JPS5797941U - - Google Patents

Info

Publication number
JPS5797941U
JPS5797941U JP1980173820U JP17382080U JPS5797941U JP S5797941 U JPS5797941 U JP S5797941U JP 1980173820 U JP1980173820 U JP 1980173820U JP 17382080 U JP17382080 U JP 17382080U JP S5797941 U JPS5797941 U JP S5797941U
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1980173820U
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1980173820U priority Critical patent/JPS5797941U/ja
Publication of JPS5797941U publication Critical patent/JPS5797941U/ja
Pending legal-status Critical Current

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Landscapes

  • Electron Beam Exposure (AREA)
JP1980173820U 1980-12-05 1980-12-05 Pending JPS5797941U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1980173820U JPS5797941U (ja) 1980-12-05 1980-12-05

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1980173820U JPS5797941U (ja) 1980-12-05 1980-12-05

Publications (1)

Publication Number Publication Date
JPS5797941U true JPS5797941U (ja) 1982-06-16

Family

ID=29965703

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1980173820U Pending JPS5797941U (ja) 1980-12-05 1980-12-05

Country Status (1)

Country Link
JP (1) JPS5797941U (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002099856A1 (en) * 2001-06-05 2002-12-12 Sony Corporation Electron beam exposure-use mask and electron beam exposure method
JP2007072423A (ja) * 2005-09-03 2007-03-22 Hynix Semiconductor Inc 二重露光用フォトマスク及びこれを用いた二重露光方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002099856A1 (en) * 2001-06-05 2002-12-12 Sony Corporation Electron beam exposure-use mask and electron beam exposure method
JP2007072423A (ja) * 2005-09-03 2007-03-22 Hynix Semiconductor Inc 二重露光用フォトマスク及びこれを用いた二重露光方法

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