JPS5694739A - Electronic beam exposure method - Google Patents

Electronic beam exposure method

Info

Publication number
JPS5694739A
JPS5694739A JP17106479A JP17106479A JPS5694739A JP S5694739 A JPS5694739 A JP S5694739A JP 17106479 A JP17106479 A JP 17106479A JP 17106479 A JP17106479 A JP 17106479A JP S5694739 A JPS5694739 A JP S5694739A
Authority
JP
Japan
Prior art keywords
deflecting device
electrostatic
electronic
polariscope
metallic plate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17106479A
Other languages
Japanese (ja)
Inventor
Toshihiko Osada
Takayuki Miyazaki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP17106479A priority Critical patent/JPS5694739A/en
Publication of JPS5694739A publication Critical patent/JPS5694739A/en
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To prevent a deflection accuracy from lowering because of a charged pulluted material sticked to an electrostatic deflecting device by a method wherein a metallic plate having fine holes through which full electronic beams deflected by an electrostatic deflecting device pass is arranged near the electrostatic deflecting device. CONSTITUTION:A variable rectangular electronic beam exposure device is composed of an electron gun 1, an aberration lens 2, rectangular slits 3, 6 an electronic lens 4, an image forming position controlling electrostatic deflecting device 4, a reduction lens 7, a beam open angle limitation throttle valve 8, an objective 9, a positioning electromagnetic polariscope 10, a positioning electrostatic polariscope 11, a glass substrate 12 on which an electronic ray photo sensing resist is applied, an XY stage 13, and a metallic plate provided with fine holes. The metallic plate 20 provided with fine holes is arranged near the electrostatic polariscope and the electronic beam reflected from the apparatus arranged at a lower part is prevented from reaching the deflecting device, thus, the deflection accuracy to the electrostatic deflecting device due to a charge accumulation is prevented from lowering.
JP17106479A 1979-12-28 1979-12-28 Electronic beam exposure method Pending JPS5694739A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17106479A JPS5694739A (en) 1979-12-28 1979-12-28 Electronic beam exposure method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17106479A JPS5694739A (en) 1979-12-28 1979-12-28 Electronic beam exposure method

Publications (1)

Publication Number Publication Date
JPS5694739A true JPS5694739A (en) 1981-07-31

Family

ID=15916378

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17106479A Pending JPS5694739A (en) 1979-12-28 1979-12-28 Electronic beam exposure method

Country Status (1)

Country Link
JP (1) JPS5694739A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5420433A (en) * 1993-06-24 1995-05-30 Fujitsu Limited Charged particle beam exposure apparatus
JP2006210457A (en) * 2005-01-26 2006-08-10 Canon Inc Charged beam exposure device
JP2013168589A (en) * 2012-02-16 2013-08-29 Nuflare Technology Inc Electron beam lithography apparatus and electron beam lithography method
JP2013191841A (en) * 2012-02-16 2013-09-26 Nuflare Technology Inc Electron beam lithography apparatus and electron beam lithography method

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5279662A (en) * 1975-12-26 1977-07-04 Toshiba Corp Electron beam exposure device
JPS5471992A (en) * 1977-11-18 1979-06-08 Cho Lsi Gijutsu Kenkyu Kumiai Electron beam shaping aperture mask

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5279662A (en) * 1975-12-26 1977-07-04 Toshiba Corp Electron beam exposure device
JPS5471992A (en) * 1977-11-18 1979-06-08 Cho Lsi Gijutsu Kenkyu Kumiai Electron beam shaping aperture mask

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5420433A (en) * 1993-06-24 1995-05-30 Fujitsu Limited Charged particle beam exposure apparatus
JP2006210457A (en) * 2005-01-26 2006-08-10 Canon Inc Charged beam exposure device
JP4634161B2 (en) * 2005-01-26 2011-02-16 キヤノン株式会社 Charged beam exposure apparatus and device manufacturing method
JP2013168589A (en) * 2012-02-16 2013-08-29 Nuflare Technology Inc Electron beam lithography apparatus and electron beam lithography method
JP2013191841A (en) * 2012-02-16 2013-09-26 Nuflare Technology Inc Electron beam lithography apparatus and electron beam lithography method

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