JPS5866942A - Manufacture of photomask - Google Patents
Manufacture of photomaskInfo
- Publication number
- JPS5866942A JPS5866942A JP56165328A JP16532881A JPS5866942A JP S5866942 A JPS5866942 A JP S5866942A JP 56165328 A JP56165328 A JP 56165328A JP 16532881 A JP16532881 A JP 16532881A JP S5866942 A JPS5866942 A JP S5866942A
- Authority
- JP
- Japan
- Prior art keywords
- photomask
- photosensitive
- photosensitive agent
- processed
- agent
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/095—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having more than one photosensitive layer
Abstract
Description
【発明の詳細な説明】 本発明はホトマスクの製造方法に関する。[Detailed description of the invention] The present invention relates to a method for manufacturing a photomask.
従来、ホトマスクの製造において、一枚の原版から複数
枚のワーΦ／グマスクを作る際に、転写方法として密着
露光方式が用いられているのは周知の通りである。原版
に形成されたパターンをよ）高精度に転写するには、原
版と被加工物を十分−に密着させる事が重要であり、そ
のため露光装置も年々改善されて来た。2. Description of the Related Art Conventionally, in the production of photomasks, it is well known that a contact exposure method is used as a transfer method when making a plurality of work masks from a single original plate. In order to transfer the pattern formed on the original plate with high precision, it is important to bring the original plate and the workpiece into close contact with each other, and for this reason, exposure equipment has been improved year by year.
第１図は従来のホトマスクの製造万ｆｆｉ？説明する几
めの断面図である。Figure 1 shows how many conventional photomasks are manufactured. FIG. 3 is a detailed cross-sectional view for explanation.
ホトマスク原版１はガラス基板３の表面にメタルパター
ン番が形成されたものから成る。被加工ホトマスク材２
はガラス基板３に金属層５が被覆されその上に感光剤６
が塗布されたものから成る。The photomask master plate 1 consists of a glass substrate 3 with a metal pattern number formed on its surface. Processed photomask material 2
A metal layer 5 is coated on a glass substrate 3, and a photosensitive agent 6 is coated on top of the metal layer 5.
It consists of a coated material.
このように形成されたホトマスク原版ｌおよび被加工ホ
トマスクを図のように重ね合せて、上からｆｔ、７ｔ−
当てて露光さ騒、感光反応を起させた後、現像をする。The thus formed photomask original plate l and the photomask to be processed are superimposed as shown in the figure, and ft, 7t-
After being exposed to light and causing a photosensitive reaction, it is developed.
゛この露光工程において、ホトマスク原板１および被加
工ホトマスク材の表面は共に極めて平滑で６砂、密着時
の接触面積が大であるから、メタルマスクの製造の様に
ホトレジスト等の接層性を有する感光剤を使用する場合
、密着露光後にホトマスク原版１と被加工ホトマスク材
２とが接層し九ｉま離れなくなるという欠点が６つ九。゛In this exposure process, both the surfaces of the photomask original plate 1 and the photomask material to be processed are extremely smooth and have a large contact area when they are in close contact, so that they have the adhesion properties of photoresist etc. as in the production of metal masks. When a photosensitive agent is used, there is a drawback that the photomask original plate 1 and the photomask material 2 to be processed come into contact with each other after contact exposure and cannot be separated from each other.
本発明は上記欠点を除き、密層露光後にホトマスク原版
゛と被加工ホトマスク材とを容易に離す事が出来るホト
マスクの製造方＠を提供するものである。The present invention eliminates the above-mentioned drawbacks and provides a method for manufacturing a photomask in which the photomask original plate and the photomask material to be processed can be easily separated after dense layer exposure.
本発明のホトマスクの製造方法は、透明板の上に直接に
または金属層を介して感覚剤が被覆されて成る被加工ホ
トマスク材の上に転写するパターンを有するホトマスク
原板を重ねて露光する工程を含むホトマスクの製造方法
において、感光反応によｐ窒素ガスを放出する特性を有
する第２の感光剤ｔ−＊記ホトマスク原版の被加工ホト
マスク材側老面あるいは前記被加工ホトマスク材の感光
剤の表面の少くとも一万に被覆することにより構成され
る。The method for manufacturing a photomask of the present invention includes the step of stacking and exposing a photomask original plate having a pattern to be transferred onto a photomask material to be processed, which is formed by coating a transparent plate with a sensory agent directly or through a metal layer. A method for manufacturing a photomask comprising: a second photosensitive agent having a property of releasing p nitrogen gas by a photosensitive reaction; by coating at least 10,000 layers of
本発明の実施例について図面を用いて説明する。Embodiments of the present invention will be described with reference to the drawings.
第２図は本発明の一実施ＩＰＩｌｔ−説明するための断
面図である。FIG. 2 is a sectional view for explaining one embodiment of the present invention.
透明なガラス基板３の上に金属層５を設け、その上に感
覚剤６ｔ−被覆する。この感光剤６の上に更に感光反応
によ〉窒素ガスを放出する特性を有する第２の感光剤８
ｔ−塗布する、感光反応により窒素ガスを放出する特性
を有する感光剤として、例えば米国シブレイ社製のＡＺ
レジストがある。A metal layer 5 is provided on a transparent glass substrate 3, and a sensory agent 6t-coated thereon. On top of this photosensitizer 6, a second photosensitizer 8 having the property of releasing nitrogen gas by a photosensitive reaction is further added.
For example, AZ manufactured by Sibley Co., Ltd. in the United States is used as a photosensitizer that has the property of releasing nitrogen gas through a photosensitive reaction.
There is a resist.
この感光剤は、元を照射すると次の様な反応（０８に１
３Ｒ８０８反応）によシ、窒素ガスを放出する。When this photosensitizer is irradiated, the following reaction occurs (1 in 2008).
3R808 reaction), nitrogen gas is released.
この夕放出される窒素ガスによりホトマスク原版と被加
ホトマスク材とが容易に分離される。This emitted nitrogen gas easily separates the photomask original from the photomask material to be added.
露光中に窒素ガスが放出さ、れるが、ホトマスク原版と
被加工ホトマスク材を分離させるための窒素ガスは極め
て少量で良く、使用する第２の感光剤の塗布厚で容易に
調節出来るので、露光時の密層状態を損う事は無い。Nitrogen gas is released during exposure, but only a very small amount of nitrogen gas is needed to separate the photomask original from the photomask material to be processed, and it can be easily adjusted by adjusting the coating thickness of the second photosensitive agent used. There is no harm to the dense state of time.
上記実施ガでは、窒素ガスを発生させる友めの第２の感
光剤を被加工ホトマスク材の感光剤６の表面に被覆し九
がホトマスク原版の被加工ホトマスク材側の表面に被覆
しても、またホトマスク原版および被加工ホトマスク材
の両方の表面に被覆しても同様の効果が得られる事は明
らかである。In the above embodiment, even if the second photosensitive agent that generates nitrogen gas is coated on the surface of the photosensitive agent 6 of the photomask material to be processed, and the second photosensitive agent is coated on the surface of the photomask master on the side of the photomask material to be processed, It is also clear that the same effect can be obtained by coating both the photomask original plate and the photomask material to be processed.
以上詳細に説明した様に、本発明によれば、密層露光に
おけるホトマスク原版と被加工ホトマスク材との＠着に
よる分離困難という欠点を除去し、露光後に両者を容易
に分離できるホトマスクの製造方法が得られるのでその
効果は大きい。As explained in detail above, according to the present invention, the drawback of difficulty in separating the photomask original plate and the photomask material to be processed due to @ adhesion during dense layer exposure is eliminated, and the method for manufacturing a photomask allows for easy separation of the two after exposure. The effect is great because it can be obtained.
Ｊｉ！１図は従来のホトマスクの製造方法を説明する九
めの断面図、第２図は本発明の一実ｍ飼を説明する几め
の断面図である。
ｌ・・・・・・ホトマスク原版、２・・・・・・被加工
ホトマスク材、３・・・・・・ガラス基板、４・・・・
・・メタルパターン、５・・・・・・金属層、６・・・
・・・感覚剤、７・・・・・・元、８・・・・・・第２
の感覚剤。
）］看・７１５イ］
￥−２可Ji! FIG. 1 is a ninth sectional view illustrating a conventional method of manufacturing a photomask, and FIG. 2 is a narrow sectional view illustrating a single feeding method of the present invention. l...Photomask original plate, 2...Photomask material to be processed, 3...Glass substrate, 4...
...Metal pattern, 5...Metal layer, 6...
・・・sensory agent, 7・・・・・・original, 8・・・・・・second
sensory agent. )] Kan・715i] ￥-2 possible
Claims (1)
されて成る被加工ホトマスク材の上に転写するパターン
を有するホトマスク原板を重ねて露光する工程を含むホ
トマスクの製造方法において、感光反応によ勤窒素ガス
を放出する特性を有する第２の感光剤を前記ホトマスク
原版の被加工ホトマスク材側表面あるいは前記被加工ホ
トマスク材の感光剤の表面の少くとも一万に被覆し九こ
とｔ％微とするホトマスクの製造方法。A method for manufacturing a photomask, which includes a step of stacking and exposing a photomask original plate having a pattern to be transferred onto a photomask material to be processed, which is a transparent plate coated with a photosensitizer directly or via a metal layer, in which a photoresist reaction is performed. Coat at least 10,000 t% of the surface of the photomask original plate on the side of the photomask material to be processed or the surface of the photosensitizer of the photomask material to be processed with a second photosensitizer having the property of releasing nitrogen gas. A method of manufacturing a photomask with a microscopic structure.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56165328A JPS5866942A (en) | 1981-10-16 | 1981-10-16 | Manufacture of photomask |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56165328A JPS5866942A (en) | 1981-10-16 | 1981-10-16 | Manufacture of photomask |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5866942A true JPS5866942A (en) | 1983-04-21 |
Family
ID=15810240
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56165328A Pending JPS5866942A (en) | 1981-10-16 | 1981-10-16 | Manufacture of photomask |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5866942A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009039909A (en) * | 2007-08-07 | 2009-02-26 | Toyota Motor Corp | Multilayer type steel sheet reinforcing material |
-
1981
- 1981-10-16 JP JP56165328A patent/JPS5866942A/en active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009039909A (en) * | 2007-08-07 | 2009-02-26 | Toyota Motor Corp | Multilayer type steel sheet reinforcing material |
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