JPS5727548A - Scanning type electron microscope - Google Patents

Scanning type electron microscope

Info

Publication number
JPS5727548A
JPS5727548A JP10117480A JP10117480A JPS5727548A JP S5727548 A JPS5727548 A JP S5727548A JP 10117480 A JP10117480 A JP 10117480A JP 10117480 A JP10117480 A JP 10117480A JP S5727548 A JPS5727548 A JP S5727548A
Authority
JP
Japan
Prior art keywords
visual field
electron beam
sample
crt13
deflector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10117480A
Other languages
Japanese (ja)
Inventor
Naotake Saito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP10117480A priority Critical patent/JPS5727548A/en
Publication of JPS5727548A publication Critical patent/JPS5727548A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)

Abstract

PURPOSE:To substantially remove contamination of the objective visual field of a sample to be observed without using high vacuum and obtain a high resolution scanning image by irradiating an electron beam on the objective visual field through the operation of a visual field shifting circuit. CONSTITUTION:The electron beam 1 which is emitted from an electron gun 5 is converged on a sample 2. The secondary electron signals 9 which are generated from the surface of the sample 2 are detected 10, amplified 11, and displayed on the screen of a CRT13 as an image. The electron beam 1 which irradiates the surface of the sample 2 is scanned two-dimensionally. This scanning sends the electrical signal which is driven by a deflection power supply 16 to a deflector 7, through a magnification converter 19 and thus deflects electron beam. Since the deflection power supply 16 synchronizes with the deflector 7 and drives the deflector 14 of the CRT13, the secondary electron signals 9 which synchronize with the electron beam on the sample 2 are displayed on the CRT13. When the magnification converter 19 and the visual field shifting circuit 20 are at operating status, the electron beam 1 is irradiated at the visual field near-by which is not overlapped with the objective visual field and magnification is also improved.
JP10117480A 1980-07-25 1980-07-25 Scanning type electron microscope Pending JPS5727548A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10117480A JPS5727548A (en) 1980-07-25 1980-07-25 Scanning type electron microscope

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10117480A JPS5727548A (en) 1980-07-25 1980-07-25 Scanning type electron microscope

Publications (1)

Publication Number Publication Date
JPS5727548A true JPS5727548A (en) 1982-02-13

Family

ID=14293636

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10117480A Pending JPS5727548A (en) 1980-07-25 1980-07-25 Scanning type electron microscope

Country Status (1)

Country Link
JP (1) JPS5727548A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62169458U (en) * 1986-04-17 1987-10-27
WO2003021186A1 (en) * 2001-08-29 2003-03-13 Hitachi, Ltd. Method for measuring dimensions of sample and scanning electron microscope

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5339847A (en) * 1976-09-24 1978-04-12 Hitachi Ltd Scanning electronic microscope
JPS5543714A (en) * 1978-09-20 1980-03-27 Jeol Ltd Electron beam irradiating method and device for electronic microscope

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5339847A (en) * 1976-09-24 1978-04-12 Hitachi Ltd Scanning electronic microscope
JPS5543714A (en) * 1978-09-20 1980-03-27 Jeol Ltd Electron beam irradiating method and device for electronic microscope

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62169458U (en) * 1986-04-17 1987-10-27
WO2003021186A1 (en) * 2001-08-29 2003-03-13 Hitachi, Ltd. Method for measuring dimensions of sample and scanning electron microscope
US7659508B2 (en) 2001-08-29 2010-02-09 Hitachi, Ltd. Method for measuring dimensions of sample and scanning electron microscope
US8080789B2 (en) 2001-08-29 2011-12-20 Hitachi, Ltd. Sample dimension measuring method and scanning electron microscope

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