JPS5698889A - Ingaasp semiconductor laser - Google Patents
Ingaasp semiconductor laserInfo
- Publication number
- JPS5698889A JPS5698889A JP88780A JP88780A JPS5698889A JP S5698889 A JPS5698889 A JP S5698889A JP 88780 A JP88780 A JP 88780A JP 88780 A JP88780 A JP 88780A JP S5698889 A JPS5698889 A JP S5698889A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- type
- semiconductor laser
- buffer area
- different composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/2205—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers
- H01S5/2218—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers having special optical properties
- H01S5/2219—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure comprising special burying or current confinement layers having special optical properties absorbing
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/20—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers
- H01S5/22—Structure or shape of the semiconductor body to guide the optical wave ; Confining structures perpendicular to the optical axis, e.g. index or gain guiding, stripe geometry, broad area lasers, gain tailoring, transverse or lateral reflectors, special cladding structures, MQW barrier reflection layers having a ridge or stripe structure
- H01S5/223—Buried stripe structure
- H01S5/2231—Buried stripe structure with inner confining structure only between the active layer and the upper electrode
Landscapes
- Semiconductor Lasers (AREA)
Abstract
PURPOSE:To obtain stabilized lateral mode oscillation, by forming on the active layer the buffer area that has the greater forbidden band and forming the neighboring clad layer with the different composition from the stripe oscillation region. CONSTITUTION:On the N type InP substrate 1, the N type InP layer 2 and the N type or P type InGaAs active layer are epitaxially grown in liquid phase. Further on this, P type InGaAs buffer area 4, the P type InP layer 5 and the P type InGaAsP layer 6 are stacked, and become In1-XGaXAsYP1-Y (0<=Y<=1,0.42Y<=X<= 0.5Y) hetero-junction semiconductor laser. Next, with the mask SiO2 7 etching is made up to the layer 5 and the strip oscillation region is formed. Again the epitaxial growth is made to fill both sides of it with N type InGaAsP layer 10 that has the different composition from the layer 5 and 6 and has the smaller forbidden band tnan the Layer 5. Thus the laser can be obtained capable to operate continuously at the room temperature at the wave length band of 1.5-1.6mum.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP88780A JPS5698889A (en) | 1980-01-10 | 1980-01-10 | Ingaasp semiconductor laser |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP88780A JPS5698889A (en) | 1980-01-10 | 1980-01-10 | Ingaasp semiconductor laser |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5698889A true JPS5698889A (en) | 1981-08-08 |
Family
ID=11486178
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP88780A Pending JPS5698889A (en) | 1980-01-10 | 1980-01-10 | Ingaasp semiconductor laser |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5698889A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0209387A2 (en) * | 1985-07-18 | 1987-01-21 | Sharp Kabushiki Kaisha | Semiconductor laser device |
JPS62221177A (en) * | 1986-03-24 | 1987-09-29 | Fujikura Ltd | Distributed reflection semiconductor laser |
DE19725809A1 (en) * | 1997-06-18 | 1998-12-24 | Laserspec Analytik Gmbh | Light emitting semiconductor heterostructure especially for laser diode |
-
1980
- 1980-01-10 JP JP88780A patent/JPS5698889A/en active Pending
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0209387A2 (en) * | 1985-07-18 | 1987-01-21 | Sharp Kabushiki Kaisha | Semiconductor laser device |
US4899349A (en) * | 1985-07-18 | 1990-02-06 | Sharp Kabushiki Kaisha | Semiconductor laser device |
JPS62221177A (en) * | 1986-03-24 | 1987-09-29 | Fujikura Ltd | Distributed reflection semiconductor laser |
DE19725809A1 (en) * | 1997-06-18 | 1998-12-24 | Laserspec Analytik Gmbh | Light emitting semiconductor heterostructure especially for laser diode |
DE19725809C2 (en) * | 1997-06-18 | 1999-07-22 | Laserspec Analytik Gmbh | Light-emitting semiconductor component and its use |
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