JPS5857623A - Production of vertical magnetic recording medium - Google Patents
Production of vertical magnetic recording mediumInfo
- Publication number
- JPS5857623A JPS5857623A JP56156136A JP15613681A JPS5857623A JP S5857623 A JPS5857623 A JP S5857623A JP 56156136 A JP56156136 A JP 56156136A JP 15613681 A JP15613681 A JP 15613681A JP S5857623 A JPS5857623 A JP S5857623A
- Authority
- JP
- Japan
- Prior art keywords
- heat treatment
- recording medium
- film
- magnetic recording
- vertical magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 229910000531 Co alloy Inorganic materials 0.000 claims abstract description 8
- 239000012298 atmosphere Substances 0.000 claims abstract description 7
- 230000008018 melting Effects 0.000 claims abstract description 5
- 238000002844 melting Methods 0.000 claims abstract description 5
- 239000010409 thin film Substances 0.000 claims abstract 3
- 230000001590 oxidative effect Effects 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 abstract description 15
- 238000000034 method Methods 0.000 abstract description 11
- 238000004544 sputter deposition Methods 0.000 abstract description 11
- 229910000599 Cr alloy Inorganic materials 0.000 abstract description 2
- 239000011261 inert gas Substances 0.000 abstract description 2
- 239000000758 substrate Substances 0.000 description 7
- 230000000694 effects Effects 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 239000002966 varnish Substances 0.000 description 2
- 241000287531 Psittacidae Species 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 239000012300 argon atmosphere Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000004070 electrodeposition Methods 0.000 description 1
- 238000007772 electroless plating Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000001552 radio frequency sputter deposition Methods 0.000 description 1
- 239000002689 soil Substances 0.000 description 1
- 238000003860 storage Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/62—Record carriers characterised by the selection of the material
- G11B5/64—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent
- G11B5/65—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition
- G11B5/656—Record carriers characterised by the selection of the material comprising only the magnetic material without bonding agent characterised by its composition containing Co
Landscapes
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は高品質、高性能な垂直磁気ディスクの作製方法
に関するものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a high-quality, high-performance perpendicular magnetic disk.
垂直磁気記録は従来の水平磁気記録よシも高密度記録が
可能な記録方式として期待されている。Perpendicular magnetic recording is expected to be a recording method capable of higher density recording than conventional horizontal magnetic recording.
従来の垂直記録用媒体としてはスパッタ法によｐ作製し
たＣｏ−Ｃｒ膜（ニス、イワサキ他、 ＩＥＥＥＴｒａ
ｎｓ ｏｎ Ｍａｇ、 Ｖｏｌ、 ＭＡＧ−１４、Ｎｏ
、 ５ 、 ｐｐ ８４９〜ｐＩ） ８５１ 、１９７
８ ）、スパッタ法で作製したＣｏ−Ｃｒ−Ｒｈ膜（２
６ｔｈ Ａｎｎｕａｌ Ｃｏｎｆｅｒｅｎｃｅ ｏｎ
Ｍａｇｎｅｔｉｓｍａｎｄ Ｍａｇｎｅｔｉｃ 、４ｔ
ｅｒｉａｌｓ、 ＦＣ−２ＮｏＶ、１９８０ ）、無電
解メッキで作製したＣｏ−Ｍｎ−Ｐ膜（日刊工業新聞＋
８１／３／１８ ） 、対向ターゲット式スパッタ法に
よるＣｏ−Ｃｒ膜（電子通信学会磁気記録研究会ＭＲ８
０−２９）、蒸着によるＣｏ−Ｃｒ膜（ワイ、−ｖｘダ
。As a conventional perpendicular recording medium, a Co-Cr film (varnish, Iwasaki et al., IEEE Tra.
ns on Mag, Vol, MAG-14, No.
, 5, pp 849-pI) 851, 197
8), Co-Cr-Rh film prepared by sputtering method (2
6th Annual Conference on
Magnetismand Magnetic, 4t
FC-2NoV, 1980), Co-Mn-P film prepared by electroless plating (Nikkan Kogyo Shimbun +
81/3/18), Co-Cr film by facing target sputtering method (IEICE Magnetic Recording Study Group MR8
0-29), Co-Cr film by vapor deposition (-vx da).
ＪＪＡＰ Ｖｏｌ、２０ Ｎｏ、 ７．１）Ｉ）、Ｌ４
６７〜Ｌ４６９．１９８１ ）、スパッタ法によるＣｏ
−Ｒｕ （ニス、ヒロ／ 、 ＪＪＡＰＶｏｌ、 ２０
． Ｎｏ、 ８ ｐｐ、 Ｌ ５７１．− Ｌ ５７４
．１９８１）等である。こｔらの垂直媒体に共通してい
ることｉｆ： Ｃｏの合金であることと、作製法によら
ず作製した状態での膜奮記録媒体として使用することで
ある。即ち、本来持っている丁ぐれた特性全作製条件た
けで引き出そうとしているため作製条件が非常に厳しく
なっていることと（たとえばスパッタ時の真空度、ガス
圧、基板温度、スパッタ速度前のマージンが狭い）、ま
た出゛米上った媒体の磁気記録上の特性も制限されてい
るという欠点をイ」していた。JJAP Vol, 20 No, 7.1) I), L4
67-L469.1981), Co by sputtering method
-Ru (varnish, Hiro/, JJAP Vol, 20
．． No. 8 pp. L 571. - L 574
．． 1981) etc. What these vertical media have in common is that they are made of a Co alloy and that they can be used as a film recording medium in the manufactured state regardless of the manufacturing method. In other words, the manufacturing conditions are extremely strict because they are trying to bring out the inherent characteristics by using all the manufacturing conditions (for example, the degree of vacuum during sputtering, gas pressure, substrate temperature, margin before sputtering speed) It also had the disadvantage that the magnetic recording characteristics of the media developed in the United States were limited.
本発明はこれら゛の欠点を除去するために、スパッタ法
、蒸着法あるいは電着法によって作製したコバルト合金
膜を熱処理することにより、特性を大幅に改善するもの
であり、こ７１．によって高１・−賀。In order to eliminate these drawbacks, the present invention significantly improves the characteristics by heat-treating a cobalt alloy film produced by sputtering, vapor deposition, or electrodeposition. By 1st year of high school.
同性能な磁気記録媒体を提供することを１」的とする。Our goal is to provide a magnetic recording medium with the same performance.
垂直磁気記録媒体の性能の指針を与える物理量は膜面に
対して垂直方向の磁気異方性の強さ、即ち垂直磁気異方
性であジ、この量が太きければ大きい程高記録密度、高
出力、高ＳＮ比の記録媒体となる。第１図は東北大岩崎
教授によって示さ扛たものであシ（電子通信学会磁気記
録研究会ＭＲ８１−４〜８）垂直異方性磁界ＨＫ （Ｈ
Ｋ ＝ ２ Ｋｉ／ ＭＳ。The physical quantity that provides a guideline for the performance of perpendicular magnetic recording media is the strength of magnetic anisotropy in the direction perpendicular to the film surface, that is, perpendicular magnetic anisotropy.The thicker this quantity, the higher the recording density. It becomes a recording medium with high output and high SN ratio. Figure 1 was shown by Professor Iwasaki of Tohoku University (IEICE Magnetic Recording Research Group MR81-4~8). Vertical anisotropic magnetic field HK (H
K = 2 Ki/MS.
ＫＪＬは垂直磁気異方性定数１ＭＳは飽和磁化）に対す
るり、。（再生時に出力が半分となる記録密度で、１．
Ｑ、ＫＢＰＩとはキロビット／インチである）を示した
ものであジｓ ＨＫが大きい程記録が度も大きくなるの
がわかる。ｇはリングヘッドのギャップ長であり、Δ印
はシングルボールヘット（Ｓｉｎｇｌｃｔ−ｐｏｌｅ−
ｈｅａｄ ）使用、○印はリングヘッド（Ｒｉｎｇｈｅ
ａｄ ）使用の場合である。又記録密度の限界を与れる
磁壁の幅Ｄ ｉｄ Ｄ ｏｃ １ ／Ｊ【となりＫｌが
大きい程小さくなることも周知である。垂直磁気異方性
定数に上は温度２時間など熱処理条件によって変化する
。以下実施例について説明する。KJL is the perpendicular magnetic anisotropy constant (1MS is the saturation magnetization). (At a recording density where the output is halved during playback, 1.
Q, KBPI is kilobits per inch), and it can be seen that the larger the HK, the larger the recording power. g is the gap length of the ring head, and the Δ mark is the single ball head (Singlct-pole-
head) is used, ○ mark is a ring head (Ringhe) used.
ad) in case of use. It is also well known that the width of the domain wall that gives the limit to the recording density is D id D oc 1 /J, which becomes smaller as Kl becomes larger. The perpendicular magnetic anisotropy constant varies depending on heat treatment conditions such as temperature and 2 hours. Examples will be described below.
〔実施例１〕
第２図は本発明の一実施例であり、スパッタ法で作製し
た１６ａｔ％Ｃｒを入れたＣｏ合金膜のに土を熱処理温
度に対して示したものである。スパッタは通常の２極Ｒ
Ｆスパツタで行ない、基板温度１３０℃、膜生成速度ハ
８０＾／分、＃ Ｊ”ｊ １１０ｎである。垂直異方性
に上はトルクメーターにより次のようにして測定した。[Example 1] Fig. 2 is an example of the present invention, and shows the relationship between the heat treatment temperature of a Co alloy film containing 16 at% Cr prepared by sputtering. Sputtering is normal 2-pole R
The substrate temperature was 130°C, the film formation rate was 80^/min, and #J"j was 110n. The perpendicular anisotropy was measured using a torque meter as follows.
トルク曲ｉ！ｉｌをフーリエ解析し、膜の垂直方向を容
易軸とする一軸異方性定数Ｋを求める。反磁場による異
方性２π隨とに、ＫＬの関係はに＝に土−２πＭｓ
となる。Torque song i! il is subjected to Fourier analysis to determine the uniaxial anisotropy constant K with the easy axis in the direction perpendicular to the film. With respect to the anisotropy of 2π due to the demagnetizing field, the relationship of KL is = −2πMs
becomes.
したがってに↓＝に＋２πＭｓとなり、Ｍｓｋ別の方法
（試料振動式磁力Ｐ５−ｔ ）で求めてＫｉ（ｚ滑出し
た。Therefore, ↓ = +2πMs, Msk was obtained by another method (specimen vibration type magnetic force P5-t), and Ki (z was slid).
熱処理はＭガス雰囲気の′Ｉわ；気炉で各温度で２時間
行なった。試料のＣｏ−Ｃｒ合金の融点は１４８０ ℃
であシ、処理温歴は、融点の１／３〜ｌ／２である５０
０℃〜７５０℃で、これにより■ぐ上は処理前に比べ３
〜４倍近く増加しているのが判る。熱処理の効果は歪み
の緩和、結晶性の向上、等が起るためと考えられる。The heat treatment was carried out in an air furnace in an M gas atmosphere at each temperature for 2 hours. The melting point of the sample Co-Cr alloy is 1480 °C
Yes, the treatment temperature is 1/3 to 1/2 of the melting point 50
From 0℃ to 750℃, the temperature is 3 times higher than before treatment.
It can be seen that the number has increased by nearly 4 times. The effect of heat treatment is thought to be due to relaxation of strain, improvement of crystallinity, etc.
〔実施例２〕
真空蒸着法によって作製した１８．５ ａｔ％Ｃｒ−Ｃ
ｏ膜も同様の効果があった。蒸着は基板温度１３０〜３
７０℃、膜厚０．８μｍ１真空度５ｘｌＯＴｏｒｒ、
蒸着速度２００〜３０００λ／分で行なった。初期状
態で０．５×１１０６ｅｒ ／ｃｃ であったに１は５
００℃、２時間の熱処理によ、り ２ ｘ １０’ ｅ
ｒｇ／ｃｃに増加した。熱処理条件は実施例１と同じで
ある。[Example 2] 18.5 at% Cr-C produced by vacuum evaporation method
The o film also had a similar effect. Vapor deposition is performed at a substrate temperature of 130 to 3
70°C, film thickness 0.8μm, degree of vacuum 5xlOTorr,
The deposition rate was 200 to 3000 λ/min. In the initial state it was 0.5×1106er/cc, but 1 is 5
By heat treatment at 00℃ for 2 hours, 2 x 10' e
increased to rg/cc. The heat treatment conditions are the same as in Example 1.
〔実施例３〕 スパッタ法によｐ作製した３０ａｔ％Ｒｕを含んだＣ。[Example 3] C containing 30 at% Ru produced by sputtering.
合金膜も同様であった。スパッタは５〜８Ｘ１０ Ｔ
ｈｒｒアルゴン雰囲気、速度２００〜２３０ Ａ／分、
ＲＦパワー１−４ Ｗ ／ ｃＪ 、基板温度２０〜２
００℃でガラス基板上に膜厚２μｍになるように行なっ
た。３０ａｔ％Ｒｕ−Ｃｏの融点は１８００℃であり５
００℃の熱処理では効果なかった。処理前に２．５ Ｘ
１０ ｅｒｇ／ｃｃであったに土が、６００℃の熱処
理によｐ ６ Ｘ １１０５ｅｒ／ ｃｃに増加した。The same was true for the alloy film. Sputtering is 5~8X10T
hrr argon atmosphere, speed 200-230 A/min,
RF power 1-4 W/cJ, substrate temperature 20-2
The film was deposited on a glass substrate at 00° C. to a film thickness of 2 μm. The melting point of 30 at% Ru-Co is 1800°C and 5
Heat treatment at 00°C had no effect. 2.5X before treatment
The soil was 10 erg/cc, but increased to p 6 × 1105 er/cc by heat treatment at 600°C.
処理条件は前例と同じである。Processing conditions are the same as in the previous example.
〔実施例４〕
ＲＦスパッタ法によ９１００ｍ径の石英ガラス基板上に
１６ ａｔ％Ｃｒ−Ｃｏ膜全伺漸した磁気ディスクを用
い記録再生特性を測定した。第３図は本磁気テイスクを
前記方法によシ熱処理（７、その処理温度に対する記録
密度を測定したものである。用いたリンクヘッドの幅は
０．２μｍである。Ｄ、。は線記録密度であり、ｂｐｍ
はビット／鵡の意味でおる。用いたヘッドはギャップ長
が０．２１１ｍのリングヘッドである。第２図と良く対
応しており、Ｋｌの１・〜加と共に記録密度も向上して
いることが判る。[Example 4] Recording and reproducing characteristics were measured using a magnetic disk in which a 16 at% Cr-Co film was entirely deposited on a 9100 m diameter quartz glass substrate by RF sputtering. Fig. 3 shows the results of heat treatment (7) of this magnetic disk according to the method described above, and the measurement of the recording density against the treatment temperature.The width of the link head used was 0.2 μm.D, . is the linear recording density. and bpm
means bit/parrot. The head used was a ring head with a gap length of 0.211 m. It corresponds well with FIG. 2, and it can be seen that the recording density improves as Kl increases by 1.about.
〔実施例５〕
実施例１と同じ方法で、ただし基板温度だけ３５０℃と
して作製したＣｏ−Ｃｒ ＃は、そのま甘では垂直異方
性を示さない。しかし５００℃で２時間熱処理すること
によｔ） ２ Ｘ １０ ｅｒｇ／ｃｃのＫ が表れた
。[Example 5] Co--Cr # produced by the same method as in Example 1 except that only the substrate temperature was changed to 350° C. does not exhibit vertical anisotropy in its natural state. However, by heat treatment at 500° C. for 2 hours, a K of t) 2 × 10 erg/cc appeared.
熱処理雰囲気はアルゴンの如き不活性ガスでなく真空雰
囲気でもよい。The heat treatment atmosphere may be a vacuum atmosphere instead of an inert gas such as argon.
以上説明した様に本発明方法によれば、垂直磁化膜の垂
直異方性を太幅に増加させることができる０また作製当
初垂直異方性を示さない膜も本方法によυ垂直記録媒体
として使用できる。したがって垂直記録媒体全作製する
場合本発明方法音用いることにより記録密度の向上が計
れる、媒体作製条件が大幅に緩和される等の利点がある
。本発明方法は将来の大容蓋ファイル記憶媒体のみなら
ず、フレキシブルティスフ、磁気テープ等垂直磁気記録
方式を採用する分野において多大な貢献をなすものであ
る。As explained above, according to the method of the present invention, it is possible to greatly increase the perpendicular anisotropy of a perpendicularly magnetized film.Furthermore, a film that does not exhibit perpendicular anisotropy at the time of manufacture can also be used as a perpendicular recording medium. Can be used as Therefore, when manufacturing a complete perpendicular recording medium, the use of the method of the present invention has advantages such as improved recording density and significantly relaxed medium manufacturing conditions. The method of the present invention will make a significant contribution not only to future large-capacity file storage media, but also to fields that employ perpendicular magnetic recording methods such as flexible tapes and magnetic tapes.
第１図は垂直異方性定数ＨＫと記録密度り、。のデータ
。第２図は本発明方法の一実施例を示すもので、垂直異
方性定数ＫＪと熱処理温度との関係を示す。第３図は本
発明の他の実施例？示す。
特許出願人 日本電信電話公社
（７）
第１図
第２図
熟九も眩（°Ｃ）Figure 1 shows the perpendicular anisotropy constant HK and the recording density. Data of. FIG. 2 shows an embodiment of the method of the present invention, and shows the relationship between the perpendicular anisotropy constant KJ and the heat treatment temperature. Is Fig. 3 another embodiment of the present invention? show. Patent applicant: Nippon Telegraph and Telephone Public Corporation (7) Figure 1 Figure 2 Mature (°C)
Claims (1)
合金の融点（℃）の１／３〜１／２の温度で非酸化性雰
囲気中で熱処理することを特徴とする垂直磁気記録媒体
の製造方法。A method for producing a perpendicular magnetic recording medium, comprising heat-treating a cobalt alloy thin film having perpendicular magnetic anisotropy in a non-oxidizing atmosphere at a temperature of 1/3 to 1/2 of the melting point (°C) of the cobalt alloy. .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56156136A JPS5857623A (en) | 1981-10-02 | 1981-10-02 | Production of vertical magnetic recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56156136A JPS5857623A (en) | 1981-10-02 | 1981-10-02 | Production of vertical magnetic recording medium |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5857623A true JPS5857623A (en) | 1983-04-05 |
| JPS6356609B2 JPS6356609B2 (en) | 1988-11-08 |
Family
ID=15621106
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56156136A Granted JPS5857623A (en) | 1981-10-02 | 1981-10-02 | Production of vertical magnetic recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5857623A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6196153A (en) * | 1984-10-11 | 1986-05-14 | ローベルト・ボツシユ・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング | Method and apparatus for controlling number of rotations of internal combustion engine |
| US4765299A (en) * | 1986-05-07 | 1988-08-23 | Mitsubishi Denki Kabushiki Kaisha | Failure-time control device for a fuel injection controller of an internal combustion engine |
-
1981
- 1981-10-02 JP JP56156136A patent/JPS5857623A/en active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6196153A (en) * | 1984-10-11 | 1986-05-14 | ローベルト・ボツシユ・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング | Method and apparatus for controlling number of rotations of internal combustion engine |
| US4765299A (en) * | 1986-05-07 | 1988-08-23 | Mitsubishi Denki Kabushiki Kaisha | Failure-time control device for a fuel injection controller of an internal combustion engine |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6356609B2 (en) | 1988-11-08 |
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