JPS58148387A - Method of treating thermo-siphon system - Google Patents
Method of treating thermo-siphon systemInfo
- Publication number
- JPS58148387A JPS58148387A JP57030160A JP3016082A JPS58148387A JP S58148387 A JPS58148387 A JP S58148387A JP 57030160 A JP57030160 A JP 57030160A JP 3016082 A JP3016082 A JP 3016082A JP S58148387 A JPS58148387 A JP S58148387A
- Authority
- JP
- Japan
- Prior art keywords
- nitrogen gas
- thermo
- radiator
- siphon
- generator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24D—DOMESTIC- OR SPACE-HEATING SYSTEMS, e.g. CENTRAL HEATING SYSTEMS; DOMESTIC HOT-WATER SUPPLY SYSTEMS; ELEMENTS OR COMPONENTS THEREFOR
- F24D1/00—Steam central heating systems
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Central Heating Systems (AREA)
Abstract
Description
【発明の詳細な説明】
こＯ発明はサーモサイフオンシステムの処理方法ｉｌｌ
、詳しくはサー毫ナイフオンシステム内Ｏ空気【窒本力
′スで置換してシステム内Ｏ水分と緻嵩ｔ＃去して作動
液Ｏ安定化とシステム内θ金属防★【行う処理方法Ｋ１
ｍ１する。[Detailed Description of the Invention] The present invention provides a processing method for a thermosiphon system.
For more details, please refer to the treatment method K1.
Do m1.
す−モサイフオンシステムの作動液は、常温で波体Ｏも
のは配管系を開放し九ままで充填できるので、常温で液
体Ｏフロンー１１．フロン−１１８゜トリフルオロエタ
ノールＴｈＫ１−バーフルオロオクタンなどが一般に用
いられる。 しかしサーモサイフオンシステムの配管内
に水分と酸素が存在すると上記Ｏごとき作動液は化学反
応を起こし１作動ｔｏ安定性が低下すると共（使用金属
が腐蝕されるのでサーモナイフオンシステムが著しく不
安定になる。 従ってす−モサイフォンシステム内Ｏ水
分と酸素を除去するために、従来は真空ポンプに１って
内部の空気を除去する方法が採用されている。 しかし
この操作はサーモサイフオンシステムｋＲ用場所に設置
する時に行うことが多く。The working fluid of the Mosaifon system can be filled at room temperature by opening the piping system and leaving the piping system open. Freon-118° trifluoroethanol ThK1-verfluorooctane and the like are generally used. However, if moisture and oxygen are present in the piping of the Thermo-Knife-on system, the above-mentioned working fluid such as O will cause a chemical reaction, reducing the stability of the operation (the metal used will corrode, making the Thermo-Knife-on system extremely unstable). Therefore, in order to remove the moisture and oxygen inside the thermosiphon system, conventional methods have been used to remove the air inside using a vacuum pump.However, this operation is not possible with the thermosiphon system. This is often done when installing the device at the location where it will be used.
装置が大きく手数がかかるなどという問題点がある。There are problems such as the equipment is large and time-consuming.
このような状況においてこθ発明の発明者らはよ）簡便
にサーモサイフオンシステムを安定化する旭鳳方法倉見
出しこの発明をなし友もので、こ０＊１ｊｌｔ作−液を
入れ大発生器、放熱器シエび作−液レシーバータンク會
導管て循環式に連結してなるサーモサイフオンシステム
において５発生器と放熱器とを連結する導管おＬび放熱
器と作動液レシーバ−タンクと管連結する導管のいずれ
か一方から窒素ガス會注入し他方から放出させクステム
内υ空気會窒嵩ガスで置換して１作−液Ｏ安定化とシス
テム円Ｏ金属防食と會行うこと管ａｌｌ黴とするサーモ
すイフオンシステムＯ処理方法會提供する４０である。Under these circumstances, the inventors of this θ invention have devised a method for easily stabilizing the thermosiphon system. In a thermosiphon system in which the radiator assembly and liquid receiver tank are connected in a circulation manner, there are 5 conduits that connect the generator and the radiator, and the radiator, the working fluid receiver tank, and the pipe connection. Nitrogen gas is injected from one of the pipes to be used and released from the other, replacing the air in the stem with bulk gas to stabilize the liquid O and prevent metal corrosion in all pipes. The ThermoSupon System O treatment method provides 40.
まま上記の７ｉ法を、放出される窒素ガスの露点を絢
定しその水分量を検出しながら行う方法もこＯ発明に含
まれる。The present invention also includes a method in which the above-mentioned method 7i is carried out while determining the dew point of the released nitrogen gas and detecting its moisture content.
上記のようにこの発明の方法によれば、極めて簡便に作
動液の安定化とシステム内の金属防食を行いサーモサイ
フオンシステムを安定化させることができる。 ｉたこ
の発明Ｏ方法はサーモティアオンシステム０生産工揚と
設置現場Ｏどちらにおいても実施できるが、ｔ−モｔイ
フオンシステムＯ装置現場で行う場合は簡単１に様器管
用いて簡便に行うことができるＯで特に有利である。As described above, according to the method of the present invention, the thermosiphon system can be stabilized by stabilizing the hydraulic fluid and preventing metal corrosion within the system in an extremely simple manner. The method invented by this octopus can be carried out both at the Thermo Tear-on System 0 production facility and at the installation site, but if it is carried out at the t-Mot IF-ON System 0 equipment site, it can be easily carried out using a similar device as described in 1. It is particularly advantageous for O to be able to.
次にこの発明の方法の一具体ｆ＠を図−に工って説明す
る。Next, one example of the method of the present invention f@ will be explained with reference to FIG.
まず生産工場においてａ！ｌｌＩＣ示した↓うＩＣ発生
器１とレシーバ−タンク（＆）音導管で連結しｓｊ５コ
ック（７） 、 （ａｌｌ ｆ ＊り付け、空間ｇｏ水
分および酸素が除去された状塵で充填し１方コツク（７
）と−）１閉じてシールしておく、 これをナーモナイ
フオン設置現楊に運搬し、１１図に示したように放熱器
（４）に連結してサーモサイフオン（１）【設置する。First, at the production factory, a! llIC shown ↓ Connect the IC generator 1 and receiver tank (&) with the sound conduit, sj5 cock (7), (all f *glue, space go and fill with dust from which moisture and oxygen have been removed). Kotuku (7)
) and -) 1 Close and seal. Transport this to the thermosiphon installation site, connect it to the radiator (4) as shown in Figure 11, and install the thermosiphon (1).
次いで窒素ボンベ（釦の窒素ガス出口とｓＴＪコツ７
（７）とを、レギュレーター■とナービスパルプＩｔ有
する導管（２）で連結する。 次いで窒素ボンベのパル
プｔｍ＊レギュレーメ−（転）で窒素ガス圧力を叡１−
ｔＬａｋｌｌ／−根度に落とし、ナルビスパルプｔｉｌ
ｌを闘いて＆−１０１７分程度の流量でＳ方コック（７
）を通じて窒素ガス會サーモサイフオン内へ送夕放熱器
（４）内￥ｒ経て８方コツク（８）から放出しサーモナ
イフオン内の空気を置換して水分と＃素を除去する。Next, connect the nitrogen cylinder (nitrogen gas outlet of the button and sTJ Tips 7)
(7) are connected by a conduit (2) containing regulator (1) and Nervis pulp It. Next, adjust the nitrogen gas pressure with the pulp tm* regulator of the nitrogen cylinder.
tLakll/- Dropped into root, Narbis pulp til
S-side cock (7
), the nitrogen gas is sent into the thermosiphon through the radiator (4), and then released from the eight-way tank (8) to replace the air in the thermosiphon and remove moisture and # elements.
次に上記Ｏ方法で行った試験例を示す。Next, a test example conducted using the method O described above will be shown.
試験例
１、試験条件
デーモナイ７オン放＊器（１）Ｐ）４Ｅ）内容積１−
窒素置換すべき配管の内容積 ８０＠ａｄ合針内容積
１！０Ｑｔｊ
外気温 ｇｔｏ’ｃ
外気相対Ｓ度 ８暴−（水分量１１４ ｅ ＰＰＸＥＩ
）（外気絶対湿度 ＩＬ０１１１ｋｇ水／−乾燥空気
）窒素ガス圧 １１ ｋｌｌ／ｄＧ
＃ 流量 ’ＩＩ１分
音素ガス露点 −７０℃
Ｌ試験結果
試験番号 １ ２ １
放出窒素ガスの露点〜 −１０−１０−４０水分
量（ＰＰｍ ） ａ、ａｌｌ ａｌｌ
Ｑ、！４水分除去率■ ９Ｌ６ 参７
Ｊ Ｉ龜９放出ガス１）５点は（株）い丁ソ製作所
製ＢＧ−１ＡＩＩＯ低亀用露点掴定器を１方コック（８
）に接続して調定した。 上記試験において放出窒素力
°ス０露点が一８０℃以下であれば、ｔ−モナイフオン
円の窒素カースＯ水分蓋がｉ ｐｐｍ以下でるや作−液
〇安定化と金属の防食が充分防止することができる。Test example 1, test conditions Demonai 7-on *exchanger (1) P) 4E) Internal volume 1- Internal volume of piping to be replaced with nitrogen 80@ad Coupling needle internal volume 1!0Qtj Outside temperature gto'c Outside air relative S degree 8-(moisture content 114 e PPXEI
) (Outside air absolute humidity IL0111kg water/-dry air) Nitrogen gas pressure 11 kll/dG # Flow rate 'II1 phoneme gas dew point -70℃ L test result Test number 1 2 1 Dew point of released nitrogen gas ~ -10-10-40 Moisture content (PPm) a, all all
Q,! 4 Moisture removal rate ■ 9L6 Reference 7
The 5 points are the BG-1AIIO low dew point grasper made by Icho Seisakusho Co., Ltd. and the one-way cock (8
) and adjusted. In the above test, if the released nitrogen power ° dew point is 180 °C or less, the nitrogen gas of the t-monaion circle is below i ppm, and the production liquid is stabilized and metal corrosion is sufficiently prevented. I can do it.
５１１図はこｔ）発明０方法を実施する皮め０鋏置を示
す概略説明図、ＭＬ意図は放熱器と一連配管會連結する
１０発生器と作動液レシーバータンタ〇概略説明図であ
る。
（υ・・・サーモサイフオン％（２ト・・作−液、■・
・・発生器、（４）・・・放熱器、（５トー・作−液レ
シーバーメンタ。
１６ト・・バーナ％（７）、 （８１・・１方コツク、
（９）用窒素ボンベ、（転）・・・レギュレーター、ｌ
ｕｌ・・・ナルビスパルプ。
及び０・・・導管。
第 １ 図
第２図Figure 511 is a schematic explanatory diagram showing a skin-scissor arrangement for carrying out the invention method, and the ML design is a schematic diagram of a generator and a hydraulic fluid receiver tank connected in series with a radiator. (υ... Thermosiphon% (2t... making liquid, ■...
... Generator, (4) ... Heat radiator, (5 toe, liquid receiver mentor. 16 To.. Burner% (7), (81.. One side kettle,
(9) Nitrogen cylinder, (transfer) regulator, l
ul... Narbis pulp. and 0... conduit. Figure 1 Figure 2
Claims (1)
ーバ−タンクを導管で循１式に連結してなるサーモサイ
フオンシステムにおいて１発生器と放ｍ器とを連結する
導管お工び放熱器と作動液レシーバ−タンクとを連結す
る導管のいずれか一方から窒素ガスを注入し他方から放
出させシステム内Ｏ空気を窒素ガスで置換して１作動液
の安定化とシステム内の金属防食と１行うことに特徴と
するナーモサイフォンシステムＯ処塩方法。 ＬＪｌｋ出窒嵩ガスｅ４点を測定して放出ガスθ水分量
を検出しながら行う特許請求の範囲纂１項紀載Ｏ方法。[Claims] In a thermosiphon system in which a large generator containing LlIP liquid, a radiator, and a working fluid receiver tank are connected in one circulation system through conduits, one generator and one radiator are connected. Nitrogen gas is injected from one of the conduits connecting the radiator and the hydraulic fluid receiver tank and released from the other to replace the O air in the system with nitrogen gas, thereby stabilizing the working fluid and the system. The Nermosiphon System O salt treatment method is characterized by metal corrosion protection and 1. A method in Claim 1, which is carried out while measuring LJlk output nitrogen bulk gas e4 points and detecting the released gas θ moisture content.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57030160A JPS58148387A (en) | 1982-02-25 | 1982-02-25 | Method of treating thermo-siphon system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP57030160A JPS58148387A (en) | 1982-02-25 | 1982-02-25 | Method of treating thermo-siphon system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS58148387A true JPS58148387A (en) | 1983-09-03 |
Family
ID=12295998
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP57030160A Pending JPS58148387A (en) | 1982-02-25 | 1982-02-25 | Method of treating thermo-siphon system |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58148387A (en) |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4933750A (en) * | 1972-07-31 | 1974-03-28 | ||
| JPS51102170A (en) * | 1975-03-07 | 1976-09-09 | Ando Shokufu Goshigaisha | |
| JPS54164723U (en) * | 1978-05-09 | 1979-11-19 | ||
| JPS5777348A (en) * | 1980-10-30 | 1982-05-14 | Hiroji Hosokawa | Base material for heat molding and heat molding method |
-
1982
- 1982-02-25 JP JP57030160A patent/JPS58148387A/en active Pending
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4933750A (en) * | 1972-07-31 | 1974-03-28 | ||
| JPS51102170A (en) * | 1975-03-07 | 1976-09-09 | Ando Shokufu Goshigaisha | |
| JPS54164723U (en) * | 1978-05-09 | 1979-11-19 | ||
| JPS5777348A (en) * | 1980-10-30 | 1982-05-14 | Hiroji Hosokawa | Base material for heat molding and heat molding method |
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