JPS57206172A - Electrostatic deflecting device for charged particle beam - Google Patents

Electrostatic deflecting device for charged particle beam

Info

Publication number
JPS57206172A
JPS57206172A JP9090081A JP9090081A JPS57206172A JP S57206172 A JPS57206172 A JP S57206172A JP 9090081 A JP9090081 A JP 9090081A JP 9090081 A JP9090081 A JP 9090081A JP S57206172 A JPS57206172 A JP S57206172A
Authority
JP
Japan
Prior art keywords
electrodes
deflecting
main
voltage
application
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP9090081A
Other languages
Japanese (ja)
Inventor
Hirobumi Morita
Teruo Hosokawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Telegraph and Telephone Corp
Original Assignee
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Telegraph and Telephone Corp filed Critical Nippon Telegraph and Telephone Corp
Priority to JP9090081A priority Critical patent/JPS57206172A/en
Publication of JPS57206172A publication Critical patent/JPS57206172A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/147Arrangements for directing or deflecting the discharge along a desired path

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Details Of Television Scanning (AREA)

Abstract

PURPOSE:To miniaturize the titled deflecting device as well as to simplify the matching of axes between the main and secondary deflecting devices and to decrease the aberration caused by the secondary deflection, by forming the main and secondary deflecting devices into a body. CONSTITUTION:The electrostatic deflecting electrodes D1-D8 having the same shape of a cylinder, rod, flat plate, circular arc, etc. are distributed opposite to each other with a 45 deg. center angle and along the beam projecting paths. A group of the electrodes D1, D3, D5 and D7 among 8 electrodes in all is used for the main deflection purpose with application of a high level of deflecting voltage. While the rest electrodes D2, D4, D6 and D8 are used for the secondary deflection purpose with application of a low level of voltage. With application of the voltage, these main and secondary deflecting electrodes form an electric field of a simple addition of equivalent electric fields at the center part of these electrodes if the partner electrodes are earthed to each other. In such way, the main and secondary deflecting devices are formed into a body.
JP9090081A 1981-06-15 1981-06-15 Electrostatic deflecting device for charged particle beam Pending JPS57206172A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9090081A JPS57206172A (en) 1981-06-15 1981-06-15 Electrostatic deflecting device for charged particle beam

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9090081A JPS57206172A (en) 1981-06-15 1981-06-15 Electrostatic deflecting device for charged particle beam

Publications (1)

Publication Number Publication Date
JPS57206172A true JPS57206172A (en) 1982-12-17

Family

ID=14011266

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9090081A Pending JPS57206172A (en) 1981-06-15 1981-06-15 Electrostatic deflecting device for charged particle beam

Country Status (1)

Country Link
JP (1) JPS57206172A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6288247A (en) * 1985-10-14 1987-04-22 Fujitsu Ltd Electron beam exposure device
EP1033738A1 (en) * 1999-02-24 2000-09-06 Leica Microsystems Lithography GmbH Device for the electrostatic deflection of a particle beam
EP1688964A2 (en) * 2005-02-04 2006-08-09 Leica Microsystems Lithography GmbH Electrostatic deflection system for corpuscular radiation
JP2017143034A (en) * 2016-02-12 2017-08-17 東方晶源微電子科技(北京)有限公司 Image acquisition method and electron beam inspection/length measurement device

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5548610B2 (en) * 1973-05-18 1980-12-06

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5548610B2 (en) * 1973-05-18 1980-12-06

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6288247A (en) * 1985-10-14 1987-04-22 Fujitsu Ltd Electron beam exposure device
EP1033738A1 (en) * 1999-02-24 2000-09-06 Leica Microsystems Lithography GmbH Device for the electrostatic deflection of a particle beam
EP1688964A2 (en) * 2005-02-04 2006-08-09 Leica Microsystems Lithography GmbH Electrostatic deflection system for corpuscular radiation
EP1688964A3 (en) * 2005-02-04 2008-08-13 Leica Microsystems Lithography GmbH Electrostatic deflection system for corpuscular radiation
US7491946B2 (en) 2005-02-04 2009-02-17 Leica Microsystems Lithography Gmbh Electrostatic deflection system for corpuscular radiation
JP2017143034A (en) * 2016-02-12 2017-08-17 東方晶源微電子科技(北京)有限公司 Image acquisition method and electron beam inspection/length measurement device

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