial filter, light from a normal striped pattern with a repetition pitch p of the test pattern between p and ~p2 and an aperture width of o < a < p. It can block light and at the same time allow light from the defective portion to pass through. According to this improved spatial filter, a striped pattern with equal pitch and equal aperture width has a repeating pitch p of p, ≦p≦p2, and an aperture width a of o (a (p 4.
0: Various patterns can be inspected, and the range in which the repetition pitch p changes is p≦.
ｐ≦ｐ２の範囲であれば検査領域内で徐々にピッチｐ及
び開口巾ａが変化するパターンの検査が可能である。If p≦p2, it is possible to inspect a pattern in which the pitch p and the aperture width a gradually change within the inspection area.
以上のように第４図示のような検査領域内で光透過性単
位パターンの繰シ返しピ、ソチ、配列角度、及び各単位
パターンの形、大きさ等が徐々に変化した複数種のパタ
ーン部分の透過光の光学的フーリエ変換スペクトルの像
を複合させて形成した、前記光学的フーリエ変換スペク
トルの全てを遮光する遮光部を有する空間ブイフレター
を用い、場所によシ光透過性単位パターンの繰シ返しピ
ッチ、配列角度、及び各単位〕くターンの形、大きさ等
が徐々に変化したパターンの欠陥部を検出することがで
きる。As described above, a plurality of types of pattern portions in which the repeating pitches, angles, and arrangement angles of the light-transmitting unit patterns and the shape, size, etc. of each unit pattern gradually change within the inspection area as shown in the fourth diagram. A spatial buiflet having a light-shielding part that blocks all of the optical Fourier-transformed spectrum, which is formed by combining the images of the optical Fourier-transformed spectrum of the transmitted light, is used to repeat the light-transmitting unit pattern from place to place. It is possible to detect defective portions of patterns in which the turn pitch, arrangement angle, and shape and size of each turn have gradually changed.
次に第５図は本発明において用いる別の改良型空間フィ
ルターを示す。Next, FIG. 5 shows another improved spatial filter for use in the present invention.
第５図示の改良型空間フィルターにおいては繰シ返しピ
ッチｐ ＝ ｐｌｌの繰シ返しパターンの透過光の光学
的フーリエ変換スペクトルの像と繰シ返しビ、テｐ ＝
ｐ１２の繰シ返しパターンの透過光の光学的フーリエ
変換スペクトルの像とを複合させてなる遮光部を有する
ものである。それであるからこの空間フィルター１つで
ｐ＝ｐ、１の繰シ返しパターンとｐ ＝ ｐ、２の繰り
返しパターンの両者の欠陥部の検出を行なうことができ
るものである。In the improved spatial filter shown in Figure 5, the image of the optical Fourier transform spectrum of the transmitted light of the repeating pattern with the repeating pitch p = pll and the repeating pitch p = p =
It has a light shielding part formed by combining the image of the optical Fourier transform spectrum of the transmitted light of the repeated pattern of p12. Therefore, this single spatial filter can detect defects in both the p=p, 1 repeating pattern and the p=p, 2 repeating pattern.
以上のように第５図示のような検査すべき複数種類の規
則的線シ返しパターンの透過光の光学的フーリエ変換ス
ペクトルの像を複合させて形成した、前記光学的フーリ
エ変換スペクトルの全てを遮光する遮光部を有する空間
フィルターを用い、複数種類の規則的線シ返しパターン
の欠陥部の検出を行なうことができる。As described above, all of the optical Fourier transform spectra formed by combining the images of the optical Fourier transform spectra of the transmitted light of the plurality of types of regular line reversal patterns to be inspected as shown in FIG. 5 are shaded. By using a spatial filter having a light-shielding portion, it is possible to detect defective portions of multiple types of regular line pattern.
尚、以上のべた例は一次元的な繰シ返しパターンの例で
あるが２次元の繰シ返しパターン例えば網目状パターン
に対しても同様な効果が奏せられるものである。Although the above-mentioned example is an example of a one-dimensional repeating pattern, the same effect can be achieved with a two-dimensional repeating pattern, such as a mesh pattern.
第１図は光学的フーリエ変換空間フィルター法の原理の
説明図、第２図は繰巾返しパターンの平面図、第３図は
第２図示のパターンの欠陥検出用の撮影型空間フィルタ
ーパターンの平面図、第４図は本発明において用いる改
良型空間フィルターの例の平面図、第５図は本発明にお
いて用いる改良型空間フィルターの他の例の平面図であ
る。
ｐ・・・・・・・・・被検パターンの繰り返しピッチａ
・・・・・・・・・開口巾
ｐｆ・・・・・・・・・繰シ返しピッチｐに対応する空
間フィルターのパターンのピッチ
ｄ・・・・・・・・・ドツト径
ｐｆ＋ ・・・・・・ｐ ＝ Ｉ）、のときのフーリエ
変換スペクトルのピッチ
ｐｈ ・・・・・・Ｉ） ＝ １）２のときのフーリ
エ変換スペクトルのピッチ
特許出願人 大日本印刷株式会社
代−−理 八 弁鳳士工弘 ｊ！ｉ 浮 エ第１図
第２図
第３図
第４図
２０６Figure 1 is an explanatory diagram of the principle of the optical Fourier transform spatial filter method, Figure 2 is a plan view of a repeating pattern, and Figure 3 is a plane view of a photographic spatial filter pattern for detecting defects in the pattern shown in Figure 2. FIG. 4 is a plan view of an example of the improved spatial filter used in the present invention, and FIG. 5 is a plan view of another example of the improved spatial filter used in the present invention. p・・・・・・Repetition pitch a of the test pattern
......Aperture width pf...Pitch d of spatial filter pattern corresponding to repetition pitch p...Dot diameter pf+... Pitch of the Fourier transform spectrum when p = I), ph ...Pitch of the Fourier transform spectrum when I) = 1) Patent applicant Dai Nippon Printing Co., Ltd. - Mr. 8 Benhoshi Kouhiro j! i Float Figure 1 Figure 2 Figure 3 Figure 4 206
Claims (3)
れたパターンに平行光を照射し、欠陥のない繰シ返しパ
ターンによって生ずる回折光を遮光しパターン欠陥部か
らの光を通過させる空間フィルターを備え、通過した光
を目視又は光検出装置で検出するパターン欠陥検出方法
において、空間フィルターとして、検査領域内で光透過
性単位パターンの繰り返しピッチ等が異なった複数種の
パターン部分の透過光の光学的フーリエ変換スペクトル
の像を複合させて形成した。 前記光学的フーリエ変換スペクトルの全てを遮光する遮
光部を有する空間フィルターを用いることを特徴とする
パターン欠陥検出方法。(1) A space in which parallel light is irradiated onto a pattern in which light-transmitting unit patterns are regularly arranged repeatedly, blocking diffracted light generated by the defect-free repeating pattern and allowing light from pattern defects to pass through. In a pattern defect detection method that includes a filter and detects the transmitted light visually or with a photodetector, the spatial filter is used to detect the transmitted light of multiple types of pattern parts with different repetition pitches of light-transmitting unit patterns within the inspection area. It was formed by combining the images of the optical Fourier transform spectra of . A pattern defect detection method characterized by using a spatial filter having a light shielding portion that shields all of the optical Fourier transform spectrum.
単位パターンの繰シ返しピッチ、配列角度、及び各単位
パターンの形、大きさ等が徐々に変化した複数種のパタ
ーン部分の透過光の光学的フーリエ変換スペクトルの像
を複合させて形成した、前記光学的フーリエ変換スペク
トルの全てを遮光する遮光部を有する空間フィルターを
用い、光透過性単位パターンの繰シ返しピッチ、配列角
度、及び各単位パターンの形、大きさ等が徐々に変化し
たパターンの欠陥部の検出を行なうことを特徴とする特
許請求の範囲第１項記載のパターン欠陥検出方法。(2) Optics of transmitted light of multiple types of pattern portions in which the repetition pitch, arrangement angle, shape, size, etc. of each unit pattern gradually change within the inspection area as the spatial filter. Using a spatial filter formed by combining images of the optical Fourier transform spectrum and having a light shielding part that blocks all of the optical Fourier transform spectrum, the repetition pitch, arrangement angle, and each unit of the light transmitting unit pattern can be determined. 2. The pattern defect detection method according to claim 1, wherein defective portions of a pattern whose shape, size, etc. have gradually changed are detected.
規則的な繰シ返しパターンの透過光の光学的フーリエ変
換スペクトルの像を複合させて形成した５、前記光学的
フーリエ変換スペクトルの全てを遮光する遮光部を有す
る空間フィルターを用い、複数種類の規則的繰り返しパ
ターンの欠陥部の検出を共通の空間フィＩレターで行な
うことを特徴とする特許請求の範囲第１項記載のパター
ン欠陥検出方法。(3) Formed by combining images of optical Fourier transform spectra of transmitted light of multiple types of regular repeating patterns to be inspected as the spatial filter 5. Blocking all of the optical Fourier transform spectra. 2. The pattern defect detection method according to claim 1, wherein defective portions of plural types of regularly repeated patterns are detected using a common spatial filter using a spatial filter having a light shielding portion.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8041783A JPS59204820A (en) | 1983-05-09 | 1983-05-09 | Pattern defect detecting method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8041783A JPS59204820A (en) | 1983-05-09 | 1983-05-09 | Pattern defect detecting method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS59204820A true JPS59204820A (en) | 1984-11-20 |
| JPH0420166B2 JPH0420166B2 (en) | 1992-03-31 |
Family
ID=13717713
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8041783A Granted JPS59204820A (en) | 1983-05-09 | 1983-05-09 | Pattern defect detecting method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59204820A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004177377A (en) * | 2002-11-29 | 2004-06-24 | Hitachi Ltd | Inspecting method and inspecting apparatus |
-
1983
- 1983-05-09 JP JP8041783A patent/JPS59204820A/en active Granted
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2004177377A (en) * | 2002-11-29 | 2004-06-24 | Hitachi Ltd | Inspecting method and inspecting apparatus |
| US7315363B2 (en) | 2002-11-29 | 2008-01-01 | Hitachi High-Technologies Corporation | Inspection method and inspection apparatus |
| US7586594B2 (en) | 2002-11-29 | 2009-09-08 | Hitachi High-Technologies Corporation | Method for inspecting defect and apparatus for inspecting defect |
| US7586593B2 (en) | 2002-11-29 | 2009-09-08 | Hitachi High-Tech Electronics Engineering Co., Ltd. | Inspection method and inspection apparatus |
| US7903244B2 (en) | 2002-11-29 | 2011-03-08 | Hitachi High-Technologies Corporation | Method for inspecting defect and apparatus for inspecting defect |
| US8094295B2 (en) | 2002-11-29 | 2012-01-10 | Hitachi High-Technologies Corporation | Inspection method and inspection apparatus |
| US8269959B2 (en) | 2002-11-29 | 2012-09-18 | Hitachi High-Technologies Corporation | Inspection method and inspection apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0420166B2 (en) | 1992-03-31 |
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