JPS57115548A - Photosensitive printing plate - Google Patents
Photosensitive printing plateInfo
- Publication number
- JPS57115548A JPS57115548A JP5405580A JP5405580A JPS57115548A JP S57115548 A JPS57115548 A JP S57115548A JP 5405580 A JP5405580 A JP 5405580A JP 5405580 A JP5405580 A JP 5405580A JP S57115548 A JPS57115548 A JP S57115548A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- particle size
- printing plate
- photosensitive
- silica
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/115—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having supports or layers with means for obtaining a screen effect or for obtaining better contact in vacuum printing
Landscapes
- Engineering & Computer Science (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
PURPOSE:To facilitate vacuum contact operation between an original image and a printing plate, by adding fine silica particles having a specified particle size or below this and hydrophobic surfaces and a matting agent having a specified particle size to the photosensitive layer of a photosensitive printing plate. CONSTITUTION:Silica fine particles has <=500nm average particle size and hydrophobic surfaces having a moisture content of <=2.0mg/100m<2> surface area in the air of 60% relative humidity and 20 deg.C, and they are colorless or white, light- transmitting, and 1.3-1.7 in refractive index. A photosensitive layer consisting of an o-quinonediazide compound, a diazo resin, a photosensitive azide compound, and a photopolymerizable compound is formed on a support, such as an aluminum plate or polyethylene terephthalate film. Said silica is added to said layer by 0.1-50% based on the total weight of said layer, and a matting agent having 3-40mum average particle size, made of polyethylene or the like synthetic resin, talc powder, titania powder, or the like is also added to said l ayer by 0.01-20% based on the total weight of said layer so as to give 50- 500,000 particles per cm<2> of the surface of said layer, thus permitting a printing plate easy in vacuum contact operation to be obtained.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5405580A JPS57115548A (en) | 1980-04-23 | 1980-04-23 | Photosensitive printing plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5405580A JPS57115548A (en) | 1980-04-23 | 1980-04-23 | Photosensitive printing plate |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS57115548A true JPS57115548A (en) | 1982-07-19 |
JPS6119027B2 JPS6119027B2 (en) | 1986-05-15 |
Family
ID=12959923
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP5405580A Granted JPS57115548A (en) | 1980-04-23 | 1980-04-23 | Photosensitive printing plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57115548A (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0161592A2 (en) * | 1984-05-12 | 1985-11-21 | Hoechst Aktiengesellschaft | Light-sensitive registration material for the production of lithographic printing plates |
JPS61252546A (en) * | 1985-05-01 | 1986-11-10 | Ueno Kagaku Kogyo Kk | Photosensitive resist ink and manufacture of ps plate by using it and method for etching this ps plate |
JPS6370841A (en) * | 1986-09-12 | 1988-03-31 | Kimoto & Co Ltd | Non-silver image forming material |
JPS63146045A (en) * | 1986-09-18 | 1988-06-18 | ナップ.システムズ(ユー.エス.エー)インコーポレイテッド | Photopolymerizing plate having mat surface |
US5576137A (en) * | 1993-10-18 | 1996-11-19 | Agfa-Gevaert Ag | Matted, radiation-sensitive recording material and printing plate |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH06173238A (en) * | 1992-03-13 | 1994-06-21 | Kiyooc Kk | Ridge cover |
-
1980
- 1980-04-23 JP JP5405580A patent/JPS57115548A/en active Granted
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0161592A2 (en) * | 1984-05-12 | 1985-11-21 | Hoechst Aktiengesellschaft | Light-sensitive registration material for the production of lithographic printing plates |
JPS61252546A (en) * | 1985-05-01 | 1986-11-10 | Ueno Kagaku Kogyo Kk | Photosensitive resist ink and manufacture of ps plate by using it and method for etching this ps plate |
JPS6370841A (en) * | 1986-09-12 | 1988-03-31 | Kimoto & Co Ltd | Non-silver image forming material |
JPS63146045A (en) * | 1986-09-18 | 1988-06-18 | ナップ.システムズ(ユー.エス.エー)インコーポレイテッド | Photopolymerizing plate having mat surface |
US5576137A (en) * | 1993-10-18 | 1996-11-19 | Agfa-Gevaert Ag | Matted, radiation-sensitive recording material and printing plate |
Also Published As
Publication number | Publication date |
---|---|
JPS6119027B2 (en) | 1986-05-15 |
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