JPS5669635A - Developing device of positive type photoresist - Google Patents

Developing device of positive type photoresist

Info

Publication number
JPS5669635A
JPS5669635A JP14517579A JP14517579A JPS5669635A JP S5669635 A JPS5669635 A JP S5669635A JP 14517579 A JP14517579 A JP 14517579A JP 14517579 A JP14517579 A JP 14517579A JP S5669635 A JPS5669635 A JP S5669635A
Authority
JP
Japan
Prior art keywords
developing
soln
inert gas
vessel
developing device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14517579A
Other languages
Japanese (ja)
Inventor
Hiroyuki Oshima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Suwa Seikosha KK
Original Assignee
Seiko Epson Corp
Suwa Seikosha KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp, Suwa Seikosha KK filed Critical Seiko Epson Corp
Priority to JP14517579A priority Critical patent/JPS5669635A/en
Publication of JPS5669635A publication Critical patent/JPS5669635A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)

Abstract

PURPOSE:To maintain a developing capacity which is stable for a long period of time while making developing operation easy by the use of a normally open developing device, by covering the surface of the developing soln. in a developing vessel with an inert gas. CONSTITUTION:An inflow port 3 and an outflow port 4 for an inert gas (for example, nitrogen gas) are mounted to a top open developing vessel 1 contg. the developing soln. 2, and the surface of the developing soln. 2 is covered by the layer of the inert gas admitted from the inflow port 3 and exhausting from the outflow part 4, whereby the contact with the outside air (particularly the carbon dioxide in the air) is shut off and the developing device of positive type photoresist is thus formed. Hence, while the deterioration of the developing soln. is being prevented, the developing of the resist may be performed stably for a long period of time in the state that the development operation is easy by using the open vessel.
JP14517579A 1979-11-09 1979-11-09 Developing device of positive type photoresist Pending JPS5669635A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14517579A JPS5669635A (en) 1979-11-09 1979-11-09 Developing device of positive type photoresist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14517579A JPS5669635A (en) 1979-11-09 1979-11-09 Developing device of positive type photoresist

Publications (1)

Publication Number Publication Date
JPS5669635A true JPS5669635A (en) 1981-06-11

Family

ID=15379160

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14517579A Pending JPS5669635A (en) 1979-11-09 1979-11-09 Developing device of positive type photoresist

Country Status (1)

Country Link
JP (1) JPS5669635A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109932874A (en) * 2019-04-25 2019-06-25 北京中科飞鸿科技有限公司 A method of improving SAW device development consistency

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109932874A (en) * 2019-04-25 2019-06-25 北京中科飞鸿科技有限公司 A method of improving SAW device development consistency

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