JPS5815346U - wafer rotation device - Google Patents
wafer rotation deviceInfo
- Publication number
- JPS5815346U JPS5815346U JP10858781U JP10858781U JPS5815346U JP S5815346 U JPS5815346 U JP S5815346U JP 10858781 U JP10858781 U JP 10858781U JP 10858781 U JP10858781 U JP 10858781U JP S5815346 U JPS5815346 U JP S5815346U
- Authority
- JP
- Japan
- Prior art keywords
- rotating shaft
- wafer
- holder
- rotation device
- suction surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Coating Apparatus (AREA)
Abstract
(57)【要約】本公報は電子出願前の出願データであるた
め要約のデータは記録されません。(57) [Summary] This bulletin contains application data before electronic filing, so abstract data is not recorded.
Description
第1図は従来のウェハ回転装置の要部断面図、第2図は
本考案のウェハ回転装置の要部断面図である。
3:保持体、7:回転軸、9:吸着面、10:排気孔、
12,12:加振機構。FIG. 1 is a sectional view of a main part of a conventional wafer rotation device, and FIG. 2 is a sectional view of a main part of a wafer rotation device of the present invention. 3: Holder, 7: Rotating shaft, 9: Adsorption surface, 10: Exhaust hole,
12, 12: Vibration mechanism.
Claims (1)
着面に形成されかつ上記吸着面にて開口する排気孔が穿
設された回転軸。 (ロ)上記回転軸を軸支する保持体。 (ハ)上記回転軸の他端部に連結され上記回転軸を回転
させる回転駆動機構。 に)上記保持体に付設され上記保持体を介して上記吸着
面に吸着保持されたウェハに振動を付加する加振機構。[Claims for Utility Model Registration] A wafer rotation device characterized by having the following configuration. (a) A rotating shaft whose end face at one end is formed as a planar suction surface for suctioning and holding a wafer, and in which an exhaust hole is provided that opens at the suction surface. (b) A holder that supports the above rotating shaft. (c) A rotational drive mechanism that is connected to the other end of the rotating shaft and rotates the rotating shaft. B) A vibration mechanism that is attached to the holder and applies vibration to the wafer suctioned and held on the suction surface via the holder.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10858781U JPS5815346U (en) | 1981-07-23 | 1981-07-23 | wafer rotation device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10858781U JPS5815346U (en) | 1981-07-23 | 1981-07-23 | wafer rotation device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5815346U true JPS5815346U (en) | 1983-01-31 |
JPS629716Y2 JPS629716Y2 (en) | 1987-03-06 |
Family
ID=29902986
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10858781U Granted JPS5815346U (en) | 1981-07-23 | 1981-07-23 | wafer rotation device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5815346U (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62125780U (en) * | 1986-01-30 | 1987-08-10 |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5759438U (en) * | 1980-09-26 | 1982-04-08 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5759438B2 (en) * | 1972-06-16 | 1982-12-14 | Hitachi Ltd |
-
1981
- 1981-07-23 JP JP10858781U patent/JPS5815346U/en active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5759438U (en) * | 1980-09-26 | 1982-04-08 |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62125780U (en) * | 1986-01-30 | 1987-08-10 | ||
JPH043992Y2 (en) * | 1986-01-30 | 1992-02-06 |
Also Published As
Publication number | Publication date |
---|---|
JPS629716Y2 (en) | 1987-03-06 |
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