JPS5673617A - Manufacture of trichlorosilane - Google Patents

Manufacture of trichlorosilane

Info

Publication number
JPS5673617A
JPS5673617A JP14923879A JP14923879A JPS5673617A JP S5673617 A JPS5673617 A JP S5673617A JP 14923879 A JP14923879 A JP 14923879A JP 14923879 A JP14923879 A JP 14923879A JP S5673617 A JPS5673617 A JP S5673617A
Authority
JP
Japan
Prior art keywords
trichlorosilane
furnace
hydrogen
fed
hydrogen chloride
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14923879A
Other languages
Japanese (ja)
Other versions
JPS6259051B2 (en
Inventor
Toshio Noda
Eiichi Nakayama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Osaka Titanium Co Ltd
Original Assignee
Osaka Titanium Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Osaka Titanium Co Ltd filed Critical Osaka Titanium Co Ltd
Priority to JP14923879A priority Critical patent/JPS5673617A/en
Publication of JPS5673617A publication Critical patent/JPS5673617A/en
Publication of JPS6259051B2 publication Critical patent/JPS6259051B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE: To efficiently manufacture trichlorosilane by simultaneously carrying out the synthesis of trichlorosilane and the conversion of by-product silicon tetrachloride into trichlorosilane by hydrogenation in the same reactor.
CONSTITUTION: Metallic silicon contg. copper dust is filled into trichlorosilane manufacturing furnace 1 and heated to about 500°C, and it is supplied by a predetermined amount each time. Hydrogen chloride, hydrogen and silicon tetrachloride are fed into furnace 1 through evaporator 7 in a predetermined ratio to cause continuous reaction. The gaseous reaction product is passed through condensation separator 2 of about -70W-80°C to condense SiHCl3 and SiCl4, and they enter distillation purifying process 4. The uncondensed gas is fed to condensation separator 3 of about -150W-180°C to liquefy hydrogen chloride, and hydrogen gas passes through separator 3. The recovered hydrogen chloride, hydrogen gas and SiCl4 are used in furnace 1 again. On the other hand, the SiHCl3 is fed to polycrystalline silicon depositing furnace 9 through evaporator 8 together with hydrogen gas to manufacture polycrystalline silicon.
COPYRIGHT: (C)1981,JPO&Japio
JP14923879A 1979-11-17 1979-11-17 Manufacture of trichlorosilane Granted JPS5673617A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14923879A JPS5673617A (en) 1979-11-17 1979-11-17 Manufacture of trichlorosilane

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14923879A JPS5673617A (en) 1979-11-17 1979-11-17 Manufacture of trichlorosilane

Publications (2)

Publication Number Publication Date
JPS5673617A true JPS5673617A (en) 1981-06-18
JPS6259051B2 JPS6259051B2 (en) 1987-12-09

Family

ID=15470895

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14923879A Granted JPS5673617A (en) 1979-11-17 1979-11-17 Manufacture of trichlorosilane

Country Status (1)

Country Link
JP (1) JPS5673617A (en)

Cited By (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4526769A (en) * 1983-07-18 1985-07-02 Motorola, Inc. Trichlorosilane production process
WO2002048034A1 (en) * 2000-12-11 2002-06-20 Solarworld Aktiengesellschaft Method for the production of high purity silicon
WO2002048024A3 (en) * 2000-12-14 2003-03-27 Solarworld Ag Method for producing trichlorosilane
JP2008303142A (en) * 2001-06-08 2008-12-18 Hemlock Semiconductor Corp Process for producing polycrystalline silicon
WO2010116500A1 (en) * 2009-04-08 2010-10-14 電気化学工業株式会社 Trichlorosilane cooling tower and trichlorosilane manufacturing method using the same
WO2011102265A1 (en) 2010-02-18 2011-08-25 株式会社トクヤマ Production method for trichlorosilane
WO2011111335A1 (en) 2010-03-10 2011-09-15 信越化学工業株式会社 Method for producing trichlorosilane
JP2012144427A (en) * 2011-01-07 2012-08-02 Mitsubishi Materials Corp Apparatus and method for producing polycrystalline silicon having reduced amount of boron compound by venting system with inert gas
JP2013535399A (en) * 2010-08-13 2013-09-12 エルケム アクシエセルスカプ Method for producing trichlorosilane and silicon for the production of trichlorosilane
JP2013193941A (en) * 2012-03-22 2013-09-30 Osaka Titanium Technologies Co Ltd Method and apparatus for manufacturing chlorosilanes
WO2013187070A1 (en) 2012-06-14 2013-12-19 信越化学工業株式会社 Method for producing high-purity polycrystalline silicon
WO2014125762A1 (en) 2013-02-13 2014-08-21 信越化学工業株式会社 Method for producing trichlorosilane
WO2015047043A1 (en) 2013-09-30 2015-04-02 주식회사 엘지화학 Method for producing trichlorosilane
KR20150037681A (en) 2013-09-30 2015-04-08 주식회사 엘지화학 Process for producing trichlorosilane
WO2015111885A1 (en) 2014-01-23 2015-07-30 한국화학연구원 Method for surface-modifying metal silicide, and method and apparatus for preparing trichlorosilane using surface-modified metal silicide
KR20160069371A (en) 2014-12-08 2016-06-16 주식회사 엘지화학 Dispersion of silicon metal powder and process for producing chlorosilane using same
KR20160069380A (en) 2014-12-08 2016-06-16 주식회사 엘지화학 Dispersion of silicon metal powder and process for producing chlorosilane using same
KR20160102807A (en) 2015-02-23 2016-08-31 주식회사 엘지화학 Dispersion of silicon metal powder and process for producing chlorosilane using same
KR20160144609A (en) 2015-06-09 2016-12-19 주식회사 엘지화학 Dispersion of silicon metal powder and process for producing chlorosilane using same
KR20170001465A (en) 2015-06-26 2017-01-04 주식회사 엘지화학 Apparatus and process for producing trichlorosilane
KR20170001411A (en) 2015-06-26 2017-01-04 주식회사 엘지화학 Apparatus and process for producing trichlorosilane
CN106470943A (en) * 2014-05-13 2017-03-01 株式会社Lg化学 The method preparing chlorosilane gas using continuous tubular reactor
KR20170027824A (en) 2014-07-10 2017-03-10 신에쓰 가가꾸 고교 가부시끼가이샤 Method for purifying chlorosilane
KR20170031878A (en) 2015-09-14 2017-03-22 주식회사 엘지화학 Apparatus and process for producing trichlorosilane
KR20170032553A (en) 2015-09-15 2017-03-23 주식회사 엘지화학 Process for producing trichlorosilane
US10065864B2 (en) 2014-07-22 2018-09-04 Hanwha Chemical Corporation Method of preparing trichlorosilan

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101143723B (en) * 2007-08-08 2010-09-01 徐州东南多晶硅材料研发有限公司 Modified method and device for preparing trichlorosilane and multicrystal silicon
CN103723734B (en) * 2012-10-10 2015-09-09 浙江昱辉阳光能源有限公司 A kind of technique preparing trichlorosilane
CN110655086A (en) * 2019-11-12 2020-01-07 唐山三孚硅业股份有限公司 Method for improving silicon tetrachloride conversion rate in trichlorosilane production process

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3148035A (en) * 1960-03-10 1964-09-08 Wacker Chemie Gmbh Apparatus for the continuous production of silicon chloroform and/or silicon tetrachloride
JPS52133022A (en) * 1976-04-30 1977-11-08 Mitsubishi Metal Corp Production of high purity silicon
JPS5433896A (en) * 1977-06-13 1979-03-12 Texas Instruments Inc Conversion of silicon tetrahalide into triholosilane

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3148035A (en) * 1960-03-10 1964-09-08 Wacker Chemie Gmbh Apparatus for the continuous production of silicon chloroform and/or silicon tetrachloride
JPS52133022A (en) * 1976-04-30 1977-11-08 Mitsubishi Metal Corp Production of high purity silicon
JPS5433896A (en) * 1977-06-13 1979-03-12 Texas Instruments Inc Conversion of silicon tetrahalide into triholosilane

Cited By (37)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4526769A (en) * 1983-07-18 1985-07-02 Motorola, Inc. Trichlorosilane production process
WO2002048034A1 (en) * 2000-12-11 2002-06-20 Solarworld Aktiengesellschaft Method for the production of high purity silicon
DE10061682A1 (en) * 2000-12-11 2002-07-04 Solarworld Ag Process for the production of high-purity silicon
US6887448B2 (en) 2000-12-11 2005-05-03 Solarworld Ag Method for production of high purity silicon
WO2002048024A3 (en) * 2000-12-14 2003-03-27 Solarworld Ag Method for producing trichlorosilane
JP2008303142A (en) * 2001-06-08 2008-12-18 Hemlock Semiconductor Corp Process for producing polycrystalline silicon
WO2010116500A1 (en) * 2009-04-08 2010-10-14 電気化学工業株式会社 Trichlorosilane cooling tower and trichlorosilane manufacturing method using the same
JPWO2010116500A1 (en) * 2009-04-08 2012-10-11 電気化学工業株式会社 Trichlorosilane cooling tower and method for producing trichlorosilane using the same
EP2537803A4 (en) * 2010-02-18 2016-10-19 Tokuyama Corp Production method for trichlorosilane
US9321653B2 (en) 2010-02-18 2016-04-26 Tokuyama Corporation Process for producing trichlorosilane
WO2011102265A1 (en) 2010-02-18 2011-08-25 株式会社トクヤマ Production method for trichlorosilane
KR20130008529A (en) 2010-02-18 2013-01-22 가부시끼가이샤 도꾸야마 Production method for trichlorosilane
US9266742B2 (en) 2010-03-10 2016-02-23 Shin-Etsu Chemical Co., Ltd. Method for producing trichlorosilane
WO2011111335A1 (en) 2010-03-10 2011-09-15 信越化学工業株式会社 Method for producing trichlorosilane
JP2013535399A (en) * 2010-08-13 2013-09-12 エルケム アクシエセルスカプ Method for producing trichlorosilane and silicon for the production of trichlorosilane
JP2012144427A (en) * 2011-01-07 2012-08-02 Mitsubishi Materials Corp Apparatus and method for producing polycrystalline silicon having reduced amount of boron compound by venting system with inert gas
JP2013193941A (en) * 2012-03-22 2013-09-30 Osaka Titanium Technologies Co Ltd Method and apparatus for manufacturing chlorosilanes
WO2013187070A1 (en) 2012-06-14 2013-12-19 信越化学工業株式会社 Method for producing high-purity polycrystalline silicon
US9355918B2 (en) 2012-06-14 2016-05-31 Shin-Etsu Chemical Co., Ltd. Method for producing high-purity polycrystalline silicon
EP3170791A1 (en) 2012-06-14 2017-05-24 Shin-Etsu Chemical Co., Ltd. Method for producing high-purity polycrystalline silicon
WO2014125762A1 (en) 2013-02-13 2014-08-21 信越化学工業株式会社 Method for producing trichlorosilane
WO2015047043A1 (en) 2013-09-30 2015-04-02 주식회사 엘지화학 Method for producing trichlorosilane
KR20150037681A (en) 2013-09-30 2015-04-08 주식회사 엘지화학 Process for producing trichlorosilane
US9643851B2 (en) 2013-09-30 2017-05-09 Lg Chem, Ltd. Method for producing trichlorosilane
WO2015111885A1 (en) 2014-01-23 2015-07-30 한국화학연구원 Method for surface-modifying metal silicide, and method and apparatus for preparing trichlorosilane using surface-modified metal silicide
CN106470943A (en) * 2014-05-13 2017-03-01 株式会社Lg化学 The method preparing chlorosilane gas using continuous tubular reactor
US10301182B2 (en) 2014-05-13 2019-05-28 Lg Chem, Ltd. Method for producing chlorosilane gas using continuous tubular reactor
KR20170027824A (en) 2014-07-10 2017-03-10 신에쓰 가가꾸 고교 가부시끼가이샤 Method for purifying chlorosilane
US10065864B2 (en) 2014-07-22 2018-09-04 Hanwha Chemical Corporation Method of preparing trichlorosilan
KR20160069380A (en) 2014-12-08 2016-06-16 주식회사 엘지화학 Dispersion of silicon metal powder and process for producing chlorosilane using same
KR20160069371A (en) 2014-12-08 2016-06-16 주식회사 엘지화학 Dispersion of silicon metal powder and process for producing chlorosilane using same
KR20160102807A (en) 2015-02-23 2016-08-31 주식회사 엘지화학 Dispersion of silicon metal powder and process for producing chlorosilane using same
KR20160144609A (en) 2015-06-09 2016-12-19 주식회사 엘지화학 Dispersion of silicon metal powder and process for producing chlorosilane using same
KR20170001465A (en) 2015-06-26 2017-01-04 주식회사 엘지화학 Apparatus and process for producing trichlorosilane
KR20170001411A (en) 2015-06-26 2017-01-04 주식회사 엘지화학 Apparatus and process for producing trichlorosilane
KR20170031878A (en) 2015-09-14 2017-03-22 주식회사 엘지화학 Apparatus and process for producing trichlorosilane
KR20170032553A (en) 2015-09-15 2017-03-23 주식회사 엘지화학 Process for producing trichlorosilane

Also Published As

Publication number Publication date
JPS6259051B2 (en) 1987-12-09

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