JPS58137698A - Constant volume injection device for liquefied gas - Google Patents
Constant volume injection device for liquefied gasInfo
- Publication number
- JPS58137698A JPS58137698A JP17958181A JP17958181A JPS58137698A JP S58137698 A JPS58137698 A JP S58137698A JP 17958181 A JP17958181 A JP 17958181A JP 17958181 A JP17958181 A JP 17958181A JP S58137698 A JPS58137698 A JP S58137698A
- Authority
- JP
- Japan
- Prior art keywords
- gas
- liquefied gas
- liquefied
- chamber
- injection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C13/00—Details of vessels or of the filling or discharging of vessels
- F17C13/02—Special adaptations of indicating, measuring, or monitoring equipment
- F17C13/021—Special adaptations of indicating, measuring, or monitoring equipment having the height as the parameter
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2203/00—Vessel construction, in particular walls or details thereof
- F17C2203/06—Materials for walls or layers thereof; Properties or structures of walls or their materials
- F17C2203/0602—Wall structures; Special features thereof
- F17C2203/0612—Wall structures
- F17C2203/0626—Multiple walls
- F17C2203/0629—Two walls
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2205/00—Vessel construction, in particular mounting arrangements, attachments or identifications means
- F17C2205/03—Fluid connections, filters, valves, closure means or other attachments
- F17C2205/0302—Fittings, valves, filters, or components in connection with the gas storage device
- F17C2205/0323—Valves
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2221/00—Handled fluid, in particular type of fluid
- F17C2221/01—Pure fluids
- F17C2221/014—Nitrogen
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2223/00—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel
- F17C2223/01—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel characterised by the phase
- F17C2223/0146—Two-phase
- F17C2223/0153—Liquefied gas, e.g. LPG, GPL
- F17C2223/0161—Liquefied gas, e.g. LPG, GPL cryogenic, e.g. LNG, GNL, PLNG
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2250/00—Accessories; Control means; Indicating, measuring or monitoring of parameters
- F17C2250/04—Indicating or measuring of parameters as input values
- F17C2250/0404—Parameters indicated or measured
- F17C2250/0408—Level of content in the vessel
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Filling Or Discharging Of Gas Storage Vessels (AREA)
- Vacuum Packaging (AREA)
Abstract
Description
【発明の詳細な説明】
寧尭明は液化ガス管液状ｏｔ＊注入する装置に関し特に
大気に開数状態にある非発泡性飲料又は一般食品等を満
した容積に１！化へ極性ガスを注入し〜その後、密封す
ることにより液化ガス封入容−を製造する際に１液化ガ
スを定量注入するのに好適な液化ガス定量注入装置Ｖｃ
ｌｌする・
近都、非発泡性飲料又は一般食品を薄肉金属缶に充填す
る際に１缶の変形又は破損を防止するために窒素ガスそ
の他の不活性ガスを封入し缶内圧力管高めることが行わ
れている。この不活性ガスな封入する方法としては１カ
ーボネータ−ｗｅ用いて予め飲料中に不活状ガスを湊解
させたＩＩＫ缶体を密封充填する方法或は缶体に飲料を
兜槙した俵に液化不活性ガスを注入し１そ０１！に蓋を
看締して密封する方法が公知である。[Detailed Description of the Invention] Ning Yaoming relates to a device for injecting liquefied gas into a liquefied gas pipe, especially 1! Liquefied gas metering injection device Vc suitable for injecting a metered amount of liquefied gas when manufacturing a liquefied gas filled container by injecting a polar gas into the tank and then sealing it.
When filling thin-walled metal cans with non-sparkling beverages or general foods, it is possible to increase the pressure inside the can by filling it with nitrogen gas or other inert gas to prevent the can from deforming or breaking. It is being done. The method for filling this inert gas is to seal the IIK can body in which the inert gas has been dissolved in the beverage using a carbonator, or to liquefy the beverage in a bale filled with a can. Inject inert gas and 1so01! There is a well-known method of tightly tightening the lid.
ＩＰＩ響によるときは１缶内圧な高めるために必要な量
の不活性ガスを飲料中に溶解させるためには飲料を室温
以下に冷却し加圧下で溶解させる必要があり一更Ｋｌｌ
鉗充填１［ＫＩ）殺菌等の加熱処場を行う必要があり、
工程数が増えコスシ高となる。According to IPI Hibiki, in order to dissolve the necessary amount of inert gas into the beverage to increase the internal pressure of one can, it is necessary to cool the beverage to below room temperature and dissolve it under pressure.
Force filling 1 [KI] It is necessary to perform heating treatment such as sterilization.
The number of steps increases and the cost becomes high.
他方、後者によるときは室温或は加熱殺菌処理後の比較
的高ｗｈｏ飲料をそ０會會眉いて実施できる利点を有す
るが１反面個々の缶体に注入する液化不活性ガス量は極
めて少量であるため超低温の液化不活性ガス【精度よく
計量投入することが重要である・
ＩＩＩＩＫ実施Ｋｌｌす、後者によるときは液化不活性
ガスが非常に気化し易く、液化不活性ガス貯蔵器−から
送給管管介して注入ノズルにより液化不活性ガスを注入
するＩＩＫ、遥常０真空断熱等の手段では送給管中で気
化ガスが発生し易く注入ノズルから気筐混会０状腺で噴
出して缶体へ定量注入するのが困難である・更に注入ノ
ズルは、＊濃或は加熱殺菌処理後の比較的高温の飲料が
満たされた缶体が一定間隔で連続的に送られてくる位置
に臨んでいるため、ノズル周辺部に大気中の水蒸気を氷
結し１を化不活性ガスの微量注入を阻害し缶体の充填密
封の連続運転に支障をきたすという同層があった〇
このため１特１ａＮ１８５４−１０ ？ ９ ？ ４４
１ｊ公報ニ掲Ｓａｔ化ガス定量注入装置が提案されてい
るが１これは前記した送給管における気化ガス発生によ
る間層１更に注入ノズル周辺部における水蒸気の氷結の
間層の改良に向けられている・しかしながら１前記問題
に加えて液化不活性ガスを注入するまでの閲−一定量の
ｔＩＩ化不化性活性ガス置内に滞留させておく方式のち
のにあっては、液化不活性ガスを連続的に注入すること
によって滞留量が変化しｔた滞留室内０＠化不活性ガス
液面上にある気化ガスの圧力が変動して注入ノズルから
の注入量が一定せず定量的な微量注入が困難となる間層
があった。このため前記発明にあっても滞留室内の液化
不活性ガスの液面位置を一定に保つ制御装置と滞留室内
の圧力【一定に保圧する制御装置を備えることが提案さ
れているが実際の操業にあっては滞留室内の液化不活性
ガスの液面位置を一定に保っために補充する液化不活性
ガスの流入によって、また液化不活性ガスの注入ノズル
からの噴出ニよっておこる液化不活性ガスの流動のため
に滞留室の条件が変動し１この変動により液化不活性ガ
スの滴下量が変化し、定量的な微量注入が阻害されてい
た。On the other hand, when using the latter method, there is an advantage that relatively high-who drinks can be prepared at room temperature or after heat sterilization, but on the other hand, the amount of liquefied inert gas injected into each can is extremely small. Therefore, ultra-low-temperature liquefied inert gas [It is important to accurately measure and inject it] When using the latter method, liquefied inert gas is very easy to vaporize, and it must be fed from a liquefied inert gas storage device. With methods such as IIK, which injects liquefied inert gas through a pipe and an injection nozzle, and vacuum insulation, vaporized gas is likely to be generated in the feed pipe, and it is ejected from the injection nozzle in a gas-filled gland. It is difficult to inject a fixed amount into the can body. Furthermore, the injection nozzle is located at a position where can bodies filled with concentrated or heat-sterilized beverages are continuously fed at regular intervals. Because of this, there was a layer around the nozzle that freezes the water vapor in the atmosphere and turns it into 1. It obstructs the injection of a small amount of inert gas and interferes with the continuous operation of filling and sealing the can body.For this reason, 1 Special 1aN1854-10? 9? 44
A fixed-rate saturation gas injection device has been proposed in Publication No. 1j.1 This is aimed at improving the above-mentioned intermediate layer due to the generation of vaporized gas in the feed pipe, as well as the interlayer where water vapor freezes around the injection nozzle. However, in addition to the above-mentioned problems, in the case of a method in which a certain amount of liquefied inert gas is retained in the tII-inactivating active gas station, the liquefied inert gas is Due to continuous injection, the amount of retention in the retention chamber changes to zero.The pressure of the vaporized gas above the inert gas liquid level fluctuates, causing the amount of injection from the injection nozzle to be inconsistent, resulting in quantitative micro-injection. There was an interlayer that made it difficult. For this reason, even in the above invention, it has been proposed to include a control device that keeps the liquid level of the liquefied inert gas in the retention chamber constant and a control device that keeps the pressure in the retention chamber constant. The flow of liquefied inert gas caused by the inflow of liquefied inert gas that is replenished to keep the level of the liquefied inert gas in the retention chamber constant, and by the jetting of liquefied inert gas from the injection nozzle. Because of this, the conditions in the retention chamber fluctuate, and this fluctuation changes the amount of liquefied inert gas dripped, hindering quantitative micro-injection.
本発明はかかる従来の欠点を解消し、微量の液化ガス、
特に液化窒素ガスの如く液化不活性ガス又は炭酸ガスリ
Ｊ蓄：１ぐ活性ガスを確実に定量的に高速で連続して注
入することができる液化ガス定量注入装置を提供するも
ので、断熱された液化ガス滞留室とｌＩ！ｉｌＩ内の液
化ガスＫＪＩ続する開Ｍ１ｊｐ装置を備えた注入ノズル
七ｉ＊＊内の液内の液化ガスを供給し液化ガスの液面の
高さを所定の位置に保持せしめる液化ガス供給制御装置
とから成り、前記貯蔵器からの液化ガス供給路を前記滞
留室内の液化ガス表面下の位置で接続し、該供給路の滞
留室への流入口に液化ガス流動緩和装置を設けると共に
液化ガス表面の揺動抑制板を設けたことを特徴とする〇
本発明の実施の一例を示す第１図及び第２図に従って更
に詳説すれば次の通りである。The present invention eliminates such conventional drawbacks, and enables trace amounts of liquefied gas,
In particular, we provide a liquefied gas metering injection device that can reliably quantitatively and continuously inject liquefied inert gas such as liquefied nitrogen gas or carbon dioxide active gas at high speed. Liquefied gas retention chamber and lI! A liquefied gas supply control device that supplies the liquefied gas in the liquid in the injection nozzle 7i** equipped with an open M1jp device that connects the liquefied gas KJI in the ilI and maintains the level of the liquefied gas at a predetermined position. A liquefied gas supply path from the storage device is connected at a position below the surface of the liquefied gas in the retention chamber, and a liquefied gas flow relaxation device is provided at the inlet of the supply path into the retention chamber, and A further detailed explanation will be given below with reference to FIGS. 1 and 2 showing an example of the implementation of the present invention.
第１ＷＪはその実施装置の概略図を示すもので、（１）
は液化不活性ガスである液化窒素ガス（以下１’ｆｗ＊
ガス」という）の注入器、（２）はＬＭ、ｊｆスの貯蔵
器、（３）は該貯蔵器（２）から注入器（１１へのＬＨ
。The first WJ shows a schematic diagram of the implementation equipment, (1)
is liquefied nitrogen gas (hereinafter referred to as 1'fw*), which is a liquefied inert gas.
(2) is a reservoir for LM, JF gas, and (3) is a reservoir for LH gas from the reservoir (2) to the injector (11).
.
ガスの供給量を制御する供給制御装置である〇注入器（
１）は詳細には第２父性の如（、ＬＭ、ガス滞留１１（
４）を備え、該滞留室（４）は真空断熱富（５３Ｋよっ
て囲繞されており一％骸富内のＬＨ，ガス液面下に開口
するＬＭ、ガス供給管路（６）により貯蔵器（２） Ｋ
！ｌ続している・該滞留室（４）の底部には滞留する
ＸＪＩＩガスを流出させる注入ノズル（７）と該ノズル
（７）を開閉する開閉弁装置（８）を備え、他方１ノズ
ル（７１′ｆｉ：低温に保持し、且つ空気中の水分の氷
結を防止するため滞留室（４）の上部には滞留するＬｌ
ｉｔガス液面上に存する気化窒素ガス（以下ｒＮｚガス
」という）に接続する気化ガス放出管路（９）の他淘を
注入ノズル（７）を囲繞する空間ｏｏＪに臨ませて設け
ると共に該管路（９）に圧力検出器Ｑｌ）及びＮ、ガス
を排気自在とする圧力調整器ａ２を介また滞留室（４）
内には、滞留するＬＭ、ガスが揺動するのを防止するた
めの浮遊させた揺動抑制板ａ■とぼ室（４ｉへのＬＨ！
ガス供給管路（６）の出口に臨ませてＡ貫通孔αＧｆ：
設けた流動級和装置ｔ（１７１とを設けた。前記注入ノ
ズル（７）は缶内容物に衝突してＬＮ、ガスを飛散させ
ないために注入する缶体ａｓ ｏ ＃ ＪＩＪ方向に沿
って曲折し注入速度に応じて垂直方向に対して４５〜８
０°の−曲げ角度を有し交挨自在とするためノズルクラ
ンプ（ＩＩＫより取付けた。また前記開閉弁装置（８）
は、滞留室（４）内を貫通する弁棒■をソレノイドによ
る駆動装筺偕υで第１ｖ！Ｊ示の缶体α均検出器（２）
の検出信号により制御装置（至）により駆動するように
したＯＬＭ、ガスー給制御装置ｔ（３１は前記した第２
ｖ！Ｊ示の滞留室（４）に設けた検知＃０により１もガ
ス液面の高さ位置を液面位置検知器０により検知して検
知信号を液面制御装置ａ４に伝えＬＭ、ガスの貯蔵器（
財）から管路（２）Ｋ介して夏宜ガスを送給しＬ−ガス
貯蔵器（２）内のＬＭ、ガスを加圧してＬＭ、ガスを管
路（６）により滞留室（４）に供給し滞留室（４）内の
ＬＨ，ガスの液面の高さ位置を所定の位置に□保持する
ように動作する加圧ガス供給管路四に設けた圧力調゛整
弁゛（ホ）を有する。Injector (injector) is a supply control device that controls the amount of gas supplied.
1) is explained in detail as second paternity (, LM, gas retention 11 (
4), the retention chamber (4) is surrounded by a vacuum insulated layer (53K) with an LH in a 1% bulk layer, a LM that opens below the gas liquid level, and a gas supply pipe (6) that connects the storage chamber (4). 2) K
! The bottom of the retention chamber (4) is equipped with an injection nozzle (7) for discharging the retained XJII gas and an on-off valve device (8) for opening and closing the nozzle (7). 71'fi: Ll that stays in the upper part of the retention chamber (4) to maintain the low temperature and prevent moisture in the air from freezing.
In addition to the vaporized gas discharge pipe (9) connected to the vaporized nitrogen gas (hereinafter referred to as rNz gas) existing on the IT gas liquid level, the pipe is provided facing the space ooJ surrounding the injection nozzle (7). The passage (9) is connected to a pressure detector Ql) and a pressure regulator a2 which allows nitrogen and gas to be freely evacuated, and is also connected to a retention chamber (4).
Inside, there is a floating rocking suppression plate a to prevent the LM and gas from fluctuating.
A through hole αGf facing the outlet of the gas supply pipe (6):
A fluid classifier t (171) was provided.The injection nozzle (7) was bent along the JIJ direction as the injection nozzle (7) was inserted into the can to prevent the LN and gas from colliding with the contents of the can and scattering. 45-8 for vertical direction depending on injection rate
It has a -bending angle of 0° and is attached to the nozzle clamp (IIK) so that it can be freely exchanged. Also, the on-off valve device (8)
The valve stem ■ passing through the retention chamber (4) is driven by a solenoid in the casing 1v! Can body α-uniform detector shown in J (2)
The OLM is driven by the control device (to) based on the detection signal of the gas supply control device t (31 is the second
v! Detection #0 installed in the retention chamber (4) indicated by J detects the height position of the gas liquid level by liquid level position detector 0, and transmits the detection signal to the liquid level control device a4 to store LM and gas. vessel(
Natsui gas is fed from L-Gas storage (2) to LM through pipe (2), gas is pressurized to LM, and gas is transported to the retention chamber (4) via pipe (6). Pressurized gas supply pipe 4 is equipped with a pressure regulating valve that operates to maintain the liquid level of LH and gas in the retention chamber (4) at a predetermined position. ).
以上の如く構成したので、缶体検出器（２）Ｋよって注
入ノズル（７）下に缶体−が移送されて来たとき１開閉
弁装置綿）が作動して注入器（１）の滞留室（４）から
注入ノズル（７）を介して、微ｊｌの一定量のＸａＭ１
ガスが缶体−に滴下される・こＣＡＬＭ、ガスの連続注
入動作中に滞留室（４）内の二舅、ガス液面の位置が降
下するときは液面制御装置ａ４が作動してＭ、ガス貯蔵
器（財）とＬＭ、ガス貯蔵器（２）とを接続する加圧ガ
ス供給管路（ハ）の圧力調整弁ｃ２６１を作動させて、
ＬＭ、ガス貯蔵器（２）内のＬＨ，ガスを滞留室（４）
に供給しＬｌｉ、ガス液面位置を所定の位置に保持する
。この滞留室（４）へのＬＭ、ガスの供給の際に流動緩
和装置１（１７）によって滞留室（４）内のＬＪガスの
流動が緩和され更にＬＮ、ガスのｍｌ尚及び開閉弁装置
（８）の作動によってＬＮ、ガスが揺動するのを揺動抑
制板（１５１により抑制し、従ってＬＨ，ガスの注入ノ
ズル（７）からの流出を安定させる◎更に、滞留室（４
ン内のＬＨ，ガスの流動、断熱条件の変化等によって滞
留室１４）内のＬＭｔガス液面上のＩｔガスの圧力が変
動し、圧力が上昇するときは、気化ガス放出管路（９）
を介して圧力論整器ａ力によりＮ、ガスを排出し滞留室
（４）内の圧力を所定の値に保持し、ＬＮ、ガスの注入
ノズルｆ７１からの流出を安定させる。With the above configuration, when the can body is transferred under the injection nozzle (7) by the can body detector (2) K, the on-off valve device (1) is activated and the injector (1) remains. From the chamber (4) through the injection nozzle (7), a certain amount of XaM1
When gas is dripped into the can, the liquid level control device a4 is activated and the gas level in the retention chamber (4) drops during the continuous gas injection operation. , operate the pressure regulating valve c261 of the pressurized gas supply pipe (c) connecting the gas storage device (goods) and the LM, gas storage device (2),
LM, gas storage chamber (2) LH, gas retention chamber (4)
Lli and maintain the gas liquid level at a predetermined position. When LM and gas are supplied to this retention chamber (4), the flow of LJ gas in the retention chamber (4) is relaxed by the flow relaxation device 1 (17), and further LN and ml of gas and the on-off valve device ( The swinging suppression plate (151) suppresses the swinging of LN and gas due to the operation of LN and gas (8), thereby stabilizing the outflow of LH and gas from the injection nozzle (7).
When the pressure of It gas above the liquid level of LMt gas in the retention chamber 14) fluctuates due to changes in the LH, gas flow, and adiabatic conditions in the tank, and the pressure rises, the vaporized gas discharge pipe (9)
N and gas are discharged through the pressure regulator a to maintain the pressure in the retention chamber (4) at a predetermined value, thereby stabilizing the outflow of LN and gas from the injection nozzle f71.
史に好ましくは、別記機械的制御に加えて０．３２１１
ｔＷ、度の微量である１Ｍｌガスを定量的に注入するた
めには１通常好適として使用されるノズル直径１．０〜
４．０１の注入ノズル（７）の場合には、更に滞留室（
４）内の６ガス圧を０．１〜０．５製の範囲に保つこと
が重要である。即ち、滞留ｍ １４＋内の一ガス圧が０
．１１以下では注入ノズル＋７１１２） 滴下が圧力調
整Ｗａ２の調圧精度の面から不安定となり定量注入が困
難となる。逆に６ガス圧を０．５を以上とすると定量注
入という点では間層がないがＸａＭｌガスの射出力が大
となるため注入する缶体ａ・の内容物に衝突した際ＫＬ
Ｍ、ガスが細粒状に飛び散る傾向があり、所定量のＬＭ
、ガスを缶体ａｓ中に止めることができないため缶内圧
力のバラツキが大きくなる。また、前記滞留室（４）の
夏寓ガス圧な圧力調整器０により０．１〜Ｏ，Ｓ ＺＫ
保持する場合であっても連続的に定量注入を行なう際に
は、滞留室（４）中のＭ、ガスの滞留容積が１−ガスの
容積の１〜５倍に設計することによって夏冨ガス圧の変
動を少くすることが好ましい。即ち、Ｍ富ガスの滞留容
積がＬ１ガスの容積の１倍以下では、圧カ関ａｉｌｊｔ
’Ｊの制御によっても圧力０［動が大きくシーガスの定
量注入に支障が生じることが多く、他方、５倍以上とす
るときは夏冨ガス圧の変動を少くすることができる反面
、滞留室（４）の容積が大となり外部よりの熱の侵入が
大となり気化ガスの発生量が増す他本発明の装置自体も
大型化して従来から用いられている蓋体巻締装置に付設
することが困難となる・
次に前記定量注入装置により実験した例を説明する。ま
ず、９５００水を充填した缶胴厚さへ１１−の２０２Ｄ
ぶり含ＤＸｔｆＩＫ＠分５５０缶の速度テＸＩＭｍガス
を充填して２秒後にア〃ミエウム蓋を巻−め、缶体温度
を２０℃に下げて試験缶体Ｂｅ缶）内圧を測定した結果
を示せば別表Ｉの逼りである。Preferably, in addition to the separate mechanical control, 0.3211
In order to quantitatively inject 1Ml gas, which is a trace amount of tW, the nozzle diameter 1.0 to 1, which is normally used as a suitable method, is used.
In the case of the injection nozzle (7) of 4.01, there is also a retention chamber (
4) It is important to keep the gas pressure within the range of 0.1 to 0.5. That is, the pressure of one gas in the retention m 14+ is 0
．． If it is less than 11, the injection nozzle +7112) will become unstable due to the pressure adjustment accuracy of the pressure adjustment Wa2, and it will be difficult to inject a fixed amount. On the other hand, if the 6 gas pressure is set to 0.5 or more, there will be no interlayer in terms of quantitative injection, but the injection force of XaMl gas will be large, so when it collides with the contents of the canister a.
M, gas tends to scatter in fine particles, and a certain amount of LM
Since the gas cannot be stopped in the can body AS, the variation in the pressure inside the can becomes large. In addition, the pressure regulator 0 adjusts the gas pressure in the retention chamber (4) from 0.1 to O, S ZK.
Even in the case of holding, when continuously injecting a fixed amount, the retention volume of the M gas in the retention chamber (4) should be designed to be 1 to 5 times the volume of the gas. It is preferable to reduce pressure fluctuations. That is, when the retention volume of M-rich gas is less than 1 times the volume of L1 gas, the pressure
Even when controlling 'J, the pressure 0 [movement is large, which often causes trouble in the quantitative injection of sea gas.On the other hand, when the pressure is increased by 5 times or more, fluctuations in summer gas pressure can be reduced, but on the other hand, 4) The volume is large, which increases the amount of heat entering from the outside and increases the amount of vaporized gas generated.The device of the present invention itself also becomes large, making it difficult to attach it to the conventionally used lid tightening device. Next, an example of an experiment conducted using the quantitative injection device described above will be explained. First, the thickness of the can body filled with 9500 water is 11-202D.
Show the results of measuring the internal pressure of the test can (Be can) by lowering the temperature of the can body to 20°C, wrapping the aluminum lid 2 seconds after filling the can with 550 cans containing yellowtail DXtfIK@min gas. It is in accordance with Appendix I.
以上の実施例１．２は通常！５℃の水を充填して２０℃
の缶体温度に下げた場合に缶胴が変形しないために必要
な缶内圧ｏ、ｓｏ 製以上であり、また各試験缶体にお
いても缶内圧にパフツキが少く良好であった。Examples 1 and 2 above are normal! Fill with 5℃ water and heat to 20℃
When the can body temperature was lowered to , the internal pressure o and so required to prevent the can body from deforming was greater than or equal to the required can body pressure, and in each test can body, there was little puffiness in the can internal pressure, which was good.
以上の説明から明らかなように本発明によるときは、液
化ガス滞留室内の液化ガスの液面位置を一定に制御し且
つ該滞留室内の内圧を所定圧に保圧すると共に、液化ガ
スを連続注入する際に生じる滞留案内の液化ガスの流動
及び揺動を抑制緩和することができるので、微量の液化
ガスを定量的Ｋｉｌ実に注入することができる液化ガス
定量注入装置を提供することができるの効果がある。As is clear from the above description, according to the present invention, the liquid level position of the liquefied gas in the liquefied gas retention chamber is controlled to be constant, the internal pressure in the retention chamber is maintained at a predetermined pressure, and the liquefied gas is continuously injected. Since the flow and fluctuation of the liquefied gas in the stagnation guide that occurs can be suppressed and alleviated, it is possible to provide a liquefied gas quantitative injection device that can quantitatively inject a small amount of liquefied gas. be.
【図面の簡単な説明】
図示するものは不発明の実施の一例を示すもので、１１
８１図は、全体概略図、第２図は第１図の注入響の裁断
面図である。
（２ト・・液化ガス貯蔵器
（３）・−・液化ガス供給制御装置
（４）・・・液化ガス滞留室
（７）ゆ・・注入ノズル
（８）ｅ・・開閉弁装置
０・・・圧力調整器
輪・・・位置検出器
四・・＠揺動抑制板
６訃・・ｍ−級和装箪
（ハ）・争・加圧ガス供給管際
特許庁長官殿
１．事件の表示
昭和５６年特願第１７９！＄８１、
発明の名称
液化ガス定量注入装置
北海製−株式金社
４代珈人
東京郁中野区上鷺富ｊ −５−＄ ５．−−７゜８２
４４ 弁環士戸 引 正 雄：ｅ、−、。
電話？９６−５９５４
ａ 補正の内容
（１）明細書の特許請求の範囲を別紙の通り訂正する。
（２） 岡１５頁１ｓ行Ｎ−４頁４ｆｌｆｌｔ） ｒ
ｌｌｌＵｌれた液化ガス滞留室と・・・時機とする。」
とあるのをｒｌｌ１発明は断熱された液化ガス滞留型と
該室内の液化ガスに接続する開閉弁装置を備えた注入ノ
ズルと＊＊内の液化ガス液面の位置検知器と験寵内の圧
力調整器と該室内の液化ガス表面下の位置と液化ガス貯
蔵器内の液化ガス麦画下の位置とな接続する液化ガス供
給路と、該供給路の滞留室へ０Ｉ１１人口に設けた液化
ガス流動緩和装置と前記位置検知器の検出信号により１
留室内に液化ガス貯蔵器内の液化ガスを供給し該室内の
液化ガスの波面の高さを所定の位置に保持せしめる液化
ガス供給制御装置とから成ることな特徴とする＠ＶＸＺ
＊明は断熱された液化ガス滞留室と該室内の液化ｌｘ＆
：１ａ１１１ｆ４ＨＩＲ＊ｌＵｌ＊ｌＩＩえた注入ノズ
ルと該室内の液化ガス液面の位置検知器と蒙室内の圧力
調整器と該室内の液化ガス表向下の位置と液化ガス貯蔵
器内の液化ガス表面下の位置とを接続する液化ガス供細
路と、該液化ガス貯蔵器内の気化ガス領域に加圧用気化
ガス貯蔵器を接続する加圧用気化ガス供給路に介在させ
た圧力調整弁な前記位置検知器の信号により作動させて
液化ガス貯蔵器から滞留室へ液化ガスを供給してｌ１１
１ＩｌＩ内の液化ガスの液面の高さを所定の位置に保持
せしめる液化ガス供給制御装置とから成ること管特徴と
する。」と訂正す“る。
（３）同書７頁７行目の「圧力調整ａαり」の前に「例
えばリリーフ弁などの」を加入する。
（４） 同書７頁ａ行目の「滞留室（４）内の」の前
に「静電容量センサーなどを用いた」な加入する。
（６）同書７頁９行目の「液面制御装置ａ４１Ｊの前に
「指示調節針又はコンピュータ等を用いた」を加入する
。
（６） 同書８頁５行目の「液面位置検知１１峙によ
り」を削除する。
（７） 同書８頁６行目の「ＬＩｌガス」とあるのを
「加圧用Ｍ−ガス」と訂正する。
（８） 同書８頁７行目の「管路（ハ）」の前に「Ｌ
ｘ。
ガス貯蔵＃ （２）の気化ガス領域に接続する加圧用ｈ
ガス供給路である」を加入する。
（９）同書８頁１２行目の「圧力調整弁（至）」の前に
「例えば、電空変換レギユレータ等を用いＱｌ 同書
８頁１５行目の「以上の如く構成したので」の次に「ま
ず、滞留室（４）内の圧力は気化ガス放出管（９）に介
在させた圧力間ｍ器ａ４により所定の値に保持されてい
る。そして」を加入する。
ａｓ 同書８頁１９行目の「降下するときは」の次に「
１Ｍｌガスの液面位置検知器（１３の検知信号により」
を加入する。
ａり 同書９頁２行目の「′ＬＭ、ガス貯蔵器（２）内
の」とあるのを「ｐｍ、ガス貯蔵１１（２）のＴ、ｒＭ
、ガスへの加圧圧力を増加し該貯蔵器（２）内の」と訂
正する。
（１３同書９頁４行目の「保持する。」の次に「他方、
該滞留室（４）内のＬ−ｍｇ、ガス液面位置が所定の位
置より液面位置検知器α謙の検知信号により液面制御装
置Ｉが圧力調整弁（ホ）を作動させ、しｈガス貯Ｉ！器
（２）の１Ｍｌガスの加圧圧力を降下して滞留室（４）
への流量を減少させてＬＮ、ガス液面位置を所定の位置
に保持する。」を加入する。
ａ◆ 同一９頁１６行目の「安定させる。」の次に、「
前記実施装置にあってはＬＮ１ガス注入の際にＬＨ，ガ
スの流動と揺動とを防止するために流動緩和装置Ｑ１と
揺動抑制板（Ｓとを併用したが例えば流動緩和装置Ｑ？
）をＬＮｔガス供給管路（６）の流入口のみならず該流
入口の位置に対応せしめて滞留室（４）内の全周に亘っ
て設けることのみによっても本発明の目的を勲げない、
」を加入する。
ａｓ 同書１２頁６〜７行目の「本発明によるとき−
は」と゛あるのを「本発明の第１発明によるときは、」
と訂正する。
（１０同書１２頁９〜１４行目の「液化ガスを・・・・
・・効果がある。」とあるのを「液化ガスを連続注入す
る際には、液化ガス貯蔵器内の液化ガスの液面下の位置
と滞留室内の液化ガスの液面、下の位置へ液（ヒガスを
供、給するので、供給される液化ガスには気化ガスが混
入することなく従って液化ガスの供給によって滞留室内
の液化ガスが気化ガスの混入による流動が防止し得て、
更に滞留室内の液化ガスの注入口に液化ガス流動緩和装
置を設けたので、液化ガスの流入に伴う滞留室内の液化
ガスの流動が緩和されて、微量の液化ガスを定量的に確
実に注入することができる液化ガス定量注入装置を提供
する。
また、本発明の第２発明によるときは滞留室内の液化ガ
スの液面位置を一定に制御するために、液化ガス貯蔵器
内の気化ガス領域に加圧用気化ガス貯蔵器を接続する加
圧用気化ガス供給路に介在させた圧力調整弁を滞留室内
の液化ガス液面検知器の信号により作動させる液化ガス
供給制御装置を設けたので、滞留室内の液化ガスの液面
の変動に即”応じて気化ガスの混入しない液化ガ天を滞
留室内へ連続供給てきるので滞留室内の気化ガスの圧力
の変動も極力これを抑制できるので微量の液化ガスを定
量的に確実に注入することができる液化ガス定量注入装
置を提供するの効果がある。」と訂正する。
ａで 同書１３頁１行目の下に「（６）・・・液化ガス
供給路」を加入する。
特 同書１５頁６行目の「ａＳ・・・揺動抑制板」を削
除する。
■ 同書１５頁７行目の下に「＠・・・加圧気化ガス貯
ｉＩ！器」を加入する。
（至）同書１５頁８行目の下に「（至）・・・圧力調整
弁」を特徴する
特許麹求の範囲
１、 断熱された液化ガス滞留室と該案内の液化ガスに
接続するｌｊＨ＆’ｌ弁装置を備えた注入ノズルと該室
内の液化ガス液面の位置検知器と該室内の！！位置検知
器の検出信号により滞留室内に液化ガス貯蔵器内の液化
ガスを供給し該室内の液化ガスのｔ＆面の高さを所定の
位置に保持せしめる液化ガス供給制御ｌｌ装置とから成
ることを特徴とする液化ガス定量注入装置
三衛熱された液化ガス滞留室と該室内の液化ガス＆：１
１！続する開閉弁装置を備えた注入ノズルと該室内の液
化ガス液面の位置検知器と該室内の圧力調整器と該室内
の液化ガス表内下の位置と液化ガス貯蔵器内の液化ガス
表面下の位置とを接続する液化ガス供給路と、該液化ガ
ス貯蔵器内の気化ガス領域に加圧用気化ガス貯ｔｒｉｍ
を接続する加圧用気化ガス供給路に介在させた圧力調整
弁を前記位置検知器の信号により作動させて液化ガス貯
蔵器から滞留室へ液化ガスを供給して該室内の液化ガス
の液面の高さを所定の位置に保持せしめる液化ガス供給
制御装置とから成ることを特徴とする液化ガス定量注入
装置さ 前記注入ノズルのノズル直径を１．０〜４．Ｏ
ｆｍｌｌとし前前記液化ガス滞留室内の圧力を０．１〜
０、５ ｋｇ／（：艷に制御したことを特徴とする特許
錆求の範囲第１項又は＄２項記載の液化ガス定量注入装
置
３ 前記液化ガス滞留室内の気化ガスの容積を該室内の
液化ガスの容積の１〜５倍に制御したことを特徴とする
特許精求の範囲第１項ｇ項Ｅ載の液化ガス定量注入装置
手続補正書
昭和 券８．’Ｖｊ２Ｆ 日
待針庁長富毀
１、事件の表示
昭和５６ΦｆＩ＃顔第１７９５８１号
′Ｌ尭嘴の名称
液化ガス定量注入装置
＆ 補止をする看
事件との間係 特軒＃１麺人
北＊ａｍ鋤株式会社
４代珈人
＆ 麺止命令の日付（１発］
ａ 補正の対象
明細書の特許請求の範囲及び発明の詳細な説明
７、 補正の内容
（１） 明細書の特１ＦＦ−請求の範Ｈｔ別紙の通ｐ
訂正する。
（２）明細書９頁４行目の「保持する。」の次に昭和５
７年５月２４日付手続補正書４頁１６行目以下ａ３によ
り加入して「他方１・・・・・・保持する」とめるのを
「他方１該湯留ｌ！（４）内のＬＭ、ガス液面位置が所
定の位置より上昇した場合％液面位置検知器ａ３の検知
信号に１９液面制御装置α尋が圧力調整弁（２）を作動
させＳＬＭ。
ガス貯蔵１Ｉ（２） ＯＬＭＩガスの加圧圧力を降下し
て滞留１！ （４）への流量を減少させてＬＭ、ガスＩ
［Ｉｋ１位置を所定の位置に保持する。」と訂正するＯ
特許請求の範囲
ｔ 断熱された液化ガス滞留室とｍ室内の液化ガスに接
続する開閉弁装置を備えた注入ノズルと該室内の液化ガ
ス波面の位置検知器と鋏冨内の圧力調整器と、該室内の
液化ガス表面下の位置と液化ガス貯蔵器内の液化ガス表
面下の位置とを接続する液化ガス供給路と１鋏供給路の
滞留雀への流入口に設けた液化ガス流動緩和装置と前記
位置検知器の検出信号によシ濃留蔓内に液化ガス貯蔵器
内の液化ガスを供給し該室内の液化ガスの液面の高さを
所定の位置に保持せしめる液化ガス供給制御装置とから
成ることｔ−Ｗ做とする液化ガス定量注入装置
２、Ｗ＃熱され九液化ガス滞留室と該室内の液化ガスＫ
Ｗ１続する開閉弁装置を備えた注入ノズルと＃室内の液
化ガス液向の位置検知器と該室内の圧カー整器と該室内
の液化ガス表面下の位置と液化ガス貯蔵器内の液化ガス
表面下の位置とを接続する液化ガス供給路と、咳液化ガ
ス貯ｊｍ器内の気化ガス領域に加圧用気化ガス貯蔵器を
接続する加圧用気化ガス供給路に介在させた圧力調整弁
を前記位置検知器の信号により作動嘔せて液化ガス貯蔵
器から滞留室へ液化ガスを供給して誼宣内の液化ガスＯ
液面の高さを所定の位置に保持せしめる液化ガス供給制
御装置とから成ることを特徴とする液化ガス定量注入装
置五 前記注入ノズルのノズル直径を１．０〜４．０■
とし田記液化ガス滞留寵内の圧力をｏ、ｓ’ｐｇ下に制
御したことを特徴とする特ｌＦＰＭ求の範囲＃！１項又
は第２ＪＪ記載の液化ガス定量注入装置本 前記液化ガ
ス滞留室内の気化ガスの容積を咳塞内の液化ガスの容積
の１〜５倍に制御したことを特徴とする特許請求の範闘
＠１項又は第２項記職ＯＳｔ化ガス定魚注入装置
手 続 補 正 書
齢 ％１８． ！２５”
４■軒庁長官殿
り事件の表示
昭和５６年特許願１＠１７９５８１、
発明の名称
液化ガス定量注入装置
１ 補正をする蓄
事件との関係 特許出願人
北海製論株式金社
表代理人
＆ 補正命令の日付
ｔｊ５１１ｇ５Ｂ峰 ！月 ８日
ａｌｌｌ′ｉＥの対象 Ｉｉ８和５易都１月ｚ６日付
提員の手続補正蕾の補正Ｏ内ＩＩ０１１１１[BRIEF DESCRIPTION OF THE DRAWINGS] What is shown in the drawings shows an example of the implementation of the invention.
FIG. 81 is an overall schematic diagram, and FIG. 2 is a cross-sectional view of the injection sound shown in FIG. 1. (2) Liquefied gas storage (3) - Liquefied gas supply control device (4) Liquefied gas retention chamber (7) Injection nozzle (8) e... Opening/closing valve device 0...・Pressure regulator wheel...position detector 4...@swing suppression plate 6...m-class kimono chest (c)・dispute・pressurized gas supply pipe to the Commissioner of the Patent Office 1.Indication of the incident Showa Patent Application No. 179 of 1956! $81, Name of the invention Liquefied gas metering injection device made in Hokkai - Kinsha Co., Ltd. 4th generation K. Tokyo Iku Nakano-ku Kamisagi Tomj -5-$5.--7゜82
44 Benkanshi Tobiki Masao: e, -,. phone? 96-5954 a Contents of amendment (1) The scope of claims in the specification is corrected as shown in the attached sheet. (2) Oka page 15 1s line N-4 page 4flflt) r
The liquefied gas retention chamber is... timely. ”
The invention consists of an insulated liquefied gas retention type, an injection nozzle equipped with an on-off valve device connected to the liquefied gas in the chamber, a position detector for the liquefied gas liquid level in the chamber, and a pressure in the chamber. A liquefied gas supply line connecting the regulator, a position below the surface of the liquefied gas in the chamber, and a position below the liquefied gas image in the liquefied gas storage device, and a liquefied gas provided at 0111 to the retention chamber of the supply line. 1 by the detection signal of the flow relaxation device and the position detector.
@VXZ characterized by comprising a liquefied gas supply control device that supplies the liquefied gas in the liquefied gas storage device into the retention chamber and maintains the height of the wave front of the liquefied gas in the chamber at a predetermined position.
*The light shows the insulated liquefied gas retention chamber and the liquefied lx &
:1a111f4HIR*lUl*lII injection nozzle, liquefied gas level position detector in the chamber, pressure regulator in the chamber, position below the surface of the liquefied gas in the chamber, and below the surface of the liquefied gas in the liquefied gas storage device and a pressure regulating valve interposed in the pressurized vaporized gas supply path that connects the pressurized vaporized gas storage device to the vaporized gas area in the liquefied gas storage device. The liquefied gas is supplied from the liquefied gas storage device to the retention chamber by the signal from the liquefied gas storage device.
The pipe is characterized by comprising a liquefied gas supply control device that maintains the level of the liquefied gas in the pipe at a predetermined position. (3) On page 7 of the same book, line 7, add ``for example, a relief valve'' before ``pressure adjustment aαr''. (4) In line a of page 7 of the same book, add ``using a capacitance sensor, etc.'' before ``in the retention chamber (4).'' (6) In the same book, page 7, line 9, add ``using an indicating adjustment needle or computer, etc.'' before the liquid level control device a41J. (6) Delete "by liquid level position detection 11" on page 8, line 5 of the same book. (7) In the same book, page 8, line 6, "LIl gas" is corrected to "M-gas for pressurization." (8) In the same book, page 8, line 7, before “pipeline (c)”
x. Gas storage # (2) Pressurizing h connected to the vaporized gas area
"It is a gas supply route" is added. (9) Before "Pressure regulating valve (to)" on page 8, line 12 of the same book, "For example, use an electro-pneumatic conversion regulator etc." After "As configured as above" on page 8, line 15 of the same book ``First, the pressure in the retention chamber (4) is maintained at a predetermined value by a pressure gauge a4 interposed in the vaporized gas discharge pipe (9).'' is added. as On page 8, line 19 of the same book, after “When descending”, “
1Ml gas level position detector (according to 13 detection signals)
join. In the second line of page 9 of the same book, ``'LM, in gas storage (2)'' is replaced with ``pm, T in gas storage 11 (2), rM.
, increasing the pressurizing pressure on the gas in the reservoir (2). (13 Ibid., p. 9, line 4, after “hold”, “on the other hand,
When the L-mg gas liquid level in the retention chamber (4) is at a predetermined position, the liquid level control device I operates the pressure regulating valve (E) based on the detection signal from the liquid level position detector α, and then Gas storage I! The pressurized pressure of 1Ml gas in the vessel (2) is lowered to the retention chamber (4).
The flow rate to LN is reduced to maintain the gas liquid level at a predetermined position. ” to join. a◆ On page 9, line 16, next to “Stabilize.”
In the above-mentioned implementation device, a flow relaxation device Q1 and a rocking suppression plate (S) were used in combination to prevent the flow and fluctuation of LH and gas during LN1 gas injection, but for example, a flow relaxation device Q?
) is not only provided at the inlet of the LNt gas supply pipe (6), but also by providing it around the entire circumference of the retention chamber (4) in correspondence with the position of the inlet. ,
” to join. as "According to the present invention-" on page 12, lines 6-7 of the same book.
"is" is replaced with "when according to the first invention of the present invention,"
I am corrected. (10 Ibid., p. 12, lines 9-14, “Liquefied gas...
··effective. "When injecting liquefied gas continuously, the liquid (hygase) is supplied to a position below the liquid level of the liquefied gas in the liquefied gas storage device and a position below the liquid level of the liquefied gas in the retention chamber. Since the liquefied gas is supplied, the liquefied gas is not mixed with the vaporized gas, and therefore, the liquefied gas in the retention chamber can be prevented from flowing due to the mixing of the vaporized gas.
Furthermore, since a liquefied gas flow relaxation device is installed at the liquefied gas injection port in the retention chamber, the flow of liquefied gas in the retention chamber due to the inflow of liquefied gas is relaxed, and a minute amount of liquefied gas can be reliably injected quantitatively. Provided is a liquefied gas metering injection device that can be used. Further, according to the second aspect of the present invention, in order to control the liquid level position of the liquefied gas in the retention chamber at a constant level, a pressurizing vaporizer is connected to a vaporizing gas region in the liquefied gas storage device. We have installed a liquefied gas supply control device that operates a pressure regulating valve interposed in the gas supply path in response to a signal from a liquefied gas level detector in the retention chamber. Since the liquefied gas containing no vaporized gas is continuously supplied into the retention chamber, fluctuations in the pressure of the vaporized gas in the retention chamber can be suppressed as much as possible, making it possible to reliably inject a small amount of liquefied gas quantitatively. It is effective to provide a fixed-dose injection device.'' Add "(6)...Liquefied gas supply path" under the first line on page 13 of the same book in a. Delete "aS...swing suppression plate" on page 15, line 6 of the special document. ■ Add "@...pressurized vaporized gas storage II! device" under line 7 on page 15 of the same book. (To) Scope 1 of the patent kojiku which features "(To) ... pressure regulating valve" under line 8 on page 15 of the same book, ljH&'l connected to the insulated liquefied gas retention chamber and the liquefied gas of the guide An injection nozzle with a valve device and a position detector for the liquefied gas level in the chamber and the! ! A liquefied gas supply control device that supplies the liquefied gas in the liquefied gas storage device into the retention chamber according to the detection signal of the position detector and maintains the height of the t-plane of the liquefied gas in the chamber at a predetermined position. Liquefied gas metering injection device featuring three heated liquefied gas retention chambers and liquefied gas inside the chamber: 1
1! an injection nozzle equipped with an on-off valve device, a position detector for the liquefied gas level in the chamber, a pressure regulator in the chamber, a position below the liquefied gas level in the chamber, and a liquefied gas surface in the liquefied gas storage device; A liquefied gas supply path connecting the lower position and a pressurizing vaporized gas storage trim in the vaporized gas region in the liquefied gas storage device.
A pressure regulating valve interposed in the pressurized vaporized gas supply path connecting the is actuated by the signal from the position detector to supply liquefied gas from the liquefied gas storage device to the retention chamber to lower the liquid level of the liquefied gas in the chamber. A liquefied gas metering injection device comprising: a liquefied gas supply control device for maintaining the height at a predetermined position; O
fmll and the pressure inside the liquefied gas retention chamber is 0.1~
The liquefied gas quantitative injection device 3 according to the scope of the patent application, item 1 or $ 2, characterized in that the volume of vaporized gas in the liquefied gas retention chamber is controlled to 0.5 kg/(:). Liquefied Gas Meter Injection Device Procedural Amendment Document 8.'Vj2F Nichimachi-Hin Agency Chotomi-Ki 1, which is characterized by controlling the volume of liquefied gas to 1 to 5 times the volume of liquefied gas. , Display of the incident 1979 ΦfI # Face No. 179581' L Yazui's name Liquefied gas metered injection device & Intermediate with the incident to make up for it Tokuken #1 Menjin Kita *am Poku Co., Ltd. 4th generation Coffee & Date of suspension order (1 issue) a Claims of the specification to be amended and detailed description of the invention 7 Contents of the amendment (1) Features of the description 1FF-Claims Ht Appendix p
correct. (2) In the 4th line of page 9 of the specification, after “retain.”
Added by A3 from page 4, line 16 onwards, in the procedural amendment dated May 24, 1997, "the other party 1......retains" is changed to "the LM in the other party 1!(4), When the gas liquid level rises above a predetermined position, the 19 liquid level control device α fathom operates the pressure regulating valve (2) in response to the detection signal from the liquid level position detector a3, and the SLM.Gas storage 1I (2) OLMI gas LM and gas I by lowering the pressurizing pressure and reducing the flow rate to retention 1! (4).
[Keep Ik1 position in place. ” Corrects O.
Claims t: An insulated liquefied gas retention chamber, an injection nozzle equipped with an on-off valve device connected to the liquefied gas in the chamber, a position detector for the liquefied gas wavefront in the chamber, and a pressure regulator in the scissors; A liquefied gas supply path connecting a position below the surface of the liquefied gas in the room and a position below the surface of the liquefied gas in the liquefied gas storage device, and a liquefied gas flow relaxation device provided at the inlet of the one scissor supply path to the retention sparrow; a liquefied gas supply control device that supplies liquefied gas in a liquefied gas storage device to the concentrated storage container according to a detection signal from the position detector and maintains the level of the liquefied gas in the chamber at a predetermined position; A liquefied gas metering injection device 2 consisting of a heated liquefied gas retention chamber and a liquefied gas K in the chamber.
W1 An injection nozzle with a continuous on-off valve device, a position detector for the liquefied gas liquid direction in the chamber, a pressure regulator in the chamber, a position below the surface of the liquefied gas in the chamber, and the liquefied gas in the liquefied gas storage device. The pressure regulating valve is interposed between the liquefied gas supply path connecting the liquefied gas supply path to the position below the surface and the pressurized vaporized gas supply path that connects the pressurized vaporized gas storage device to the vaporized gas region in the cough liquefied gas storage device. It is activated by the signal from the position detector and supplies liquefied gas from the liquefied gas storage device to the retention chamber to remove the liquefied gas inside the storage chamber.
Liquefied gas quantitative injection device characterized by comprising a liquefied gas supply control device that maintains the height of the liquid level at a predetermined position.
A special FPM range # that is characterized by controlling the pressure in the liquefied gas retention chamber to below o, s'pg! The liquefied gas metering injection device according to item 1 or 2 JJ, characterized in that the volume of vaporized gas in the liquefied gas retention chamber is controlled to be 1 to 5 times the volume of liquefied gas in the cough occlusion. @Clause 1 or Paragraph 2 OSt gas constant injection device procedure correction Book age %18. ! 25" 4■ Indication of the case of the Chief Justice of the Agency 1981 Patent Application 1 @ 179581, Name of the invention Liquefied gas quantitative injection device 1 Relationship with the amended storage case Patent applicant Representative representative of Hokkai Seiron Co., Ltd. & Date of amendment order tj511g5B peak !Month 8th subject of all'iE Ii8和5一月z6date Amendment of procedure amendment bud of the member II01111
Claims (1)
続する一閉弁装置管備えた注入ノズルとｌＩＮ内の液化
ｌＸ液面Ｏ位置検出器と該室内の圧力調葺響と位置検ａ
ｓ＠ｔ）検知信号により鋏寵内に液化ｌス貯ｍｓ内の液
化ガスを供給し液化ガスの液面の高さを所定の位置に保
持賃しめる液化ガス供給制御装置とから成り、前記貯票
薯からの液化ガス供給路を前記滞留富内の液化ｌス表面
下の位置で接続し１鋏供給路の滞留富への流入口に７１
！ｉ化ガス流動緩和装置を設けると共Ｋｍ化ガス表面の
揺動抑制板を設けたことを特徴とする液化ガス足置注入
装置。 ２ 前記注入ノス＃Ｏノズル直径を１．０〜４．０■と
じ前記液化ｆＸｌｌ留富内の室内を０．１〜ｏ、 ｓ
’Ｂに制御したことｔ時機とする特許請求の範囲第１項
の液化ガス定量注入装置−瓢 前記液化ガス滞留室内の
気化ガスの容積な該室内ｔｖｔｌ化ガスの容積の１〜５
４１１に制−したことｔ４Ｉ黴とする液化ガス定量注入
装置。[Claims] t. An insulated monoxide gas tank, an injection nozzle equipped with a one-close valve device pipe connected to the liquefied gas in the am, a liquefied lX liquid level O position detector in the inn, and an insulating liquid lX liquid level O position detector in the chamber. Pressure adjustment roof sound and position inspection a
s@t) A liquefied gas supply control device that supplies liquefied gas in the liquefied gas storage ms into the scissors in response to a detection signal and maintains the level of the liquefied gas at a predetermined position. Connect the liquefied gas supply path from the sump at a position below the surface of the liquefied gas in the stagnant gas, and connect the liquefied gas supply path 71 to the inlet of the 1 scissor supply path to the stagnant gas.
! A liquefied gas foot injection device characterized in that a liquefied gas flow relaxation device is provided and a rocking suppression plate on the surface of the oxidized gas is provided. 2. The diameter of the injection nozzle #O is 1.0 to 4.0 mm, and the interior of the liquefaction fXll Tomomi is 0.1 to 0.0 seconds.
The liquefied gas quantitative injection device according to claim 1, wherein the liquefied gas metering injector is controlled at t timing.
Liquefied gas metering injection device that controls t4I mold in 411.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17958181A JPS58137698A (en) | 1981-11-11 | 1981-11-11 | Constant volume injection device for liquefied gas |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP17958181A JPS58137698A (en) | 1981-11-11 | 1981-11-11 | Constant volume injection device for liquefied gas |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58137698A true JPS58137698A (en) | 1983-08-16 |
| JPH0227212B2 JPH0227212B2 (en) | 1990-06-15 |
Family
ID=16068224
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP17958181A Granted JPS58137698A (en) | 1981-11-11 | 1981-11-11 | Constant volume injection device for liquefied gas |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58137698A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0179366A2 (en) * | 1984-10-12 | 1986-04-30 | The Continental Group, Inc. | Method of and control system for monitoring the supply of a liquified gas under pressure to a container |
| CN103398287A (en) * | 2013-07-29 | 2013-11-20 | 山东新华医疗器械股份有限公司 | Gas supply device capable of setting amount of gas freely |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5796921A (en) * | 1980-12-03 | 1982-06-16 | Toyo Seikan Kaisha Ltd | Device for dropping and filling liquefied inert gas |
-
1981
- 1981-11-11 JP JP17958181A patent/JPS58137698A/en active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5796921A (en) * | 1980-12-03 | 1982-06-16 | Toyo Seikan Kaisha Ltd | Device for dropping and filling liquefied inert gas |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0179366A2 (en) * | 1984-10-12 | 1986-04-30 | The Continental Group, Inc. | Method of and control system for monitoring the supply of a liquified gas under pressure to a container |
| EP0179366A3 (en) * | 1984-10-12 | 1987-08-19 | The Continental Group, Inc. | Method of and control system for monitoring the supply of a liquified gas under pressure to a container |
| CN103398287A (en) * | 2013-07-29 | 2013-11-20 | 山东新华医疗器械股份有限公司 | Gas supply device capable of setting amount of gas freely |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0227212B2 (en) | 1990-06-15 |
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