JPS5741368A - Vacuum treatment chamber containing trap member - Google Patents
Vacuum treatment chamber containing trap memberInfo
- Publication number
- JPS5741368A JPS5741368A JP11647780A JP11647780A JPS5741368A JP S5741368 A JPS5741368 A JP S5741368A JP 11647780 A JP11647780 A JP 11647780A JP 11647780 A JP11647780 A JP 11647780A JP S5741368 A JPS5741368 A JP S5741368A
- Authority
- JP
- Japan
- Prior art keywords
- impurities
- trap member
- capturing
- vacuum
- backflowing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Furnace Details (AREA)
- Drying Of Semiconductors (AREA)
Abstract
PURPOSE:To prevent effluent and backflowing impurities from intruding into articles by suitably disposing a trap member which is provided with a capturing surface cooled by a sub-zero refrigerant and has venting parts in a vacuum chamber. CONSTITUTION:After the inside of a vacuum vessle 11 is roughly evacuated with a rough evacuating system 12, the system 12 is shut off, and a high vacuum is developed by a cryogenic pump 13. For example, gaseous Ar is introduced from a gaseous source 15 and an article 16 to be treated is subjected to sputtering treatment. At this time, a sub-zero refrigerant is flowed in a trap member 20 so that the surface of a tube 21 forming the coil serves as a capturing surface for condensing and capturing impurities. The clearances between the turns and upper and lower opening parts of the coil form venting parts that permit passage of the gas. Then, effluent impurities, backflowing impurities and other impurities are condensed and captured without hampering the maintenance of a required low pressure atmosphere, and the intrusion of these impurities into the article 16 to be treated is prevented.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11647780A JPS5741368A (en) | 1980-08-26 | 1980-08-26 | Vacuum treatment chamber containing trap member |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP11647780A JPS5741368A (en) | 1980-08-26 | 1980-08-26 | Vacuum treatment chamber containing trap member |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5741368A true JPS5741368A (en) | 1982-03-08 |
Family
ID=14688067
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP11647780A Pending JPS5741368A (en) | 1980-08-26 | 1980-08-26 | Vacuum treatment chamber containing trap member |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5741368A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57133633A (en) * | 1981-02-13 | 1982-08-18 | Anelva Corp | Dry-etching device |
JPS5912865U (en) * | 1982-07-17 | 1984-01-26 | 日本真空技術株式会社 | Vacuum film forming equipment |
JPS5980461U (en) * | 1982-11-18 | 1984-05-31 | 三洋電機株式会社 | vacuum equipment |
JPH02138424U (en) * | 1990-03-02 | 1990-11-19 |
-
1980
- 1980-08-26 JP JP11647780A patent/JPS5741368A/en active Pending
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57133633A (en) * | 1981-02-13 | 1982-08-18 | Anelva Corp | Dry-etching device |
JPS5912865U (en) * | 1982-07-17 | 1984-01-26 | 日本真空技術株式会社 | Vacuum film forming equipment |
JPS5980461U (en) * | 1982-11-18 | 1984-05-31 | 三洋電機株式会社 | vacuum equipment |
JPH02138424U (en) * | 1990-03-02 | 1990-11-19 |
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