JPS59166250A - Surface-layer heat-treating rice cleaning method - Google Patents
Surface-layer heat-treating rice cleaning methodInfo
- Publication number
- JPS59166250A JPS59166250A JP4059283A JP4059283A JPS59166250A JP S59166250 A JPS59166250 A JP S59166250A JP 4059283 A JP4059283 A JP 4059283A JP 4059283 A JP4059283 A JP 4059283A JP S59166250 A JPS59166250 A JP S59166250A
- Authority
- JP
- Japan
- Prior art keywords
- rice
- grains
- milling
- rice grains
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Adjustment And Processing Of Grains (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
【発明の詳細な説明】
本発明は、原料米の糠層にJ経くきずをつける程度に粗
搗稍を施したものに、その表層温度及び水分を調質して
、糠層が低い圧力で際離しゃ丁いようにして搗精する精
米法に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention is based on the rice bran, which has been coarsely milled to the extent that the bran layer is roughened to the extent that scratches are formed. This relates to a method of polishing rice in which rice is milled in a manner that the rice grains are separated from each other.
次に、本発明について述べるに、
従来の搗精方法には、種々あるが大別すれば乾式搗精と
湿式搗精があり、乾式搗精は通常玄米を自然状態の空気
中で搗精することで、そのほとんどは大気の空気を搗精
室内に噴風し、その空気を米粒にあてながら搗精する方
法である。また、湿式搗精は搗精室への噴風空気を高温
多湿にしたり、水を噴霧またはミスト空気を米粒に接触
して搗精する方法である。その外に搗精の前に玄米を適
温、適湿に静置したシ、また水の噴霧、ミスト空気の接
触等によって、玄米を予め適温適湿に調質する方法があ
る。そして、このような従来方法を種々研究中に、米粒
の糠層の擦離を一層効果的に改良するため、扁精前に米
粒の糠層のみを主体に予備処理を施すことに着目し、こ
れによって従来搗精における省エネルギーを改良し、歩
留シを−良くし、しかも時代に即応した無洗精米を得る
ことに専心し、かくて、次の事項の改良目的を達成した
。すなわち、
1、 搗精に必要なエネルギーを節約すること。Next, to describe the present invention, there are various conventional methods of milling, but they can be roughly divided into dry milling and wet milling. This is a method in which air from the atmosphere is blasted into the milling chamber, and the air is applied to the rice grains while milling. In addition, wet milling is a method of milling rice grains by making the blast air to the milling room hot and humid, or by spraying water or mist air into contact with the rice grains. In addition, there is a method in which brown rice is left to stand at an appropriate temperature and humidity before milling, or a method in which brown rice is conditioned to an appropriate temperature and humidity by spraying water, contact with mist air, etc. While researching various conventional methods, we focused on pre-treating only the bran layer of rice grains before milling, in order to more effectively improve the abrasion of the bran layer of rice grains. By doing so, we have focused on improving the energy saving in conventional milling, improving the yield, and obtaining wash-free milled rice that is in line with the times, thus achieving the following improvement objectives. In other words, 1. To save the energy required for pumping.
2、 搗精歩留シ全向上する。2. Completely improve milling yield.
3、搗精による米温上昇で水分ロスを低くし米粒の内部
ひずみをなくし、ひび割粒、水湿割粒の発生を防止する
。3. Raising the rice temperature through milling reduces moisture loss and eliminates internal distortion of rice grains, preventing the occurrence of cracked grains and water-moist grains.
4、 脱芽性を向上する。4. Improve de-sprouting properties.
5、 無洗精米を実現する。5. Achieve washing-free rice.
そこで、このような問題を解決した本発明の工程を以下
に具体的に説8Aすると、
先ず、原料米を研削式精米機または、摩擦精米機等の通
常精米機にかけ、糠層に軽くキズを付ける程度の圧力で
処理する工程を施すのであるが、原料米、たとえば玄米
を研削式または摩擦式精米機にて高い圧力を加えること
なく、最低3%〜15%(望ましくは5%〜10%)の
荒板の出る程度に搗精して、玄米表面に軽くキズを付け
る。Therefore, the process of the present invention that solves such problems will be described in detail below. First, raw rice is passed through a grinding rice mill or a conventional rice mill such as a friction rice mill to lightly scratch the bran layer. However, raw rice, such as brown rice, is processed using a grinding or friction rice milling machine to reduce the amount of rice to a minimum of 3% to 15% (preferably 5% to 10%). ) Polish the brown rice until rough grains appear and lightly scratch the surface of the brown rice.
この処理によって、玄米表面に小量の水分を短時間付与
しても、急速にその表層部を加湿することができ、長時
間水の接触を必要としないから米粒の内芯部に水の滲透
することがなく、胴割れの心配がない。糠層の軽いキズ
はこの目的を達成するためで、荒板15%以上にすると
後述の粗搗精米のv4質と搗精の処理を循環的に繰返す
とき水が内芯部に滲透することになり、軽胴割れが生じ
、また搗精において糠中ρ微細粒が増加する原因となる
のである。そのため望ましくは荒板5%〜10%の生ず
る程度に米粒の全表層に軽いキズが生ずるのがよい。Through this process, even if a small amount of water is added to the surface of brown rice for a short period of time, the surface layer can be rapidly humidified, and since long-term contact with water is not required, water permeates into the inner core of the rice grain. There is no need to worry about the body breaking. The light scratches on the bran layer are to achieve this purpose, and if the rough plate is 15% or more, water will seep into the inner core when the V4 quality of coarsely milled rice and the milling process described later are repeated cyclically. This causes light body cracking and an increase in the number of fine grains in the rice bran during polishing. Therefore, it is preferable that light scratches occur on the entire surface layer of the rice grains to the extent that 5% to 10% of the grains are rough.
なお、本発明の原料米とは玄米また、その搗精中の未精
白米をいう。すなわち未精白の米粒を改めて、原料米と
して本発明の処理を施す場合が搗精し易いことがある。In addition, the raw material rice of the present invention refers to brown rice or unpolished white rice that is being milled. In other words, it may be easier to mill unmilled rice grains when they are used as raw material rice and subjected to the treatment of the present invention.
この軽いキズを付した玄米(以下粗搗精米と略す)は、
その表層に0.1〜1.0%望ましくは0.2〜0.6
%の水分を加湿し、それと共に表層温度を15〜25℃
に調整する調質の工程に移す。この工程は原料米の表層
を擦離し易くする軍費な調質工程である。This lightly scratched brown rice (hereinafter referred to as rough polished rice) is
0.1 to 1.0%, preferably 0.2 to 0.6
% of moisture and at the same time raise the surface temperature to 15-25℃.
Move on to the refining process to adjust the temperature. This process is an expensive tempering process that makes it easier to remove the surface layer of raw rice.
先ず、米粒の加湿は、米粒の表層を軟化し、搗精を行い
易くするもので、その水分量は通常米粒に0.1〜i、
o%を付与すれば足りる。すなわち、本発明では0.
1〜1.0%、望ましくは0.2〜0.6%の割合にて
米粒に胴割れが生じない量にて米粒の糠層を主に吸湿さ
せるものであろう
この加湿は、超音波加湿器によるミスト、噴霧器から水
を微粒化したもの等の微小氷粒を米粒表面に付与して加
湿する。−力、米粒の表面には軽いキズが付しであるか
ら、水分は比較的に滲透性がよく表面層によく広が夛、
表面から内層に含湿されて行く、そのため、加湿量、加
湿時間によって表層部と内芯部の加湿に差が生じ、内芯
は低くそれによって剛体に保つことができ、そのため、
擦離が゛よくなシ、搗精の摩擦熱において米粒水分の逃
散が少なく、また一部米粒の表層部に水分の微かな逃散
が少じても、米粒表層部と内芯部にひずみを生ずること
がなくひび割粒水浸割粒の発生が防止できる。さらに、
本発明ではこのように表層部を0.1〜1.0%の微少
の水分量で加湿するため、搗精中に生ずる脱除糠の水分
が低く、それが精白米粒に付着し、密着することもない
。First, humidification of rice grains softens the surface layer of the rice grains and makes it easier to mill.The moisture content of the rice grains is usually 0.1~i,
It is sufficient to give 0%. That is, in the present invention, 0.
This humidification will mainly absorb moisture in the bran layer of rice grains at a rate of 1 to 1.0%, preferably 0.2 to 0.6%, in an amount that does not cause cracking of the rice grains. The surface of the rice grains is humidified by applying mist from a humidifier or microscopic ice particles made by atomizing water from a sprayer. - Since the surface of rice grains has light scratches, moisture is relatively permeable and spreads well to the surface layer.
Moisture is absorbed from the surface to the inner layer, so there is a difference in humidification between the surface layer and the inner core depending on the amount of humidification and humidification time, and the inner core is low and can be kept rigid.
If the abrasion is good, there is little moisture escaping from the rice grains due to the frictional heat of milling, and even if there is a small amount of moisture escaping from the surface layer of some rice grains, distortion will occur in the surface layer and inner core of the rice grain. The generation of cracked grains and water-soaked grains can be prevented. moreover,
In the present invention, since the surface layer is humidified with a very small moisture content of 0.1 to 1.0%, the moisture content of the removed bran produced during milling is low, and it adheres to and adheres to the polished rice grains. Nor.
一方、調質工程における米粒の加温についてみるに、
貯蔵米の温度は四季及び暖地、摩冷地にて異なるが、通
常搗精し易い原料玄米の温度は15℃〜25℃である。On the other hand, regarding the heating of rice grains in the tempering process, the temperature of stored rice differs depending on the season and whether it is a warm region or a cold region, but the temperature of raw brown rice that is easy to mill is usually 15°C to 25°C.
そのため、原料玄米の温度は搗精適温に加温調節する必
要がちシ、寒冷地では、原料玄米の温度が0〜5℃であ
るから、米粒を15’〜25℃に加温調節するのにはそ
れだけ長時間の熱エネルギーを消費することになる。ま
た、搗精処理される玄米の性状として、前記のように玄
米は乾燥が進むと硬度を増し、過度の乾燥により硬質と
なる。また、玄米は低温になればなるほど硬質となシ、
そのため、米粒はそれ自体の乾燥及び温度条件によシ、
それが著しく精米能力に影響すること−が分った。Therefore, it is necessary to adjust the temperature of raw brown rice to the appropriate temperature for milling.In cold regions, the temperature of raw brown rice is 0 to 5℃, so it is necessary to adjust the temperature of rice grains to 15' to 25℃. Thermal energy will be consumed over a longer period of time. In addition, as for the properties of the brown rice subjected to the milling process, as described above, brown rice increases in hardness as it is dried, and becomes hard due to excessive drying. Also, the lower the temperature, the harder brown rice becomes.
Therefore, rice grains are susceptible to their own drying and temperature conditions.
It was found that this significantly affected rice milling ability.
そこで、玄米の表層と内芯部に温度差を作る。Therefore, a temperature difference is created between the surface layer and the inner core of brown rice.
すなわち、米粒の表層部を搗精適温のII〜25℃に高
め、内芯部は温度上昇しないように温度差を作る。かく
すると、寒冷地では玄米全粒温度と15〜25℃に加熱
する時間と熱エネルギーが著しく省略できる。−力、米
粒は温度が低い程米粒の剛度を増すから、表層に比して
内芯部の温度が低く剛度が高いと表層の搗精が極めて有
利となシ搗精時の糠中の微細粒の生ずることもなくなる
ことに気付いた。そして、この米粒の加熱保温器として
は、例えば、パネルヒータ〜、面状発熱体、遠赤外線ヒ
ーター等が使用でき、この中、遠赤外mは照射温度を4
00〜8oo℃に高められるので、特に米粒の表面層温
度を短時間に高めるのに有利である。That is, the surface layer of the rice grain is raised to a temperature of II to 25° C., which is the optimum temperature for milling, and a temperature difference is created in the inner core portion so that the temperature does not rise. In this way, in cold regions, the time and heat energy required to heat the whole grain of brown rice to 15 to 25°C can be significantly reduced. -The lower the temperature of rice grains, the higher the stiffness of the rice grains, so if the temperature and stiffness of the inner core is lower than that of the surface layer, it is extremely advantageous to mill the surface layer. I noticed that it no longer occurs. As a heat insulator for the rice grains, for example, a panel heater, a sheet heating element, a far infrared heater, etc. can be used.
Since the temperature can be raised to 00 to 80°C, it is particularly advantageous for raising the temperature of the surface layer of rice grains in a short time.
また、一方夏期のように米温か高い場合は、前記のよう
に超音波加湿器によるミスト、噴霧器から水を微粒化し
たもの等の微小氷粒の温度を低温にしたもので加湿し米
粒量を調整してもよい。On the other hand, when the rice temperature is high like in the summer, humidify the rice with a mist from an ultrasonic humidifier or atomized water from a sprayer, which has a low temperature of micro ice particles, to reduce the amount of rice grains. May be adjusted.
以上のよう釦、本発明では、米粒の表面層を15〜25
℃に調整すると共釦同米粒の表面層を0.1〜1.0%
、望ましくは0.2〜0.6%に加湿する調質工程を行
うが、この加温、加湿は何れが前後しても問題なく、た
ソ、加温を加湿より先にする場合には、米粒が乾燥して
ヒビ割れの生ずることがあるので注意を要する。また、
加温と加湿を同時的に平行して行うとその操作を順次に
行う場合よりも操作時r=Jが短縮され、それだけ熱エ
ネルギーの逃散が少なく有利となる。As described above, in the present invention, the surface layer of rice grains is
When adjusted to ℃, the surface layer of cobutton rice grains is reduced to 0.1-1.0%.
Preferably, a tempering step is carried out to humidify to 0.2 to 0.6%, but there is no problem whether the heating or humidification is performed before or after the humidification. Be careful, as the rice grains may dry out and crack. Also,
When heating and humidifying are performed simultaneously and in parallel, r=J during operation is shorter than when the operations are performed sequentially, which is advantageous because less heat energy is dissipated.
次に、調質工程が終ると搗精工程に移る。Next, after the tempering process is completed, the process moves to the polishing process.
上記の調質米粒は、その全表面に軽いキズが与えられ、
適度に加温、加湿されているため、摩擦力によって糠層
はよく擦離される。また米粒表面の糠層の加湿はo、
i〜i、 o%のように低く適質のため、その脱離糠の
微粒子は精白米粒に付着することなく搗精エネルギーも
搗精時間も節約される。The above-mentioned tempered rice grains have light scratches on their entire surface.
Since it is heated and humidified appropriately, the bran layer is easily rubbed off by frictional force. Also, the humidification of the bran layer on the surface of rice grains is o,
Since the ratio of i to i, o% is low and suitable, the fine particles of the detached bran do not adhere to the polished rice grains, thereby saving milling energy and milling time.
また、搗精工程は、調質後常法によって搗精するが、原
料米は種類により、また季節その他の環境条件において
、米粒の適調質状態を保つために、その搗精の途中で調
質と搗精を、繰返すか、また、はじめから調質と搗精を
順次繰返すことによって搗精してもよい。In addition, in the milling process, the grains are milled using a conventional method after tempering, but depending on the type of raw rice, season, and other environmental conditions, tempering and milling may be carried out during the milling process to maintain the appropriate quality of the rice grains. It may be refined by repeating or by repeating tempering and polishing sequentially from the beginning.
次に、系統図によって、本発明の搗Wi’cさらに具体
的に説明するに・
第1図は本発明の系統図である。図面において、玄米は
研削式精米機Aのホッパー1に入り、搗精されて米粒表
面に軽いきすを付した米粒とし、この米粒は精米機Aの
出口2から流出する。続いて、粗搗稍米粒は流路3を通
過して、調質ボックスBのホッパー4に流入する。調質
ボックスBのホッパー4を流入した所に、噴霧器また超
音波のミスト発生装M5を設け、これから発生する噴霧
微小水aまfCは加湿ミストを付与して米粒群の流れを
加湿し・続いてその米粒群の流れる調質ボックスBの周
囲をパネルヒーター6にて加熱し、また、遠赤外線爆7
にて照射加熱して米粒を調質する。Next, the process of the present invention will be explained in more detail with reference to a system diagram. FIG. 1 is a system diagram of the present invention. In the drawing, brown rice enters a hopper 1 of a grinding rice mill A, is milled and polished into rice grains with light scratches on the surface, and these rice grains flow out of an outlet 2 of the rice mill A. Subsequently, the coarse milled rice grains pass through the channel 3 and flow into the hopper 4 of the tempering box B. A sprayer or an ultrasonic mist generator M5 is installed at the place where the hopper 4 of the tempering box B flows, and the atomized fine water amafC generated from this adds a humidifying mist to humidify the flow of rice grains. The area around the tempering box B through which the rice grains flow is heated by a panel heater 6, and a far-infrared bomb 7 is heated.
The rice grains are tempered by irradiation and heating.
調質ボックスBの流出口8がら流路9を経て摩擦精米機
Cのホッパー10に入シ、搗精されて出ロエ1から流路
12を経てブラシロールDにて糠を清掃除去する。ブラ
シロールDは特に必要ない。The rice enters the hopper 10 of the friction rice polishing machine C through the flow path 9 from the outlet 8 of the tempering box B, is milled, and is cleaned and removed by the brush roll D through the flow path 12 from the output loe 1. Brush roll D is not particularly necessary.
なお、調質ボックスBi簡単な例示であるが米粒群の各
米粒の表面に噴霧微小氷粒または加湿ミストが付与され
、一方、米粒表面層が速かに1島梢迩温になるように効
果的に加熱されればよい。第2図は調質ボックスBの別
型を示す。In addition, as a simple example of the tempering box Bi, sprayed micro ice particles or humidifying mist are applied to the surface of each rice grain in a group of rice grains, and on the other hand, it is effective to quickly bring the surface layer of the rice grains to the temperature of one island. It only needs to be heated appropriately. FIG. 2 shows another type of refining box B.
絖いて、この装置?便用して」島梢する実施例を示すと
、
玄米i tonを研削式または摩擦式精米機Aにがけて
5%の荒板を分離し、米粒の表面の糠層全面に軽くまば
らなきすを付ける。Is this the device? To give an example of how rice grains can be used for convenience, brown rice is passed through a grinding or friction rice mill A to separate 5% of the rough grains, which are then lightly scattered over the entire bran layer on the surface of the rice grains. Add.
を付設し、(パネルヒーター6け季節によるが特に必要
ない)ボックスBのホンパー4から流入した゛米粒は噴
霧器5かも米粒量に対して0.4 (Xの割合洸噴霧し
、また一方遠赤外線ヒーター7(表面加熱400°〜8
00℃)を照射して加熱し、米粒の表面温度を20℃に
調節するうαいて、調質された米粒は摩擦式精米機Cに
がけ0.89tonの精米を得た。(6 panel heaters are not particularly necessary depending on the season) The rice grains flowing in from the homper 4 of box B are sprayed at a ratio of 0.4 (X) to the amount of rice grains by the sprayer 5, Heater 7 (Surface heating 400°~8
The surface temperature of the rice grains was adjusted to 20°C, and the tempered rice grains were passed through a friction rice mill C to obtain 0.89 tons of polished rice.
第1図 調質精米法に使用する調質精米装置の全体系統
図。−
A 研削式また摩擦式精米機
1ホツパ〜 2出口
3連絡流路
B 8質ボツクス
4*ツバ−s噴霧器または超音波の
ミスト発生装置
6パネルヒーター
7遠赤外線燈
8出口 9連絡通路
C摩擦式精米機
io ホッパー 11出口
12 連絡通路
D ブラシロール
13人口
弁理士 中 村 豊
手続補正書(方式)
昭和58年7月20日
特許庁長官 若 杉 和 夫 殿
1、事件の表示
特IJfi[s 8−40592号
2、発明の名称・
表層調質精米法
3、補正をする者
4、代理人 〒161
住 所 東京都新宿区下落合2丁目1−8三栄ビル (
埴950−0896
氏名弁理士中村 豊!七
5、補正命令の日付
昭和58年6月8日
(発送日昭和58年6月28髪9
6、補正の対象
明細書の図面の簡単な説明の欄
7、補正の内容
明細書11頁9行(路行)の次に、次の事項を挿入する
。
「第2図 第2図は第1図と全く同じ全体系統図を示す
。たソ図において、調質ボ
ックスBの構成が第1図の変形にな
っている。
図面の部品符号は第1図と同一数字
にて同じ部品を示す。」Figure 1: Overall system diagram of tempered rice milling equipment used in tempered rice milling method. - A Grinding type or friction type rice polishing machine 1 Hopper ~ 2 Outlets 3 Connecting channels B 8 quality boxes 4 * Tsubasa -S Sprayer or ultrasonic mist generator 6 Panel heater 7 Far infrared light 8 Outlets 9 Connecting channels C Friction type Rice polishing machine io Hopper 11 Exit 12 Connecting passage D Brush roll 13 Population Patent attorney Yutaka Nakamura Procedural amendment (method) July 20, 1981 Commissioner of the Japan Patent Office Kazuo Wakasugi 1, Case display special IJfi [s 8 -40592 No. 2, Title of the invention / Surface tempering rice polishing method 3, Person making the amendment 4, Agent 161 Address Sanei Building, 2-1-8 Shimoai, Shinjuku-ku, Tokyo (
Hani950-0896 Name Patent Attorney Yutaka Nakamura! 75. Date of amendment order: June 8, 1982 (Date of dispatch: June 28, 1982) 6. Brief description of the drawings in the specification subject to amendment 7, Description of contents of amendment, page 11, 9 Insert the following item next to the line (route): "Figure 2 Figure 2 shows the same overall system diagram as Figure 1. In the Figure 2, the configuration of refining box B is This is a modification of the figure.The parts numbers in the drawing are the same as in Figure 1 and indicate the same parts.''
Claims (1)
常の精米機によシ、軽くキズを付ける程度に搗精した後
、その粗搗精米の表層に0.1〜1.0%、望ましくは
0.2〜0.6 CXの水分を加湿し、それと共に表層
温度を15〜25℃に調整して、糠層が低い圧力で擦離
しや丁いように調質し、続いて常法によって搗精するか
、または、必要に応じて上記の調質と常法の搗精を繰返
すことによって搗′l′I!することを特徴とする表層
調質精米法。After polishing the bran layer of the raw rice using a regular rice milling machine such as a grinding type, friction type, or impact type to the extent that it slightly scratches, 0.1 to 1.0% is added to the surface layer of the coarsely milled rice. , desirably 0.2 to 0.6 CX of moisture, and at the same time adjust the surface layer temperature to 15 to 25 degrees Celsius, and heat the bran layer to remove and finely remove it under low pressure. Pulse using the conventional method, or repeat the above tempering and the conventional method as needed. A surface tempering rice polishing method that is characterized by:
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4059283A JPS59166250A (en) | 1983-03-14 | 1983-03-14 | Surface-layer heat-treating rice cleaning method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4059283A JPS59166250A (en) | 1983-03-14 | 1983-03-14 | Surface-layer heat-treating rice cleaning method |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS59166250A true JPS59166250A (en) | 1984-09-19 |
Family
ID=12584775
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4059283A Pending JPS59166250A (en) | 1983-03-14 | 1983-03-14 | Surface-layer heat-treating rice cleaning method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59166250A (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5029870B1 (en) * | 1972-03-24 | 1975-09-26 | ||
JPS52107953A (en) * | 1976-03-08 | 1977-09-10 | Toshihiko Satake | Pearling device to lustered rice |
-
1983
- 1983-03-14 JP JP4059283A patent/JPS59166250A/en active Pending
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5029870B1 (en) * | 1972-03-24 | 1975-09-26 | ||
JPS52107953A (en) * | 1976-03-08 | 1977-09-10 | Toshihiko Satake | Pearling device to lustered rice |
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