JPS5830753A - Method for regerating developing solution - Google Patents
Method for regerating developing solutionInfo
- Publication number
- JPS5830753A JPS5830753A JP12780881A JP12780881A JPS5830753A JP S5830753 A JPS5830753 A JP S5830753A JP 12780881 A JP12780881 A JP 12780881A JP 12780881 A JP12780881 A JP 12780881A JP S5830753 A JPS5830753 A JP S5830753A
- Authority
- JP
- Japan
- Prior art keywords
- developing soln
- tank
- photoresist
- developing
- tower
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/3092—Recovery of material; Waste processing
Landscapes
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
Description
【発明の詳細な説明】 本発明は、IA儂液の濃度管理に関するものである。[Detailed description of the invention] The present invention relates to concentration management of IA solutions.
iI儂液0’t1MiKは、現像処理量に応じて液を更
新する方法と、経時時間に応じて更新する方法の組合せ
北方法がとられているが、溶出したホトレジス)tKよ
る液の溶出速度変化シよび経時により現像液へ吸収する
炭酸ガスでアルカリ量が中和され、ホトレジストの溶出
速度が変化するなどの欠点を持うている。iI's solution 0't1MiK uses a north method that combines a method of renewing the solution according to the development processing amount and a method of renewing it according to the elapsed time, but the elution rate of the solution due to tK The problem is that the amount of alkali is neutralized by carbon dioxide gas absorbed into the developer over time and the elution rate of the photoresist changes.
本発明の目的は、以上述べたような欠点な解消し九新規
な方法を取り入れたf!JL儂液の再生処理方法を提供
するにある。It is an object of the present invention to overcome the above-mentioned drawbacks and incorporate a novel method. An object of the present invention is to provide a method for regenerating JL liquid.
本発明の特徴は、使用中及び使用済みの現像液をSV1
〜20の速度で活性炭塔と一過塔を通過させ、溶解した
ホトレジストを活性炭へ吸着して液中の固形物を7過除
去した後、ホトレジスト反応消費された現像液成分と空
気中の炭酸ガス吸収により中和消費された現像液成分を
補うため、PK針でアルカリ濃度を管理し、fA儂原液
を補充して再度現像液として用いるものである。The feature of the present invention is that the used and used developer solution is
The dissolved photoresist is passed through an activated carbon tower and a passing tower at a speed of ~20°C, and the dissolved photoresist is adsorbed onto the activated carbon to remove solids in the solution. In order to compensate for the developer components that have been neutralized and consumed by absorption, the alkali concentration is controlled with a PK needle, and the fA stock solution is replenished and used again as a developer.
本発明の再生処理方法が対象となる現像液とは、アルカ
リ性を示す水溶液である。The developer to which the regeneration treatment method of the present invention is applied is an alkaline aqueous solution.
以下、本発明を実施例により!!に説明する。Hereinafter, the present invention will be explained with reference to examples! ! Explain.
図に示したように、2の現像液槽にある現像液を、5の
ポンプを用いて、10の流量針でSF3 K調整して、
4の活性炭塔5の濾過塔を通過させ。As shown in the figure, the developer in the developer tank 2 is adjusted to SF3K using the pump 5 and the flow rate needle 10.
4 activated carbon tower 5 filtration tower.
9の関整檜の11のチッ素ガスによる攪拌状態の中へ入
れ% 8のpH針を用いてPH115になるまで7の電
磁弁を開いて6の現像液原液を滴下して調整し、12の
ポンプを用いて元のiA儂液槽へもどし再度使用した。Put Seki Seihinoki in No. 9 into a state of stirring with nitrogen gas in No. 11. Using a pH needle of No. 8, open the electromagnetic valve No. 7 until the pH reaches 115 and adjust by dropping the developer stock solution No. 6. Using the same pump, I returned it to the original iA liquid tank and used it again.
零発#IKより、@*液の適正な濃度管MIKよるli
e精度の向上及びfA儂液液成分有効活用が行なえる。From the zero-start #IK, @* Li from the proper concentration tube MIK of the liquid
e Accuracy can be improved and fA's liquid components can be effectively utilized.
図は、本発明によりfAfI液の再生処理するための装
置である。
1・−恒温II 2・・現像液槽3・・・ポン
プ 4・・・活性炭塔5−濾過塔 6
・−濃厚現像液種7・−電磁弁 8−P K計The figure shows an apparatus for regenerating fAfl liquid according to the present invention. 1.-Constant temperature II 2..Developer tank 3..Pump 4..Activated carbon tower 5-Filtration tower 6
・-Concentrated developer type 7・-Solenoid valve 8-P K meter
Claims (1)
速度aimで追加させ液中Kll屏したホトレジストを
成層除去するM1工程と、現gIdIk件に応じえ濃度
のPHfCPH針を用いて現gR原液を追加し間型する
M2工程とからなる一連の現像液の再生処暑方法。In use! In the M1 step, a liquid activated carbon tower and a filtration tower are added at a speed of SVt-20, and the photoresist that has been filtered in the liquid is stratifiedly removed. A method for regenerating and heat-processing a series of developer solutions, which includes an M2 step of adding and inter-molding.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12780881A JPS5830753A (en) | 1981-08-17 | 1981-08-17 | Method for regerating developing solution |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12780881A JPS5830753A (en) | 1981-08-17 | 1981-08-17 | Method for regerating developing solution |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5830753A true JPS5830753A (en) | 1983-02-23 |
Family
ID=14969179
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12780881A Pending JPS5830753A (en) | 1981-08-17 | 1981-08-17 | Method for regerating developing solution |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5830753A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61183528U (en) * | 1985-05-09 | 1986-11-15 | ||
US5545309A (en) * | 1992-11-10 | 1996-08-13 | Tama Chemicals Co., Ltd. | Method of processing organic quaternary ammonium hydroxide-containing waste liquid |
US6187519B1 (en) * | 1998-10-30 | 2001-02-13 | Organo Corporation | Process and equipment for recovering developer from photoresist development waste and reusing it |
WO2014196358A1 (en) * | 2013-06-03 | 2014-12-11 | 住友理工株式会社 | Method for treating printing plate developer liquid and treatment system for printing plate developer liquid |
-
1981
- 1981-08-17 JP JP12780881A patent/JPS5830753A/en active Pending
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61183528U (en) * | 1985-05-09 | 1986-11-15 | ||
JPH0238439Y2 (en) * | 1985-05-09 | 1990-10-17 | ||
US5545309A (en) * | 1992-11-10 | 1996-08-13 | Tama Chemicals Co., Ltd. | Method of processing organic quaternary ammonium hydroxide-containing waste liquid |
US6187519B1 (en) * | 1998-10-30 | 2001-02-13 | Organo Corporation | Process and equipment for recovering developer from photoresist development waste and reusing it |
US6488847B2 (en) | 1998-10-30 | 2002-12-03 | Organo Corporation | Process and equipment for recovering developer from photoresist development waste and reusing it |
WO2014196358A1 (en) * | 2013-06-03 | 2014-12-11 | 住友理工株式会社 | Method for treating printing plate developer liquid and treatment system for printing plate developer liquid |
JP2014235325A (en) * | 2013-06-03 | 2014-12-15 | 住友理工株式会社 | Treatment method for printing plate developer and treatment system for printing plate developer |
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