JPS5669624A - Photoresist composition - Google Patents
Photoresist compositionInfo
- Publication number
- JPS5669624A JPS5669624A JP14505179A JP14505179A JPS5669624A JP S5669624 A JPS5669624 A JP S5669624A JP 14505179 A JP14505179 A JP 14505179A JP 14505179 A JP14505179 A JP 14505179A JP S5669624 A JPS5669624 A JP S5669624A
- Authority
- JP
- Japan
- Prior art keywords
- compound
- photoresist composition
- added
- conjugated diene
- amount
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
Abstract
PURPOSE: To obtain a composition capable of forming an image of high resolution even on a substrate having a surface of high reflectance by adding a specified compound to a photoresist composition of diamide compound-conjugated diene cyclized polymer type.
CONSTITUTION: A compound (d) such as diazoaminobenzene represented by the formula (where each of Ar and Ar' is an aromatic group) is added to a conjugated diene (co)polymer (a), an org. solvent-soluble photocross-linking agent (b) which is an azide type photosensitive substance such as 4,4'-diazidostilbene and a shelf stabilizer (c) such as hydroquinone. The amount of compound (d) added is about 0.1W10wt% to the amount of component (a).
COPYRIGHT: (C)1981,JPO&Japio
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14505179A JPS5669624A (en) | 1979-11-09 | 1979-11-09 | Photoresist composition |
US06/185,771 US4349619A (en) | 1979-09-19 | 1980-09-10 | Photoresist composition |
EP80303280A EP0026088B1 (en) | 1979-09-19 | 1980-09-18 | Photoresist compositions |
DE8080303280T DE3065699D1 (en) | 1979-09-19 | 1980-09-18 | Photoresist compositions |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14505179A JPS5669624A (en) | 1979-11-09 | 1979-11-09 | Photoresist composition |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5669624A true JPS5669624A (en) | 1981-06-11 |
JPS622304B2 JPS622304B2 (en) | 1987-01-19 |
Family
ID=15376238
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14505179A Granted JPS5669624A (en) | 1979-09-19 | 1979-11-09 | Photoresist composition |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5669624A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60208749A (en) * | 1984-04-02 | 1985-10-21 | Japan Synthetic Rubber Co Ltd | Photoresist composition |
-
1979
- 1979-11-09 JP JP14505179A patent/JPS5669624A/en active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60208749A (en) * | 1984-04-02 | 1985-10-21 | Japan Synthetic Rubber Co Ltd | Photoresist composition |
Also Published As
Publication number | Publication date |
---|---|
JPS622304B2 (en) | 1987-01-19 |
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