JPS58175629U - semiconductor manufacturing equipment - Google Patents
semiconductor manufacturing equipmentInfo
- Publication number
- JPS58175629U JPS58175629U JP7201682U JP7201682U JPS58175629U JP S58175629 U JPS58175629 U JP S58175629U JP 7201682 U JP7201682 U JP 7201682U JP 7201682 U JP7201682 U JP 7201682U JP S58175629 U JPS58175629 U JP S58175629U
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor manufacturing
- manufacturing equipment
- jig
- exhaust
- heat treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第１図は従来の装置の断面図、第２図および第３図はそ
れぞれ本考案の装置の実施例の構成図である。
１・・・・・・炉芯管、２・・・・・・サセプタ（従来
）、３・・・・・・ｓｉウェハー、４・・・・・・真空
ガイド（本発明）、５・・・・・・異物吸引用穴、６・
・・・・・サセプタ（本発明）、７・・・・・・ウェハ
立て用溝兼異物吸収用穴。FIG. 1 is a sectional view of a conventional device, and FIGS. 2 and 3 are configuration diagrams of embodiments of the device of the present invention. 1... Furnace core tube, 2... Susceptor (conventional), 3... Si wafer, 4... Vacuum guide (present invention), 5... ...Foreign matter suction hole, 6.
... Susceptor (present invention), 7... Groove for wafer stand and hole for foreign matter absorption.
Claims (1)
において、ウェハを炉内部で移動する目的に使用する治
具であって、熱処理炉内の異物を吸引除去できるよう内
部を中空とし、排気機能を有するウェハ治具又は排気用
レールを備えた半導体製造装置。 ２ 上記治具又は排気用レー／Ｌ／を石英あるいは多結
晶シリコンで作製した実用新案登録請求の範囲第１項の
半導体製造装置。[Scope of Claim for Utility Model Registration] 1. A jig used for the purpose of moving wafers within a horizontal heat treatment furnace in semiconductor manufacturing equipment that processes wafers within the furnace, which is capable of suctioning and removing foreign matter within the heat treatment furnace. Semiconductor manufacturing equipment that is hollow inside and equipped with a wafer jig or exhaust rail that has an exhaust function. 2. The semiconductor manufacturing apparatus according to claim 1, wherein the jig or the exhaust tray /L/ is made of quartz or polycrystalline silicon.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7201682U JPS58175629U (en) | 1982-05-19 | 1982-05-19 | semiconductor manufacturing equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7201682U JPS58175629U (en) | 1982-05-19 | 1982-05-19 | semiconductor manufacturing equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS58175629U true JPS58175629U (en) | 1983-11-24 |
Family
ID=30081601
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7201682U Pending JPS58175629U (en) | 1982-05-19 | 1982-05-19 | semiconductor manufacturing equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58175629U (en) |
-
1982
- 1982-05-19 JP JP7201682U patent/JPS58175629U/en active Pending
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