JPS57182152A - Diffraction device - Google Patents
Diffraction deviceInfo
- Publication number
- JPS57182152A JPS57182152A JP57065246A JP6524682A JPS57182152A JP S57182152 A JPS57182152 A JP S57182152A JP 57065246 A JP57065246 A JP 57065246A JP 6524682 A JP6524682 A JP 6524682A JP S57182152 A JPS57182152 A JP S57182152A
- Authority
- JP
- Japan
- Prior art keywords
- diffraction device
- diffraction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
- G21K2201/062—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements the element being a crystal
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
- G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
- G21K2201/068—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements specially adapted for particle beams
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US25597481A | 1981-04-20 | 1981-04-20 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57182152A true JPS57182152A (en) | 1982-11-09 |
JPH0421840B2 JPH0421840B2 (ja) | 1992-04-14 |
Family
ID=22970630
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP57065246A Granted JPS57182152A (en) | 1981-04-20 | 1982-04-19 | Diffraction device |
Country Status (6)
Country | Link |
---|---|
JP (1) | JPS57182152A (ja) |
CA (1) | CA1183285A (ja) |
DE (1) | DE3214611A1 (ja) |
FR (1) | FR2504308B1 (ja) |
IT (1) | IT1150848B (ja) |
NL (1) | NL8201621A (ja) |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60111125A (ja) * | 1983-11-21 | 1985-06-17 | Hitachi Ltd | モノクロメ−タ |
JPS61197547U (ja) * | 1985-05-29 | 1986-12-10 | ||
US4699509A (en) * | 1984-04-21 | 1987-10-13 | Nippon Soken, Inc. | Device for measuring contamination of lubricant |
JPH02179500A (ja) * | 1988-12-29 | 1990-07-12 | Shimadzu Corp | 軟x線用フレネルゾーンプレート |
JPH0692946B2 (ja) * | 1988-06-16 | 1994-11-16 | フラウンホッファー―ゲゼルシャフト ツァ フェルダールング デァ アンゲヴァンテン フォアシュンク エー.ファオ. | 隔膜表面の構造を検査する方法及び装置 |
JP2008170236A (ja) * | 2007-01-10 | 2008-07-24 | High Energy Accelerator Research Organization | X線及び中性子線の反射率曲線測定方法及び測定装置 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4525853A (en) * | 1983-10-17 | 1985-06-25 | Energy Conversion Devices, Inc. | Point source X-ray focusing device |
JPH0782117B2 (ja) * | 1989-02-23 | 1995-09-06 | オリンパス光学工業株式会社 | 反射型結像光学系 |
US5802137A (en) * | 1993-08-16 | 1998-09-01 | Commonwealth Scientific And Industrial Research | X-ray optics, especially for phase contrast imaging |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50144678U (ja) * | 1974-05-15 | 1975-11-29 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3777156A (en) * | 1972-02-14 | 1973-12-04 | Hewlett Packard Co | Bent diffraction crystal with geometrical aberration compensation |
US4012843A (en) * | 1973-04-25 | 1977-03-22 | Hitachi, Ltd. | Concave diffraction grating and a manufacturing method thereof |
US3980883A (en) * | 1973-05-15 | 1976-09-14 | National Research Development Corporation | X-ray diffraction gratings |
US3991309A (en) * | 1975-07-09 | 1976-11-09 | University Of Rochester | Methods and apparatus for the control and analysis of X-rays |
US4132654A (en) * | 1976-07-02 | 1979-01-02 | The Machlett Laboratories, Inc. | X-ray focal spot test system |
US4192994A (en) * | 1978-09-18 | 1980-03-11 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Diffractoid grating configuration for X-ray and ultraviolet focusing |
-
1982
- 1982-04-15 CA CA000401037A patent/CA1183285A/en not_active Expired
- 1982-04-19 JP JP57065246A patent/JPS57182152A/ja active Granted
- 1982-04-19 FR FR8206676A patent/FR2504308B1/fr not_active Expired
- 1982-04-19 NL NL8201621A patent/NL8201621A/nl unknown
- 1982-04-19 IT IT20815/82A patent/IT1150848B/it active
- 1982-04-20 DE DE19823214611 patent/DE3214611A1/de not_active Withdrawn
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS50144678U (ja) * | 1974-05-15 | 1975-11-29 |
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60111125A (ja) * | 1983-11-21 | 1985-06-17 | Hitachi Ltd | モノクロメ−タ |
US4699509A (en) * | 1984-04-21 | 1987-10-13 | Nippon Soken, Inc. | Device for measuring contamination of lubricant |
JPS61197547U (ja) * | 1985-05-29 | 1986-12-10 | ||
JPH0515120Y2 (ja) * | 1985-05-29 | 1993-04-21 | ||
JPH0692946B2 (ja) * | 1988-06-16 | 1994-11-16 | フラウンホッファー―ゲゼルシャフト ツァ フェルダールング デァ アンゲヴァンテン フォアシュンク エー.ファオ. | 隔膜表面の構造を検査する方法及び装置 |
JPH02179500A (ja) * | 1988-12-29 | 1990-07-12 | Shimadzu Corp | 軟x線用フレネルゾーンプレート |
JP2008170236A (ja) * | 2007-01-10 | 2008-07-24 | High Energy Accelerator Research Organization | X線及び中性子線の反射率曲線測定方法及び測定装置 |
JP4521573B2 (ja) * | 2007-01-10 | 2010-08-11 | 大学共同利用機関法人 高エネルギー加速器研究機構 | 中性子線の反射率曲線測定方法及び測定装置 |
Also Published As
Publication number | Publication date |
---|---|
FR2504308A1 (fr) | 1982-10-22 |
NL8201621A (nl) | 1982-11-16 |
JPH0421840B2 (ja) | 1992-04-14 |
CA1183285A (en) | 1985-02-26 |
DE3214611A1 (de) | 1982-11-04 |
IT8220815A0 (it) | 1982-04-19 |
IT1150848B (it) | 1986-12-17 |
FR2504308B1 (fr) | 1988-09-02 |
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