JPS5678123A - Position detecting method for photomask - Google Patents

Position detecting method for photomask

Info

Publication number
JPS5678123A
JPS5678123A JP15533779A JP15533779A JPS5678123A JP S5678123 A JPS5678123 A JP S5678123A JP 15533779 A JP15533779 A JP 15533779A JP 15533779 A JP15533779 A JP 15533779A JP S5678123 A JPS5678123 A JP S5678123A
Authority
JP
Japan
Prior art keywords
pattern
graduations
short time
detected
reticle
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15533779A
Other languages
Japanese (ja)
Other versions
JPS5738024B2 (en
Inventor
Kenichi Kobayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP15533779A priority Critical patent/JPS5678123A/en
Publication of JPS5678123A publication Critical patent/JPS5678123A/en
Publication of JPS5738024B2 publication Critical patent/JPS5738024B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE:To accurately detect the desired photomask position in a short time by a method wherein an equally arranged coordinate graduation pattern is provided toward X and Y directions on the element pattern circumference of a reticle. CONSTITUTION:An equally arranged coordinate graduation pattern 14 is formed in the circumference of the element pattern 11 of a reticle 10 and graduations 14' of the same scale as each element pattern are provided using the technique which is commonly known. By utilizing these graduations 14 and 14', the desired position can be detected in each element pattern in a short time without having a scaling error. For instance, when a defect 13 has been detected in a pattern 11-7, coordinates can be found by the number of graduations of the pattern 14' which was calculated in advance, and when the graduations of other element patterns are calculated in accordance with the above coordinate value, the position can be detected accurately in a short time, and the scaling error for every device and the positioning error at the time of pattern printing give no influence at all.
JP15533779A 1979-11-30 1979-11-30 Position detecting method for photomask Granted JPS5678123A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15533779A JPS5678123A (en) 1979-11-30 1979-11-30 Position detecting method for photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15533779A JPS5678123A (en) 1979-11-30 1979-11-30 Position detecting method for photomask

Publications (2)

Publication Number Publication Date
JPS5678123A true JPS5678123A (en) 1981-06-26
JPS5738024B2 JPS5738024B2 (en) 1982-08-13

Family

ID=15603677

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15533779A Granted JPS5678123A (en) 1979-11-30 1979-11-30 Position detecting method for photomask

Country Status (1)

Country Link
JP (1) JPS5678123A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6046724U (en) * 1983-09-07 1985-04-02 株式会社カナメ Connection plate for horizontal roofing materials
JPS60162619U (en) * 1985-03-04 1985-10-29 船木　元旦 Connecting device for surface structural materials
JPH0524743Y2 (en) * 1987-06-29 1993-06-23

Also Published As

Publication number Publication date
JPS5738024B2 (en) 1982-08-13

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