JPS5864166A - Formation of coating film - Google Patents
Formation of coating filmInfo
- Publication number
- JPS5864166A JPS5864166A JP16232581A JP16232581A JPS5864166A JP S5864166 A JPS5864166 A JP S5864166A JP 16232581 A JP16232581 A JP 16232581A JP 16232581 A JP16232581 A JP 16232581A JP S5864166 A JPS5864166 A JP S5864166A
- Authority
- JP
- Japan
- Prior art keywords
- coating film
- electron beam
- cured
- coated
- irradiation
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Application Of Or Painting With Fluid Materials (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は電子線照射法によシ塗膜を硬化せしめる方法に
関し、特に電子線照射雰囲気中に酸素が存在する場合に
起る塗膜の重合阻害の影醤を少なくする方法を提供する
ものであり、不活性ガス雰囲気制御を必要としない電子
線照射による塗膜の形成方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for curing paint films by electron beam irradiation, and particularly to a method for reducing the effect of polymerization inhibition of paint films that occurs when oxygen is present in the electron beam irradiation atmosphere. The present invention relates to a method for forming a coating film by electron beam irradiation that does not require inert gas atmosphere control.
電子線照射法により塗膜を硬化せしめる方法は、従来か
ら行なわれている加熱硬化法に較べ、塗膜の硬化時間が
短縮できること、常温での硬化が可能であること、溶剤
が不用であること、一度に厚膜硬化が可能であることな
どの利点を有するため注目され最近実用化されつつある
。Compared to the conventional heat curing method, the method of curing a coating film using electron beam irradiation has the following advantages: it can shorten the curing time of the coating film, it can be cured at room temperature, and it does not require a solvent. , which has the advantage of being able to cure a thick film at once, has attracted attention and has recently been put into practical use.
電子線硬化法に適用する被覆形成性物質は、ラジカル重
合により架橋し塗膜を形成するものが主体である。これ
らラジカル重合性の被覆形成性物質は、酸素によってラ
ジカル重合阻害が起り、空気中では塗膜表面が十分硬化
せず、十分力性能を有する塗膜を形成することが出来な
い。電子線照射硬化法および光硬化法のいずれも、一般
に空気中の酸素に′よって重合が阻害されるが、その阻
害の程度には差異があり、紫外線硬化被覆形成性物質は
、反応性の高いオリプマー及びモノマーを用い、オリゴ
マー／モノマー比を高くすることなどによって、空気中
で十分硬化するものが実用化されているが、電子線硬化
被覆形成性物質は不活性ガス雰囲気中でないと硬化しな
いのが実状である。The coating-forming substances used in the electron beam curing method are mainly those that can be crosslinked by radical polymerization to form a coating film. In these radically polymerizable coating-forming substances, radical polymerization is inhibited by oxygen, and the surface of the coating film is not sufficiently cured in air, making it impossible to form a coating film with sufficient strength performance. In both the electron beam irradiation curing method and the photocuring method, polymerization is generally inhibited by oxygen in the air, but there are differences in the degree of inhibition. Products that cure sufficiently in air have been put into practical use by using oligomers and monomers and increasing the oligomer/monomer ratio, but electron beam-curable coating-forming materials do not cure unless in an inert gas atmosphere. is the actual situation.
従って、不活性ガス雰囲気で使用する紫外線硬化塗料で
も、重子線硬化に較べ雰囲気制御が一般に容易である。Therefore, even with ultraviolet curing paints used in an inert gas atmosphere, the atmosphere can generally be controlled more easily than with deuteron beam curing.
−力学気中で十分硬化する紫外線硬化塗料は、オリゴマ
ー、モノマーおよびその構成比々どに制限があり、それ
に伴い塗膜物性的にも制限があって単体塗膜としては利
用に限界、がある。- Ultraviolet curable paints that cure sufficiently in dynamic air have limitations in terms of oligomers, monomers, and their composition ratios, and as a result, there are also limitations in the physical properties of the coating film, which limits its use as a single coating film. .
又、光峻化法は電子線照射法と同様、加熱硬化法に較べ
塗膜の硬化時間゛の短縮、溶剤が不要も−しくは減少に
よる環境汚染の低下などの利点を有するが、隠蔽性の高
い塗料の一内部にまで至る硬化が不用能である。従って
、電子線照射によるラジカル重合架橋反応で塗膜を形成
させる場合、電子線の照射雰囲気をラジ゛カル重合を阻
害しないような不活性ガス雰囲気にする必要があり、窒
素ガス、炭酸ガスおよび燃焼ガスなどで雰囲気制御を行
う方法、並に酸素の透過性の小さなフィルム状物質を未
照射塗膜表面に添着した後、大気中で電子線照射し、塗
膜を硬化させる方法などが公知である。In addition, like the electron beam irradiation method, the photo-hardening method has advantages over the heat-curing method, such as shortening the curing time of the coating film and reducing environmental pollution due to the need or reduction of solvents; It is not necessary to cure the paint to the inside of the paint. Therefore, when forming a coating film by radical polymerization crosslinking reaction by electron beam irradiation, it is necessary to make the electron beam irradiation atmosphere an inert gas atmosphere that does not inhibit radical polymerization. A method of controlling the atmosphere using gas, etc., and a method of attaching a film-like material with low oxygen permeability to the surface of an unirradiated coating film and then irradiating it with an electron beam in the atmosphere to cure the coating film are well known. .
しかし電子＆１照射雰囲気を不活性ガスで制御する方法
は費用がかかり、塗膜硬化に関する費用が大きな割合を
占める。又、フィルム添着法も費用がかかり、且つ平滑
性に優れた塗膜が形成できないなどの欠点を有する。However, the method of controlling the electron & 1 irradiation atmosphere with an inert gas is expensive, and the cost for curing the coating film occupies a large proportion. Further, the film impregnation method also has drawbacks such as being expensive and not being able to form a coating film with excellent smoothness.
更に被塗物に被穆形成物を塗布し、直接電子線照射で便
化させる場合、塗布表面はロール、遮蔽板などに接触さ
せることが出来ず、隙間を開けておく必要があり、電子
線照射時に発生する制動Ｘ線、オゾン々どが電子線照射
室領域外に漏洩しないようにすることが難かしく、装置
自体を複雑にしなければならない。又、隙間が開いてい
るため雰囲気制御に必要な不活性ガス量を多くしなけれ
ばならず、経済的にも不利である。Furthermore, when applying a substance to be coated to a material to be coated and irradiating it with direct electron beam irradiation, the surface to be coated cannot come into contact with rolls, shielding plates, etc., and a gap must be left open. It is difficult to prevent bremsstrahlung X-rays, ozone, etc. generated during irradiation from leaking outside the electron beam irradiation chamber, and the apparatus itself must be complicated. Furthermore, since the gap is open, the amount of inert gas required for atmosphere control must be increased, which is economically disadvantageous.
そこで本発明はこれらの欠点を除去するためになされた
ものであって、その目的は電子線照射硬化による塗膜形
成時に雰囲気制御を必要とせず、硬化性及び平滑性に優
れた塗膜の形成方法を提供しようとするものである。Therefore, the present invention was made to eliminate these drawbacks, and its purpose is to form a coating film with excellent curability and smoothness without requiring atmosphere control during coating film formation by electron beam irradiation curing. It is intended to provide a method.
本発明の塗膜形成方法は雰囲気制御なしで、光照射によ
って硬化する樹脂に隠蔽性の無機物、顔料などを含有し
た被覆形成性塗膜を光照射によって表面を硬化させた後
、深部の未硬化部分を電子線によって硬化させ、硬化性
及び平滑性にすぐれた塗膜を形成する方法と、雰囲気制
御なしで、光照射硬化する被覆形成性物質を電子線照射
によって硬化し、塗膜を形成する未硬化の塗膜上に重ね
塗りした塗膜を先ず光照射によって表面を硬化させ、空
気中の酸素による重合阻害を低下させた後型イ線照射に
よって塗膜の深部までを硬化させるものであり、それに
よって優れた塗膜が形成されるのである。The method of forming a coating film of the present invention is to cure the surface of a coating film containing a masking inorganic substance, pigment, etc. in a resin that hardens by light irradiation without controlling the atmosphere. A method of curing a part with an electron beam to form a coating film with excellent curability and smoothness, and a method of curing a coating-forming substance that cures with light irradiation without atmosphere control to form a coating film with electron beam irradiation. The surface of the coating layered on top of the uncured coating layer is first cured by light irradiation, and then the deep layer of the coating layer is cured by irradiation to reduce polymerization inhibition caused by oxygen in the air. , thereby forming an excellent coating film.
本発明は塗布された塗膜表面を先ず光照射し硬化せしめ
るために、ひきつづいて電子線照射を行う場合、塗膜表
面がロール又は遮蔽板と接触しても塗膜表面が損なわれ
ないため、制動Ｘ線、オゾンなどが電子線照射宰領′域
外に漏洩しないようにＩｊ−ル、遮蔽板など被塗物表面
に接触させることが出来るようになり、その制御が容易
となる。又、「コール、遮蔽板などで照射室を密閉する
ことができるので、仮え雰囲気制御が必要な場合におい
ても、その制御は容易である。特に連続ラインにおいて
、照射室を減圧にし、酸素濃度を制御することができる
。In the present invention, when the surface of the applied coating film is first irradiated with light and then irradiated with electron beam to cure it, the surface of the coating film is not damaged even if it comes into contact with a roll or a shielding plate. Braking X-rays, ozone, etc. can be brought into contact with the surfaces of objects to be coated, such as Ijers and shielding plates, to prevent them from leaking out of the electron beam irradiation area, making it easier to control them. Furthermore, since the irradiation chamber can be sealed with coals, shielding plates, etc., even if temporary atmosphere control is required, it is easy to do so.Especially in continuous lines, the irradiation chamber can be depressurized and the oxygen concentration can be controlled. can be controlled.
本発明に使用される光硬化性被覆形成物は、感光基を主
鎖、側釧あるいは末端基、とじて含んでいるモノマーも
しくはオリゴマーから成り、光を照射すれば感光基によ
る重合や架橋反応が生じ、溶剤への不溶化や流動状から
固体状への物性変化が起るものから選ばれる。The photocurable coating used in the present invention consists of monomers or oligomers containing photosensitive groups in the main chain, side chains, or terminal groups, and when irradiated with light, polymerization and crosslinking reactions by the photosensitive groups occur. The material is selected from among those that occur, become insolubilized in solvents, or change physical properties from a fluid state to a solid state.
感光基の種類から分類すると次のようになる。The classification based on the type of photosensitive group is as follows.
■ 光により直接または光重合開始剤の作用により付加
重合し高分子化するアクリロイル基０−ＣＨ＝ＣＨ２）
、ビニルチオエーテル（−８−ＣＨ＝ＣＨ２，）、Ｎ
、Ｎ−ビニルアルキルアミノ基（−ＮＲ−ＣＨ＝ＣＨ２
） 、アリル基（−ＣＨ２−ＣＨ＝アセチレン不飽和基
（−ＣミＣ−Ｈ） などの光重合性不飽和基を有する
モノマーおよびオリゴマー〇
■ 光や電子線で励起されるとエチレン基の部分がシク
ロブタン環を形成して、二量化する物質をオリゴマー中
に導入することにより光照射で分子量を増大させたシ三
次元構造して硬化させ光二量化性感光基を有するモノマ
ーおよびオリゴマー。■ Acryloyl group (0-CH=CH2) that undergoes addition polymerization and polymerization by direct exposure to light or by the action of a photopolymerization initiator.
, vinylthioether (-8-CH=CH2,), N
, N-vinylalkylamino group (-NR-CH=CH2
), allyl group (-CH2-CH = acetylenically unsaturated group (-CmiC-H)) Monomers and oligomers with photopolymerizable unsaturated groups such as Monomers and oligomers that form a cyclobutane ring and increase the molecular weight by light irradiation by introducing a substance that dimerizes into the oligomer.The monomers and oligomers have a three-dimensional structure and a photodimerizable photosensitive group that is cured.
■ 光によって分解しラジカルを生成するアジド化合物
、ビスアジド化合物、ジアゾニウム塩、テトラゾニウム
塩などをモノマーおよびオリゴマー中に導入もしくはラ
ジカル重合性モノマー、オリゴマーに混合することによ
って光硬化可能に々る板径形成物。■ By introducing azide compounds, bisazide compounds, diazonium salts, tetrazonium salts, etc., which decompose with light and generate radicals, into monomers and oligomers, or by mixing them with radically polymerizable monomers and oligomers, plates with various diameters can be photocured. .
以上のものが適用可能であるが、光硬化型塗料やインキ
では合成の容易さ、塗装や印刷に適した粘度、必要に応
じては反応性希釈剤による粘度調節が可能であること、
光重合開始剤の量により反応性を調節し易いこと、並び
にバランスのとれた皮膜特性が得られ易いとと々どの理
由で、光重合性不飽和基を有するモノマー並びにオリゴ
マーが使用し易い。The above can be applied, but photocurable paints and inks should be easy to synthesize, have a viscosity suitable for painting and printing, and if necessary, can adjust the viscosity with a reactive diluent.
Monomers and oligomers having photopolymerizable unsaturated groups are easy to use because the reactivity can be easily adjusted by adjusting the amount of photopolymerization initiator and well-balanced film properties can be obtained.
従って、汎用的には光硬化性波〜形成物は基本的に ０反応性不飽和オリゴマー ■反応性希釈剤 ■光増感剤 から成る。Therefore, in general terms, photocurable wave ~ formed products are basically 0 reactive unsaturated oligomers ■Reactive diluent ■Photosensitizer Consists of.
光反応性不飽和オリゴマーを樹脂系から分類すると、
（１）無水マレイン酸型不飽和ポリエステル並びにその
シリコーン変性、ウレタン変性、アクリルウレタン変性
など。Photoreactive unsaturated oligomers can be classified based on their resin type: (1) maleic anhydride type unsaturated polyesters and their silicone-modified, urethane-modified, acrylic-urethane modified, etc.
（２） アクリロイル基反応型樹脂 ＣＨ２＝Ｃ−Ｃｏｏ−を分子中に２個以上有するもので （１）ポリエステルアクリレート系 （１１）エポキシアクリレート系 ６１０ウレタンアクリレート系 １１Ｖ）ポリエーテルアクリレート系 （Ｖ）ポリオールアクリレート系 位）メラミンアクリレート系 （Ｓ／１１）シリコンアクリレート系 などがある。(2) Acryloyl group-reactive resin Those with two or more CH2=C-Coo- in the molecule (1) Polyester acrylate type (11) Epoxy acrylate type 610 urethane acrylate type 11V) Polyether acrylate type (V) Polyol acrylate type ) Melamine acrylate type (S/11) Silicon acrylate type and so on.
本発明の方法に用いる反応性希釈剤は光反応性不飽和オ
リゴマー、ポリマーのベースレジンをそのまま塗料やイ
ンキのバインダーとして用いるには、その粘度が高すぎ
るので一般に多官能性モノマーによって希釈して使用さ
れる。反応性希釈剤としては低粘度で溶解力が大きいこ
とは勿論揮発性、臭気及び安全性並びに皮膜物性などの
面から一般に、１，４−ブタンジオールジアクリレート
、１．６−ヘキサンノオールジアクリレート、ネオペン
チルグリコールジアクリレート、ジエチレングリコール
ジアクリレート、テトラエチレングリコールシアクリ゛
レート、ポリエチレングリコール−４００ジアクリレー
トなどのジアクリレート系、トリメチロールプロパント
リアクリレート、ペンタエリスリトールトリアクリレー
トなどのトリアクリレートなどが市販されているものを
用いることができる。The reactive diluent used in the method of the present invention is a photoreactive unsaturated oligomer or polymer base resin, which has too high a viscosity to be used as a paint or ink binder as it is, so it is generally used after being diluted with a polyfunctional monomer. be done. As a reactive diluent, 1,4-butanediol diacrylate and 1,6-hexaneol diacrylate are generally used because of their low viscosity and high dissolving power, as well as their volatility, odor, safety, and film properties. , diacrylates such as neopentyl glycol diacrylate, diethylene glycol diacrylate, tetraethylene glycol cyacrylate, and polyethylene glycol-400 diacrylate, and triacrylates such as trimethylolpropane triacrylate and pentaerythritol triacrylate are commercially available. You can use whatever you have.
本発明の方法で用いることのできる光増感剤は一般的に
は暗所では安定であるが紫外線などの光によってラジカ
ルが発生するものから選ばれ、ベンゾフェノンやその誘
導体のような芳香族ケトンかハロゲン化芳香族化合物な
どが用いられる。The photosensitizers that can be used in the method of the present invention are generally selected from those that are stable in the dark but generate radicals when exposed to light such as ultraviolet light, and include aromatic ketones such as benzophenone and its derivatives. Halogenated aromatic compounds and the like are used.
本発明に用いることのできる電子線硬化性被覆形成物は
、基本的には電子線反応性不飽和ポリマーおよびオリゴ
マーと反応性希釈剤から成り、それぞれ光硬化性被覆形
成物に用いることのできるものから選択することができ
る。The electron beam curable coating material that can be used in the present invention basically consists of an electron beam-reactive unsaturated polymer and oligomer and a reactive diluent, each of which can be used in the photocurable coating material. You can choose from.
以下に本発明の実施例を挙げる。Examples of the present invention are listed below.
実施例１
多官能オリゴエステルアクリレート（商標登録アロエッ
クスＭ−８０６０） １００重量部に光増感剤としてベ
ンジル２重量部、酸化チタン（商標登録タイベークＲ７
８０） ３０重量部を混合し、光硬化性被覆形成物を調
整した。この調整した粘ちょう液を清浄なアルミニウム
板に約関μ塗布した後、紫外線硬化装置（商標登録ミニ
キュア４５０）で照射距離５確で２０秒間、照射雰囲気
の制御を行なわない状態で照射した後電子線照射装置（
商標ＥＳＨ１５０−０２０）で加速電圧１５０ＫＶで５
Ｍｒａｄ ％照射雰囲気制御を行なわない状態で照射
した結果、塗膜鉛筆硬度３Ｈ，塗膜厚間μの光沢を有す
る被膜を得た。Example 1 100 parts by weight of polyfunctional oligoester acrylate (registered trademark Aloex M-8060), 2 parts by weight of benzyl as a photosensitizer, and titanium oxide (registered trademark Tybake R7)
80) 30 parts by weight were mixed to prepare a photocurable coating. After applying this adjusted viscous liquid on a clean aluminum plate, it was irradiated with an ultraviolet curing device (trademark registered MiniCure 450) at a irradiation distance of 5 degrees for 20 seconds without controlling the irradiation atmosphere. Ray irradiation device (
5 at acceleration voltage 150KV with trademark ESH150-020)
Mrad % As a result of irradiation without controlling the irradiation atmosphere, a glossy coating with a pencil hardness of 3H and a coating thickness μ was obtained.
比較例１
板に実施例１と同様の方法で紫外線照射だけを行々つた
結果、塗膜内部が未硬化であった。Comparative Example 1 A board was irradiated only with ultraviolet rays in the same manner as in Example 1, and as a result, the inside of the coating film was uncured.
比較例２
実施例１と同様の方法で塗布したアルミニウム板を゛紫
外線照射硬化せずに、直接実施例１と同様の方法で電子
線照射硬化を行なった結果、塗膜内面は硬化したが塗膜
表面は十分硬化せずまだ粘着性を持っていた。Comparative Example 2 An aluminum plate coated in the same manner as in Example 1 was directly cured by electron beam irradiation in the same manner as in Example 1 without being cured by ultraviolet rays. As a result, the inner surface of the coating was cured, but the coating The film surface was not sufficiently cured and still had stickiness.
実施例２
電子線硬化性樹脂単官能アクリルオリゴエステル（商標
登録アロエックスＭ５７００ ）をリン酸塩化成処理を
施した鋼板上にカーテンフローコーターで約２０μ塗布
し、さらにその上に光硬化剤としてのベンジル２重量％
を含有するアクリルオリゴエステル混合物（商標登録ア
ロニックスＭ８０６０／アロニツクスＭ６３００１ ：
１ ）をカーテンフローコーターで約２０μ塗布した
試験板を、紫外線硬化装置（商標登録ミニキュア４５０
）で照射距離５ｃｒＩＬで加秒間、照射雰囲気制御を行
なわない状態で照射した後電子線照射装置（商標ＥＳＨ
１５０−０２０） で加速電圧１５０ＫＶで５ Ｍｒ
ａｄ 、照射雰囲気の制御を行なわ々い状態で照射した
結果、塗膜鉛筆硬度２Ｈ。Example 2 Electron beam curable resin monofunctional acrylic oligoester (trademark registered Aloex M5700) was coated on a steel plate that had been subjected to phosphate chemical conversion treatment by a curtain flow coater to approximately 20 μm, and then a photocuring agent was applied on top of the coating. Benzyl 2% by weight
Acrylic oligoester mixture containing (trademark registered Aronix M8060/Aronix M63001:
1) was coated with about 20 μm of the product using a curtain flow coater, and then the test plate was coated with an ultraviolet curing device (registered trademark MiniCure 450).
) at an irradiation distance of 5crIL for an extended period of time without controlling the irradiation atmosphere.
150-020) at an accelerating voltage of 150KV and 5 Mr.
ad, the paint film had a pencil hardness of 2H as a result of irradiation under controlled irradiation atmosphere.
塗膜厚的□□□μの光沢を有する被膜を得た。A coating having a gloss of □□□μ in terms of coating thickness was obtained.
比較例３
実施例２と同様の方法で塗布した試験板に実施例２と同
様の方法で紫外線硬化のみを行なった結果、塗膜内部は
未硬化であった。Comparative Example 3 A test plate coated in the same manner as in Example 2 was only subjected to ultraviolet curing in the same manner as in Example 2. As a result, the inside of the coating film was not cured.
比較例４
実施例２と同様の方法で塗布した試験板を紫外線照射せ
ずに直接実施例２と同様の方法で電子線硬化を行なった
結果塗膜内面は硬化したが塗膜表面は十分硬化せず、粘
着性を有していた。Comparative Example 4 A test plate coated in the same manner as in Example 2 was directly cured with electron beam in the same manner as in Example 2 without irradiating it with ultraviolet rays. As a result, the inner surface of the coating was cured, but the surface of the coating was sufficiently cured. It was not sticky and had stickiness.
特許出願人 日本パー力ライジング株式会社手続補正書
昭和５７年２月１７日
特許庁長官殿
（特許庁審査官 殿）
１、事件の表示
昭和５６年特許願第１６２３２５ 号２、発明の名称
塗膜の形成方法
３、補正をする者
事件との関係 出願人
氏名（名称）日本ノ９−カライ・ソング株式会社４、代
理人
住所 東京都港区南青山−丁目１番１号５、 補正命令
の日付（自発）
（発送日）昭和 年 月 日６、補正の対
象
発明の詳細な説明の欄
７、補正の内容
（１）、本願明細書第２頁第４行目の「不用」を「不要
」と訂正する。Patent Applicant Nippon Pariki Rising Co., Ltd. Procedural Amendment February 17, 1980 To the Commissioner of the Patent Office (To the Examiner of the Patent Office) 1. Indication of the case Patent Application No. 162325 of 1981 2. Name of the invention Coating film Formation method 3, Relationship with the case of the person making the amendment Applicant name: Japan No. 9 Karai Song Co., Ltd. 4, Agent address: 1-1-5 Minami-Aoyama, Minato-ku, Tokyo, Date of amendment order (Spontaneous) (Date of dispatch) Showa, Month, Day 6, Detailed explanation column 7 of the invention subject to amendment, Contents of the amendment (1), Changed "unnecessary" to "unnecessary" in line 4 of page 2 of the specification of the application. I am corrected.
（２）、同第４頁第９行目の「難かしく」を「難しく」
と訂正する。(2) "Difficult" in the 9th line of page 4 is "difficult"
I am corrected.
（３）、同第５頁第１９行目の「仮え」を「仮に」と訂
正する、
（４）、同第６頁第８行目の「起る」を「起こる」と訂
正する。(3) Correct ``kari'' on page 5, line 19 to ``temporarily.'' (4) Correct ``happen'' on page 6, line 8 of the same page to ``happen.''
（５）、同第１１頁第１１行目の「粘ちょう液」を「粘
ちゆう液」と訂正する。(5), ``viscous liquid'' on page 11, line 11 is corrected to ``viscous liquid''.
以上that's all
Claims (2)
よって表面を硬化させた後、電子線照射によって、さら
に塗膜内面を硬化させることを特徴とする塗膜の形成方
法。(1) A method for forming a coating film, which comprises applying a curable coating material to an object to be coated, curing the surface by irradiation with light, and then further curing the inner surface of the coating film by irradiation with an electron beam.
さらに光硬化性被覆形成物を重ね塗りした後光照射によ
って表面を硬化させ、その後電子線照射によってさらに
塗膜内面を硬化させることを特徴とする塗膜の形成方法
。(2) Applying an electron beam curable coating material to the object to be coated,
A method for forming a coating film, which further comprises overcoating a photocurable coating material, curing the surface by irradiation with light, and then further curing the inner surface of the coating film by irradiation with an electron beam.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16232581A JPS5844432B2 (en) | 1981-10-12 | 1981-10-12 | How to form a coating film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16232581A JPS5844432B2 (en) | 1981-10-12 | 1981-10-12 | How to form a coating film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5864166A true JPS5864166A (en) | 1983-04-16 |
| JPS5844432B2 JPS5844432B2 (en) | 1983-10-03 |
Family
ID=15752384
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16232581A Expired JPS5844432B2 (en) | 1981-10-12 | 1981-10-12 | How to form a coating film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5844432B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6242768A (en) * | 1985-08-20 | 1987-02-24 | Dynic Corp | Method for irradiating electron beam |
| JP2005152751A (en) * | 2003-11-25 | 2005-06-16 | Tdk Corp | Method for forming protective layer and method for manufacturing optical information medium |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59150940U (en) * | 1983-03-29 | 1984-10-09 | 三菱重工業株式会社 | Water cooled engine reserve tank |
-
1981
- 1981-10-12 JP JP16232581A patent/JPS5844432B2/en not_active Expired
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6242768A (en) * | 1985-08-20 | 1987-02-24 | Dynic Corp | Method for irradiating electron beam |
| JP2005152751A (en) * | 2003-11-25 | 2005-06-16 | Tdk Corp | Method for forming protective layer and method for manufacturing optical information medium |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5844432B2 (en) | 1983-10-03 |
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