JPS568560A - Method and device for resistance measurement - Google Patents
Method and device for resistance measurementInfo
- Publication number
- JPS568560A JPS568560A JP8374379A JP8374379A JPS568560A JP S568560 A JPS568560 A JP S568560A JP 8374379 A JP8374379 A JP 8374379A JP 8374379 A JP8374379 A JP 8374379A JP S568560 A JPS568560 A JP S568560A
- Authority
- JP
- Japan
- Prior art keywords
- resistance
- rays
- filament
- baking
- processor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
- Measurement Of Resistance Or Impedance (AREA)
Abstract
PURPOSE: To ensure the high-accuracy measurement for the resistance value, by irradiating X-rays to the resistance line to be measured and then measuring and calculating the resistance value from the secondary X-ray intensity.
CONSTITUTION: Shift table 11 to which measuring subject 12 with no baking given yet is fixed is positioned under head support rest 21. Then measuring head 23 is positioned right above thin line part 1a' of filament 1a. Shutter 58 is opened to irradiate the X-rays to part 1a', and then the secondary X-rays sent from 1a are supplied to proportional counter tube 34. Then the intensity value of the secondary X-rays is supplied to processor 55a via high frequency discriminator 53 and others. Processor 55a calculates the resistance after baking for part 1a'of filament 1a, and stores the calculated result in memory unit 55c. Hereafter, processor 55a calculates the resistance after baking for each filament, and then calculates parallel compound resistance R to then decide whether R is within the allowable range. In such constitution, an extremely high-accuracy measurement is possible for the resistance.
COPYRIGHT: (C)1981,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8374379A JPS568560A (en) | 1979-07-02 | 1979-07-02 | Method and device for resistance measurement |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8374379A JPS568560A (en) | 1979-07-02 | 1979-07-02 | Method and device for resistance measurement |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS568560A true JPS568560A (en) | 1981-01-28 |
JPS6336460B2 JPS6336460B2 (en) | 1988-07-20 |
Family
ID=13810999
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8374379A Granted JPS568560A (en) | 1979-07-02 | 1979-07-02 | Method and device for resistance measurement |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS568560A (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5276971A (en) * | 1975-12-19 | 1977-06-28 | Sierracin Corp | Method of monitoring surface resistance ratio of metallic deposition film |
JPS5429843A (en) * | 1977-08-10 | 1979-03-06 | Nippon Steel Corp | Controlling method for composition and thickness of plated multicomponent alloy films |
-
1979
- 1979-07-02 JP JP8374379A patent/JPS568560A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5276971A (en) * | 1975-12-19 | 1977-06-28 | Sierracin Corp | Method of monitoring surface resistance ratio of metallic deposition film |
JPS5429843A (en) * | 1977-08-10 | 1979-03-06 | Nippon Steel Corp | Controlling method for composition and thickness of plated multicomponent alloy films |
Also Published As
Publication number | Publication date |
---|---|
JPS6336460B2 (en) | 1988-07-20 |
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