JPS5844838U - Wafer cleaning and drying equipment - Google Patents

Wafer cleaning and drying equipment

Info

Publication number
JPS5844838U
JPS5844838U JP14127681U JP14127681U JPS5844838U JP S5844838 U JPS5844838 U JP S5844838U JP 14127681 U JP14127681 U JP 14127681U JP 14127681 U JP14127681 U JP 14127681U JP S5844838 U JPS5844838 U JP S5844838U
Authority
JP
Japan
Prior art keywords
wafer cleaning
cleaning
center
mounting rod
drying equipment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14127681U
Other languages
Japanese (ja)
Inventor
射手　道文
Original Assignee
三菱電機株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 三菱電機株式会社 filed Critical 三菱電機株式会社
Priority to JP14127681U priority Critical patent/JPS5844838U/en
Publication of JPS5844838U publication Critical patent/JPS5844838U/en
Pending legal-status Critical Current

Links

Landscapes

  • Cleaning By Liquid Or Steam (AREA)
  • Drying Of Solid Materials (AREA)

Abstract

(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.

Description

【図面の簡単な説明】[Brief explanation of the drawing]

第１図は従来のウェーハ洗浄乾燥装置の縦断面図１、第
２図は第１図の装置の乾燥後ふたを開けた状態を示す正
面図、第３図は第１図のノズル取付棒の要部を示す縦断
面図、第４図はこの考案の一実施例によるウェーハ洗浄
乾燥装置のノズル取付棒の要部を示す縦断面図である。 １・・・・・・洗浄容器、３・・・・・・電動機、６・
・・・・・ターンテーブル、８・・・・・・回転わく、
９・・・・・・収納用具、１０・・・・・・ウェーハ、
１１・・・・・・ふた、１４・・・・・・ノズル、２１
・・・・−・ノズル取付棒、２１ａ・・・・・・連通穴
、２２ａ・・・・・・***。なお、図中同一符号は同−
又は相当部分を示す。Fig. 1 is a longitudinal cross-sectional view of a conventional wafer cleaning and drying device, Fig. 2 is a front view of the device shown in Fig. 1 with the lid open after drying, and Fig. 3 is a view of the nozzle mounting rod shown in Fig. 1. FIG. 4 is a vertical cross-sectional view showing the main parts of a nozzle mounting rod of a wafer cleaning and drying apparatus according to an embodiment of the invention. 1...Cleaning container, 3...Electric motor, 6.
...Turntable, 8...Rotating frame,
9...Storage equipment, 10...Wafer,
11... Lid, 14... Nozzle, 21
...Nozzle mounting rod, 21a...Communication hole, 22a...Small hole. In addition, the same symbols in the figures are the same.
or a corresponding portion.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] 筒状をなし開口した上部番玉ふたがかぶせられた洗浄容
器と、この洗浄容器内の下方に配設され回転されるター
ンテーブル上に固着された回転わくと、この回転わくに
円周方向に対し等間隔に保持され、それぞれ多数枚のウ
ェーハを上下のす”き間をあけて収容した複数の収納用
具と、上記ふたの下面中央に取付けられ側部に複数のノ
ズルが設けられ、上記回転わくの軸中心に位置しており
、上記各ノズルから洗浄液を噴射させ、後、乾燥ガスを
噴出させるためのノズル取付棒とを備え−たウェーハ洗
浄乾燥装置において、上記ノズル取付棒は先端を鋭角に
突出した形状にしており、中心に***を通しであること
を特徴とするウェーハ洗浄乾燥装置。A cleaning container that has a cylindrical shape and is covered with an open upper ball lid, a rotating frame that is disposed below the cleaning container and is fixed to a rotating turntable; A plurality of storage devices are held at equal intervals and each accommodates a large number of wafers with gaps between the top and bottom, and a plurality of nozzles are attached to the center of the lower surface of the lid and provided on the sides, and the In a wafer cleaning/drying apparatus, the nozzle mounting rod is located at the axial center of the frame and includes a nozzle mounting rod for jetting cleaning liquid from each nozzle and then spouting drying gas. A wafer cleaning/drying device that has a protruding shape with a small hole in the center.
JP14127681U 1981-09-21 1981-09-21 Wafer cleaning and drying equipment Pending JPS5844838U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14127681U JPS5844838U (en) 1981-09-21 1981-09-21 Wafer cleaning and drying equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14127681U JPS5844838U (en) 1981-09-21 1981-09-21 Wafer cleaning and drying equipment

Publications (1)

Publication Number Publication Date
JPS5844838U true JPS5844838U (en) 1983-03-25

Family

ID=29934386

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14127681U Pending JPS5844838U (en) 1981-09-21 1981-09-21 Wafer cleaning and drying equipment

Country Status (1)

Country Link
JP (1) JPS5844838U (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61144636U (en) * 1985-02-28 1986-09-06

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5295967A (en) * 1976-02-09 1977-08-12 Hitachi Ltd Wafer washing and drying unit
JPS548455A (en) * 1977-06-22 1979-01-22 Hitachi Ltd Cleansing/drying device for products

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5295967A (en) * 1976-02-09 1977-08-12 Hitachi Ltd Wafer washing and drying unit
JPS548455A (en) * 1977-06-22 1979-01-22 Hitachi Ltd Cleansing/drying device for products

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61144636U (en) * 1985-02-28 1986-09-06

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