JPS5845502U - 広角反射器 - Google Patents

広角反射器

Info

Publication number
JPS5845502U
JPS5845502U JP14103581U JP14103581U JPS5845502U JP S5845502 U JPS5845502 U JP S5845502U JP 14103581 U JP14103581 U JP 14103581U JP 14103581 U JP14103581 U JP 14103581U JP S5845502 U JPS5845502 U JP S5845502U
Authority
JP
Japan
Prior art keywords
angle
sub
reflecting surface
wide
main
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14103581U
Other languages
English (en)
Inventor
津山　吉正
Original Assignee
株式会社津山金属製作所
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式会社津山金属製作所 filed Critical 株式会社津山金属製作所
Priority to JP14103581U priority Critical patent/JPS5845502U/ja
Publication of JPS5845502U publication Critical patent/JPS5845502U/ja
Pending legal-status Critical Current

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  • Optical Elements Other Than Lenses (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。

Description

【図面の簡単な説明】
第１図は反射素子の再帰原理説明図、第２図は再帰反射
を示す曲線グラフ、第３図、第４図は公知例の反射器を
それぞれ水平方向に横断した断面図、第５図は公知例の
反射説明図、第６図は本考案実施例の反射説明図、第７
図は本考案実施例反射器の斜視図、第８図は第７図の水
平方向横断面図、第９図は他実施例反射器の斜面図、第
１０図は第９図の要部を二段に水平方向に断面して示し
た説明断面図である。 Ｘは主光軸、Ｙ−Ｙ’は副光軸、１１．１１′は反射器
本体、１２．１２’は主反射面、１３゜１３’、１４．
１４’は副反射面、１２ａ、１３ａ。 １４ａは反射素子。

Claims (5)

    【実用新案登録請求の範囲】
  1. （１）透明なガラス又は合成樹脂等で裏面に多数のキュ
    ービックコーナによる反射素子が集合的に配列されるよ
    うに成型された反射器において、正面主光軸をもつ主反
    射面と、主反射面に対し対向的に６０′以上の傾斜角α
    を有する二面以上の副反射面とから成り、該副反射面に
    反射素子によって形成される副光軸は副反射面に対して
    αとは逆方向のある傾斜角βを有することを特徴とする
    広角反射器。
  2. （２）　　主反射面の両側に一対の副反射面をそれぞれ
    隣接させた実用新案登録請求の範囲第（１）項記載の広
    角反射器。
  3. （３）二面の副反射面を、互に隣接させると共にその隣
    接させた交点を、主反射面の中心線の上方又は下方に位
    置させるように設けたことを特徴とする広角反射器。
  4. （４）傾斜角βを０°〈β＜６０°とした実用新案登録
    請求の範囲第（１）項〜同第（３）項記載の広角反射器
    。
  5. （５）　　主反射面と両側反射器のなす角度αは６１゜
    〜９０°であり、両側反射面のなす角度α′は５８°〜
    ０°の範囲内にして、主反射面の巾以内において広角反
    射を得る゛ことを特徴とする実用新案登録請求の範囲第
    （３）項記載の広角反射器。
JP14103581U 1981-09-21 1981-09-21 広角反射器 Pending JPS5845502U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14103581U JPS5845502U (ja) 1981-09-21 1981-09-21 広角反射器

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14103581U JPS5845502U (ja) 1981-09-21 1981-09-21 広角反射器

Publications (1)

Publication Number Publication Date
JPS5845502U true JPS5845502U (ja) 1983-03-26

Family

ID=29934168

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14103581U Pending JPS5845502U (ja) 1981-09-21 1981-09-21 広角反射器

Country Status (1)

Country Link
JP (1) JPS5845502U (ja)

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WO2007001017A1 (ja) * 2005-06-28 2007-01-04 Nikon Corporation 反射部材、光学部材、干渉計システム、ステージ装置、露光装置、及びデバイス製造方法
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US9310696B2 (en) 2005-05-12 2016-04-12 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method

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US9885959B2 (en) 2003-04-09 2018-02-06 Nikon Corporation Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9760014B2 (en) 2003-10-28 2017-09-12 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US10281632B2 (en) 2003-11-20 2019-05-07 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10241417B2 (en) 2004-02-06 2019-03-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10234770B2 (en) 2004-02-06 2019-03-19 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10007194B2 (en) 2004-02-06 2018-06-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US9429851B2 (en) 2005-05-12 2016-08-30 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9310696B2 (en) 2005-05-12 2016-04-12 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US9360763B2 (en) 2005-05-12 2016-06-07 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
JP5024043B2 (ja) * 2005-06-28 2012-09-12 株式会社ニコン 測定システム
JP2012147028A (ja) * 2005-06-28 2012-08-02 Nikon Corp 測定装置、測定方法及びステージ装置
WO2007001017A1 (ja) * 2005-06-28 2007-01-04 Nikon Corporation 反射部材、光学部材、干渉計システム、ステージ装置、露光装置、及びデバイス製造方法
US8693006B2 (en) 2005-06-28 2014-04-08 Nikon Corporation Reflector, optical element, interferometer system, stage device, exposure apparatus, and device fabricating method
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US9857599B2 (en) 2007-10-24 2018-01-02 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method

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