JPS5669624A - Photoresist composition - Google Patents

Photoresist composition

Info

Publication number
JPS5669624A
JPS5669624A JP14505179A JP14505179A JPS5669624A JP S5669624 A JPS5669624 A JP S5669624A JP 14505179 A JP14505179 A JP 14505179A JP 14505179 A JP14505179 A JP 14505179A JP S5669624 A JPS5669624 A JP S5669624A
Authority
JP
Japan
Prior art keywords
compound
photoresist composition
added
conjugated diene
amount
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP14505179A
Other languages
Japanese (ja)
Other versions
JPS622304B2 (en
Inventor
Yoichi Kamoshita
Toshiaki Yoshihara
Yoshiyuki Harita
Toko Harada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP14505179A priority Critical patent/JPS5669624A/en
Priority to US06/185,771 priority patent/US4349619A/en
Priority to EP80303280A priority patent/EP0026088B1/en
Priority to DE8080303280T priority patent/DE3065699D1/en
Publication of JPS5669624A publication Critical patent/JPS5669624A/en
Publication of JPS622304B2 publication Critical patent/JPS622304B2/ja
Granted legal-status Critical Current

Links

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  • Compositions Of Macromolecular Compounds (AREA)

Abstract

PURPOSE: To obtain a composition capable of forming an image of high resolution even on a substrate having a surface of high reflectance by adding a specified compound to a photoresist composition of diamide compound-conjugated diene cyclized polymer type.
CONSTITUTION: A compound (d) such as diazoaminobenzene represented by the formula (where each of Ar and Ar' is an aromatic group) is added to a conjugated diene (co)polymer (a), an org. solvent-soluble photocross-linking agent (b) which is an azide type photosensitive substance such as 4,4'-diazidostilbene and a shelf stabilizer (c) such as hydroquinone. The amount of compound (d) added is about 0.1W10wt% to the amount of component (a).
COPYRIGHT: (C)1981,JPO&Japio
JP14505179A 1979-09-19 1979-11-09 Photoresist composition Granted JPS5669624A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP14505179A JPS5669624A (en) 1979-11-09 1979-11-09 Photoresist composition
US06/185,771 US4349619A (en) 1979-09-19 1980-09-10 Photoresist composition
EP80303280A EP0026088B1 (en) 1979-09-19 1980-09-18 Photoresist compositions
DE8080303280T DE3065699D1 (en) 1979-09-19 1980-09-18 Photoresist compositions

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14505179A JPS5669624A (en) 1979-11-09 1979-11-09 Photoresist composition

Publications (2)

Publication Number Publication Date
JPS5669624A true JPS5669624A (en) 1981-06-11
JPS622304B2 JPS622304B2 (en) 1987-01-19

Family

ID=15376238

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14505179A Granted JPS5669624A (en) 1979-09-19 1979-11-09 Photoresist composition

Country Status (1)

Country Link
JP (1) JPS5669624A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60208749A (en) * 1984-04-02 1985-10-21 Japan Synthetic Rubber Co Ltd Photoresist composition

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60208749A (en) * 1984-04-02 1985-10-21 Japan Synthetic Rubber Co Ltd Photoresist composition

Also Published As

Publication number Publication date
JPS622304B2 (en) 1987-01-19

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