JPS5693333A - Method of manufacturing insulating layer for covering one side surface of semiconductor - Google Patents
Method of manufacturing insulating layer for covering one side surface of semiconductorInfo
- Publication number
- JPS5693333A JPS5693333A JP15397180A JP15397180A JPS5693333A JP S5693333 A JPS5693333 A JP S5693333A JP 15397180 A JP15397180 A JP 15397180A JP 15397180 A JP15397180 A JP 15397180A JP S5693333 A JPS5693333 A JP S5693333A
- Authority
- JP
- Japan
- Prior art keywords
- covering
- semiconductor
- insulating layer
- manufacturing insulating
- manufacturing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 239000004065 semiconductor Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02123—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon
- H01L21/02164—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer the material containing silicon the material being a silicon oxide, e.g. SiO2
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02205—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition
- H01L21/02208—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si
- H01L21/02211—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates the layer being characterised by the precursor material for deposition the precursor containing a compound comprising Si the compound being a silane, e.g. disilane, methylsilane or chlorosilane
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Electromagnetism (AREA)
- Photovoltaic Devices (AREA)
- Formation Of Insulating Films (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19792944180 DE2944180A1 (en) | 1979-11-02 | 1979-11-02 | METHOD FOR PRODUCING AN INSULATION LAYER COVERING A SEMICONDUCTOR BODY ON ONE SIDE |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5693333A true JPS5693333A (en) | 1981-07-28 |
Family
ID=6084926
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15397180A Pending JPS5693333A (en) | 1979-11-02 | 1980-11-04 | Method of manufacturing insulating layer for covering one side surface of semiconductor |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPS5693333A (en) |
DE (1) | DE2944180A1 (en) |
FR (1) | FR2468996A1 (en) |
GB (1) | GB2062962A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59111329A (en) * | 1982-12-17 | 1984-06-27 | Fuji Electric Corp Res & Dev Ltd | Manufacture of coated thin-film |
JPH01216544A (en) * | 1988-02-24 | 1989-08-30 | Sharp Corp | Forming method for passivation film of semiconductor element |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5676538A (en) * | 1979-11-28 | 1981-06-24 | Sumitomo Electric Ind Ltd | Formation of insulating film on semiconductor substrate |
US4935095A (en) * | 1985-06-21 | 1990-06-19 | National Semiconductor Corporation | Germanosilicate spin-on glasses |
EP0218117A3 (en) * | 1985-10-11 | 1989-11-23 | Allied Corporation | Cyclosilazane polymers as dielectric films in integrated circuit fabrication technology |
DE3725134A1 (en) * | 1987-07-29 | 1989-02-09 | Basf Ag | FLAECHENFOERMIGES, MULTILAYER, LASEROPTIC RECORDING MATERIAL |
DE3831857A1 (en) * | 1988-09-20 | 1990-03-22 | Meinhard Prof Dr Ing Knoll | Process for producing a light-transmitting dielectric from a doped silicon compound in an inversion-layer solar cell |
DE3833931A1 (en) * | 1988-10-05 | 1990-04-12 | Texas Instruments Deutschland | Method for producing a doped insulator layer |
US4894352A (en) * | 1988-10-26 | 1990-01-16 | Texas Instruments Inc. | Deposition of silicon-containing films using organosilicon compounds and nitrogen trifluoride |
US5186745A (en) * | 1991-02-04 | 1993-02-16 | Motorola, Inc. | Teos based spin-on-glass and processes for making and using the same |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US505582A (en) * | 1893-09-26 | Speed-measure | ||
US3601667A (en) * | 1968-12-09 | 1971-08-24 | Gen Electric | A semiconductor device with a heat sink having a foot portion |
US3707944A (en) * | 1970-10-23 | 1973-01-02 | Ibm | Automatic photoresist apply and dry apparatus |
US3695928A (en) * | 1970-12-07 | 1972-10-03 | Western Electric Co | Selective coating |
US3889632A (en) * | 1974-05-31 | 1975-06-17 | Ibm | Variable incidence drive for deposition tooling |
DE2506457C3 (en) * | 1975-02-15 | 1980-01-24 | S.A. Metallurgie Hoboken-Overpelt N.V., Bruessel | Process for the production of a silicate covering layer on a semiconductor wafer or on a layer thereon |
DE2637105B2 (en) * | 1976-08-18 | 1978-10-05 | Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt | Method for evenly distributing a varnish |
US4068019A (en) * | 1976-11-08 | 1978-01-10 | International Business Machines Corporation | Spin coating process for prevention of edge buildup |
DE2743011C2 (en) * | 1977-09-23 | 1982-06-03 | Siemens AG, 1000 Berlin und 8000 München | Arrangement for applying a light-sensitive lacquer layer to a semiconductor wafer |
DD136673A1 (en) * | 1977-10-21 | 1979-07-18 | Manfred Schwan | METHOD OF APPLYING PROTECTION AND ISOLATION LAYERS ON OVAL SEMICONDUCTOR SURFACES |
-
1979
- 1979-11-02 DE DE19792944180 patent/DE2944180A1/en not_active Ceased
-
1980
- 1980-10-31 FR FR8023370A patent/FR2468996A1/en not_active Withdrawn
- 1980-11-03 GB GB8035287A patent/GB2062962A/en not_active Withdrawn
- 1980-11-04 JP JP15397180A patent/JPS5693333A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59111329A (en) * | 1982-12-17 | 1984-06-27 | Fuji Electric Corp Res & Dev Ltd | Manufacture of coated thin-film |
JPH01216544A (en) * | 1988-02-24 | 1989-08-30 | Sharp Corp | Forming method for passivation film of semiconductor element |
Also Published As
Publication number | Publication date |
---|---|
GB2062962A (en) | 1981-05-28 |
DE2944180A1 (en) | 1981-05-07 |
FR2468996A1 (en) | 1981-05-08 |
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