JPS57159821A - Production of photopolymer - Google Patents

Production of photopolymer

Info

Publication number
JPS57159821A
JPS57159821A JP4561481A JP4561481A JPS57159821A JP S57159821 A JPS57159821 A JP S57159821A JP 4561481 A JP4561481 A JP 4561481A JP 4561481 A JP4561481 A JP 4561481A JP S57159821 A JPS57159821 A JP S57159821A
Authority
JP
Japan
Prior art keywords
polymer
photopolymer
ultrafilter
filtrate
narrow
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4561481A
Other languages
Japanese (ja)
Other versions
JPS6324521B2 (en
Inventor
Yasutaka Ban
Nobuo Fujie
Hiroyuki Baba
Kazuo Toda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP4561481A priority Critical patent/JPS57159821A/en
Publication of JPS57159821A publication Critical patent/JPS57159821A/en
Publication of JPS6324521B2 publication Critical patent/JPS6324521B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

PURPOSE: To obtain a high-resolution photopolymer suitable as a photoresist used in the production of semiconductor devices, by subjecting a synthesized polymer to ultrafiltration to remove high-MW region compounds and to narrow the MW distribution.
CONSTITUTION: The purpose photopolymer is obtained by synthesizing a polymer suitable as a photopolymer (e.g., triallyl trimellitate polymer) and filtering the produced polymer solution through an ultrafilter to thereby high-MW region compounds. As the ultrafilter, there can be used, for example, a filter cylinder consisting of a stainless pipe in which an ultrafilter membrane is attached through a sponge layer. Then, a narrow-MW distribution polymer is obtained by passing the solution to be treated through the cylinder from its one end at a constant pressure, recovering a filtrate which does not contain high-MW region compounds from the holes provided in the pipe and then drying the filtrate.
COPYRIGHT: (C)1982,JPO&Japio
JP4561481A 1981-03-30 1981-03-30 Production of photopolymer Granted JPS57159821A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4561481A JPS57159821A (en) 1981-03-30 1981-03-30 Production of photopolymer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4561481A JPS57159821A (en) 1981-03-30 1981-03-30 Production of photopolymer

Publications (2)

Publication Number Publication Date
JPS57159821A true JPS57159821A (en) 1982-10-02
JPS6324521B2 JPS6324521B2 (en) 1988-05-20

Family

ID=12724246

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4561481A Granted JPS57159821A (en) 1981-03-30 1981-03-30 Production of photopolymer

Country Status (1)

Country Link
JP (1) JPS57159821A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60243105A (en) * 1984-05-17 1985-12-03 Osaka Soda Co Ltd Preparation of diallyl phthalate based polymer
EP0558102A2 (en) * 1991-12-27 1993-09-01 Sumitomo Chemical Company, Limited Resist composition and process for producing the same
EP1044394A1 (en) * 1998-01-16 2000-10-18 Olin Microelectronic Chemicals, Inc. Process for preparing a radiation-sensitive composition
WO2009063726A1 (en) * 2007-11-12 2009-05-22 Jsr Corporation Process for production of photoresist resins

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60243105A (en) * 1984-05-17 1985-12-03 Osaka Soda Co Ltd Preparation of diallyl phthalate based polymer
EP0558102A2 (en) * 1991-12-27 1993-09-01 Sumitomo Chemical Company, Limited Resist composition and process for producing the same
EP0558102A3 (en) * 1991-12-27 1994-11-02 Sumitomo Chemical Co Resist composition and process for producing the same
EP1044394A1 (en) * 1998-01-16 2000-10-18 Olin Microelectronic Chemicals, Inc. Process for preparing a radiation-sensitive composition
EP1044394A4 (en) * 1998-01-16 2001-04-04 Olin Microelectronic Chem Inc Process for preparing a radiation-sensitive composition
WO2009063726A1 (en) * 2007-11-12 2009-05-22 Jsr Corporation Process for production of photoresist resins

Also Published As

Publication number Publication date
JPS6324521B2 (en) 1988-05-20

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