JPS5710239A - Washing method and apparatus thereof - Google Patents

Washing method and apparatus thereof

Info

Publication number
JPS5710239A
JPS5710239A JP8288680A JP8288680A JPS5710239A JP S5710239 A JPS5710239 A JP S5710239A JP 8288680 A JP8288680 A JP 8288680A JP 8288680 A JP8288680 A JP 8288680A JP S5710239 A JPS5710239 A JP S5710239A
Authority
JP
Japan
Prior art keywords
water
washing
piston
tank
washing tank
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8288680A
Other languages
Japanese (ja)
Inventor
Tamotsu Sasaki
Yasumasa Takeuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP8288680A priority Critical patent/JPS5710239A/en
Publication of JPS5710239A publication Critical patent/JPS5710239A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Cleaning Or Drying Semiconductors (AREA)

Abstract

PURPOSE:To enhance washing effect and to shorten the processing time by saving washing water in the apparatus comprising a plurality of washing tanks used in semiconductor manufacturing processes and the like, by providing a water discharge mechanism in the first stage washing tank, and discharging the washing liquid in the first stage washing tank for every batch. CONSTITUTION:The washing water is supplied to the last stage washing tank 14 from a water source 16 through a perforated plate 22 at the bottom. The overflowed water is sequentially supplied to the preceding washing tank. Thus, e.g., the apparatus having three stages of tanks is obtained. In the first washing tank, wherein the objects to be washed are washed at first, are provided a cylinder 24 which drives an L shaped piston 26 up and down and a water outlet 28. When the piston 26 is moved down, the outlet 28 is closed, and the water is overflowed. When the piston 26 in moved up, the water is discharged. The upward movement of said piston 26 is performed for every batch of the object to be washed contained in a cartridge 30, and the highly contaminated water in the tank 10 is discharged. In this constitution, the washing effect can be enhanced, water can be saved, and the processing time can be shortened.
JP8288680A 1980-06-20 1980-06-20 Washing method and apparatus thereof Pending JPS5710239A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8288680A JPS5710239A (en) 1980-06-20 1980-06-20 Washing method and apparatus thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8288680A JPS5710239A (en) 1980-06-20 1980-06-20 Washing method and apparatus thereof

Publications (1)

Publication Number Publication Date
JPS5710239A true JPS5710239A (en) 1982-01-19

Family

ID=13786749

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8288680A Pending JPS5710239A (en) 1980-06-20 1980-06-20 Washing method and apparatus thereof

Country Status (1)

Country Link
JP (1) JPS5710239A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58142965U (en) * 1982-03-23 1983-09-27 日本電気ホームエレクトロニクス株式会社 Solvent cutting device
JPS58213495A (en) * 1982-06-07 1983-12-12 株式会社日立製作所 Cleaning device
JPH01137531U (en) * 1988-03-14 1989-09-20
JPH07100444A (en) * 1993-10-06 1995-04-18 Hitachi Zosen Corp Method and device for cleaning
CN107734870A (en) * 2017-09-26 2018-02-23 深圳明阳电路科技股份有限公司 A kind of rigid-flex combined board is except the method for boring dirt

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4962088A (en) * 1972-10-18 1974-06-15
JPS5271871A (en) * 1975-12-11 1977-06-15 Nec Corp Washing apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4962088A (en) * 1972-10-18 1974-06-15
JPS5271871A (en) * 1975-12-11 1977-06-15 Nec Corp Washing apparatus

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58142965U (en) * 1982-03-23 1983-09-27 日本電気ホームエレクトロニクス株式会社 Solvent cutting device
JPS58213495A (en) * 1982-06-07 1983-12-12 株式会社日立製作所 Cleaning device
JPH0221154B2 (en) * 1982-06-07 1990-05-11 Hitachi Ltd
JPH01137531U (en) * 1988-03-14 1989-09-20
JPH07100444A (en) * 1993-10-06 1995-04-18 Hitachi Zosen Corp Method and device for cleaning
CN107734870A (en) * 2017-09-26 2018-02-23 深圳明阳电路科技股份有限公司 A kind of rigid-flex combined board is except the method for boring dirt

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