JPS5764740A - Developing device - Google Patents
Developing deviceInfo
- Publication number
- JPS5764740A JPS5764740A JP14174880A JP14174880A JPS5764740A JP S5764740 A JPS5764740 A JP S5764740A JP 14174880 A JP14174880 A JP 14174880A JP 14174880 A JP14174880 A JP 14174880A JP S5764740 A JPS5764740 A JP S5764740A
- Authority
- JP
- Japan
- Prior art keywords
- solvent
- pattern
- workpiece
- sprayed
- vessel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photographic Processing Devices Using Wet Methods (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
PURPOSE:To obtain a developing device that forms a high precision pattern by alternately bringing >=2 kinds of solvents having so solubility individually but soluble when mixed, into contact with a macromolecular material layer that senses to a high energy line. CONSTITUTION:In a device that performs pattern forming consisting of a macromolecular material layer on a workpiece 3, which is used for work of a semiconductor element, optical applied parts, etc., for instance, the workpiece 3 having a pattern drawn with an electron beam on polystylene on a silicon wafer is put on a supporter and sprayed with poor solvent S1 (aceton, etc.) from a perforated pipe supplied by a vessel 7 through a solenoid valve 10 and a fixed quantity pump. After 19sec, also developing solvent S2 (cyclohexane, etc.) is sprayed from vessel 8. Then, it is taken out after the solvent is removed by sending a gas such as gaseous N2 from a pipe 9. This operation is carried out automatically by a control circuit 13. Thus, a high precision pattern of necessary polymer parts free from swelling and deformation can be obtained.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14174880A JPS5764740A (en) | 1980-10-09 | 1980-10-09 | Developing device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14174880A JPS5764740A (en) | 1980-10-09 | 1980-10-09 | Developing device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5764740A true JPS5764740A (en) | 1982-04-20 |
Family
ID=15299274
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14174880A Pending JPS5764740A (en) | 1980-10-09 | 1980-10-09 | Developing device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5764740A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61171244U (en) * | 1985-04-12 | 1986-10-24 | ||
US4708452A (en) * | 1985-11-15 | 1987-11-24 | Hoechst Aktiengesellschaft | Decoating device |
KR100481556B1 (en) * | 2002-06-29 | 2005-04-07 | 동부아남반도체 주식회사 | Develop water dispense apparatus |
-
1980
- 1980-10-09 JP JP14174880A patent/JPS5764740A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61171244U (en) * | 1985-04-12 | 1986-10-24 | ||
JPH0234823Y2 (en) * | 1985-04-12 | 1990-09-19 | ||
US4708452A (en) * | 1985-11-15 | 1987-11-24 | Hoechst Aktiengesellschaft | Decoating device |
KR100481556B1 (en) * | 2002-06-29 | 2005-04-07 | 동부아남반도체 주식회사 | Develop water dispense apparatus |
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