JPS5717144A - Evaluation of film quality for wiring metal film in semiconductor device - Google Patents
Evaluation of film quality for wiring metal film in semiconductor deviceInfo
- Publication number
- JPS5717144A JPS5717144A JP9174480A JP9174480A JPS5717144A JP S5717144 A JPS5717144 A JP S5717144A JP 9174480 A JP9174480 A JP 9174480A JP 9174480 A JP9174480 A JP 9174480A JP S5717144 A JPS5717144 A JP S5717144A
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- potential
- sample
- wiring metal
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
Abstract
PURPOSE:To evaluate the film quality of a wiring metal film by putting a standard electrode and an electrode working as a tested sample in a strong acid etching solution wherein the electric potential generated by the electrodes is detected by a potentiostud. CONSTITUTION:With an aluminum standard electrode 4 and an aluminum measuring sample 5 immersed in an aqueous strong acid solution 2, etching is started. At that time, a natural electrode potential is generated between a platinum electrode 3 and the sample 5 and the potential is recorded by a recorder 9 through a potentiometer 7. Furthermore, a natural electrode potential is simultaneously generated between the electrode 4 and the sample 5 and the potential is recorded by a recorder 10 through a potentiometer 8. The above potentials vary by etching process. Therefore, measured samples can be tested by checking the values by the recorders 9, 10.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9174480A JPS5832781B2 (en) | 1980-07-07 | 1980-07-07 | Film quality evaluation method for metal films for semiconductor device wiring |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9174480A JPS5832781B2 (en) | 1980-07-07 | 1980-07-07 | Film quality evaluation method for metal films for semiconductor device wiring |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5717144A true JPS5717144A (en) | 1982-01-28 |
JPS5832781B2 JPS5832781B2 (en) | 1983-07-15 |
Family
ID=14035032
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9174480A Expired JPS5832781B2 (en) | 1980-07-07 | 1980-07-07 | Film quality evaluation method for metal films for semiconductor device wiring |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5832781B2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS602750U (en) * | 1983-06-21 | 1985-01-10 | ダイキン工業株式会社 | air conditioning duct |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6238618Y2 (en) * | 1984-10-24 | 1987-10-01 |
-
1980
- 1980-07-07 JP JP9174480A patent/JPS5832781B2/en not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS602750U (en) * | 1983-06-21 | 1985-01-10 | ダイキン工業株式会社 | air conditioning duct |
Also Published As
Publication number | Publication date |
---|---|
JPS5832781B2 (en) | 1983-07-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
DE3779967D1 (en) | METHOD AND DEVICE FOR ELECTROCHEMICAL MEASUREMENTS. | |
CA2087720A1 (en) | Method for analytically utilizing microfabricated sensors during wet-up | |
DE2967619D1 (en) | Method and apparatus for measuring ph | |
ES471120A1 (en) | Method and apparatus for particle analysis | |
GB1516812A (en) | Means and method for measuring levels of ionic contamination | |
EP0107491A3 (en) | Electrochemical method of testing for surface-characteristics, and testing apparatus for use in the method | |
JPS5717144A (en) | Evaluation of film quality for wiring metal film in semiconductor device | |
Martin et al. | Differential Voltammetry Using Hanging Mercury Drop Electrode | |
JPH06213869A (en) | Method for monitoring main component in plating bath containing simultaneously attached component | |
US2962426A (en) | Electrochemical method for analyzing materials | |
SU1434353A1 (en) | Method of potentiometric measurement of hydrocyanic acid concentration in air | |
SU1500911A1 (en) | Method of determining energy of ionization of the surface condition | |
JPS57203943A (en) | Method of and apparatus for detecting concentration of metal ion | |
JPS5647751A (en) | Measuring method for concentration | |
SU819665A1 (en) | Method of determination of wet gas corrosivity | |
RU2062461C1 (en) | Electrochemical method of proximate identification of standard of fineness of golden alloys and electrolyte for this method | |
FR2366559A1 (en) | Corrosion analysis conducting and static electrochemical process - involving multiple electrode, electrolyte bath and EMF measurement | |
Podymov et al. | An Independent Apparatus for Measuring and Recording Electrode Potentials of Different Metals | |
GB1080940A (en) | Analysing apparatus | |
JPS5687802A (en) | Measuring method for surface area of solid body | |
JPS54105595A (en) | Assessing method of local corrosion susceptibility | |
IT1206382B (en) | Corrosion analysis conducting and static electrochemical process - involving multiple electrode, electrolyte bath and EMF measurement | |
FR2330002A1 (en) | Ion concentration measurement in liquid - is performed by comparison with reference liquid of variable ion concentration to achieve wide range | |
JPS5651657A (en) | Measuring method for ion concentration | |
Burgers et al. | Measurement of the crack length in a metal sheet with an electric potential method |