JPS5672440A - Developing liquid composition for lithographic plate - Google Patents
Developing liquid composition for lithographic plateInfo
- Publication number
- JPS5672440A JPS5672440A JP15025579A JP15025579A JPS5672440A JP S5672440 A JPS5672440 A JP S5672440A JP 15025579 A JP15025579 A JP 15025579A JP 15025579 A JP15025579 A JP 15025579A JP S5672440 A JPS5672440 A JP S5672440A
- Authority
- JP
- Japan
- Prior art keywords
- acid
- organic
- carbonate
- main chain
- lithographic plate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/30—Imagewise removal using liquid means
- G03F7/32—Liquid compositions therefor, e.g. developers
- G03F7/325—Non-aqueous compositions
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Abstract
PURPOSE:To obtain a superior printing master, by adding an organic carbonate, a mineral acid, and one or more of organic carboxylic aicd and sulfonic acid to a printing master developer having a coat layer of a photosensitive polymer having a specified unsaturated carboxylic acid ester in the main chain. CONSTITUTION:A photosensitive layer made of a photosensitive polymer having in the main chain a group represented by the formula, X, Y being H, halogen, CN, or NO2, and (n) being 1 or 2, such as a condensation product from p-phenylenediacrylic acid, bisphenol A, and triethylene glycol is formed on an aluminum plate made hydrophilic. A lithographic plate having a superior image free from ground stain is obtained by using a developer containing an organic carbonate such as ethylene carbonate, one or more acids of a group of a mineral acid, such as phosphoric acid or hydrochloric acid, an organic acid such as acetic acid, and an organic sulfonic acid such as benzenesulfonic acid, and a good solvent such as ethylene glycol monophenyl ether.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15025579A JPS5672440A (en) | 1979-11-20 | 1979-11-20 | Developing liquid composition for lithographic plate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15025579A JPS5672440A (en) | 1979-11-20 | 1979-11-20 | Developing liquid composition for lithographic plate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5672440A true JPS5672440A (en) | 1981-06-16 |
Family
ID=15492937
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15025579A Pending JPS5672440A (en) | 1979-11-20 | 1979-11-20 | Developing liquid composition for lithographic plate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5672440A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05216242A (en) * | 1991-10-22 | 1993-08-27 | Internatl Business Mach Corp <Ibm> | Solvent composition for development of photoresist and strip |
WO2014178285A1 (en) * | 2013-05-02 | 2014-11-06 | 富士フイルム株式会社 | Pattern-forming method, electronic device and method for producing same, and developing fluid |
-
1979
- 1979-11-20 JP JP15025579A patent/JPS5672440A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH05216242A (en) * | 1991-10-22 | 1993-08-27 | Internatl Business Mach Corp <Ibm> | Solvent composition for development of photoresist and strip |
WO2014178285A1 (en) * | 2013-05-02 | 2014-11-06 | 富士フイルム株式会社 | Pattern-forming method, electronic device and method for producing same, and developing fluid |
JP2014219487A (en) * | 2013-05-02 | 2014-11-20 | 富士フイルム株式会社 | Pattern formation method, electronic device and method of manufacturing the same, developer |
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