JPS59121746A - Surface spectrometer - Google Patents

Surface spectrometer

Info

Publication number
JPS59121746A
JPS59121746A JP57227437A JP22743782A JPS59121746A JP S59121746 A JPS59121746 A JP S59121746A JP 57227437 A JP57227437 A JP 57227437A JP 22743782 A JP22743782 A JP 22743782A JP S59121746 A JPS59121746 A JP S59121746A
Authority
JP
Japan
Prior art keywords
cathode
anode
sample
ion
hole
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP57227437A
Other languages
Japanese (ja)
Other versions
JPH0135469B2 (en
Inventor
Katsuhiro Kageyama
影山 賀都鴻
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP57227437A priority Critical patent/JPS59121746A/en
Publication of JPS59121746A publication Critical patent/JPS59121746A/en
Publication of JPH0135469B2 publication Critical patent/JPH0135469B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00Particle spectrometers or separator tubes
    • H01J49/02Details
    • H01J49/10Ion sources; Ion guns

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Tubes For Measurement (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

PURPOSE:To obtain a simple and compact mass spectrometer that is suitable for use in a nuclear fusion device and such by providing a means that applies a magnetic field in parallel to the axial center of the hollow section of an anode and applying higher potential than that of first and third cathodes, to a second cathode. CONSTITUTION:Negative potential is applied to a second cathode 7 by a power supply 17 and much lower potential than that of the second cathode 7 is applied to a first cathode 5 by the power supplies 17 and 18 and to a third cathode 9 by the power supplies 17 and 19, respectively. A high temperature and density electron group is confined in the hollow section of an anode 3 and ionizes gas molecules. The ionized molecules move in the hollow section of the anode 3 by the force received from an electromagnetic field and a part of them hits the surface of a sample 10 in high energy by the potential difference applies to a third cathode 9. Since a sufficient amount of primary ions that are incident on the surface of the sample are obtained by low operation gas pressure and since the amount of the surface material sputtered from the sample surface is large, a differential exhaust system and such for the radiation of the primary ions are not required.

Description

【発明の詳細な説明】 〔発明の、@する技術分野〕 本発明は固体の表面を分析する装置に係り、就中試料表
面をイオン衝撃してスパッタさ、1また粒子を分析する
表面分析装置に関する。
[Detailed Description of the Invention] [Technical Field of the Invention] The present invention relates to an apparatus for analyzing the surface of a solid, and in particular, a surface analysis apparatus for analyzing spatter and particles by bombarding the surface of a sample with ions. Regarding.

〔従来技術とその問題点] 表面分析装置は近年、工場、研究槻関等に普及し、その
種類も多く、用途に適したものが選択されている。
[Prior art and its problems] In recent years, surface analysis devices have become widespread in factories, research facilities, etc., and there are many types, and one suitable for the application is selected.

核融合の研究においては、プラズマに不純物を供給する
プラズマ・壁相互作用の研究が重要である。この用途に
は燃料として考えらノ1でいる水素の同位元素と、灰物
買のヘリウムを分析できるものが必要である。水素、ヘ
リウム等を分析できる表面分析装置に、二次イオン質量
分析装置がある。
In nuclear fusion research, it is important to study plasma-wall interactions that supply impurities to the plasma. For this purpose, we need something that can analyze the isotopes of hydrogen, which are the most commonly used fuels, and helium, which is found in ashes. A secondary ion mass spectrometer is a surface analyzer that can analyze hydrogen, helium, etc.

これは、試料に一次イオンを照射し1表面からスパッタ
された粒子のうちのイオンの質量分析を行うものである
。二次イオン質量分析装置を核融合装置:にとりつけて
、プラズマ・壁相互作用の研究に使用するIi合には、
従来二りの問題があった。
In this method, a sample is irradiated with primary ions, and ions among particles sputtered from one surface are subjected to mass spectrometry. When a secondary ion mass spectrometer is attached to a nuclear fusion device and used for research on plasma-wall interactions,
Conventionally, there were two problems.

試料照射用の一次イオンを生成するイオン源からは、イ
オンの他に多址の作動気体(−次イオンとなるべき気体
)が流出するが、この作動気体が核融合装置aを汚染し
7ないような対策が必要である。
In addition to ions, a large amount of working gas (gas that should become negative ions) flows out from the ion source that generates primary ions for sample irradiation, but this working gas does not contaminate the fusion device a. Such measures are necessary.

その対策としては、イオンビームのヒームラインを差動
排気する等がちるが、装置が大形かつW、雑になるとい
う問題がある。これが第一の問題である。
Some countermeasures include differential pumping of the heel line of the ion beam, but this poses a problem in that the apparatus becomes large and complicated. This is the first problem.

一万、二次イオン質量分析に利用される二次イオンの収
率、すなわち−次イオン1個あたりの二次イオンの数が
非常に小さいから、二次イオンの質量分析には非常に高
感度の計測装置dを必要とする。これが第二の問題であ
る。
10,000, the yield of secondary ions used in secondary ion mass spectrometry, that is, the number of secondary ions per negative ion, is very small, so secondary ion mass spectrometry has very high sensitivity. measurement device d is required. This is the second problem.

〔発明の目的〕[Purpose of the invention]

本発明は斯かる事情に鑑みて為されたもので、その目的
とするところは、第一に核融合装置等への使用に適する
ように簡易で小形の質量分析装置を提供すること+WJ
二に高感度の計測装置を用いなくても機能する/i![
量分折装置を提供することにある。
The present invention has been made in view of the above circumstances, and its primary purpose is to provide a simple and compact mass spectrometer suitable for use in nuclear fusion devices, etc.+WJ
Second, it functions without the use of highly sensitive measuring equipment/i! [
An object of the present invention is to provide a quantitative spectrometer.

〔発明の瞳要〕[Eye of Invention Kaname]

上記の目的を達成する−ためにこの発明は真空容器と、
該真空容器に収容〜される陽極と三つの陰極て試料の表
面物質のイオンを発生させる二次イオン発生部を形成し
、該陽極は貫通した中空印(i有11、該中空部の両方
の開口印に対しては第−及び第二の陰極を、それぞれの
開1]印を覆うように配設し、第−及び第二の陰極には
陽極の中空印と同軸の貫通孔を設け、第二の貫通孔の中
に表面分析される試料を保持する第三の陰惨を設け、か
つ、上記陽極の中空部に、陽4壱の中空部の軸心に人員
的に平行である磁場を印加する手段を設け、1揚他には
最も高く、第二の陰惨には第一の1裟憔及び第三の1雲
惨のそハぞれの′区イ司よりも商い、40Lj’+71
 <’C与える手段により表面分析に用いる二次イア】
−7発生装置を構成した。
To achieve the above object, the present invention provides a vacuum container,
The anode and three cathodes housed in the vacuum container form a secondary ion generating section that generates ions of the surface substance of the sample, and the anode has a hollow mark (i11) that penetrates through both of the hollow parts. For the opening mark, a second cathode and a second cathode are arranged so as to cover each opening mark, and a through hole coaxial with the hollow mark of the anode is provided in the second cathode and the second cathode, A third hole for holding a sample to be surface analyzed is provided in the second through-hole, and a magnetic field is applied to the hollow part of the anode, which is physically parallel to the axis of the hollow part of the first anode. A means of applying is provided, and the first one is the highest, and the second one is higher than the first one, and the third one is higher than each of the 'gu'iji,'40Lj' + 71.
<Secondary ear used for surface analysis by means of providing C]
-7 generator was constructed.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、放電空間に面し7で試料を配設し、か
つ放電空間の電位の分布を放電で発生した一次イオンが
試料表面に高エネルギで衝突するようにして試料の表面
物質のスパッタ量を多くすると共に差動排気系を用いな
い小形で簡易な装置で商いガス効率で一次イオンの試料
照射を行ない、スパッタされた試料表面物質の粒子の大
部分を占める中性原子を放電空間に閉じ込められている
高淵高密曳の電子群でイオン化して大址の二次イオンを
発生させることができるため、二次イオンの検出に高感
度の計測装置を使用する必要がなくなる。
According to the present invention, the sample is disposed at 7 facing the discharge space, and the potential distribution in the discharge space is changed so that the primary ions generated by the discharge collide with the sample surface with high energy, thereby reducing the surface material of the sample. In addition to increasing the amount of sputtering, the sample is irradiated with primary ions with commercial gas efficiency using a small and simple device that does not use a differential pumping system, and the neutral atoms that make up most of the particles of the sputtered sample surface material are removed from the discharge space. Since secondary ions can be generated by ionizing the electrons trapped in the Takabuchi and Takabuchi electrons, there is no need to use highly sensitive measurement equipment to detect secondary ions.

〔発明の実施例〕[Embodiments of the invention]

第1図は本発明の一実施例を示す表面分析装置の主要部
縦断面図である。真空容器f1+は図示しない排気装置
と気体供給装置をボート(2)で接続され。
FIG. 1 is a longitudinal sectional view of the main parts of a surface analysis device showing one embodiment of the present invention. The vacuum vessel f1+ is connected to an exhaust system and a gas supply system (not shown) via a boat (2).

との真空容器(1)内には筒状の陽極(3)と、この陽
極(3)の中空部(4)の開口を覆うようにしかも離間
しかつ近接して配設された第一の陰極(5)と、この第
一の陰極(5)にはその中心部に貫通孔(6)が設けら
れ、陽極(3)の中空部(4)の他方の開口を覆うよう
に配設され、該陽極の中空部(4)と同軸の貫通孔(8
)を廟する第二の陰極、(9)は第二の陰極(7)に離
間かつ近接して配設され、該第二の陰極の貫通孔(8)
の中に配設された試料Qf)をホルダ(1υとともに保
持する第三の陰極である。該ホルダ(1υは図示されな
い′電源出力を印加される端子++21から第三の陰極
(9)への給′屯径路を兼ねる。上記第一の陰極(5)
第二の陰極(7)及び第三の陰極(9)は、上記ボート
(2)の内部の図示されない支持部に支持された支柱に
よって支持され、第一の陰極(5)及び第二の陰惨(7
)へは該支柱によって給電される。上記陽極(3)はホ
ード(2)を介して接地された真空容器(1)に支持さ
れ電気的には接地されている。上記第一の陰極(5)に
離間、かつ近接して、イオンの質量を分析する装置が配
設される。
Inside the vacuum container (1) is a cylindrical anode (3) and a first anode (3) disposed close to and spaced from the anode (3) so as to cover the opening of the hollow (4) of the anode (3). A through hole (6) is provided in the center of the cathode (5) and the first cathode (5), and is arranged to cover the other opening of the hollow part (4) of the anode (3). , a through hole (8) coaxial with the hollow part (4) of the anode.
), the second cathode (9) is arranged spaced apart from and close to the second cathode (7), and has a through hole (8) in the second cathode.
This is the third cathode that holds the sample (Qf) placed in the holder (1υ) together with the holder (1υ). Also serves as a supply path.The first cathode (5)
The second cathode (7) and the third cathode (9) are supported by columns supported by a support part (not shown) inside the boat (2), and the first cathode (5) and the second cathode (7
) is supplied with power by the pillar. The anode (3) is supported by a grounded vacuum container (1) via a hoard (2) and is electrically grounded. A device for analyzing the mass of ions is arranged at a distance from and close to the first cathode (5).

不発明は二次イオンの質量分析の方法に関して何等の制
限を昧すものではないが1本実施例においてはイオン速
度選択装置0漕を用いている。o優はイオン検出装置で
ある。該イオン速度選択装置(131は互に絶縁された
二板の導体板とそれを収容するケースからなる。該イオ
ン検出装置Hには、ファンデーカツノを用いている。イ
オン速度選択装置Oy及びイオン検出装置(1・υは、
内部に通電径路を有し。
Although the invention does not impose any restrictions on the method of mass spectrometry of secondary ions, in this embodiment, zero ion velocity selection devices are used. o Yu is an ion detection device. The ion velocity selection device (131) consists of two mutually insulated conductor plates and a case that houses them. The ion detection device H uses a foundation cutlet. The ion velocity selection device Oy and the ion velocity selection device Oy Detection device (1・υ is
It has a current-carrying path inside.

上記ボート内部の支持部によって支持された支柱(15
)により支持される。陽極(3)、第一の陰極(5)、
第二の陰惨(7)、第五の陰極(9)、イオン速度選択
装置(1:a及びイオン検出装@(1優は上記真空容器
(1)に収容きれている。
A column (15
) is supported by Anode (3), first cathode (5),
The second gruesome (7), the fifth cathode (9), the ion velocity selection device (1:a) and the ion detection device (1) are all housed in the vacuum container (1).

真空容器(IIの外周囲に設けらfまたコイルθωけ図
示されない電源と共に磁場発生装置を構成している。励
磁されたコイル(IGは陽極の中空部(4)の全開にそ
の軸心に実質的に平行である磁場を印加し、かつイオン
速度選択装置にほぼ一様な磁場を印加する。
A magnetic field generator is constituted by a coil (F) and a coil (θω) installed around the outer periphery of the vacuum vessel (II) along with a power source (not shown). A magnetic field is applied that is parallel to the ion velocity selector, and a substantially uniform magnetic field is applied to the ion velocity selector.

第2図は本発明の表面分析装置の主要部動作説明図であ
る。第1図と共通する部分には同一番号を符1〜でその
説明の重複を避ける。コイルQ61は第2図では示して
いないが動作中は陽極に磁場がかかっている状態で説明
する。また第二の陰極(7)にQ−1、′電源0ηによ
り負の・電位が与えられていて、第一の陰惨(5)には
電源信)、0樽により、第三の陰極(9)には電源(1
71,01によりそねぞわ第二の1ど倹(7)の電イ☆
より更に低い荀5缶が与えられ1゛いる。
FIG. 2 is an explanatory diagram of the operation of the main parts of the surface analysis device of the present invention. Components common to those in FIG. 1 are designated by the same numerals 1 through 1 to avoid duplication of description. Although the coil Q61 is not shown in FIG. 2, the description will be made assuming that a magnetic field is applied to the anode during operation. In addition, a negative potential is given to the second cathode (7) by the power supply 0η, and the third cathode (9 ) has a power supply (1
By 71,01 Sonezawa Second 1st Savings (7) Den-i ☆
If you are given 5 cans, which is even lower, you will receive 1.

以下、第1図及び第2図を参照して本発明の詳細な説明
する。−次イオンとなるべき気体1例えばアルコンは本
実施例ではホード(2) f Jし7て真空容器(1)
に供給きれ、陽極の中空部(4)に速する。酵陽惟の中
空部(4)には、印加された磁場と寛憧間′屯圧により
作らfL 、7)’4場により、クロストフィールド放
電が発生し1持する放電を安定に自続させるために、第
二(7)の陰極の電位は第一の陰極(5)の′電位より
而ぐなければならない。1鴇憧の中空部(4)には、A
6?UA密反の電子群が閉じ込められていて気体の分子
をイオン化する。イオン化さねた分子(例えばアルゴン
の原子イオン)は、電磁場から受ける力pcより、陽(
りの中空部(,4)を運動しその一部は試料の方向に移
動第二の1掴極(7)と試料(1〔9を保持する第五の
陰(夕(9)に与えられたRL位差により、高エネルギ
で試料(川)の表面に衝突する。試料の表面に入射する
一次イオンは、・を冗明で用いているクロストフィール
ド族′+4では低い作動ガス圧力で充分なすが?Mられ
かつ一次イオンのエイルギが簡く試料表面からス・・ツ
タされる表面物質の量が多いから、本発明では一次イオ
ン照射のための差動排気  が不戦であり、表面分析装
置が小形化かつ筒易化できる。
The present invention will be described in detail below with reference to FIGS. 1 and 2. -The gas 1 that should become the next ion, for example, alcon, is in the hoard (2) in this example, then in the vacuum container (1)
When the water is completely supplied, it is quickly transferred to the hollow part (4) of the anode. In the hollow part (4) of the Koyore, a crossed field discharge is generated by the applied magnetic field and the pressure between the two sides, fL, 7)'4, and the discharge is stably sustained for one period. Therefore, the potential of the second (7) cathode must be lower than the potential of the first cathode (5). 1. In the hollow part (4) of the
6? A group of electrons is trapped in the UA and ionizes gas molecules. A molecule that has not been ionized (for example, an atomic ion of argon) becomes positively (
The second gripping pole (7) moves through the hollow part (, 4) of the sample, and part of it moves toward the sample. Due to the RL phase difference, the primary ions collide with the surface of the sample (river) with high energy.The primary ions incident on the surface of the sample are In the present invention, differential pumping for primary ion irradiation is unsuitable, and the surface analysis device can be made smaller and easier to carry.

従来の二次イオン質量分析は、スパッタされた粒子のう
ち大部分、占める中性原子は利用できず非常に少岨しか
含丑れていない二次イオンを用いているため、二次イオ
ンの4炙出には特殊な高感度の針側装置を必要としてい
た。本発明では、スパッタされた粒子のほぼ全部に近い
中性原子を利用する。イオン衝撃を受け、試料表面から
放出された中性原子は、クロストフィールド放電の…、
電子群中を運動′し、その一部はイオン化されて第一の
陰極の貫通孔(6)を通過する。イオン速pi選択装置
031は、導体板間電圧を 定して所定の速度のイオン
だけをイオン検出装置(14)に導くものである。第一
の陰惨の貫通孔(6)を通過1−.、イオン速度選択装
置(1;嚇の入射孔に達したイオンは、−定のエネルギ
を持つから、その速度によって質量が求−まる。すなわ
ち、イオン速度メ択装置i¥ tl、1iOiq体氾)
間咀L1−を変化させて、イオン検出&i L# 0.
11の検出するイオン電流 との対応を得ることにより
、試料011)の入面分析ができる。クロストフィール
ド故知、01社イオー1は、試料(10)からスパッタ
さねた中4−ト原子を効率よくイオン化するから、イオ
ン検出装置aoの1(り出するイオン′ば流は従来の表
面分析装置のイオン直流より非常に大きくなり、特殊な
篩感曳の61副装置を使用する必要はない。
Conventional secondary ion mass spectrometry uses secondary ions, which contain only a very small amount of the neutral atoms that make up most of the sputtered particles, and therefore Broiling required a special, highly sensitive needle-side device. The present invention utilizes nearly all neutral atoms in the sputtered particles. Neutral atoms released from the sample surface due to ion bombardment cause a cross field discharge...
The electrons move in the group, a part of which is ionized and passes through the through hole (6) of the first cathode. The ion speed pi selection device 031 sets the voltage between the conductor plates and guides only ions with a predetermined speed to the ion detection device (14). Passing through the first gruesome through hole (6) 1-. , Ion velocity selection device (1; Ions that reach the entrance hole have a constant energy, so their mass can be found from their velocity. In other words, ion velocity selection device i¥tl, 1iOiq body flood)
Ion detection &i L# 0.
By obtaining a correspondence with the ion current detected by 11, it is possible to perform an in-plane analysis of sample 011). Clost field knowledge, 01 company Io 1 efficiently ionizes the middle atoms sputtered from the sample (10). The ion direct current of the device is much larger and there is no need to use a special sieving device.

〔発明の他の実施例〕[Other embodiments of the invention]

作動気体はどこから導入してもよく、例えば端子QZか
ら導入して」:い。磁場発生−に′2置け、実施例で示
した空心コイルでなくてもよい。イオンのTり曾分析は
、実施例で示1.た速曳選択カ式でなくてもよい。
The working gas may be introduced from anywhere, for example from terminal QZ. It can be placed in the magnetic field generator, and does not need to be an air-core coil as shown in the embodiment. T-resistance analysis of ions is shown in Example 1. It does not have to be a quick selection type.

【図面の簡単な説明】[Brief explanation of drawings]

第1昭1は本発明の一実施例を示す次面/、 I析鯨I
kの主戦部縦断田1図、第2図は本発明の主ν部4jl
J作説明図でp)る。 (1)・・・真空容器。 (2)・・・真空装置のホード。 (3)・・・陽極。 (4)・・・陽極の中空部。 (5)・・・第一の陰極。 (6)・・・第一の陰極の貫通孔。 (7)・・・第二の陰極1、 (8)・・・第二の陰極の貫通孔。 (9)・・・第三の陰極。 (1ト・・試料。 (16)・・・コイル。 αη、0槌、(IL・・電源。 代理人弁理士   則 近 憲 佑 (tlか1名) 0υ
No. 1 Show 1 shows an embodiment of the present invention/I Analyzing Whales I
Fig. 1 and Fig. 2 show the main part 4jl of the present invention.
J's explanatory diagram p). (1)...Vacuum container. (2)...Hoard of vacuum equipment. (3)...Anode. (4)...Hollow part of the anode. (5)...first cathode. (6)...through hole of first cathode. (7)...Second cathode 1, (8)...Second cathode through hole. (9)...Third cathode. (1t... sample. (16)... coil. αη, 0 hammer, (IL... power supply. Patent attorney Noriyuki Noriyuki (TL or 1 person) 0υ

Claims (1)

【特許請求の範囲】[Claims] (1)磁場の印加さハる真空容器内に収容されてなり、
貫通した中空部を有しかつこの中空部の細心を前記磁場
に平行に配置した陽極を、この陽極の開口部の一端に離
間かつ近接してこの開口部を覆うように配設されかつこ
の陽極の軸組方向に貫通孔をゼする第一の陰極と、この
第一の陰極と対向し前記陽憔の他の開口端に離間かつ近
接してこの開口部を覆うように配設されかつ前記第一の
陰極に設けられた貫通孔と同軸の貫通孔を有する第二の
陰極と、この第二の陰極の貫通孔に離間して挿入されか
つ分析すべき試料を前記駆使の方向に向けて保持してな
る第三の陰惨と、前記第一の陰極の貫通口に離間かつ近
接して設けたイrンの質量を分析するイオン質量分析部
と、@記陽極に最も高い電位を与える手段と、前記第二
の陰極に第−及び第三の陰極のそれぞれの′4位より高
い′電位を与える手段とを具備したことを特徴とする表
面分析装置。
(1) It is housed in a vacuum container to which a magnetic field is applied,
an anode having a hollow portion extending therethrough and having a fine point of the hollow portion arranged parallel to the magnetic field, the anode being spaced apart from and close to one end of the opening of the anode so as to cover the opening; a first cathode having a through hole in the axis direction of the anode; A second cathode having a through hole coaxial with the through hole provided in the first cathode, and a sample to be analyzed that is inserted into the through hole of the second cathode at a distance and is oriented in the direction of the use. an ion mass spectrometer for analyzing the mass of ion, which is provided at a distance from and close to the through-hole of the first cathode; and means for applying the highest potential to the anode. and means for applying a higher potential to the second cathode than the fourth position of each of the second and third cathodes.
JP57227437A 1982-12-28 1982-12-28 Surface spectrometer Granted JPS59121746A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57227437A JPS59121746A (en) 1982-12-28 1982-12-28 Surface spectrometer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57227437A JPS59121746A (en) 1982-12-28 1982-12-28 Surface spectrometer

Publications (2)

Publication Number Publication Date
JPS59121746A true JPS59121746A (en) 1984-07-13
JPH0135469B2 JPH0135469B2 (en) 1989-07-25

Family

ID=16860844

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57227437A Granted JPS59121746A (en) 1982-12-28 1982-12-28 Surface spectrometer

Country Status (1)

Country Link
JP (1) JPS59121746A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5150010A (en) * 1990-03-14 1992-09-22 Kabushiki Kaisha Toshiba Discharge-in-magnetic-field type ion generating apparatus

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5150010A (en) * 1990-03-14 1992-09-22 Kabushiki Kaisha Toshiba Discharge-in-magnetic-field type ion generating apparatus

Also Published As

Publication number Publication date
JPH0135469B2 (en) 1989-07-25

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