JPS5722129A - Production of optical glass - Google Patents
Production of optical glassInfo
- Publication number
- JPS5722129A JPS5722129A JP9575780A JP9575780A JPS5722129A JP S5722129 A JPS5722129 A JP S5722129A JP 9575780 A JP9575780 A JP 9575780A JP 9575780 A JP9575780 A JP 9575780A JP S5722129 A JPS5722129 A JP S5722129A
- Authority
- JP
- Japan
- Prior art keywords
- optical glass
- hydroxide
- och3
- mol
- silica gel
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/12—Other methods of shaping glass by liquid-phase reaction processes
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C1/00—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels
- C03C1/006—Ingredients generally applicable to manufacture of glasses, glazes, or vitreous enamels to produce glass through wet route
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/20—Wet processes, e.g. sol-gel process
- C03C2203/26—Wet processes, e.g. sol-gel process using alkoxides
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/20—Wet processes, e.g. sol-gel process
- C03C2203/30—Additives
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/50—After-treatment
- C03C2203/52—Heat-treatment
- C03C2203/54—Heat-treatment in a dopant containing atmosphere
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Silicon Compounds (AREA)
- Glass Melting And Manufacturing (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
- Glass Compositions (AREA)
Abstract
PURPOSE:Si(OCH3)4 is hydrolyzed using water containing a hydroxide of monovalent metal at a specific ratio and the resultant porous silica gel is heated to produce the objective optical glass with no damage on the heat treatment process in high yield. CONSTITUTION:The water containing a hydroxide of monovalent metal such as sodium hydroxide by 10<-2>-3X10<-4>mol/l, preferably 10<-2>-10<-3>mol/1 is used to hydrolyze Si(OC3)4. Then, the resultant silica gel is heated successively in an oxidative atmosphere, a chlorine-containing atmosphere and vacuum or helium-containing atmosphere to produce the objective optical glass. At least one selected from Ge, P, B, Al, Sb, Ti, Zr, Sn and others is included in the glass by adding their compounds to the Si(OCH3)4.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9575780A JPS599499B2 (en) | 1980-07-15 | 1980-07-15 | Optical glass manufacturing method |
GB8112800A GB2075003B (en) | 1980-04-28 | 1981-04-24 | Method for producing optical glass |
DE19813116883 DE3116883C2 (en) | 1980-04-28 | 1981-04-28 | Process for the production of optical glass by sintering a silica gel |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9575780A JPS599499B2 (en) | 1980-07-15 | 1980-07-15 | Optical glass manufacturing method |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5722129A true JPS5722129A (en) | 1982-02-05 |
JPS599499B2 JPS599499B2 (en) | 1984-03-02 |
Family
ID=14146357
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9575780A Expired JPS599499B2 (en) | 1980-04-28 | 1980-07-15 | Optical glass manufacturing method |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS599499B2 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59116134A (en) * | 1982-12-23 | 1984-07-04 | Seiko Epson Corp | Manufacture of quartz glass |
WO1984002519A1 (en) * | 1982-12-23 | 1984-07-05 | Suwa Seikosha Kk | Process for producing quartz glass |
JPS59156935A (en) * | 1983-02-22 | 1984-09-06 | Osaka Suiso Kogyo Kk | Manufacture of silica glass |
KR20000060200A (en) * | 1999-03-12 | 2000-10-16 | 윤종용 | Manufacturing method of silica glass for sol-gel process |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61158823U (en) * | 1985-03-26 | 1986-10-02 |
-
1980
- 1980-07-15 JP JP9575780A patent/JPS599499B2/en not_active Expired
Cited By (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59116134A (en) * | 1982-12-23 | 1984-07-04 | Seiko Epson Corp | Manufacture of quartz glass |
WO1984002519A1 (en) * | 1982-12-23 | 1984-07-05 | Suwa Seikosha Kk | Process for producing quartz glass |
US4681615A (en) * | 1982-12-23 | 1987-07-21 | Seiko Epson Kabushiki Kaisha | Silica glass formation process |
JPS64330B2 (en) * | 1982-12-23 | 1989-01-06 | Seiko Epson Corp | |
US4801318A (en) * | 1982-12-23 | 1989-01-31 | Seiko Epson Corporation | Silica glass formation process |
JPS59156935A (en) * | 1983-02-22 | 1984-09-06 | Osaka Suiso Kogyo Kk | Manufacture of silica glass |
KR20000060200A (en) * | 1999-03-12 | 2000-10-16 | 윤종용 | Manufacturing method of silica glass for sol-gel process |
Also Published As
Publication number | Publication date |
---|---|
JPS599499B2 (en) | 1984-03-02 |
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