JPS57132654A - Gas ion source - Google Patents

Gas ion source

Info

Publication number
JPS57132654A
JPS57132654A JP19464881A JP19464881A JPS57132654A JP S57132654 A JPS57132654 A JP S57132654A JP 19464881 A JP19464881 A JP 19464881A JP 19464881 A JP19464881 A JP 19464881A JP S57132654 A JPS57132654 A JP S57132654A
Authority
JP
Japan
Prior art keywords
ion source
gas ion
gas
source
ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19464881A
Other languages
Japanese (ja)
Inventor
Aasaa Paashiyurei Neiru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DEYUBIRIE SAIENTEIFUITSUKU Ltd
Original Assignee
DEYUBIRIE SAIENTEIFUITSUKU Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by DEYUBIRIE SAIENTEIFUITSUKU Ltd filed Critical DEYUBIRIE SAIENTEIFUITSUKU Ltd
Publication of JPS57132654A publication Critical patent/JPS57132654A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00Ion beam tubes
    • H01J27/02Ion sources; Ion guns
    • H01J27/20Ion sources; Ion guns using particle beam bombardment, e.g. ionisers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06Sources
    • H01J2237/08Ion sources
    • H01J2237/0802Field ionization sources
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/06Sources
    • H01J2237/08Ion sources
    • H01J2237/0802Field ionization sources
    • H01J2237/0807Gas field ion sources [GFIS]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
JP19464881A 1980-12-04 1981-12-04 Gas ion source Pending JPS57132654A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB8038922 1980-12-04

Publications (1)

Publication Number Publication Date
JPS57132654A true JPS57132654A (en) 1982-08-17

Family

ID=10517754

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19464881A Pending JPS57132654A (en) 1980-12-04 1981-12-04 Gas ion source

Country Status (2)

Country Link
EP (1) EP0056899A1 (en)
JP (1) JPS57132654A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007227381A (en) * 2006-02-22 2007-09-06 Fei Co Particle optical device equipped with gas ion source

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57174467A (en) * 1981-04-20 1982-10-27 Inoue Japax Res Inc Ion working device
US4926056A (en) * 1988-06-10 1990-05-15 Sri International Microelectronic field ionizer and method of fabricating the same
US9941094B1 (en) 2017-02-01 2018-04-10 Fei Company Innovative source assembly for ion beam production

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3309873A (en) * 1964-08-31 1967-03-21 Electro Optical Systems Inc Plasma accelerator using hall currents
US3955090A (en) * 1973-12-27 1976-05-04 Exxon Nuclear Company, Inc. Sputtered particle flow source for isotopically selective ionization
DE2610165C2 (en) * 1976-03-11 1983-11-10 Gesellschaft für Schwerionenforschung mbH, 6100 Darmstadt Duoplasmatron ion source for generating multiply charged ions
DE2701395C3 (en) * 1977-01-14 1979-12-06 Dr. Franzen Analysentechnik Gmbh & Co Kg, 2800 Bremen Ion source for the chemical ionization of atoms and molecules

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007227381A (en) * 2006-02-22 2007-09-06 Fei Co Particle optical device equipped with gas ion source

Also Published As

Publication number Publication date
EP0056899A1 (en) 1982-08-04

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