JPS5830753A - Method for regerating developing solution - Google Patents

Method for regerating developing solution

Info

Publication number
JPS5830753A
JPS5830753A JP12780881A JP12780881A JPS5830753A JP S5830753 A JPS5830753 A JP S5830753A JP 12780881 A JP12780881 A JP 12780881A JP 12780881 A JP12780881 A JP 12780881A JP S5830753 A JPS5830753 A JP S5830753A
Authority
JP
Japan
Prior art keywords
developing soln
tank
photoresist
developing
tower
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12780881A
Other languages
Japanese (ja)
Inventor
Tateo Ite
射手　建雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP12780881A priority Critical patent/JPS5830753A/en
Publication of JPS5830753A publication Critical patent/JPS5830753A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3092—Recovery of material; Waste processing

Landscapes

  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To enable repeated uses, by passing a developing soln. being used during present development of a photoresist, and used for the past development through an activated carbon tower and a filtration tower, adjusting pH, and adding a fresh developing soln. CONSTITUTION:A photoresist developing soln. now being used or before used stored in a developing solution tank 2 in a thermostatic vessel 1 is drawn with a pump 3, adjusted in an amount of flow with a flowmeter in the range of 1-20 SV, passed through an activated carbon tower 4 and a filtration tower 5 to attract and remove the photoresist. Then, gaseous nitrogen 11 is sent to agitate a pH adjusting tank 9, and pH is controlled to 11.5 value with a pH meter 8 by adding a fresh concd. developing soln. from a tank 6 through an electromagnetic valve 7. The adjusted developing soln. is returned to the tank 2 and reutilized again, thus permitting the component of the developing soln. 2 to be effectively used.

Description

【発明の詳細な説明】 本発明は、ＩＡ儂液の濃度管理に関するものである。[Detailed description of the invention] The present invention relates to concentration management of IA solutions.

ｉＩ儂液０’ｔ１ＭｉＫは、現像処理量に応じて液を更
新する方法と、経時時間に応じて更新する方法の組合せ
北方法がとられているが、溶出したホトレジス）ｔＫよ
る液の溶出速度変化シよび経時により現像液へ吸収する
炭酸ガスでアルカリ量が中和され、ホトレジストの溶出
速度が変化するなどの欠点を持うている。iI's solution 0't1MiK uses a north method that combines a method of renewing the solution according to the development processing amount and a method of renewing it according to the elapsed time, but the elution rate of the solution due to tK The problem is that the amount of alkali is neutralized by carbon dioxide gas absorbed into the developer over time and the elution rate of the photoresist changes.

本発明の目的は、以上述べたような欠点な解消し九新規
な方法を取り入れたｆ！ＪＬ儂液の再生処理方法を提供
するにある。It is an object of the present invention to overcome the above-mentioned drawbacks and incorporate a novel method. An object of the present invention is to provide a method for regenerating JL liquid.

本発明の特徴は、使用中及び使用済みの現像液をＳＶ１
〜２０の速度で活性炭塔と一過塔を通過させ、溶解した
ホトレジストを活性炭へ吸着して液中の固形物を７過除
去した後、ホトレジスト反応消費された現像液成分と空
気中の炭酸ガス吸収により中和消費された現像液成分を
補うため、ＰＫ針でアルカリ濃度を管理し、ｆＡ儂原液
を補充して再度現像液として用いるものである。The feature of the present invention is that the used and used developer solution is
The dissolved photoresist is passed through an activated carbon tower and a passing tower at a speed of ~20°C, and the dissolved photoresist is adsorbed onto the activated carbon to remove solids in the solution. In order to compensate for the developer components that have been neutralized and consumed by absorption, the alkali concentration is controlled with a PK needle, and the fA stock solution is replenished and used again as a developer.

本発明の再生処理方法が対象となる現像液とは、アルカ
リ性を示す水溶液である。The developer to which the regeneration treatment method of the present invention is applied is an alkaline aqueous solution.

以下、本発明を実施例により！！に説明する。Hereinafter, the present invention will be explained with reference to examples! ! Explain.

図に示したように、２の現像液槽にある現像液を、５の
ポンプを用いて、１０の流量針でＳＦ３　Ｋ調整して、
４の活性炭塔５の濾過塔を通過させ。As shown in the figure, the developer in the developer tank 2 is adjusted to SF3K using the pump 5 and the flow rate needle 10.
4 activated carbon tower 5 filtration tower.

９の関整檜の１１のチッ素ガスによる攪拌状態の中へ入
れ％　８のｐＨ針を用いてＰＨ１１５になるまで７の電
磁弁を開いて６の現像液原液を滴下して調整し、１２の
ポンプを用いて元のｉＡ儂液槽へもどし再度使用した。Put Seki Seihinoki in No. 9 into a state of stirring with nitrogen gas in No. 11. Using a pH needle of No. 8, open the electromagnetic valve No. 7 until the pH reaches 115 and adjust by dropping the developer stock solution No. 6. Using the same pump, I returned it to the original iA liquid tank and used it again.

零発＃ＩＫより、＠＊液の適正な濃度管ＭＩＫよるｌｉ
ｅ精度の向上及びｆＡ儂液液成分有効活用が行なえる。From the zero-start #IK, @* Li from the proper concentration tube MIK of the liquid
e Accuracy can be improved and fA's liquid components can be effectively utilized.

【図面の簡単な説明】[Brief explanation of drawings]

図は、本発明によりｆＡｆＩ液の再生処理するための装
置である。 １・−恒温ＩＩ　　　　　２・・現像液槽３・・・ポン
プ　　　　　４・・・活性炭塔５−濾過塔　　　　　６
・−濃厚現像液種７・−電磁弁　　　　　８−Ｐ　Ｋ計The figure shows an apparatus for regenerating fAfl liquid according to the present invention. 1.-Constant temperature II 2..Developer tank 3..Pump 4..Activated carbon tower 5-Filtration tower 6
・-Concentrated developer type 7・-Solenoid valve 8-P K meter

Claims (1)

【特許請求の範囲】[Claims] 使用中の！Ｉ儂液な活性炭塔と濾過塔をＳＶｔ−２０の
速度ａｉｍで追加させ液中Ｋｌｌ屏したホトレジストを
成層除去するＭ１工程と、現ｇＩｄＩｋ件に応じえ濃度
のＰＨｆＣＰＨ針を用いて現ｇＲ原液を追加し間型する
Ｍ２工程とからなる一連の現像液の再生処暑方法。In use! In the M1 step, a liquid activated carbon tower and a filtration tower are added at a speed of SVt-20, and the photoresist that has been filtered in the liquid is stratifiedly removed. A method for regenerating and heat-processing a series of developer solutions, which includes an M2 step of adding and inter-molding.
JP12780881A 1981-08-17 1981-08-17 Method for regerating developing solution Pending JPS5830753A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12780881A JPS5830753A (en) 1981-08-17 1981-08-17 Method for regerating developing solution

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12780881A JPS5830753A (en) 1981-08-17 1981-08-17 Method for regerating developing solution

Publications (1)

Publication Number Publication Date
JPS5830753A true JPS5830753A (en) 1983-02-23

Family

ID=14969179

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12780881A Pending JPS5830753A (en) 1981-08-17 1981-08-17 Method for regerating developing solution

Country Status (1)

Country Link
JP (1) JPS5830753A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61183528U (en) * 1985-05-09 1986-11-15
US5545309A (en) * 1992-11-10 1996-08-13 Tama Chemicals Co., Ltd. Method of processing organic quaternary ammonium hydroxide-containing waste liquid
US6187519B1 (en) * 1998-10-30 2001-02-13 Organo Corporation Process and equipment for recovering developer from photoresist development waste and reusing it
WO2014196358A1 (en) * 2013-06-03 2014-12-11 住友理工株式会社 Method for treating printing plate developer liquid and treatment system for printing plate developer liquid

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61183528U (en) * 1985-05-09 1986-11-15
JPH0238439Y2 (en) * 1985-05-09 1990-10-17
US5545309A (en) * 1992-11-10 1996-08-13 Tama Chemicals Co., Ltd. Method of processing organic quaternary ammonium hydroxide-containing waste liquid
US6187519B1 (en) * 1998-10-30 2001-02-13 Organo Corporation Process and equipment for recovering developer from photoresist development waste and reusing it
US6488847B2 (en) 1998-10-30 2002-12-03 Organo Corporation Process and equipment for recovering developer from photoresist development waste and reusing it
WO2014196358A1 (en) * 2013-06-03 2014-12-11 住友理工株式会社 Method for treating printing plate developer liquid and treatment system for printing plate developer liquid
JP2014235325A (en) * 2013-06-03 2014-12-15 住友理工株式会社 Treatment method for printing plate developer and treatment system for printing plate developer

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