JPS568560A - Method and device for resistance measurement - Google Patents

Method and device for resistance measurement

Info

Publication number
JPS568560A
JPS568560A JP8374379A JP8374379A JPS568560A JP S568560 A JPS568560 A JP S568560A JP 8374379 A JP8374379 A JP 8374379A JP 8374379 A JP8374379 A JP 8374379A JP S568560 A JPS568560 A JP S568560A
Authority
JP
Japan
Prior art keywords
resistance
rays
filament
baking
processor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8374379A
Other languages
Japanese (ja)
Other versions
JPS6336460B2 (en
Inventor
Kazuo Katsuki
Katsuhisa Enjoji
Toshio Yamada
Sanenori Oka
Makoto Nishimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Nippon Sheet Glass Co Ltd
Original Assignee
Seiko Instruments Inc
Nippon Sheet Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc, Nippon Sheet Glass Co Ltd filed Critical Seiko Instruments Inc
Priority to JP8374379A priority Critical patent/JPS568560A/en
Publication of JPS568560A publication Critical patent/JPS568560A/en
Publication of JPS6336460B2 publication Critical patent/JPS6336460B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Analysing Materials By The Use Of Radiation (AREA)
  • Measurement Of Resistance Or Impedance (AREA)

Abstract

PURPOSE: To ensure the high-accuracy measurement for the resistance value, by irradiating X-rays to the resistance line to be measured and then measuring and calculating the resistance value from the secondary X-ray intensity.
CONSTITUTION: Shift table 11 to which measuring subject 12 with no baking given yet is fixed is positioned under head support rest 21. Then measuring head 23 is positioned right above thin line part 1a' of filament 1a. Shutter 58 is opened to irradiate the X-rays to part 1a', and then the secondary X-rays sent from 1a are supplied to proportional counter tube 34. Then the intensity value of the secondary X-rays is supplied to processor 55a via high frequency discriminator 53 and others. Processor 55a calculates the resistance after baking for part 1a'of filament 1a, and stores the calculated result in memory unit 55c. Hereafter, processor 55a calculates the resistance after baking for each filament, and then calculates parallel compound resistance R to then decide whether R is within the allowable range. In such constitution, an extremely high-accuracy measurement is possible for the resistance.
COPYRIGHT: (C)1981,JPO&Japio
JP8374379A 1979-07-02 1979-07-02 Method and device for resistance measurement Granted JPS568560A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8374379A JPS568560A (en) 1979-07-02 1979-07-02 Method and device for resistance measurement

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8374379A JPS568560A (en) 1979-07-02 1979-07-02 Method and device for resistance measurement

Publications (2)

Publication Number Publication Date
JPS568560A true JPS568560A (en) 1981-01-28
JPS6336460B2 JPS6336460B2 (en) 1988-07-20

Family

ID=13810999

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8374379A Granted JPS568560A (en) 1979-07-02 1979-07-02 Method and device for resistance measurement

Country Status (1)

Country Link
JP (1) JPS568560A (en)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5276971A (en) * 1975-12-19 1977-06-28 Sierracin Corp Method of monitoring surface resistance ratio of metallic deposition film
JPS5429843A (en) * 1977-08-10 1979-03-06 Nippon Steel Corp Controlling method for composition and thickness of plated multicomponent alloy films

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5276971A (en) * 1975-12-19 1977-06-28 Sierracin Corp Method of monitoring surface resistance ratio of metallic deposition film
JPS5429843A (en) * 1977-08-10 1979-03-06 Nippon Steel Corp Controlling method for composition and thickness of plated multicomponent alloy films

Also Published As

Publication number Publication date
JPS6336460B2 (en) 1988-07-20

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