JPS57211729A - Furnace for semiconductor heat treatment - Google Patents

Furnace for semiconductor heat treatment

Info

Publication number
JPS57211729A
JPS57211729A JP9774281A JP9774281A JPS57211729A JP S57211729 A JPS57211729 A JP S57211729A JP 9774281 A JP9774281 A JP 9774281A JP 9774281 A JP9774281 A JP 9774281A JP S57211729 A JPS57211729 A JP S57211729A
Authority
JP
Japan
Prior art keywords
semiconductor substrates
gas
cooled
cooling chamber
cooling
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9774281A
Other languages
Japanese (ja)
Inventor
Shuji Watanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP9774281A priority Critical patent/JPS57211729A/en
Publication of JPS57211729A publication Critical patent/JPS57211729A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67098Apparatus for thermal treatment
    • H01L21/67109Apparatus for thermal treatment mainly by convection

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)

Abstract

PURPOSE:To cool heat-treated semiconductor substrates in a short time with good efficiency, by providing a cooling part which cools semiconductor substrates being taken out adjacent to the opening of a furnace core tube for heat treatment. CONSTITUTION:A gas cooling chamber 22 with a plurality of cooling gas spout holes 23 on the peripheral wall thereof is provided in continuity to a treatment gas exhaust part 4 installed on the opening 3 of the furnace core tube 2. A photosensor 24 constituted of an LED 24a and photo detector 24b is arranged on the end part in the side of the exhaust part 4 to detect cooled materials taken into the gas cooling chamber 22. On the bottom part of the gas cooling chamber 22, a thermocouple 27 to measure the temperature of the cooled semiconductor substrates 6 is installed for the constitution of a system cooling automatically cooled materials down to a constant temperature. In this manner, the heat- treated semiconductor substrates 6 can be automatically cooled in a short time.
JP9774281A 1981-06-23 1981-06-23 Furnace for semiconductor heat treatment Pending JPS57211729A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9774281A JPS57211729A (en) 1981-06-23 1981-06-23 Furnace for semiconductor heat treatment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9774281A JPS57211729A (en) 1981-06-23 1981-06-23 Furnace for semiconductor heat treatment

Publications (1)

Publication Number Publication Date
JPS57211729A true JPS57211729A (en) 1982-12-25

Family

ID=14200338

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9774281A Pending JPS57211729A (en) 1981-06-23 1981-06-23 Furnace for semiconductor heat treatment

Country Status (1)

Country Link
JP (1) JPS57211729A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS64328U (en) * 1987-06-22 1989-01-05
JPH02296321A (en) * 1989-05-10 1990-12-06 Mitsubishi Electric Corp Semiconductor manufacturing device
US5259883A (en) * 1988-02-16 1993-11-09 Kabushiki Kaisha Toshiba Method of thermally processing semiconductor wafers and an apparatus therefor
JP2010186778A (en) * 2009-02-10 2010-08-26 Koyo Thermo System Kk Cooler, and cooling method
US20110079047A1 (en) * 2009-10-02 2011-04-07 Japan Super Quartz Corporation Apparatus and method for manufacturing vitreous silica crucible
CN109211426A (en) * 2018-10-12 2019-01-15 中国航发沈阳发动机研究所 A kind of air cooling total temperature detector probe gauge head

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS64328U (en) * 1987-06-22 1989-01-05
US5259883A (en) * 1988-02-16 1993-11-09 Kabushiki Kaisha Toshiba Method of thermally processing semiconductor wafers and an apparatus therefor
JPH02296321A (en) * 1989-05-10 1990-12-06 Mitsubishi Electric Corp Semiconductor manufacturing device
JP2010186778A (en) * 2009-02-10 2010-08-26 Koyo Thermo System Kk Cooler, and cooling method
US20110079047A1 (en) * 2009-10-02 2011-04-07 Japan Super Quartz Corporation Apparatus and method for manufacturing vitreous silica crucible
KR101285455B1 (en) * 2009-10-02 2013-07-12 쟈판 스파 쿼츠 가부시키가이샤 Apparatus and method for manufacturing virteous silica crucible
US8844321B2 (en) * 2009-10-02 2014-09-30 Japan Super Quartz Corporation Apparatus and method for manufacturing vitreous silica crucible
CN109211426A (en) * 2018-10-12 2019-01-15 中国航发沈阳发动机研究所 A kind of air cooling total temperature detector probe gauge head
CN109211426B (en) * 2018-10-12 2020-04-21 中国航发沈阳发动机研究所 Air-cooled total temperature sensing part measuring head

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