JPS5764740A - Developing device - Google Patents

Developing device

Info

Publication number
JPS5764740A
JPS5764740A JP14174880A JP14174880A JPS5764740A JP S5764740 A JPS5764740 A JP S5764740A JP 14174880 A JP14174880 A JP 14174880A JP 14174880 A JP14174880 A JP 14174880A JP S5764740 A JPS5764740 A JP S5764740A
Authority
JP
Japan
Prior art keywords
solvent
pattern
workpiece
sprayed
vessel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14174880A
Other languages
Japanese (ja)
Inventor
Kazunari Miyoshi
Osamu Kogure
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP14174880A priority Critical patent/JPS5764740A/en
Publication of JPS5764740A publication Critical patent/JPS5764740A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26Processing photosensitive materials; Apparatus therefor
    • G03F7/30Imagewise removal using liquid means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photographic Processing Devices Using Wet Methods (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Abstract

PURPOSE:To obtain a developing device that forms a high precision pattern by alternately bringing >=2 kinds of solvents having so solubility individually but soluble when mixed, into contact with a macromolecular material layer that senses to a high energy line. CONSTITUTION:In a device that performs pattern forming consisting of a macromolecular material layer on a workpiece 3, which is used for work of a semiconductor element, optical applied parts, etc., for instance, the workpiece 3 having a pattern drawn with an electron beam on polystylene on a silicon wafer is put on a supporter and sprayed with poor solvent S1 (aceton, etc.) from a perforated pipe supplied by a vessel 7 through a solenoid valve 10 and a fixed quantity pump. After 19sec, also developing solvent S2 (cyclohexane, etc.) is sprayed from vessel 8. Then, it is taken out after the solvent is removed by sending a gas such as gaseous N2 from a pipe 9. This operation is carried out automatically by a control circuit 13. Thus, a high precision pattern of necessary polymer parts free from swelling and deformation can be obtained.
JP14174880A 1980-10-09 1980-10-09 Developing device Pending JPS5764740A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14174880A JPS5764740A (en) 1980-10-09 1980-10-09 Developing device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14174880A JPS5764740A (en) 1980-10-09 1980-10-09 Developing device

Publications (1)

Publication Number Publication Date
JPS5764740A true JPS5764740A (en) 1982-04-20

Family

ID=15299274

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14174880A Pending JPS5764740A (en) 1980-10-09 1980-10-09 Developing device

Country Status (1)

Country Link
JP (1) JPS5764740A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61171244U (en) * 1985-04-12 1986-10-24
US4708452A (en) * 1985-11-15 1987-11-24 Hoechst Aktiengesellschaft Decoating device
KR100481556B1 (en) * 2002-06-29 2005-04-07 동부아남반도체 주식회사 Develop water dispense apparatus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61171244U (en) * 1985-04-12 1986-10-24
JPH0234823Y2 (en) * 1985-04-12 1990-09-19
US4708452A (en) * 1985-11-15 1987-11-24 Hoechst Aktiengesellschaft Decoating device
KR100481556B1 (en) * 2002-06-29 2005-04-07 동부아남반도체 주식회사 Develop water dispense apparatus

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