JPS59187304A - Optical transmission high polymer film and its manufacture - Google Patents
Optical transmission high polymer film and its manufactureInfo
- Publication number
- JPS59187304A JPS59187304A JP58062036A JP6203683A JPS59187304A JP S59187304 A JPS59187304 A JP S59187304A JP 58062036 A JP58062036 A JP 58062036A JP 6203683 A JP6203683 A JP 6203683A JP S59187304 A JPS59187304 A JP S59187304A
- Authority
- JP
- Japan
- Prior art keywords
- refractive index
- polymer film
- low refractive
- high polymer
- light guide
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
- G02B6/138—Integrated optical circuits characterised by the manufacturing method by using polymerisation
Abstract
Description
【発明の詳細な説明】
本発明は光伝送高分子フィルム及びその製造方法に関し
光導波路の大口径化及び良光伝送特性を図るものである
。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a light transmission polymer film and a method for manufacturing the same, and is intended to increase the diameter of an optical waveguide and improve light transmission characteristics.
第１図は従来の光伝送高分子フィルムの製造工程を示す
図面である。光又は電子線により反応するアクリル酸メ
チルなどの単量体を含んだポリカーボネートを塩化メチ
レンなどの溶媒中に溶かしたものを鏡面仕上げを施こし
た平板上に流し、溶媒を蒸発させて第１図（イ）に示し
たような膜厚が均一なポリカーボネートからなる透明高
分子フィルム（１）を作製（この作製法を溶液製造法と
言う）する。次に第１図（ロ）のように所定のパターン
穴（２）含有するマスク（３）を、前記透明高分子フィ
ルム（１）上に配置し、前記マスク上から光又は電子・
線（７）を照射し、単量体を選択的に反応させ低屈折Ｉ
重層（４）を形成する。最後に第７図（ハ）に示したよ
うにポリメチルメタクリレート等の低屈折率高分子（６
）で被覆することによシ光導波路（５）を得る。しかし
、光又は電子線Ｃ４）ＩＶｃＩよシ単量体を選択的に反
応させる場合、透明高分子フィルム（１）が厚いと深さ
方向に光又は電子線の散乱による反応層の広がシを生じ
、第１図（ハ）の如く断面が台形の光導波路（５）が出
来たり、光又は電子線の減衰による反応量の低下が起こ
り、低屈折率層（４）全体が完全に低屈折率にならない
欠点があった。そのため、従来の光伝送高分子フィルム
の場合、光導波路（５）の膜厚を厚くできず、従って導
光量が少なくなってしまったり、又低屈折率層（４）と
の屈折率差も大きくできないため光の伝送特性の悪い光
導波路になってしまうという難点があった。FIG. 1 is a drawing showing the manufacturing process of a conventional optical transmission polymer film. A polycarbonate containing a monomer such as methyl acrylate that reacts with light or electron beams is dissolved in a solvent such as methylene chloride and poured onto a flat plate with a mirror finish, and the solvent is evaporated. A transparent polymer film (1) made of polycarbonate having a uniform thickness as shown in (a) is produced (this production method is referred to as a solution production method). Next, as shown in FIG. 1(b), a mask (3) containing a predetermined pattern of holes (2) is placed on the transparent polymer film (1), and light or electronic light is applied from above the mask.
By irradiating the beam (7), the monomers are selectively reacted and the low refractive index I
Form a multilayer (4). Finally, as shown in Figure 7(c), a low refractive index polymer such as polymethyl methacrylate (6
) to obtain an optical waveguide (5). However, when selectively reacting monomers such as light or electron beam C4) IVcI, if the transparent polymer film (1) is thick, the reaction layer may spread in the depth direction due to scattering of the light or electron beam. As a result, an optical waveguide (5) with a trapezoidal cross section as shown in Fig. 1 (c) is formed, and the amount of reaction decreases due to attenuation of the light or electron beam, and the entire low refractive index layer (4) has a completely low refractive index. There were some drawbacks that could not be achieved. For this reason, in the case of conventional optical transmission polymer films, the film thickness of the optical waveguide (5) cannot be increased, resulting in a decrease in the amount of light guided, and also a large difference in refractive index with the low refractive index layer (4). This poses the problem of creating an optical waveguide with poor light transmission characteristics.
本発明は、これらの欠点を解決するため光導波路と同形
状の凸部を透明高分子フィルム作成時に形成し、該凸部
全光導波路としたことに特徴がある。以下、その詳細を
第２図の（イ）、（ロ）、（ハ）に示した／実施例の製
造工程を示す図面にょシ説明するつまず、作製する光導
波路と同形状の溝を有する鏡面仕上げの金型（８）上に
、従来例と同様にして溶液製造法によりポリカーボネイ
トからなる透明高分子フィルム（１）を作製すると、透
明高分子フィルム（１）は、第１図（イ）に示したごと
く、光導波路と同形状の凸部を有したものとなる。この
際、高分子フィルム中の溶媒の蒸発速度を正確にコント
ロールすることによシ、透明高分子フィルム中に、特に
凸部に気泡ができるのを防止する必要がある。In order to solve these drawbacks, the present invention is characterized in that a convex portion having the same shape as the optical waveguide is formed at the time of producing a transparent polymer film, and the convex portion is entirely an optical waveguide. The details will be explained below with reference to the drawings showing the manufacturing process of the example shown in (a), (b), and (c) of Figure 2.The groove has the same shape as the optical waveguide to be manufactured. When a transparent polymer film (1) made of polycarbonate is produced on a mirror-finished mold (8) by the solution manufacturing method in the same manner as in the conventional example, the transparent polymer film (1) is as shown in Fig. 1 (a). As shown in , it has a convex portion having the same shape as the optical waveguide. At this time, it is necessary to accurately control the evaporation rate of the solvent in the polymer film to prevent bubbles from forming in the transparent polymer film, especially in the convex portions.
この透明高分子フィルムの中には、前もって光又は電子
線によシ反応する透明高分子フィルムより低屈折率の例
えばアクリル酸メチルなとの単量体及び必要に応じてベ
ンゾインエチルエーテル等の増感剤、ハイドロキノン等
の禁止剤等を含浸させておく。次に、第２図（ロ）の如
く、マスク（３）を介して前記単量体全党もしくは電子
線（７）により選択的に反応させることにより、透明面
分子フィルム（１）中の光導波路となるべき白部分に隣
接する薄膜中に低屈折率層（４）全形成させる。この後
、約りＯ″Ｃにて真空乾燥することにより、未反応単量
体を除去し、ポリメチルメタクリレート等の低屈折率高
分子（６）で被覆すると、第２図０うの如く、光導波路
（５）の周囲は完全に低屈折率高分子層で覆われる。This transparent polymer film contains a monomer having a lower refractive index than the transparent polymer film that reacts with light or electron beams, such as methyl acrylate, and if necessary, an additive such as benzoin ethyl ether. Impregnate with inhibitors such as sensitizers and hydroquinone. Next, as shown in FIG. 2(b), the light guide in the transparent surface molecular film (1) is selectively reacted with the entire monomer or an electron beam (7) through a mask (3). A low refractive index layer (4) is entirely formed in the thin film adjacent to the white portion that is to become a wave path. Thereafter, unreacted monomers are removed by vacuum drying at about 0''C and coated with a low refractive index polymer (6) such as polymethyl methacrylate, as shown in Figure 2. The periphery of the optical waveguide (5) is completely covered with a low refractive index polymer layer.
これによシ、光導波路（５）の部分の屈折率をその周囲
よシ高くすることができ、光伝送特性の良い光伝送高分
子フィルムを作製できる。As a result, the refractive index of the optical waveguide (5) can be made higher than that of its surroundings, and a light transmission polymer film with good light transmission characteristics can be produced.
この様にして、作製された光伝送高分子フィルムにおい
ては、単量体の反応にょシ得られる低屈折率層（４）の
膜厚は光導波路（５）の厚さに関係なく薄くできるため
、光又は電子線の散乱による反応層の広がシも無視でき
、従って従来例の如く断面が台形の光導波路も形成され
ず、又、光又は電子線の減衰もなく、完全に単量体が反
応し低屈折率な層が得られる。さらに、光導波路（５）
は、金型（８）の溝形状を変えることにより、大口径化
は容易に行なうことができる。又、含浸単量体濃度の増
加等により低屈折率（４）の屈折率の低下を大きくする
ことができ、かっ光導波路（５）の大部分を覆う低屈折
率高分子（６）の屈折率は任意に設定できることｒＢ、
光導波路（５）とその周囲との屈折率差を大きくするこ
とができる。さらに、光導波路（５）の大口径化及び高
屈折率差が可能となったことＧ′こより、石英ファイバ
はもとより、従来の光伝送高分子フィルムでは不可能で
あった大口径から高屈折率差のプラスチックファイバと
の結合も容易となる。In the light transmission polymer film produced in this manner, the thickness of the low refractive index layer (4) obtained through the reaction of the monomers can be made thin regardless of the thickness of the optical waveguide (5). , the spread of the reaction layer due to the scattering of light or electron beams can be ignored, and therefore an optical waveguide with a trapezoidal cross section is not formed as in the conventional example, and there is no attenuation of light or electron beams, making it completely monomeric. reacts and a layer with a low refractive index is obtained. Furthermore, the optical waveguide (5)
The diameter can be easily increased by changing the groove shape of the mold (8). In addition, by increasing the concentration of the impregnated monomer, etc., the reduction in the refractive index of the low refractive index (4) can be increased, and the refraction of the low refractive index polymer (6) covering most of the optical waveguide (5) can be increased. The rate can be set arbitrarily rB,
The difference in refractive index between the optical waveguide (5) and its surroundings can be increased. Furthermore, it has become possible to increase the diameter of the optical waveguide (5) and achieve a high refractive index difference. Coupling with different plastic fibers is also facilitated.
以上、説明したように本発明の光伝送高分子フィルムは
任意の口径及び屈折率差の光導波路を形成することがで
きるため、光通信における端末や中継器などの、伝送路
と接続の必要な光学回路としての応用はもとより、短距
離伝送における光配線系のターミナル等にも応用できる
という大きな利点があるっAs explained above, the optical transmission polymer film of the present invention can form an optical waveguide with an arbitrary diameter and refractive index difference, so it is possible to form optical waveguides with arbitrary diameters and refractive index differences. It has the great advantage that it can be applied not only to optical circuits but also to optical wiring terminals for short-distance transmission.
第１図及び第２図はそ力、それ従来及び本発明の光伝送
高分子フィルムの製造工程を示す図面であるつ
（１）・・・透明高分子フィルム、（２）・・・パター
” 穴、（３）・・・マスク、（４）・・・低屈折率層
、（５）・・・光導波路、（６）−・・低屈折率高分子
、（７）・・・光もしくは電子線、（８）・・・金型っ
（イ）
（イ）
（ロ） ７
（ハ）Figures 1 and 2 are drawings showing the manufacturing process of conventional and inventive light transmitting polymer films. (1) Transparent polymer film, (2) Putter. hole, (3)...mask, (4)...low refractive index layer, (5)...optical waveguide, (6)...low refractive index polymer, (7)...light or Electron beam, (8)...mold (a) (b) (b) 7 (c)
Claims (1)
路の両側に高分子中に含まれた単量体を反応させて形成
した薄い低屈折率層とを備えたことを特徴とする光伝送
高分子フィルム１（２） 光又は電子線により反応す
る低屈折率単量体を含有した凸部を有する透明高分子フ
ィルムを作成する工程と、所定のマスクを介して単量体
を光又は電子線により選択的に反応させ薄い低屈折率層
を形成する工程と、未反応の単量体を除去する工程と、
前記透明高分子フィルムの外周を低屈折率高分子で被覆
する工程とからなることを特徴とする光伝送高分子フィ
ルムの製造方法。(1) A convex optical waveguide made of a transparent polymer, and a thin low refractive index layer formed by reacting a monomer contained in the polymer on both sides of the optical waveguide. Light transmission polymer film 1 (2) The process of creating a transparent polymer film having convex portions containing a low refractive index monomer that reacts with light or electron beams, and the process of introducing the monomer through a predetermined mask. A step of selectively reacting with light or an electron beam to form a thin low refractive index layer, and a step of removing unreacted monomers,
A method for producing a light transmission polymer film, comprising the step of coating the outer periphery of the transparent polymer film with a low refractive index polymer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58062036A JPS59187304A (en) | 1983-04-08 | 1983-04-08 | Optical transmission high polymer film and its manufacture |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58062036A JPS59187304A (en) | 1983-04-08 | 1983-04-08 | Optical transmission high polymer film and its manufacture |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS59187304A true JPS59187304A (en) | 1984-10-24 |
Family
ID=13188532
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58062036A Pending JPS59187304A (en) | 1983-04-08 | 1983-04-08 | Optical transmission high polymer film and its manufacture |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS59187304A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5136678A (en) * | 1990-02-19 | 1992-08-04 | Brother Kogyo Kabushiki Kaisha | Optical wave guide array |
-
1983
- 1983-04-08 JP JP58062036A patent/JPS59187304A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5136678A (en) * | 1990-02-19 | 1992-08-04 | Brother Kogyo Kabushiki Kaisha | Optical wave guide array |
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