JPS57121227A - Resist applying device - Google Patents

Resist applying device

Info

Publication number
JPS57121227A
JPS57121227A JP668581A JP668581A JPS57121227A JP S57121227 A JPS57121227 A JP S57121227A JP 668581 A JP668581 A JP 668581A JP 668581 A JP668581 A JP 668581A JP S57121227 A JPS57121227 A JP S57121227A
Authority
JP
Japan
Prior art keywords
substrate
glass substrate
spinner
resist
thread
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP668581A
Other languages
Japanese (ja)
Other versions
JPS6217851B2 (en
Inventor
Toshiaki Tsurushima
Chuji Tawara
Nobuji Tsuchiya
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Tokyo Shibaura Electric Co Ltd filed Critical Toshiba Corp
Priority to JP668581A priority Critical patent/JPS57121227A/en
Publication of JPS57121227A publication Critical patent/JPS57121227A/en
Publication of JPS6217851B2 publication Critical patent/JPS6217851B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Coating Apparatus (AREA)

Abstract

PURPOSE:To prevent adhesion of a thread generated by scattering of a resist to the surface of a substrate by a method wherein a wall body to rotate together with a spinner is provided at the circumference of the spinner. CONSTITUTION:A means to prevent adhesion of the thread of drop of the photo resist scattered from the circumferential edge of the substrate to the photo resist applying face of the substrate is provided. When the glass substrate 15 is put thereon and the spinner is made to rotate, because the glass substrate 15 is fastened by substrate stoppers 141-144, the substrate is made to rotate together with the spinner. Accordingly when the photo resist is to be dropt on the surface of the glass substrate 15 to be applied, although the phot resist is scattered from the circumferential edge part of the glass substrate 15 drawing the thread, it is caught by the wall body 16 rotating with the same angular velocity. Moreover because the wall body 16 is inclined spreading out in a fan-shape, the drop falls down along the wall face, and adhesion on the glass substrate 15 can be prevented.
JP668581A 1981-01-20 1981-01-20 Resist applying device Granted JPS57121227A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP668581A JPS57121227A (en) 1981-01-20 1981-01-20 Resist applying device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP668581A JPS57121227A (en) 1981-01-20 1981-01-20 Resist applying device

Publications (2)

Publication Number Publication Date
JPS57121227A true JPS57121227A (en) 1982-07-28
JPS6217851B2 JPS6217851B2 (en) 1987-04-20

Family

ID=11645205

Family Applications (1)

Application Number Title Priority Date Filing Date
JP668581A Granted JPS57121227A (en) 1981-01-20 1981-01-20 Resist applying device

Country Status (1)

Country Link
JP (1) JPS57121227A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4674724A (en) * 1982-08-03 1987-06-23 Future Apparatus Corporation Collapsible stand especially for books
JPH02249225A (en) * 1989-03-22 1990-10-05 Fujitsu Ltd Resist coating apparatus
US5452905A (en) * 1990-08-03 1995-09-26 International Business Machines Corporation Spinning plate for substrates
JPH07288226A (en) * 1995-05-01 1995-10-31 Hoya Corp Spin chuck and processing-liquid applying method
CN108996468A (en) * 2018-06-29 2018-12-14 中国石油天然气股份有限公司 The packaging method and equipment of micron order glass etching model

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4916858A (en) * 1987-08-03 1990-04-17 Rubbermaid Incorporated Self-watering planter

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS544936A (en) * 1977-06-14 1979-01-16 Nat Jutaku Kenzai Rotary coating method of viscous material and apparatus therefor
JPS5472973A (en) * 1977-11-24 1979-06-11 Hitachi Ltd Rotary applying unit

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS544936A (en) * 1977-06-14 1979-01-16 Nat Jutaku Kenzai Rotary coating method of viscous material and apparatus therefor
JPS5472973A (en) * 1977-11-24 1979-06-11 Hitachi Ltd Rotary applying unit

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4674724A (en) * 1982-08-03 1987-06-23 Future Apparatus Corporation Collapsible stand especially for books
JPH02249225A (en) * 1989-03-22 1990-10-05 Fujitsu Ltd Resist coating apparatus
US5452905A (en) * 1990-08-03 1995-09-26 International Business Machines Corporation Spinning plate for substrates
JPH07288226A (en) * 1995-05-01 1995-10-31 Hoya Corp Spin chuck and processing-liquid applying method
CN108996468A (en) * 2018-06-29 2018-12-14 中国石油天然气股份有限公司 The packaging method and equipment of micron order glass etching model

Also Published As

Publication number Publication date
JPS6217851B2 (en) 1987-04-20

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