JPS58179943A - Production of magnetic recording medium - Google Patents
Production of magnetic recording mediumInfo
- Publication number
- JPS58179943A JPS58179943A JP6275882A JP6275882A JPS58179943A JP S58179943 A JPS58179943 A JP S58179943A JP 6275882 A JP6275882 A JP 6275882A JP 6275882 A JP6275882 A JP 6275882A JP S58179943 A JPS58179943 A JP S58179943A
- Authority
- JP
- Japan
- Prior art keywords
- film
- magnetic
- controlled
- vapor deposition
- magnetic recording
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/545—Controlling the film thickness or evaporation rate using measurement on deposited material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/542—Controlling the film thickness or evaporation rate
- C23C14/544—Controlling the film thickness or evaporation rate using measurement in the gas phase
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/85—Coating a support with a magnetic layer by vapour deposition
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Thin Magnetic Films (AREA)
Abstract
Description
【発明の詳細な説明】
本発明は磁気記録媒体の特に磁性薄膜の製造方法に係る
ものである。DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method of manufacturing a magnetic recording medium, particularly a magnetic thin film.
近年、磁気記録媒体を用いた機器は、磁気テープを１吏
用する録音機やビデオテープレコーダー、まだ磁気ディ
スクを用いるコンピュータやフロッピーディスクなど、
さらにカード状にして使用する各種磁気カード装置等、
多方面で実用されている。これらに用いられる磁気記録
媒体としては一般的に塗布型と金属薄膜型（磁性薄膜）
が提案されている。塗布型の磁気記録媒体は多くのもの
がフィルム（高分子基板）の上に酸化鉄（γ−Ｆｅ２Ｏ
３）や、二酸化クロム（ＣｒＯ２）、鉄、コバルト、ニ
ッケル系合金磁性粉などを接着剤（樹脂）、滑剤。In recent years, devices using magnetic recording media have been developed, such as recorders and video tape recorders that use magnetic tape, computers and floppy disks that still use magnetic disks, etc.
Furthermore, various magnetic card devices that can be used in the form of cards, etc.
It is used in many fields. The magnetic recording media used for these are generally coated type and metal thin film type (magnetic thin film).
is proposed. Many coating-type magnetic recording media are coated with iron oxide (γ-Fe2O) on a film (polymer substrate).
3), chromium dioxide (CrO2), iron, cobalt, nickel alloy magnetic powder, etc. as adhesives (resins) and lubricants.
帯電防止剤などと混ぜ合せて塗布した後、配向。After mixing with antistatic agent and applying it, it is oriented.
カンノダー９表面処理などを経て磁性層を形成するもの
である。従って磁性層内に含まれる磁性粉は６０〜７０
チであり、磁性層の厚さも概ね２〜３μｍとなってしま
う。このだめ反磁界等により短波長記録が制限されてし
まう。これに対して、本発明が提案する金属薄膜による
磁性層においては、磁性材料を原子状にして蒸発させ、
フィルム上に薄膜を形成するものであり、磁性層は１０
０チ磁性材料で構成されるものである。また磁性層の厚
さも数汀オングストロームへの単位で均一に形成するこ
とが可能であり、磁性層の磁束密度は塗布型のものに比
べて１０倍程度までに高められる特徴を有すると共に、
磁性層を薄く出来る特徴と合せて短波長記録媒体向きで
あり、高密度磁気記録媒体となり得るものである。この
ような金属薄膜の磁性層の形成方法としては、メッキ法
、スパッタ法、蒸着法など多くの方法が提案されている
が、本発明においては比較的簡単であり、工業的に量産
性に富む真空蒸着法において、磁気記録媒体として鑞気
的特性、磁気特性、物理特性、量産性、コスト等につい
て十分満足し得る製造方法を提供するものである。A magnetic layer is formed through surface treatment such as Kannodar 9. Therefore, the magnetic powder contained in the magnetic layer is 60 to 70
Therefore, the thickness of the magnetic layer is approximately 2 to 3 μm. Short wavelength recording is limited by this demagnetizing field and the like. In contrast, in the magnetic layer made of a metal thin film proposed by the present invention, the magnetic material is evaporated into atoms,
A thin film is formed on the film, and the magnetic layer has a thickness of 10
It is made of 0% magnetic material. In addition, the thickness of the magnetic layer can be uniformly formed in units of several angstroms, and the magnetic flux density of the magnetic layer can be increased to about 10 times that of the coating type.
Combined with the feature that the magnetic layer can be made thin, it is suitable for short wavelength recording media and can be used as high-density magnetic recording media. Many methods have been proposed for forming the magnetic layer of such a thin metal film, such as plating, sputtering, and vapor deposition, but the present invention is relatively simple and has high industrial mass productivity. In the vacuum evaporation method, it is an object of the present invention to provide a manufacturing method that satisfies the mechanical properties, magnetic properties, physical properties, mass productivity, cost, etc. of a magnetic recording medium.
以下実施例を掲げて本発明の詳細な説明する。The present invention will be described in detail below with reference to Examples.
第１図に製造装置の一例を示す。真空槽１は排気＃１２
で接続された真空排気装置１３により約１０−４〜１０
−６Ｔｏ ｒ ｒに排気される。真空槽１内にはフィル
ム（高分子基板）４の巻出部２と巻取部３に走行される
。なお、フィルム４の巻出９巻取はクーリングキャン６
が矢印入方向に回転されるときは２が巻出部、３が巻取
部であり、クーリングキャン６が矢印Ｂ方向に回転され
るときは巻出部と巻取部が逆になる。また真空槽１は防
着板７により上室と王室に分離しである。FIG. 1 shows an example of a manufacturing apparatus. Vacuum chamber 1 is exhaust #12
Approximately 10-4 to 10
Exhausted to -6 Torr. In the vacuum chamber 1, a film (polymer substrate) 4 is transported to an unwinding section 2 and a winding section 3. Note that the unwinding and winding of film 4 is performed using cooling can 6.
When the cooling can 6 is rotated in the direction of the arrow B, 2 is an unwinding part and 3 is a winding part, and when the cooling can 6 is rotated in the direction of the arrow B, the unwinding part and the winding part are reversed. Further, the vacuum chamber 1 is separated into an upper chamber and a royal chamber by an anti-adhesion plate 7.
クーリングキャン６の下部には金属原子のフィルム４へ
の蒸着を制御するだめのシャッター８が・設けられてい
る。このシャッター８が閉のときはフィルム４への蒸着
はなされず、開のときに蒸着が行なわれる。さらにシャ
ッター８の下部には金属原子のフーイルム４への入射角
を制限するだめのマスク９．防着板１０．ルツボを置く
だめのコモンベース１１が設けられている。蒸発源１５
はコモンベース１１の上に置かれたルツボ１４に入れた
金属であり、本発明ではコバルト、ニッケル。A shutter 8 is provided at the bottom of the cooling can 6 to control the deposition of metal atoms onto the film 4. When this shutter 8 is closed, no vapor deposition is performed on the film 4, and when it is open, vapor deposition is performed. Furthermore, a mask 9 is provided below the shutter 8 to limit the angle of incidence of metal atoms onto the film 4. Anti-adhesion plate 10. A common base 11 is provided on which to place the crucible. Evaporation source 15
are the metals placed in the crucible 14 placed on the common base 11, and in the present invention they are cobalt and nickel.
クロム、鉄から選んだ磁性材料を単一や合金としく
て加熱源１８により加熱蒸発する。蒸発原子のレートを
監視する測定器として原子吸光式のモニター６が設けら
れ、そして必要とされる磁気特性を得るために蒸着条件
を制御するだめのガス供給口１７が設けられている。さ
らに蒸着後にフィルム４に蒸着された膜厚を監視するた
めに透過率計２６が備えられている。A single magnetic material or an alloy of magnetic materials selected from chromium and iron is heated and evaporated by a heating source 18. An atomic absorption type monitor 6 is provided as a measuring device for monitoring the rate of evaporated atoms, and a gas supply port 17 is provided for controlling the deposition conditions to obtain the required magnetic properties. Further, a transmittance meter 26 is provided to monitor the thickness of the film 4 after vapor deposition.
Ｅ述の叩く磁気記録媒体を真空蒸着法で得るだめには、
複数の条件設定や監視が必要であり、第２図〜第４図に
示す複数の条件を変化させるだめの要因の制御が必要で
ある。従って本発明による製造方法は、透過率計２５は
ライン２ｏにより測定器Ａ１ を経て、中央制御ボック
スＣに接続され、壕だレートモニタ１６はライン２１に
より測定器Ａ２を経て中央制御ボックスＣへ接続され、
さらにガス供給口１７のガス供給量はガスノくイブ２２
の途中に設けられた流量調整弁Ｂ、を中央制御ボックス
Ｃにより制御する。また蒸発源からのレートは加熱源の
電源を中央制御ボックスＣとライン２４で結ばれた制御
ボックスＣ１により制御することにより調整するように
している。従って本発明の製造方法は、あらかじめ設定
された磁気記録媒体としての特性を得るため、膜厚、蒸
発レート。In order to obtain the magnetic recording medium described in E using the vacuum evaporation method,
It is necessary to set and monitor a plurality of conditions, and it is necessary to control the factors that cause the plurality of conditions shown in FIGS. 2 to 4 to change. Therefore, in the manufacturing method according to the present invention, the transmittance meter 25 is connected to the central control box C via the measuring device A1 by the line 2o, and the rate monitor 16 is connected to the central control box C via the measuring device A2 by the line 21. is,
Furthermore, the gas supply amount of the gas supply port 17 is
A central control box C controls a flow rate adjustment valve B provided in the middle of the flow rate adjustment valve B. Further, the rate from the evaporation source is adjusted by controlling the power source of the heating source by a control box C1 connected to the central control box C by a line 24. Therefore, in the manufacturing method of the present invention, in order to obtain predetermined characteristics as a magnetic recording medium, the film thickness and evaporation rate are adjusted.
ガス供給量を中央制御ボックスＣにデータを集め、条件
設定要因を制御して必要な特性を均一に得るようにした
ものである。Data on the amount of gas supplied is collected in a central control box C, and condition setting factors are controlled to uniformly obtain the required characteristics.
つぎに、本製造方法を開発するに当って得だ条件を提示
し、本製造方法の優秀さを説明する。第２図にいわゆる
斜方蒸着における最少入射角（最大入射角は９ｏ０）と
抗磁力の関係を示す。最少入射角が５０’以上になると
抗磁力の増加が大となるのが分かる。しかし第２図の特
性はガス（本発明では酸素０２）の供給がない場合であ
り、この条件では量産性、コストに少々問題がある。従
って一般的には雰囲気ガスとして酸素を供給することに
より低入射角で大きな抗磁力を得ている。第３図に酸素
供給量と抗磁力の関係を示す。横軸に酸素供給量を、縦
軸に抗磁力をとっている。酸素供給量が０ ／ｍｉｎ
から０．８β／ｍ ｉ ｎまではほぼ酸怠
素置に対して抗磁力は比例して増減する。０．８″’／
ｒｎ ｉ ｎ以上はやや酸素供給量の増加に対する抗磁
力の増加は低減するが、依然として抗磁力は増加する。Next, we will present the advantageous conditions for developing this manufacturing method and explain the excellence of this manufacturing method. FIG. 2 shows the relationship between the minimum incident angle (maximum incident angle is 9o0) and coercive force in so-called oblique evaporation. It can be seen that when the minimum incident angle is 50' or more, the coercive force increases greatly. However, the characteristics shown in FIG. 2 are for the case where no gas (oxygen 02 in the present invention) is supplied, and under this condition there are some problems in mass productivity and cost. Therefore, generally a large coercive force is obtained at a low incident angle by supplying oxygen as an atmospheric gas. Figure 3 shows the relationship between oxygen supply amount and coercive force. The horizontal axis shows the amount of oxygen supplied, and the vertical axis shows the coercive force. Oxygen supply rate is 0/min
From 0.8β/min to 0.8β/min, the coercive force increases or decreases in proportion to the oxygen-depleted condition. 0.8″'/
Above rn i n , the increase in coercive force with respect to the increase in oxygen supply is somewhat reduced, but the coercive force still increases.
しかし２．０”／ｍｉｎ以上では抗磁力はほぼ飽和する
。第４図に蒸着膜厚と抗磁力の関係を示す。蒸着膜厚が
厚くなれば抗磁力が低下することが示されている。上記
真空蒸着装置においては蒸発レートを１０００人／ｓｅ
ｃ程度が確保できるので、フィルム４の走行速度を一定
にすれば加熱源の制御により蒸着膜厚を制御することは
容易である。However, at 2.0"/min or more, the coercive force is almost saturated. FIG. 4 shows the relationship between the deposited film thickness and the coercive force. It is shown that as the deposited film thickness increases, the coercive force decreases. In the above vacuum evaporation equipment, the evaporation rate is 1000 people/se.
Since approximately c can be secured, it is easy to control the deposited film thickness by controlling the heating source if the traveling speed of the film 4 is kept constant.
以上のような製造方法によれば磁気記録媒体に必要とさ
れる特性の一部、蒸着膜厚（磁束密度）、抗磁力は酸素
供給量、蒸発レートを制御することにより、長尺フィル
ムでも均一な製品ができるものである。従って本発明で
は第１図に示すように蒸着膜厚、蒸発レートを監視し、
各データを中央制御ボックスに入力して集中管理し、前
もって設定された蒸着条件を維持するように、中央制御
ボックスから出力として加熱源、酸素供給用流量調節弁
に制御信号を送り、予め設定された蒸着膜厚と抗磁力を
得るようにしたものである。According to the above manufacturing method, some of the characteristics required for magnetic recording media, such as the deposited film thickness (magnetic flux density) and coercive force, can be made uniform even in long films by controlling the oxygen supply amount and evaporation rate. It is possible to create a product that is unique. Therefore, in the present invention, the deposited film thickness and evaporation rate are monitored as shown in FIG.
Each data is input into the central control box for central management, and the central control box sends control signals as output to the heating source and oxygen supply flow control valve to maintain the preset deposition conditions. It is designed to obtain a deposited film thickness and coercive force.
このように本発明方法は、複数のデータを中央管理して
複数の制御系を同時制御することにより、（１）フィル
ム基板が２０００ｍ以上の長尺ものでも安定した蒸着膜
厚と抗磁力が得られる。In this way, the method of the present invention centrally manages multiple pieces of data and simultaneously controls multiple control systems, thereby achieving (1) stable deposited film thickness and coercive force even when the film substrate is long, 2,000 m or more; It will be done.
（２）蒸着による磁気記録媒体の製造が容易になり、量
産性が向上する。(2) Manufacture of magnetic recording media by vapor deposition is facilitated, and mass productivity is improved.
（３）品質の安定化により、コストダウンが可能である
。(3) Cost reduction is possible by stabilizing quality.
（４）蒸着作業が簡単となる。(4) Vapor deposition work becomes easier.
等の効果があり、蒸着による磁気記録媒体の供給に安定
性を持たせることができる。したがって磁性薄膜が持つ
短波長記録による高記録密度化が容易に達成できるもの
である。As a result, it is possible to stabilize the supply of magnetic recording media by vapor deposition. Therefore, high recording density can be easily achieved by the short wavelength recording of the magnetic thin film.
第１図は本発明方法を実施するだめの蒸着装置の一例を
示す概略構成図、第２図、第３図、第４図はそれぞれ蒸
着特性を示す図である。
１ ・・・真空槽、４−・フィルム、６・・・・・クー
リンクキャン、８−・・シャッター、９・・・・・・マ
スク、１５−・蒸発源、１６・ モニタ、１７・−ガス
供給口、１８− 加熱源、２６−・・−透過率計、Ａ、
。
Ａ２ ・・測定器、Ｂ、・・・・流量調整弁、Ｃ−中央
制御ボックス、Ｃ４・・・・・・制御ボックス。
５８１図
第２図
最ン入ｌ）！を角（事）
１１ｇ３ 図FIG. 1 is a schematic diagram showing an example of a vapor deposition apparatus for carrying out the method of the present invention, and FIGS. 2, 3, and 4 are diagrams showing vapor deposition characteristics, respectively. 1...Vacuum chamber, 4--Film, 6--Cooling scan, 8--Shutter, 9--Mask, 15--Evaporation source, 16--Monitor, 17-- Gas supply port, 18- heating source, 26-...- transmittance meter, A,
. A2...Measuring instrument, B...Flow rate adjustment valve, C-Central control box, C4...Control box. 581 Figure 2 Last entry l)! Angle (thing) 11g3 Figure
Claims (1)
の製造方法であって、加熱源、蒸発源、フィルム走行系
、雰囲気ガスのうちいずれかの２種類以上を同時に制御
し得る制御装置を有し、磁性薄膜の膜厚もしくは抗磁力
の少なくとも１つを一定範囲内の値に制御しながら磁性
薄膜を形成することを特徴とする磁気記録媒体の製造方
法。 費）蒸発源にコバルト、ニッケル、クロム、鉄の単一も
しくは混合物を用いることを特徴とする特許請求の範囲
第１項記載の磁気記録媒体の製造方法。 （３）雰囲気ガスが酸素であることを特徴とする特許請
求の範囲第１項または第２項記載の磁気記録媒体の製造
方法。[Scope of Claims] (1) A method for manufacturing a magnetic recording medium in which a magnetic thin film is formed by vacuum deposition, wherein two or more of a heating source, an evaporation source, a film running system, and an atmospheric gas are controlled simultaneously. 1. A method of manufacturing a magnetic recording medium, the method comprising: forming a magnetic thin film while controlling at least one of the thickness or coercive force of the magnetic thin film to a value within a certain range. 2. The method of manufacturing a magnetic recording medium according to claim 1, wherein cobalt, nickel, chromium, and iron are used alone or as a mixture as the evaporation source. (3) The method for manufacturing a magnetic recording medium according to claim 1 or 2, wherein the atmospheric gas is oxygen.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6275882A JPS58179943A (en) | 1982-04-14 | 1982-04-14 | Production of magnetic recording medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP6275882A JPS58179943A (en) | 1982-04-14 | 1982-04-14 | Production of magnetic recording medium |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS58179943A true JPS58179943A (en) | 1983-10-21 |
Family
ID=13209613
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP6275882A Pending JPS58179943A (en) | 1982-04-14 | 1982-04-14 | Production of magnetic recording medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58179943A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6069834A (en) * | 1983-09-24 | 1985-04-20 | Konishiroku Photo Ind Co Ltd | Method and device for production of magnetic recording medium |
| EP0236310A1 (en) * | 1985-09-12 | 1987-09-16 | Dennison Manufacturing Company | Metallization of substrates |
-
1982
- 1982-04-14 JP JP6275882A patent/JPS58179943A/en active Pending
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6069834A (en) * | 1983-09-24 | 1985-04-20 | Konishiroku Photo Ind Co Ltd | Method and device for production of magnetic recording medium |
| EP0236310A1 (en) * | 1985-09-12 | 1987-09-16 | Dennison Manufacturing Company | Metallization of substrates |
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