JPS584900U - Residual liquid vaporization device in low temperature liquefied gas tank - Google Patents

Residual liquid vaporization device in low temperature liquefied gas tank

Info

Publication number
JPS584900U
JPS584900U JP9917881U JP9917881U JPS584900U JP S584900 U JPS584900 U JP S584900U JP 9917881 U JP9917881 U JP 9917881U JP 9917881 U JP9917881 U JP 9917881U JP S584900 U JPS584900 U JP S584900U
Authority
JP
Japan
Prior art keywords
liquefied gas
gas tank
residual liquid
vaporization device
temperature liquefied
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9917881U
Other languages
Japanese (ja)
Inventor
野口 信久
Original Assignee
石川島播磨重工業株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 石川島播磨重工業株式会社 filed Critical 石川島播磨重工業株式会社
Priority to JP9917881U priority Critical patent/JPS584900U/en
Publication of JPS584900U publication Critical patent/JPS584900U/en
Pending legal-status Critical Current

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  • Filling Or Discharging Of Gas Storage Vessels (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。
(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本考案による低温液化ガスタンクにおける残液
気化装置の一実施例を示す概略縦断面図、第2図は第1
図の■−■線に沿う断面図、第3図は本考案の第2実施
例を示す概略縦断面図、第4図は本考案の第3実施例を
示す概略縦断面図、第5図は本考案の第4実施例を示す
概略横断面図、第6図は本考案の第5実施例を示す概略
横断面図である。     ・ 1・・・・・・低温液化ガスタンク、9. 10. 2
1゜31.32・・・・・・リング状の配管、12・・
・・・・液化ガス、13,14,22.53・・・・・
・ノズル、15゜33.42・・・・・・ガス供給用配
管、16・・・・・・ガス加熱器、34.43・・・・
・・ガス回収用配管、41・・・・・・うず巻状の配管
、52・・・・・・放射状の配管。
FIG. 1 is a schematic vertical cross-sectional view showing an embodiment of the residual liquid vaporization device in a low-temperature liquefied gas tank according to the present invention, and FIG.
3 is a schematic vertical sectional view showing the second embodiment of the present invention; FIG. 4 is a schematic longitudinal sectional view showing the third embodiment of the present invention; FIG. 6 is a schematic cross-sectional view showing a fourth embodiment of the present invention, and FIG. 6 is a schematic cross-sectional view showing a fifth embodiment of the present invention.・1...Low temperature liquefied gas tank, 9. 10. 2
1゜31.32...Ring-shaped piping, 12...
...Liquified gas, 13,14,22.53...
・Nozzle, 15° 33.42...Gas supply piping, 16...Gas heater, 34.43...
... Gas recovery piping, 41 ... Spiral piping, 52 ... Radial piping.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] タンク内の底部に残留する低温液の、液面上方近傍位置
よりタンク底部側に熱媒供給用配管を設置してなること
を特徴とする低温液化ガスタンク−における残液気化装
置。
A residual liquid vaporization device in a low-temperature liquefied gas tank, characterized in that a heating medium supply piping is installed on the bottom side of the tank from a position near above the liquid surface of the low-temperature liquid remaining at the bottom of the tank.
JP9917881U 1981-07-03 1981-07-03 Residual liquid vaporization device in low temperature liquefied gas tank Pending JPS584900U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9917881U JPS584900U (en) 1981-07-03 1981-07-03 Residual liquid vaporization device in low temperature liquefied gas tank

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9917881U JPS584900U (en) 1981-07-03 1981-07-03 Residual liquid vaporization device in low temperature liquefied gas tank

Publications (1)

Publication Number Publication Date
JPS584900U true JPS584900U (en) 1983-01-12

Family

ID=29893920

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9917881U Pending JPS584900U (en) 1981-07-03 1981-07-03 Residual liquid vaporization device in low temperature liquefied gas tank

Country Status (1)

Country Link
JP (1) JPS584900U (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008007337A (en) * 2006-06-27 2008-01-17 Sumitomo Heavy Ind Ltd Ozone concentrating apparatus
JP2009280458A (en) * 2008-05-23 2009-12-03 Sumitomo Heavy Ind Ltd Ozone concentrating apparatus and method for operating the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008007337A (en) * 2006-06-27 2008-01-17 Sumitomo Heavy Ind Ltd Ozone concentrating apparatus
JP2009280458A (en) * 2008-05-23 2009-12-03 Sumitomo Heavy Ind Ltd Ozone concentrating apparatus and method for operating the same

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