JPS59137943A - Photosensitive resin composition - Google Patents
Photosensitive resin compositionInfo
- Publication number
- JPS59137943A JPS59137943A JP58011249A JP1124983A JPS59137943A JP S59137943 A JPS59137943 A JP S59137943A JP 58011249 A JP58011249 A JP 58011249A JP 1124983 A JP1124983 A JP 1124983A JP S59137943 A JPS59137943 A JP S59137943A
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive resin
- printing
- resin composition
- weight
- effect
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000011342 resin composition Substances 0.000 title claims description 11
- 239000004094 surface-active agent Substances 0.000 claims abstract description 12
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 claims abstract description 4
- 125000005010 perfluoroalkyl group Chemical group 0.000 claims abstract description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 2
- 238000007639 printing Methods 0.000 abstract description 22
- 239000011347 resin Substances 0.000 abstract description 20
- 229920005989 resin Polymers 0.000 abstract description 20
- 230000000694 effects Effects 0.000 abstract description 5
- LTEQMZWBSYACLV-UHFFFAOYSA-N Hexylbenzene Chemical compound CCCCCCC1=CC=CC=C1 LTEQMZWBSYACLV-UHFFFAOYSA-N 0.000 abstract 1
- 230000001747 exhibiting effect Effects 0.000 abstract 1
- 230000003405 preventing effect Effects 0.000 abstract 1
- 239000000203 mixture Substances 0.000 description 8
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 6
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 5
- JOYRKODLDBILNP-UHFFFAOYSA-N Ethyl urethane Chemical compound CCOC(N)=O JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- ISAOCJYIOMOJEB-UHFFFAOYSA-N benzoin Chemical compound C=1C=CC=CC=1C(O)C(=O)C1=CC=CC=C1 ISAOCJYIOMOJEB-UHFFFAOYSA-N 0.000 description 4
- 229910052731 fluorine Inorganic materials 0.000 description 4
- 239000011737 fluorine Substances 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- 239000004372 Polyvinyl alcohol Substances 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 238000009472 formulation Methods 0.000 description 3
- 238000007644 letterpress printing Methods 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 229920000728 polyester Polymers 0.000 description 3
- 229940051841 polyoxyethylene ether Drugs 0.000 description 3
- 229920000056 polyoxyethylene ether Polymers 0.000 description 3
- 229920002451 polyvinyl alcohol Polymers 0.000 description 3
- 239000007787 solid Substances 0.000 description 3
- 238000010186 staining Methods 0.000 description 3
- 229920002818 (Hydroxyethyl)methacrylate Polymers 0.000 description 2
- KMNCBSZOIQAUFX-UHFFFAOYSA-N 2-ethoxy-1,2-diphenylethanone Chemical compound C=1C=CC=CC=1C(OCC)C(=O)C1=CC=CC=C1 KMNCBSZOIQAUFX-UHFFFAOYSA-N 0.000 description 2
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 2
- 244000028419 Styrax benzoin Species 0.000 description 2
- 235000000126 Styrax benzoin Nutrition 0.000 description 2
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
- 235000008411 Sumatra benzointree Nutrition 0.000 description 2
- 229960002130 benzoin Drugs 0.000 description 2
- WOZVHXUHUFLZGK-UHFFFAOYSA-N dimethyl terephthalate Chemical compound COC(=O)C1=CC=C(C(=O)OC)C=C1 WOZVHXUHUFLZGK-UHFFFAOYSA-N 0.000 description 2
- JBKVHLHDHHXQEQ-UHFFFAOYSA-N epsilon-caprolactam Chemical compound O=C1CCCCCN1 JBKVHLHDHHXQEQ-UHFFFAOYSA-N 0.000 description 2
- 235000019382 gum benzoic Nutrition 0.000 description 2
- 229920001778 nylon Polymers 0.000 description 2
- 229920001451 polypropylene glycol Polymers 0.000 description 2
- 230000002265 prevention Effects 0.000 description 2
- -1 soethylene dalicol Chemical compound 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 229920003051 synthetic elastomer Polymers 0.000 description 2
- 239000005061 synthetic rubber Substances 0.000 description 2
- JJUBFBTUBACDHW-UHFFFAOYSA-N 3,3,4,4,5,5,6,6,7,7,8,8,9,9,10,10,10-heptadecafluoro-1-decanol Chemical compound OCCC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F JJUBFBTUBACDHW-UHFFFAOYSA-N 0.000 description 1
- AYKYXWQEBUNJCN-UHFFFAOYSA-N 3-methylfuran-2,5-dione Chemical compound CC1=CC(=O)OC1=O AYKYXWQEBUNJCN-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 241000854711 Shinkai Species 0.000 description 1
- 239000002174 Styrene-butadiene Substances 0.000 description 1
- DHXVGJBLRPWPCS-UHFFFAOYSA-N Tetrahydropyran Chemical compound C1CCOCC1 DHXVGJBLRPWPCS-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 125000000129 anionic group Chemical group 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- MTAZNLWOLGHBHU-UHFFFAOYSA-N butadiene-styrene rubber Chemical compound C=CC=C.C=CC1=CC=CC=C1 MTAZNLWOLGHBHU-UHFFFAOYSA-N 0.000 description 1
- 230000002308 calcification Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 125000002091 cationic group Chemical group 0.000 description 1
- 239000003610 charcoal Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 125000005442 diisocyanate group Chemical group 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- KFIGICHILYTCJF-UHFFFAOYSA-N n'-methylethane-1,2-diamine Chemical compound CNCCN KFIGICHILYTCJF-UHFFFAOYSA-N 0.000 description 1
- ZIUHHBKFKCYYJD-UHFFFAOYSA-N n,n'-methylenebisacrylamide Chemical compound C=CC(=O)NCNC(=O)C=C ZIUHHBKFKCYYJD-UHFFFAOYSA-N 0.000 description 1
- DDHQTWZKAJOZQL-UHFFFAOYSA-N naphthalene-1,4,5-tricarboxylic acid Chemical compound C1=CC=C2C(C(=O)O)=CC=C(C(O)=O)C2=C1C(O)=O DDHQTWZKAJOZQL-UHFFFAOYSA-N 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N p-methoxyphenol Chemical compound COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 230000002940 repellent Effects 0.000 description 1
- 239000005871 repellent Substances 0.000 description 1
- 239000011435 rock Substances 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 239000011343 solid material Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 239000011115 styrene butadiene Substances 0.000 description 1
- 229920003048 styrene butadiene rubber Polymers 0.000 description 1
- 238000003786 synthesis reaction Methods 0.000 description 1
- 230000008719 thickening Effects 0.000 description 1
- 229920006305 unsaturated polyester Polymers 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
Abstract
Description
【発明の詳細な説明】
本発明は、高速輪転刷版用感光性樹脂組成物、特に新聞
刷版用感光性樹脂組成物に関する。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a photosensitive resin composition for high-speed rotary printing plates, particularly a photosensitive resin composition for newspaper printing plates.
近年、新聞刷版は従来の鉛版から樹脂凸版に後行され又
はされつ＼ある。樹脂凸版は、感光性樹脂と呼称される
組成物にネガフィルムを通して活性光線を照射すること
によって該感光性樹脂を硬化させ、しかる後、種々の手
段で：＊Ｓすることによって凸版像を形成させたもので
ある。樹脂凸版は、その軽量さからくる作業性及び印刷
効果の観点から充分に利点が認められてはｈるけれども
、一般的に′Ｉｔつて、印刷中に網点とくに写真面に不
都合の汚れ（以下、汚れという）が発生し易いという欠
点がある。この汚れの発生機構は充分には明らかではな
いが、現象的には、印刷中にインキや紙粉が所謂レリー
フの谷（凹）部分に堆積して遂には正常な網点（写真）
品質を損なう汚れを誘発するに至るものである。In recent years, newspaper printing plates have been replaced by resin letterpress printing from the conventional lead printing plates. Resin relief printing is made by irradiating a composition called a photosensitive resin with actinic rays through a negative film to cure the photosensitive resin, and then forming a letterpress image by performing *S by various means. It is something that Although resin letterpress printing plates are well recognized for their advantages in terms of workability and printing effectiveness due to their light weight, they generally suffer from undesirable stains (hereinafter referred to as "stains") on the halftone dots, especially on the photographic surface, during printing. It has the disadvantage that it is easy to cause stains (referred to as dirt). The mechanism by which this stain occurs is not fully clear, but the phenomenon is that during printing, ink and paper dust accumulates in the so-called valleys (concave areas) of the relief, eventually resulting in normal halftone dots (photo).
This leads to stains that impair quality.
従来、この汚れを防止するために、シリコーン油を炭化
水素系溶媒に醇解し九処理剤や繊維用撥水撥油剤で予め
樹脂板を処理することが行なわれている。しかし、前者
はインキに溶解され易いため耐久性が不足し、約２０，
０００部の印刷の後に汚れが発生し、また、後者は逃理
後に完全な熱キ二アさせない限り効果が発現せず而かも
その耐久性も必ずしも満足し得るほどではなく、約３へ
０００部の印刷後には汚れが発生する。Conventionally, in order to prevent this staining, a resin board has been previously treated with a treatment agent made by dissolving silicone oil in a hydrocarbon solvent or a water/oil repellent for fibers. However, since the former is easily dissolved in ink, it lacks durability;
Smearing occurs after printing 3,000 copies, and the latter does not become effective unless it is completely heat-kineered after release, and its durability is not necessarily satisfactory. Smudges occur after printing.
本発明の目的は、：ＩＭ脂凸版による印刷における上記
のような問題点を解消することにある。An object of the present invention is to solve the above-mentioned problems in printing with :IM resin letterpress.
本発明のこの目的れ、パーフルオロアルキル基（炭素数
Ｃ１〜Ｃ１４）を有するノニオン型の炭化フッ素界面活
性剤を０．００１〜５重量％含有する感光性樹脂組成物
によって達成される。本発明の感光性樹脂組成物からつ
くられた樹脂凸版は、顕著な汚れ防止効果（汚れを発生
することなしに印刷可能な部数の増大）を示すので、従
来におけるような予備的表面処理等の操作を全く必要と
ぜす、単に輪転機に装着するだけで印刷に供することが
可能である。This object of the present invention is achieved by a photosensitive resin composition containing 0.001 to 5% by weight of a nonionic fluorocarbon surfactant having a perfluoroalkyl group (C1 to C14 carbon atoms). The resin letterpress made from the photosensitive resin composition of the present invention exhibits a remarkable stain prevention effect (increase in the number of copies that can be printed without staining). No operation is required; it can be used for printing simply by attaching it to a rotary press.
本発明においては、パーフルオロアルキル基（炭素数Ｃ
４〜Ｃ１４）を有し且つイオン性がノニオン型である炭
化フッ素界面活性剤が感光性樹脂組成物中に０．０ Ｏ
１重竜％から５重電％含有されていなけれはならない。In the present invention, a perfluoroalkyl group (carbon number C
4 to C14) and whose ionicity is nonionic is contained in the photosensitive resin composition at 0.0 O
It must contain from 1% to 5%.
０．００１重量％未満であると効果が乏しく、５重量％
を越えると経済的に不利となり、また、撥インキ性が強
くなりすぎて写真印刷効果が不良となる。汚れ防止の観
点からは、アニオン型、カチオン型又は両性型のイオン
性を有する同穐炭化フッ素界面活性剤も有効であるが、
これらのイオン性を有するものは、概して、感光性樹脂
組成物として調製した場合に経時安定性に間１があり、
液状感光性樹脂組成物の場合には増粘乃至ケ゛ル化を招
き易く、固形状感光性樹脂の場合には現１＃！不能等の
障害を招き易い。If it is less than 0.001% by weight, the effect is poor, and 5% by weight.
Exceeding this is economically disadvantageous, and the ink repellency becomes too strong, resulting in poor photographic printing effects. From the perspective of stain prevention, anionic, cationic, or amphoteric ionic carbide fluorine surfactants are also effective;
Generally, these ionic materials have a stability of 1 to 1 when prepared as a photosensitive resin composition, and
In the case of a liquid photosensitive resin composition, it is easy to cause thickening or calcification, and in the case of a solid photosensitive resin, the current level is 1#! This can easily lead to disabilities such as disability.
本発明における炭化フッ素界面活性剤としては、例えば
、［２−ｚ＋−フルオロオクチルエチル、Ｊ？ＩＪオキ
シグロピレンエーテルカルパミール〕−ホリオキシエチ
レンカルパミールートルエン、２−／＃−フルオロオク
チルー１−アセトキシメチルエチルカルパミルトリレン
ステアリルポリオキシエチレ７カ−パメ−ト、２−パー
フルオロアルキル（炭−数Ｃ４〜Ｃｌ４）エタノール、
２−パーフルオロオクチル−１−メチル−エチルポリオ
キシエチレンエーテル、ツクーフルオロイソグロポキシ
プロビルシルセスキオキサンなどが挙げられるが、勿論
、上記物質に限定されるものではない。Examples of the fluorine carbide surfactant in the present invention include [2-z+-fluorooctylethyl, J? IJ Oxyglopylene ether carpamyl] - holoxyethylene carpamyl toluene, 2-/#-fluorooctyl-1-acetoxymethylethyl carpamyl trilene stearyl polyoxyethyle 7-carpamate, 2-perfluoroalkyl (charcoal number C4 to Cl4) ethanol,
Examples include 2-perfluorooctyl-1-methyl-ethyl polyoxyethylene ether, fluoroisoglopoxypropylsilsesquioxane, and the like, but of course, the substance is not limited to the above substances.
感光性樹脂組成物としては、常温で液状のものも固形状
のものも、いずれも本発明において適用可能である。例
えば、液状のものとしては、ポリウレタン系、ポリエス
テル系又は合成ゴＪ１系を主成分とする感光性樹脂が、
また、固形状のものとしては、ポリビニルアルコール系
又はナイロン系を主成分とする感光性樹脂が、それぞれ
好ましいものとして例示される。勿論、これらの樹脂の
みに限定されるものではない。Both photosensitive resin compositions that are liquid or solid at room temperature are applicable to the present invention. For example, as a liquid, a photosensitive resin whose main component is a polyurethane type, a polyester type, or a synthetic rubber J1 type,
In addition, as solid materials, photosensitive resins mainly composed of polyvinyl alcohol or nylon are exemplified as preferred. Of course, it is not limited to only these resins.
次に、実施例及び比較例によって本発明をＸ本釣に説明
する。Next, the present invention will be explained in terms of X-ray fishing using Examples and Comparative Examples.
実施例１
ポリオキシプロピレングリコール（分子量１０００）、
）リレンジイソシアネート及びヒドロキシエチルメタア
クリレートを熱反応させることによって得られるウレタ
ン系！レポリマ−６０２１ノエチレングリコールソメタ
アクリレート３５ｆ並びにペンタエリスリトールテトラ
キス（β−メルカプトグロピオネー））５ｆを、熱屯合
禁止剤としてのハイドロキノンモノメチルエーテルｏ、
ｓｒ、増感剤としてのベンゾインエチルエーテルＩＦと
共に混合し、凸版印刷用ウレタン系。Example 1 Polyoxypropylene glycol (molecular weight 1000),
) Urethane type obtained by thermally reacting lylene diisocyanate and hydroxyethyl methacrylate! Repolymer-6021 no ethylene glycol some acrylate 35f and pentaerythritol tetrakis (β-mercaptogropione) 5f, hydroquinone monomethyl ether o as a thermal synthesis inhibitor,
sr, mixed with benzoin ethyl ether IF as a sensitizer, a urethane system for letterpress printing.
感光性樹脂組成物１ Ｇ １．５ ｆを得た。Photosensitive resin composition 1G 1.5f was obtained.
この組成物に、０．５Ｆの２−パーフルオロオクチル−
１−メチルーエチルポ゛リオキシエチレンエーテルを加
え、混曾した。こへ配合物は保存安定性が艮く、製版ｖ
ｋＫ刷版として新聞輪転機で使用したところ、ｅＱＯＯ
Ｏ部の印刷まで汚れが発生しなかった。To this composition, 0.5F 2-perfluorooctyl-
1-Methyl-ethyl polyoxyethylene ether was added and mixed. This formulation has excellent storage stability and is suitable for plate making.
When used as a kK printing plate on a newspaper rotary press, eQOO
No stains occurred until the printing of part O.
実施例２
実施例１と同様なウレタン系感光性樹脂配合物１０１、
り ｆに、０．５ｆの〔２−）９−フルオロオクチル
エチルポリオキシグロピレンエーテルカルパミール）
−ｙＮ １７オキシエチレンカルパミールートルエンを
加え、混合した。この配合物も、保存安定性が良く、製
版後に新開輪転機で使用したところ、６０，０００部の
印刷まで汚れが発生しなかった。Example 2 Urethane photosensitive resin formulation 101 similar to Example 1,
To f, 0.5 f of [2-)9-fluorooctylethyl polyoxyglopylene ether carpamil)
-yN 17 oxyethylenecarpamylutetoluene was added and mixed. This formulation also had good storage stability, and when used on a Shinkai rotary press after plate making, no staining occurred until 60,000 copies were printed.
実施例３
テレフタル酸ジメチル、ソエチレンダリコール、プロピ
レングリコール、１，４．８−ナフタリントリカルがン
酸無水吻及び無水シトラコン酸より、熱反応で不飽和ポ
リエステルを得た。この樹脂７０Ｆにアクリルアミド３
０ｆ、ハイドロキノンＯ０θ１を及びベンゾインＯ，７
Ｆを加えて、ポリエステル系感光性樹脂を得た。更に、
実施例２と同様な炭化フッ素界面活性剤を０．５２加え
て、組成物を調製した。この組成物を用いて製版した刷
版は、ｓｏ、ｏｏｏ部の印刷まで汚れが発生しなかった
。Example 3 An unsaturated polyester was obtained by thermal reaction from dimethyl terephthalate, soethylene dalicol, propylene glycol, 1,4,8-naphthalene tricarboxylic acid anhydride, and citraconic anhydride. Acrylamide 3 is added to this resin 70F.
0f, hydroquinone O0θ1 and benzoin O,7
F was added to obtain a polyester photosensitive resin. Furthermore,
A composition was prepared by adding 0.52% of the same fluorocarbide surfactant as in Example 2. The printing plate made using this composition did not become stained until the so and ooo portions were printed.
実施例４
ホリビニルアルコール６０ｆ１ ヒドロキシエチルメタ
アクリレート３０ｆ１ハイドロキノン０．ｌｔｌ ペン
ツルヅメチルケタール５ｆ及び実施例２に用いた炭化フ
ッ素界面活性剤０．５Ｆを混合して、固形状ポリビニー
ルアルコール糸感光性掴脂を得た。この配付物は、保存
安に性が良く、製版後に刷版として使用したところ、ｓ
ｏ、ｏｏｏ部の印刷まで汚れが発生しなかった。Example 4 Holivinyl alcohol 60f1 Hydroxyethyl methacrylate 30f1 Hydroquinone 0. ltl Pentrudz Methyl Ketal 5F and the fluorine carbide surfactant 0.5F used in Example 2 were mixed to obtain a solid polyvinyl alcohol thread photosensitive grip. This handout has good storage stability, and when used as a printing plate after platemaking, it was
No stains occurred until the o and ooo portions were printed.
比較例１
実施例１の炭化フッ素界面活性剤を使用しないで作成し
た中レタン系板は、１０，０００部の印刷で汚れが発生
した。Comparative Example 1 A medium urethane board prepared without using the fluorocarbide surfactant of Example 1 was smeared after printing 10,000 copies.
比較間２
実施例３の炭化フッ素界面活性剤を使用しないで作成し
たポリエステル系板は、ａｏｏｏｌＭｌｉの印刷でｔ９
れが発生し友。Comparison 2 The polyester board prepared without using the fluorocarbide surfactant of Example 3 was printed with aoooolMli at t9.
This happened to my friend.
比較例３
実施例４の炭化フッ素界面活性剤を使用しないで作成し
たポリビニルアルコ−に系板１ｄ、ｓ、ｏｏ。Comparative Example 3 Polyvinyl alcohol-based plates 1d, s, and oo were prepared without using the fluorine carbide surfactant of Example 4.
部の印刷で汚れが発生した。A smudge appeared when printing a copy.
実施例５〜１６及び比較例４〜７
下記Ａ −Ｆの各ノニオン型炭化フッ素界面活性剤を下
表に示す棹々の樹脂に所定量混合した組成物から刷版を
つくり、これを新聞輪転機に使用した。結果を下表に示
す。Examples 5 to 16 and Comparative Examples 4 to 7 A printing plate was made from a composition in which a predetermined amount of each of the following nonionic fluorocarbide surfactants A to F was mixed with each of the resins shown in the table below. It was used as a turning point. The results are shown in the table below.
Ａ：２−パーフルオロオクチル−１−メチル−エチルポ
リオキシエチレンエーテル
Ｂ：〔２−パーフルオロオクチルエチルポリオキシプロ
ピレンエーテルカルバミール］ −、ｆ？ ＩＪオキシ
エチレンカルバミール−トルエンＣ：２−パーフルオロ
オクチル−１−アセトキシメチルエチルカルパミルトリ
レンステアリルホリオキシエチレンカーパメート
Ｄ：２−パーフルオロオクチルエタノールＥ＞ｅ−フル
オロイソグロポキシグロビルシルセスキオキサン
ｐ’ ”、 ／＃−フルオロオクタンスルホン酸ジエタ
ノールアミド
なお、上表ＶＣおけるナイロン系樹脂（実施例１５及び
比較例６）は、Ｎ−ビス（２−アミノエチル）メチルア
ミン、アソピン酸及びε−カプロラクタムの共重合ポリ
アミド１００ 喧ｆ１部、メチレンビスアクリルアミド
５重量部、ハイドロキノンα１重量部並びにベンゾイン
ｌｔＸ量部から成るものであシ、合成ゴム系樹脂（実楕
例１６及び比較例７）ｉｌ：、スチレン−ブタジェン系
！ロック共重合体（スチレン含有［３５〜５０ｊ４ｍ１
％） １００重量部、ｌ、６−ヘキサンソオールソアク
リレート２０重電部、ターシャクツチルフェノール０．
５重量部及びベンゾインエチルエーテル１ｆＥｔ部から
成るものである。A: 2-perfluorooctyl-1-methyl-ethyl polyoxyethylene ether B: [2-perfluorooctyl ethyl polyoxypropylene ether carbamyl] -, f? IJ Oxyethylenecarbamyl-toluene C: 2-perfluorooctyl-1-acetoxymethylethylcarpamyltrilenestearylphorioxyethylenecarpamate D: 2-perfluorooctylethanol E>e-fluoroisoglopoxyglobil silsesqui Oxane p''', /#-fluorooctanesulfonic acid diethanolamide Note that the nylon resins (Example 15 and Comparative Example 6) in VC in the above table are N-bis(2-aminoethyl)methylamine, asopic acid and Synthetic rubber resin (Example 16 and Comparative Example 7) consisting of 1 part of copolymerized polyamide 100 of ε-caprolactam, 5 parts by weight of methylene bisacrylamide, 1 part by weight of hydroquinone α, and 1 part by weight of benzoin. :, Styrene-butadiene-based!rock copolymer (styrene-containing [35-50j4m1
%) 100 parts by weight, 20 parts by weight of l,6-hexanetho-acrylate, 0.0 parts by weight of tertiary phenol.
5 parts by weight and 1 fEt parts of benzoin ethyl ether.
Claims (1)
オン型の炭化フッ素界面活性剤を０．０．０１重量％か
ら５重量％含有することを特徴とする感光性樹脂組成物
。A photosensitive resin composition containing from 0.0.01% by weight to 5% by weight of a nonionic fluorocarbon surfactant having a perfluoroalkyl group having 4 to 14 carbon atoms.
Priority Applications (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58011249A JPS59137943A (en) | 1983-01-28 | 1983-01-28 | Photosensitive resin composition |
| CA000445119A CA1232915A (en) | 1983-01-28 | 1984-01-11 | Photosensitive resin compositions |
| GB08401661A GB2134275B (en) | 1983-01-28 | 1984-01-23 | Photosensitive resin compositions |
| AU23716/84A AU556611B2 (en) | 1983-01-28 | 1984-01-24 | Photosensitive resin compositions |
| DE19843402465 DE3402465A1 (en) | 1983-01-28 | 1984-01-25 | LIGHT SENSITIVE RESIN COMPOSITION |
| NL8400257A NL8400257A (en) | 1983-01-28 | 1984-01-27 | Photosensitive Resin Products. |
| IT8419349A IT1206696B (en) | 1983-01-28 | 1984-01-27 | SURFACE FOR PHOTOSENSITIVE DIRESINE COMPOSITIONS AND RELATED COMPOSITIONS. |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58011249A JPS59137943A (en) | 1983-01-28 | 1983-01-28 | Photosensitive resin composition |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS59137943A true JPS59137943A (en) | 1984-08-08 |
Family
ID=11772662
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58011249A Pending JPS59137943A (en) | 1983-01-28 | 1983-01-28 | Photosensitive resin composition |
Country Status (7)
| Country | Link |
|---|---|
| JP (1) | JPS59137943A (en) |
| AU (1) | AU556611B2 (en) |
| CA (1) | CA1232915A (en) |
| DE (1) | DE3402465A1 (en) |
| GB (1) | GB2134275B (en) |
| IT (1) | IT1206696B (en) |
| NL (1) | NL8400257A (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61226745A (en) * | 1985-03-30 | 1986-10-08 | Japan Synthetic Rubber Co Ltd | Radiation sensitive composition |
| JPS61226746A (en) * | 1985-03-30 | 1986-10-08 | Japan Synthetic Rubber Co Ltd | Radiation sensitive composition |
| JPS6236657A (en) * | 1985-08-10 | 1987-02-17 | Japan Synthetic Rubber Co Ltd | Resist composition |
| JPS62170950A (en) * | 1986-01-23 | 1987-07-28 | Fuji Photo Film Co Ltd | Photosensitive composition |
| JPS62226143A (en) * | 1986-03-27 | 1987-10-05 | Fuji Photo Film Co Ltd | Photosensitive composition |
| JPS62227140A (en) * | 1986-03-28 | 1987-10-06 | Fuji Photo Film Co Ltd | Image forming material |
| JPS6418142A (en) * | 1987-07-13 | 1989-01-20 | Fuji Photo Film Co Ltd | Photosensitive composition |
| JPH0815859A (en) * | 1994-04-27 | 1996-01-19 | Tokyo Ohka Kogyo Co Ltd | Coating liquid for resist and resist material using same |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54135004A (en) * | 1978-04-10 | 1979-10-19 | Fuji Photo Film Co Ltd | Photosensitive flat printing plate |
| JPS5660441A (en) * | 1979-10-22 | 1981-05-25 | Asahi Chem Ind Co Ltd | Photosensitive resin composition improved in water development property and manufacture of photosensitive resin plate using this composition |
| JPS5740249A (en) * | 1980-06-14 | 1982-03-05 | Hoechst Ag | Photographic copying material and method of coating photosensitive copying layer on support |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3347676A (en) * | 1964-04-30 | 1967-10-17 | Du Pont | Photopolymerizable compositions and process |
| US4252887A (en) * | 1979-08-14 | 1981-02-24 | E. I. Du Pont De Nemours And Company | Dimers derived from unsymmetrical 2,4,5-triphenylimidazole compounds as photoinitiators |
-
1983
- 1983-01-28 JP JP58011249A patent/JPS59137943A/en active Pending
-
1984
- 1984-01-11 CA CA000445119A patent/CA1232915A/en not_active Expired
- 1984-01-23 GB GB08401661A patent/GB2134275B/en not_active Expired
- 1984-01-24 AU AU23716/84A patent/AU556611B2/en not_active Ceased
- 1984-01-25 DE DE19843402465 patent/DE3402465A1/en not_active Withdrawn
- 1984-01-27 IT IT8419349A patent/IT1206696B/en active
- 1984-01-27 NL NL8400257A patent/NL8400257A/en not_active Application Discontinuation
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54135004A (en) * | 1978-04-10 | 1979-10-19 | Fuji Photo Film Co Ltd | Photosensitive flat printing plate |
| JPS5660441A (en) * | 1979-10-22 | 1981-05-25 | Asahi Chem Ind Co Ltd | Photosensitive resin composition improved in water development property and manufacture of photosensitive resin plate using this composition |
| JPS5740249A (en) * | 1980-06-14 | 1982-03-05 | Hoechst Ag | Photographic copying material and method of coating photosensitive copying layer on support |
Cited By (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61226745A (en) * | 1985-03-30 | 1986-10-08 | Japan Synthetic Rubber Co Ltd | Radiation sensitive composition |
| JPS61226746A (en) * | 1985-03-30 | 1986-10-08 | Japan Synthetic Rubber Co Ltd | Radiation sensitive composition |
| JPH0558189B2 (en) * | 1985-03-30 | 1993-08-25 | Japan Synthetic Rubber Co Ltd | |
| JPH0558188B2 (en) * | 1985-03-30 | 1993-08-25 | Japan Synthetic Rubber Co Ltd | |
| JPS6236657A (en) * | 1985-08-10 | 1987-02-17 | Japan Synthetic Rubber Co Ltd | Resist composition |
| JPS62170950A (en) * | 1986-01-23 | 1987-07-28 | Fuji Photo Film Co Ltd | Photosensitive composition |
| JPS62226143A (en) * | 1986-03-27 | 1987-10-05 | Fuji Photo Film Co Ltd | Photosensitive composition |
| JPS62227140A (en) * | 1986-03-28 | 1987-10-06 | Fuji Photo Film Co Ltd | Image forming material |
| JPS6418142A (en) * | 1987-07-13 | 1989-01-20 | Fuji Photo Film Co Ltd | Photosensitive composition |
| JPH0815859A (en) * | 1994-04-27 | 1996-01-19 | Tokyo Ohka Kogyo Co Ltd | Coating liquid for resist and resist material using same |
Also Published As
| Publication number | Publication date |
|---|---|
| IT8419349A0 (en) | 1984-01-27 |
| GB2134275B (en) | 1987-05-13 |
| GB2134275A (en) | 1984-08-08 |
| AU2371684A (en) | 1984-08-02 |
| IT1206696B (en) | 1989-04-27 |
| CA1232915A (en) | 1988-02-16 |
| GB8401661D0 (en) | 1984-02-22 |
| AU556611B2 (en) | 1986-11-13 |
| DE3402465A1 (en) | 1984-08-02 |
| NL8400257A (en) | 1984-08-16 |
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