JPS57126966A - Formation of thin film using mask - Google Patents

Formation of thin film using mask

Info

Publication number
JPS57126966A
JPS57126966A JP1205081A JP1205081A JPS57126966A JP S57126966 A JPS57126966 A JP S57126966A JP 1205081 A JP1205081 A JP 1205081A JP 1205081 A JP1205081 A JP 1205081A JP S57126966 A JPS57126966 A JP S57126966A
Authority
JP
Japan
Prior art keywords
mask
thickness
opening
film
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1205081A
Other languages
Japanese (ja)
Inventor
Junzo Toda
Yoshio Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP1205081A priority Critical patent/JPS57126966A/en
Publication of JPS57126966A publication Critical patent/JPS57126966A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C23C14/044—Coating on selected surface areas, e.g. using masks using masks using masks to redistribute rather than totally prevent coating, e.g. producing thickness gradient

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Magnetic Heads (AREA)

Abstract

PURPOSE:To generate difference of a film thickness to a film only by once mask fitting and adhesion of the film by partially differentiating a thickness or a shape in the peripheral part of a mask opening. CONSTITUTION:An opening 71 is provided to the mask 63 and the peripheral part of said opening is constituted, for example, from a part with a thickness of about 150mu and a part with a thickness of about 50mu. When sputtering of an alloy is carried out by using said mask 63, a permalloy alloy thin film 21 of which the thickness is about 4mu at a part under the opening encircled by the thick mask peripheral part and about 6mu at a part under the opening encircled by the thin mask peripheral part is formed. As described above, only by once film formation using the mask, the thin film of which the thickness is partially different can be formed.
JP1205081A 1981-01-29 1981-01-29 Formation of thin film using mask Pending JPS57126966A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1205081A JPS57126966A (en) 1981-01-29 1981-01-29 Formation of thin film using mask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1205081A JPS57126966A (en) 1981-01-29 1981-01-29 Formation of thin film using mask

Publications (1)

Publication Number Publication Date
JPS57126966A true JPS57126966A (en) 1982-08-06

Family

ID=11794765

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1205081A Pending JPS57126966A (en) 1981-01-29 1981-01-29 Formation of thin film using mask

Country Status (1)

Country Link
JP (1) JPS57126966A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5971115A (en) * 1982-10-15 1984-04-21 Hitachi Ltd Thin film head for vertical magnetic recording and reproduction
JPS6333555A (en) * 1986-07-25 1988-02-13 Anelva Corp Mask device for producing thin film recording medium

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5971115A (en) * 1982-10-15 1984-04-21 Hitachi Ltd Thin film head for vertical magnetic recording and reproduction
JPH0520802B2 (en) * 1982-10-15 1993-03-22 Hitachi Ltd
JPS6333555A (en) * 1986-07-25 1988-02-13 Anelva Corp Mask device for producing thin film recording medium

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