JPS57500530A - - Google Patents

Info

Publication number
JPS57500530A
JPS57500530A JP56501703A JP50170381A JPS57500530A JP S57500530 A JPS57500530 A JP S57500530A JP 56501703 A JP56501703 A JP 56501703A JP 50170381 A JP50170381 A JP 50170381A JP S57500530 A JPS57500530 A JP S57500530A
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56501703A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS57500530A publication Critical patent/JPS57500530A/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP56501703A 1980-05-05 1981-04-01 Pending JPS57500530A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/146,642 US4314022A (en) 1980-05-05 1980-05-05 Photoresist developers and process

Publications (1)

Publication Number Publication Date
JPS57500530A true JPS57500530A (ja) 1982-03-25

Family

ID=22518305

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56501703A Pending JPS57500530A (ja) 1980-05-05 1981-04-01

Country Status (8)

Country Link
US (1) US4314022A (ja)
EP (1) EP0051627A4 (ja)
JP (1) JPS57500530A (ja)
BE (1) BE888666A (ja)
BR (1) BR8108583A (ja)
CA (1) CA1166507A (ja)
IT (1) IT8148391A0 (ja)
WO (1) WO1981003231A1 (ja)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4330614A (en) * 1980-10-14 1982-05-18 International Business Machines Corporation Process for forming a patterned resist mask
US4366224A (en) * 1981-08-06 1982-12-28 American Hoechst Corporation Inorganic lithium developer composition
JPS58190952A (ja) * 1982-04-30 1983-11-08 Fuji Photo Film Co Ltd 感光性印刷版の現像液
US4436807A (en) 1982-07-15 1984-03-13 American Hoechst Corporation Developer composition with sodium, lithium and/or potassium salts for developing negative working imaged photographic material
JPS59121336A (ja) * 1982-12-28 1984-07-13 Fuji Photo Film Co Ltd 感光性平版印刷版の現像液
US4708920A (en) * 1985-09-16 1987-11-24 Minnesota Mining And Manufacturing Company Microlens sheet containing directional half-tone images and method for making the same
US4758368A (en) * 1986-07-21 1988-07-19 Motorola Inc. Method for etching silicon wafers using a potassium hydroxide and water etching solution
KR100194370B1 (ko) * 1993-04-28 1999-06-15 마에다 가쯔노스께 포지형 전자선 레지스트 조성물 및 포지형 전자선 레지스트용 현상액
US5445911A (en) * 1993-07-28 1995-08-29 Hewlett-Packard Company Chelating positive charge director for liquid electrographic toner
US5589311A (en) * 1994-11-28 1996-12-31 Hewlett-Packard Company Cage complexes for charge direction in liquid toners
EP0716347B1 (en) * 1994-12-06 2002-07-24 Fuji Photo Film Co., Ltd. Developer for photosensitive lithographic printing plate
US5952050A (en) 1996-02-27 1999-09-14 Micron Technology, Inc. Chemical dispensing system for semiconductor wafer processing
US20120129093A1 (en) * 2010-11-18 2012-05-24 Moshe Levanon Silicate-free developer compositions

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1572153B2 (de) * 1966-06-27 1971-07-22 E I Du Pont de Nemours and Co , Wilmington, Del (V St A ) Fotopolymerisierbares aufzeichnungsmaterial
US3615480A (en) * 1969-02-24 1971-10-26 Du Pont Developer solutions for photopolymerized layers
US4193797A (en) * 1971-03-22 1980-03-18 E. I. Dupont De Nemours And Company Method for making photoresists
US3957553A (en) * 1972-08-09 1976-05-18 Pennwalt Corporation Non-chromated alkaline etching bath and etching process for aluminum
JPS5821257B2 (ja) * 1974-04-25 1983-04-28 富士写真フイルム株式会社 キンゾクガゾウケイセイザイリヨウ
US3980587A (en) * 1974-08-16 1976-09-14 G. T. Schjeldahl Company Stripper composition
US3957583A (en) * 1974-12-02 1976-05-18 Mcdonnell Douglas Corporation Apparatus and process for determining the susceptibility of microorganisms to antibiotics
US4028205A (en) * 1975-09-29 1977-06-07 Kaiser Aluminum & Chemical Corporation Surface treatment of aluminum
JPS5299103A (en) * 1976-02-16 1977-08-19 Fuji Photo Film Co Ltd Method of reducing strength of dot image
US4078102A (en) * 1976-10-29 1978-03-07 International Business Machines Corporation Process for stripping resist layers from substrates
AT384896B (de) * 1977-10-24 1988-01-25 Fuji Photo Film Co Ltd Entwicklungsverfahren
DE3201241A1 (de) * 1982-01-16 1983-07-28 Continental Gummi-Werke Ag, 3000 Hannover Laufstreifenerneuerter guertelreifen

Also Published As

Publication number Publication date
IT8148391A0 (it) 1981-05-04
EP0051627A1 (en) 1982-05-19
BR8108583A (pt) 1982-04-06
US4314022A (en) 1982-02-02
CA1166507A (en) 1984-05-01
EP0051627A4 (en) 1983-02-04
BE888666A (fr) 1981-11-04
WO1981003231A1 (en) 1981-11-12

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