JPS5749218A - Heat treating apparatus - Google Patents
Heat treating apparatusInfo
- Publication number
- JPS5749218A JPS5749218A JP12571380A JP12571380A JPS5749218A JP S5749218 A JPS5749218 A JP S5749218A JP 12571380 A JP12571380 A JP 12571380A JP 12571380 A JP12571380 A JP 12571380A JP S5749218 A JPS5749218 A JP S5749218A
- Authority
- JP
- Japan
- Prior art keywords
- tube
- liquid
- gases
- inlet
- tank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
- C30B25/08—Reaction chambers; Selection of materials therefor
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Recrystallisation Techniques (AREA)
Abstract
PURPOSE:To avoid the leakage of toxic and detrimental gases by providing a liquid tank which contains liquid for absorbing these gases to an exhaust tube connecting a process tube with a vacuum pump forming a heat treating apparatus. CONSTITUTION:A cap 4a is covered on the opening end of a process tube 1 having a gas inlet in the vicinity of an open end, and a fine tube 7 is connected to the other end. Then, wafers are aligned and placed on a boat 3, which is contained in the tube 1, the prescribed gas is fed from the inlet 5 through a tube 7 while heating them by a heater 2 provided on the outer periphery of the tube 1, and is evacuated by a vacuum pump 10. With this construction a liquid tank 9 which contains liquid, e.g., water for absorbing toxic and detrimental gases branched on the way of the tube 7 is provided, and liquid level position detecting sensor 91, a liquid inlet 92, a liquid outlet 93 and a check valve 94 are provided therein. Thus, the exhaust gases are all passed through the liquid in the tank 9 to remove the remaining gases, e.g., HCl, PH3, etc. and are then externally exhausted from the outlet 6.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12571380A JPS5749218A (en) | 1980-09-08 | 1980-09-08 | Heat treating apparatus |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12571380A JPS5749218A (en) | 1980-09-08 | 1980-09-08 | Heat treating apparatus |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5749218A true JPS5749218A (en) | 1982-03-23 |
Family
ID=14916897
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP12571380A Pending JPS5749218A (en) | 1980-09-08 | 1980-09-08 | Heat treating apparatus |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5749218A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007272010A (en) * | 2006-03-31 | 2007-10-18 | Mitsubishi Electric Corp | Manufacturing method for liquid crystal display device |
-
1980
- 1980-09-08 JP JP12571380A patent/JPS5749218A/en active Pending
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2007272010A (en) * | 2006-03-31 | 2007-10-18 | Mitsubishi Electric Corp | Manufacturing method for liquid crystal display device |
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