JPS5771587A - Semiconductor storing device - Google Patents
Semiconductor storing deviceInfo
- Publication number
- JPS5771587A JPS5771587A JP14792180A JP14792180A JPS5771587A JP S5771587 A JPS5771587 A JP S5771587A JP 14792180 A JP14792180 A JP 14792180A JP 14792180 A JP14792180 A JP 14792180A JP S5771587 A JPS5771587 A JP S5771587A
- Authority
- JP
- Japan
- Prior art keywords
- signal
- cell
- line wire
- case
- selective line
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C7/00—Arrangements for writing information into, or reading information out from, a digital store
Landscapes
- Non-Volatile Memory (AREA)
- Read Only Memory (AREA)
Abstract
PURPOSE:To reduce an occupied area of a memory cell, by constituting it so as to connect plural double type MOSFETs in series. CONSTITUTION:A memory cell 16 consists of double gate type MOSFETs, and plural series circuits 17 are formed by connecting in series the same number of MOSFETs respectively. In case when a data is read out from this storing device, R/W and a signal A are set to ''1'' and ''0'', respectively, and while a clock signal phi is set to ''1'', a ''0'' signal and a ''1'' signal are supplied to a selective line wire and a non-selective line wire, respectively, from a line decoder 14, and a signal of a connecting point S in that case is detected. Subsequently, in case when a data is written to the cell 16, the signal R/W is set to ''0'', and while the signal phi is set to ''1'', high potential voltage V1 and voltage of lower potential the V1 are supplied to the selective line wire and the non-selective line wire, respectively, and the signal A is set to ''1'' in accordance with a write data. According to such a constitution, it is unnecessary to apply ground potential to the source of each cell 16, and also a contact hole for for connecting each drain and a row wire 13 is not required, therefore, an occupied area of the cell is reduced.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14792180A JPS5771587A (en) | 1980-10-22 | 1980-10-22 | Semiconductor storing device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14792180A JPS5771587A (en) | 1980-10-22 | 1980-10-22 | Semiconductor storing device |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5771587A true JPS5771587A (en) | 1982-05-04 |
JPH0143400B2 JPH0143400B2 (en) | 1989-09-20 |
Family
ID=15441098
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14792180A Granted JPS5771587A (en) | 1980-10-22 | 1980-10-22 | Semiconductor storing device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5771587A (en) |
Cited By (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61120474A (en) * | 1984-11-07 | 1986-06-07 | エツセジーエツセ ミクロエレツトロニカ ソチエタ ペル アノニマ | Eprom memory matrix and writng thereinto |
JPS61186019A (en) * | 1985-02-13 | 1986-08-19 | Toshiba Corp | Logic circuit |
JPS63184367A (en) * | 1987-01-26 | 1988-07-29 | Nec Corp | Mos nonvolatile semiconductor storage device |
JPS63266884A (en) * | 1987-04-24 | 1988-11-02 | Toshiba Corp | Nonvolatile semiconductor memory |
JPS63268192A (en) * | 1987-04-24 | 1988-11-04 | Toshiba Corp | Nonvolatile semiconductor memory |
JPS63268193A (en) * | 1987-04-24 | 1988-11-04 | Toshiba Corp | Nonvolatile semiconductor memory |
JPS645072A (en) * | 1987-06-29 | 1989-01-10 | Toshiba Corp | Nonvolatile semiconductor memory device |
JPH01133290A (en) * | 1987-11-18 | 1989-05-25 | Toshiba Corp | Non-volatile semiconductor memory device |
JPH027295A (en) * | 1988-06-27 | 1990-01-11 | Toshiba Corp | Non-volatile semiconductor memory |
JPH0294198A (en) * | 1988-09-30 | 1990-04-04 | Toshiba Corp | Nonvolatile semiconductor memory device |
US4939690A (en) * | 1987-12-28 | 1990-07-03 | Kabushiki Kaisha Toshiba | Electrically erasable programmable read-only memory with NAND cell structure that suppresses memory cell threshold voltage variation |
US4962481A (en) * | 1988-12-27 | 1990-10-09 | Samsung Electronics Co., Ltd. | EEPROM device with plurality of memory strings made of floating gate transistors connected in series |
JPH02260455A (en) * | 1988-12-15 | 1990-10-23 | Samsung Electron Co Ltd | Electrically exasable and programmable semiconductor memory device and its eraoing method and its erasing programming method |
US5008856A (en) * | 1987-06-29 | 1991-04-16 | Kabushiki Kaisha Toshiba | Electrically programmable nonvolatile semiconductor memory device with NAND cell structure |
US5050125A (en) * | 1987-11-18 | 1991-09-17 | Kabushiki Kaisha Toshiba | Electrically erasable programmable read-only memory with NAND cellstructure |
US5245566A (en) * | 1987-04-24 | 1993-09-14 | Fujio Masuoka | Programmable semiconductor |
US5270969A (en) * | 1987-06-29 | 1993-12-14 | Kabushiki Kaisha Toshiba | Electrically programmable nonvolatile semiconductor memory device with nand cell structure |
US5295096A (en) * | 1988-07-11 | 1994-03-15 | Mitsubishi Denki Kabushiki Kaisha | NAND type EEPROM and operating method therefor |
US5313420A (en) * | 1987-04-24 | 1994-05-17 | Kabushiki Kaisha Toshiba | Programmable semiconductor memory |
JPH06196717A (en) * | 1993-10-12 | 1994-07-15 | Toshiba Corp | Nonvolatile semiconductor memory device |
JPH06196718A (en) * | 1993-10-12 | 1994-07-15 | Toshiba Corp | Nonvolatile semiconductor memory device |
US5440509A (en) * | 1987-11-18 | 1995-08-08 | Kabushiki Kaisha Toshiba | Electrically erasable programmable read-only memory with NAND cell structure and intermediate level voltages initially applied to bit lines |
US5448517A (en) * | 1987-06-29 | 1995-09-05 | Kabushiki Kaisha Toshiba | Electrically programmable nonvolatile semiconductor memory device with NAND cell structure |
JPH07302855A (en) * | 1995-06-05 | 1995-11-14 | Toshiba Corp | Non-volatile semiconductor storage device |
US5589699A (en) * | 1993-12-27 | 1996-12-31 | Kabushiki Kaisha Toshiba | Electrically erasable programmable non-volatile semiconductor memory device having select gates and small number of contact holes |
JPH09120689A (en) * | 1996-10-21 | 1997-05-06 | Toshiba Corp | Nonvolatile semiconductor memory |
US5719805A (en) * | 1987-04-24 | 1998-02-17 | Kabushiki Kaisha Toshiba | Electrically programmable non-volatile semiconductor memory including series connected memory cells and decoder circuitry for applying a ground voltage to non-selected circuit units |
US5877981A (en) * | 1987-06-29 | 1999-03-02 | Kabushiki Kaisha Toshiba | Nonvolatile semiconductor memory device having a matrix of memory cells |
US6034899A (en) * | 1987-06-29 | 2000-03-07 | Kabushiki Kaisha Toshiba | Memory cell of nonvolatile semiconductor memory device |
US6545913B2 (en) | 1987-06-29 | 2003-04-08 | Kabushiki Kaisha Toshiba | Memory cell of nonvolatile semiconductor memory device |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6091639A (en) | 1993-08-27 | 2000-07-18 | Kabushiki Kaisha Toshiba | Non-volatile semiconductor memory device and data programming method |
-
1980
- 1980-10-22 JP JP14792180A patent/JPS5771587A/en active Granted
Cited By (45)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61120474A (en) * | 1984-11-07 | 1986-06-07 | エツセジーエツセ ミクロエレツトロニカ ソチエタ ペル アノニマ | Eprom memory matrix and writng thereinto |
JPH0519798B2 (en) * | 1985-02-13 | 1993-03-17 | Tokyo Shibaura Electric Co | |
JPS61186019A (en) * | 1985-02-13 | 1986-08-19 | Toshiba Corp | Logic circuit |
JPS63184367A (en) * | 1987-01-26 | 1988-07-29 | Nec Corp | Mos nonvolatile semiconductor storage device |
JPS63266884A (en) * | 1987-04-24 | 1988-11-02 | Toshiba Corp | Nonvolatile semiconductor memory |
JPS63268192A (en) * | 1987-04-24 | 1988-11-04 | Toshiba Corp | Nonvolatile semiconductor memory |
JPS63268193A (en) * | 1987-04-24 | 1988-11-04 | Toshiba Corp | Nonvolatile semiconductor memory |
US5812453A (en) * | 1987-04-24 | 1998-09-22 | Kabushiki Kaisha Toshiba | Programmable semiconductor memory |
US5719805A (en) * | 1987-04-24 | 1998-02-17 | Kabushiki Kaisha Toshiba | Electrically programmable non-volatile semiconductor memory including series connected memory cells and decoder circuitry for applying a ground voltage to non-selected circuit units |
US6434043B2 (en) | 1987-04-24 | 2002-08-13 | Kabushiki Kaisha Toshiba | Programmable semiconductor memory array having series-connected memory |
US5313420A (en) * | 1987-04-24 | 1994-05-17 | Kabushiki Kaisha Toshiba | Programmable semiconductor memory |
US5245566A (en) * | 1987-04-24 | 1993-09-14 | Fujio Masuoka | Programmable semiconductor |
US6269021B1 (en) | 1987-06-29 | 2001-07-31 | Kabushiki Kaisha Toshiba | Memory cell of nonvolatile semiconductor memory device |
US6178116B1 (en) | 1987-06-29 | 2001-01-23 | Kabushiki Kaisha Toshiba | Memory cell of non-volatile semiconductor memory device |
US6011747A (en) * | 1987-06-29 | 2000-01-04 | Kabushiki Kaisha Toshiba | Memory cell of non-volatile semiconductor memory device |
US5148394A (en) * | 1987-06-29 | 1992-09-15 | Kabushiki Kaisha Toshiba | Electrically programmable nonvolatile semiconductor memory device with nand cell structure |
US6061271A (en) * | 1987-06-29 | 2000-05-09 | Kabushiki Kaisha Toshiba | Memory cell of nonvolatile semiconductor memory device |
US5877982A (en) * | 1987-06-29 | 1999-03-02 | Kabushiki Kaisha Toshiba | Semiconductor memory device including circuitry for selecting a block in both read and write modes |
US5270969A (en) * | 1987-06-29 | 1993-12-14 | Kabushiki Kaisha Toshiba | Electrically programmable nonvolatile semiconductor memory device with nand cell structure |
US6058051A (en) * | 1987-06-29 | 2000-05-02 | Kabushiki Kaisha Toshiba | Memory cell of non-volatile semiconductor memory device |
US6034899A (en) * | 1987-06-29 | 2000-03-07 | Kabushiki Kaisha Toshiba | Memory cell of nonvolatile semiconductor memory device |
US6549462B1 (en) | 1987-06-29 | 2003-04-15 | Kabushiki Kaisha Toshiba | Memory cell of nonvolatile semiconductor memory device |
US6545913B2 (en) | 1987-06-29 | 2003-04-08 | Kabushiki Kaisha Toshiba | Memory cell of nonvolatile semiconductor memory device |
US5877981A (en) * | 1987-06-29 | 1999-03-02 | Kabushiki Kaisha Toshiba | Nonvolatile semiconductor memory device having a matrix of memory cells |
US5448517A (en) * | 1987-06-29 | 1995-09-05 | Kabushiki Kaisha Toshiba | Electrically programmable nonvolatile semiconductor memory device with NAND cell structure |
US5008856A (en) * | 1987-06-29 | 1991-04-16 | Kabushiki Kaisha Toshiba | Electrically programmable nonvolatile semiconductor memory device with NAND cell structure |
US5517449A (en) * | 1987-06-29 | 1996-05-14 | Kabushiki Kaisha Toshiba | Memory cell of nonvolatile semiconductor memory device |
US6072748A (en) * | 1987-06-29 | 2000-06-06 | Kabushiki Kaisha Toshiba | Memory cell of nonvolatile semiconductor memory device |
US6021073A (en) * | 1987-06-29 | 2000-02-01 | Kabushiki Kaisha Toshiba | Memory cell of non-volatile semiconductor memory device |
JPS645072A (en) * | 1987-06-29 | 1989-01-10 | Toshiba Corp | Nonvolatile semiconductor memory device |
US5745413A (en) * | 1987-06-29 | 1998-04-28 | Kabushiki Kaisha Toshiba | Electrically programmable nonvolatile semiconductor memory device with NAND cell structure |
JPH01133290A (en) * | 1987-11-18 | 1989-05-25 | Toshiba Corp | Non-volatile semiconductor memory device |
US5440509A (en) * | 1987-11-18 | 1995-08-08 | Kabushiki Kaisha Toshiba | Electrically erasable programmable read-only memory with NAND cell structure and intermediate level voltages initially applied to bit lines |
US5050125A (en) * | 1987-11-18 | 1991-09-17 | Kabushiki Kaisha Toshiba | Electrically erasable programmable read-only memory with NAND cellstructure |
US4939690A (en) * | 1987-12-28 | 1990-07-03 | Kabushiki Kaisha Toshiba | Electrically erasable programmable read-only memory with NAND cell structure that suppresses memory cell threshold voltage variation |
JPH027295A (en) * | 1988-06-27 | 1990-01-11 | Toshiba Corp | Non-volatile semiconductor memory |
US5295096A (en) * | 1988-07-11 | 1994-03-15 | Mitsubishi Denki Kabushiki Kaisha | NAND type EEPROM and operating method therefor |
JPH0294198A (en) * | 1988-09-30 | 1990-04-04 | Toshiba Corp | Nonvolatile semiconductor memory device |
JPH02260455A (en) * | 1988-12-15 | 1990-10-23 | Samsung Electron Co Ltd | Electrically exasable and programmable semiconductor memory device and its eraoing method and its erasing programming method |
US4962481A (en) * | 1988-12-27 | 1990-10-09 | Samsung Electronics Co., Ltd. | EEPROM device with plurality of memory strings made of floating gate transistors connected in series |
JPH06196718A (en) * | 1993-10-12 | 1994-07-15 | Toshiba Corp | Nonvolatile semiconductor memory device |
JPH06196717A (en) * | 1993-10-12 | 1994-07-15 | Toshiba Corp | Nonvolatile semiconductor memory device |
US5589699A (en) * | 1993-12-27 | 1996-12-31 | Kabushiki Kaisha Toshiba | Electrically erasable programmable non-volatile semiconductor memory device having select gates and small number of contact holes |
JPH07302855A (en) * | 1995-06-05 | 1995-11-14 | Toshiba Corp | Non-volatile semiconductor storage device |
JPH09120689A (en) * | 1996-10-21 | 1997-05-06 | Toshiba Corp | Nonvolatile semiconductor memory |
Also Published As
Publication number | Publication date |
---|---|
JPH0143400B2 (en) | 1989-09-20 |
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