JPS5750755A - Variable slit for large current ion - Google Patents

Variable slit for large current ion

Info

Publication number
JPS5750755A
JPS5750755A JP12462280A JP12462280A JPS5750755A JP S5750755 A JPS5750755 A JP S5750755A JP 12462280 A JP12462280 A JP 12462280A JP 12462280 A JP12462280 A JP 12462280A JP S5750755 A JPS5750755 A JP S5750755A
Authority
JP
Japan
Prior art keywords
pipes
carbon
cooled
parallel
improved
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP12462280A
Other languages
Japanese (ja)
Other versions
JPS6116149B2 (en
Inventor
Toshimichi Taya
Atsushi Shibata
Toshio Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP12462280A priority Critical patent/JPS5750755A/en
Publication of JPS5750755A publication Critical patent/JPS5750755A/en
Publication of JPS6116149B2 publication Critical patent/JPS6116149B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/09Diaphragms; Shields associated with electron or ion-optical arrangements; Compensation of disturbing fields

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)

Abstract

PURPOSE:To simplify the structure and to improve the cooling effect, by arranging two carbon pipes supported by pipes for passing the coolant in parallel while rotating the entire body around the center between the pipes thereby regulating the amount of the incident beam. CONSTITUTION:A metallic rod for supporting two carbon pipes 2 arranged in parallel is the double structure of an outer tube 3 and an inner tube 4 and can be cooled by the water through a cooling water pipe inlet 5 and outlet 6. The entire body is rotated by a rotary shaft 7 around the central point O between the pipes 2 to vary the slit width and to regulate the amount of the incident ion beam 1. Since the portion impinged with the beam is a carbon cylinder, the work and the fixing are facilitated and the spatter damage is reduced, while since the entire carbon pipe is cooled the cooling effect can be improved and since simple structure is employed where the opening/closing of the slit is performed by single motor rotary mechanism the reliability of the operation can also be improved.
JP12462280A 1980-09-10 1980-09-10 Variable slit for large current ion Granted JPS5750755A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12462280A JPS5750755A (en) 1980-09-10 1980-09-10 Variable slit for large current ion

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12462280A JPS5750755A (en) 1980-09-10 1980-09-10 Variable slit for large current ion

Publications (2)

Publication Number Publication Date
JPS5750755A true JPS5750755A (en) 1982-03-25
JPS6116149B2 JPS6116149B2 (en) 1986-04-28

Family

ID=14889969

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12462280A Granted JPS5750755A (en) 1980-09-10 1980-09-10 Variable slit for large current ion

Country Status (1)

Country Link
JP (1) JPS5750755A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5220174A (en) * 1989-10-09 1993-06-15 Yoshino Kogyosho Co., Ltd. Apparatus for controlling the dose of irradiation
US5629528A (en) * 1996-01-16 1997-05-13 Varian Associates, Inc. Charged particle beam system having beam-defining slit formed by rotating cyclinders
KR100699121B1 (en) 2005-05-20 2007-03-22 동부일렉트로닉스 주식회사 Ion beam extraction apparatus of ion implantation equipment

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5220174A (en) * 1989-10-09 1993-06-15 Yoshino Kogyosho Co., Ltd. Apparatus for controlling the dose of irradiation
US5629528A (en) * 1996-01-16 1997-05-13 Varian Associates, Inc. Charged particle beam system having beam-defining slit formed by rotating cyclinders
EP0785567A3 (en) * 1996-01-16 1998-07-29 Varian Associates, Inc. Charged particle beam slit assembly
KR100483725B1 (en) * 1996-01-16 2005-08-24 배리언 어소시에이츠 인코포레이티드 Charged particle beam system with beam limiting slit formed by rotating cylinder
KR100699121B1 (en) 2005-05-20 2007-03-22 동부일렉트로닉스 주식회사 Ion beam extraction apparatus of ion implantation equipment

Also Published As

Publication number Publication date
JPS6116149B2 (en) 1986-04-28

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