JPS5797941U - - Google Patents
Info
- Publication number
- JPS5797941U JPS5797941U JP1980173820U JP17382080U JPS5797941U JP S5797941 U JPS5797941 U JP S5797941U JP 1980173820 U JP1980173820 U JP 1980173820U JP 17382080 U JP17382080 U JP 17382080U JP S5797941 U JPS5797941 U JP S5797941U
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Electron Beam Exposure (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1980173820U JPS5797941U (ja) | 1980-12-05 | 1980-12-05 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1980173820U JPS5797941U (ja) | 1980-12-05 | 1980-12-05 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5797941U true JPS5797941U (ja) | 1982-06-16 |
Family
ID=29965703
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1980173820U Pending JPS5797941U (ja) | 1980-12-05 | 1980-12-05 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5797941U (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2002099856A1 (en) * | 2001-06-05 | 2002-12-12 | Sony Corporation | Electron beam exposure-use mask and electron beam exposure method |
JP2007072423A (ja) * | 2005-09-03 | 2007-03-22 | Hynix Semiconductor Inc | 二重露光用フォトマスク及びこれを用いた二重露光方法 |
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1980
- 1980-12-05 JP JP1980173820U patent/JPS5797941U/ja active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2002099856A1 (en) * | 2001-06-05 | 2002-12-12 | Sony Corporation | Electron beam exposure-use mask and electron beam exposure method |
JP2007072423A (ja) * | 2005-09-03 | 2007-03-22 | Hynix Semiconductor Inc | 二重露光用フォトマスク及びこれを用いた二重露光方法 |