JPS5735393A - Semiconductor laser - Google Patents

Semiconductor laser

Info

Publication number
JPS5735393A
JPS5735393A JP11196580A JP11196580A JPS5735393A JP S5735393 A JPS5735393 A JP S5735393A JP 11196580 A JP11196580 A JP 11196580A JP 11196580 A JP11196580 A JP 11196580A JP S5735393 A JPS5735393 A JP S5735393A
Authority
JP
Japan
Prior art keywords
layer
type
substrate
semiconductor
current
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11196580A
Other languages
Japanese (ja)
Inventor
Etsuji Omura
Hirobumi Namisaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP11196580A priority Critical patent/JPS5735393A/en
Publication of JPS5735393A publication Critical patent/JPS5735393A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S5/00Semiconductor lasers
    • H01S5/20Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
    • H01S5/22Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
    • H01S5/2203Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure with a transverse junction stripe [TJS] structure

Landscapes

  • Semiconductor Lasers (AREA)

Abstract

PURPOSE:To make a semiconductor laser device to generate no reactive current and to contrive to reduce the threshold current thereof by a method wherein when the necessary semiconductor layers are to be formed in order on a semiconductor substrate, a transparent N type semiconductor layer is formed between the substrate and a P type semiconductor layer to be jointed to the substrate. CONSTITUTION:A P type GaAlAs layer 102, an N type GaAl layer 103, an N type GaAs active layer 104, and an N type GaAlAs layer 105 are made to grow in order on an I type GaAs substrate 101 by the liquid phase epitaxial growth technique, etc. At this time, an N type GaAlAs layer 301 is formed between the substrate 101 and the P type layer 102, and the forbidden band gap of the N type layer 301 is made as broader than that of the active layer 104 as to become transparent to radiation of an active region 111 Therefore because excitation of a pair of electron and hole to be caused by absorption of light in a degenerated layer 112 is not generated, the Fermi level of the N type layer 301 is held at a constant, and a PN hetero junction 302 performs current blocking function. Accordingly the reactive current A is not generated, and reduction of the threshold current can be attained.
JP11196580A 1980-08-11 1980-08-11 Semiconductor laser Pending JPS5735393A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11196580A JPS5735393A (en) 1980-08-11 1980-08-11 Semiconductor laser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11196580A JPS5735393A (en) 1980-08-11 1980-08-11 Semiconductor laser

Publications (1)

Publication Number Publication Date
JPS5735393A true JPS5735393A (en) 1982-02-25

Family

ID=14574573

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11196580A Pending JPS5735393A (en) 1980-08-11 1980-08-11 Semiconductor laser

Country Status (1)

Country Link
JP (1) JPS5735393A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04146680A (en) * 1990-10-08 1992-05-20 Mitsubishi Electric Corp Manufacture of p-type compound semiconductor, semiconductor light emitting device and manufacture thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04146680A (en) * 1990-10-08 1992-05-20 Mitsubishi Electric Corp Manufacture of p-type compound semiconductor, semiconductor light emitting device and manufacture thereof

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