JPS57159821A - Production of photopolymer - Google Patents
Production of photopolymerInfo
- Publication number
- JPS57159821A JPS57159821A JP4561481A JP4561481A JPS57159821A JP S57159821 A JPS57159821 A JP S57159821A JP 4561481 A JP4561481 A JP 4561481A JP 4561481 A JP4561481 A JP 4561481A JP S57159821 A JPS57159821 A JP S57159821A
- Authority
- JP
- Japan
- Prior art keywords
- polymer
- photopolymer
- ultrafilter
- filtrate
- narrow
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Polymerisation Methods In General (AREA)
Abstract
PURPOSE: To obtain a high-resolution photopolymer suitable as a photoresist used in the production of semiconductor devices, by subjecting a synthesized polymer to ultrafiltration to remove high-MW region compounds and to narrow the MW distribution.
CONSTITUTION: The purpose photopolymer is obtained by synthesizing a polymer suitable as a photopolymer (e.g., triallyl trimellitate polymer) and filtering the produced polymer solution through an ultrafilter to thereby high-MW region compounds. As the ultrafilter, there can be used, for example, a filter cylinder consisting of a stainless pipe in which an ultrafilter membrane is attached through a sponge layer. Then, a narrow-MW distribution polymer is obtained by passing the solution to be treated through the cylinder from its one end at a constant pressure, recovering a filtrate which does not contain high-MW region compounds from the holes provided in the pipe and then drying the filtrate.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4561481A JPS57159821A (en) | 1981-03-30 | 1981-03-30 | Production of photopolymer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4561481A JPS57159821A (en) | 1981-03-30 | 1981-03-30 | Production of photopolymer |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57159821A true JPS57159821A (en) | 1982-10-02 |
JPS6324521B2 JPS6324521B2 (en) | 1988-05-20 |
Family
ID=12724246
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4561481A Granted JPS57159821A (en) | 1981-03-30 | 1981-03-30 | Production of photopolymer |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57159821A (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60243105A (en) * | 1984-05-17 | 1985-12-03 | Osaka Soda Co Ltd | Preparation of diallyl phthalate based polymer |
EP0558102A2 (en) * | 1991-12-27 | 1993-09-01 | Sumitomo Chemical Company, Limited | Resist composition and process for producing the same |
EP1044394A1 (en) * | 1998-01-16 | 2000-10-18 | Olin Microelectronic Chemicals, Inc. | Process for preparing a radiation-sensitive composition |
WO2009063726A1 (en) * | 2007-11-12 | 2009-05-22 | Jsr Corporation | Process for production of photoresist resins |
-
1981
- 1981-03-30 JP JP4561481A patent/JPS57159821A/en active Granted
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60243105A (en) * | 1984-05-17 | 1985-12-03 | Osaka Soda Co Ltd | Preparation of diallyl phthalate based polymer |
EP0558102A2 (en) * | 1991-12-27 | 1993-09-01 | Sumitomo Chemical Company, Limited | Resist composition and process for producing the same |
EP0558102A3 (en) * | 1991-12-27 | 1994-11-02 | Sumitomo Chemical Co | Resist composition and process for producing the same |
EP1044394A1 (en) * | 1998-01-16 | 2000-10-18 | Olin Microelectronic Chemicals, Inc. | Process for preparing a radiation-sensitive composition |
EP1044394A4 (en) * | 1998-01-16 | 2001-04-04 | Olin Microelectronic Chem Inc | Process for preparing a radiation-sensitive composition |
WO2009063726A1 (en) * | 2007-11-12 | 2009-05-22 | Jsr Corporation | Process for production of photoresist resins |
Also Published As
Publication number | Publication date |
---|---|
JPS6324521B2 (en) | 1988-05-20 |
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