JPS57211047A - Measuring apparatus - Google Patents

Measuring apparatus

Info

Publication number
JPS57211047A
JPS57211047A JP56096260A JP9626081A JPS57211047A JP S57211047 A JPS57211047 A JP S57211047A JP 56096260 A JP56096260 A JP 56096260A JP 9626081 A JP9626081 A JP 9626081A JP S57211047 A JPS57211047 A JP S57211047A
Authority
JP
Japan
Prior art keywords
ray
irradiated
crystal
rocking curve
ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP56096260A
Other languages
Japanese (ja)
Inventor
Jiyunji Matsui
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP56096260A priority Critical patent/JPS57211047A/en
Publication of JPS57211047A publication Critical patent/JPS57211047A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials

Landscapes

  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

PURPOSE:To measure a lattice constant in the thickness direction or an inclination variation of the lattice face without touching a sample, by irradiating an ion on the surface of a sample to be inspected and measuring an X-ray rocking curve etching physically. CONSTITUTION:Characteristic X-rays 2 generated from an X-ray generating tube 1 are irradiated to a monochrometer crystal 3 and are collimated monochromatically and then, a part of this monochromatic parallel X-ray 4 is cut by a slit 5. Hereafter, said X-ray 4 is irradiated to a crystal to be inspected 8 through an X-ray window provided to a vacuum vessel 6. An X-ray rocking curve is obtained by recording the intensity of detected diffraction X-ray by an X-ray detector 10 rotating the crystal 8 slowly. After this curve is measured, the surface of an epitaxial layer 82 is etched physically by an ion beam 12 of hellium, etc. irradiated from an ion gun 11 which is provided to the inner part of a vacuum vessel 6 and after that, the X-ray rocking curve is measured again.
JP56096260A 1981-06-22 1981-06-22 Measuring apparatus Pending JPS57211047A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56096260A JPS57211047A (en) 1981-06-22 1981-06-22 Measuring apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56096260A JPS57211047A (en) 1981-06-22 1981-06-22 Measuring apparatus

Publications (1)

Publication Number Publication Date
JPS57211047A true JPS57211047A (en) 1982-12-24

Family

ID=14160210

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56096260A Pending JPS57211047A (en) 1981-06-22 1981-06-22 Measuring apparatus

Country Status (1)

Country Link
JP (1) JPS57211047A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6188131A (en) * 1984-10-05 1986-05-06 Shimadzu Corp X-ray microanalyzer

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49129589A (en) * 1973-04-13 1974-12-11

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS49129589A (en) * 1973-04-13 1974-12-11

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6188131A (en) * 1984-10-05 1986-05-06 Shimadzu Corp X-ray microanalyzer
JPH0736005B2 (en) * 1984-10-05 1995-04-19 株式会社島津製作所 Surface layer analysis method

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